Impedance matching network, plasma control system, and impedance matching method

TW202640697APending Publication Date: 2026-10-01ROHDE & SCHWARZ GMBH & CO KG
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Patent Information

Application Number
TW114139896
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-20
Filing Date
2025-10-16
Publication Date
2026-10-01

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Abstract

An impedance matching network for plasma processes is described. The impedance matching network comprises an input port being connectable to a radio frequency, RF, generator circuit. The impedance matching network further comprises an output port being connectable to a load. The impedance matching network further comprises a transmission line, wherein the transmission line connects the output port to the input port. The impedance matching network comprises an impedance matching circuit
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