Substrate processing system, maintenance device, and maintenance method

Abstract

The substrate processing system disclosed in this invention includes a plasma processing chamber, a transport chamber, a transport device, at least one light source, and a light receiving device. The plasma processing chamber has an optical window. The transport device is disposed within the transport chamber. The transport device has an end effector. The transport device is configured to move the end effector between a processing space within the plasma processing chamber and a space within the transport chamber. At least one light source is mounted on the end effector. The light receiving device is disposed outside the plasma processing chamber. The light receiving device is configured to receive reference light from at least one light source transported into the plasma processing chamber via the optical window.

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