System and method for optimizing target expansion for enhancing EUV radiation from a laser-produced plasma

TW202640937APending Publication Date: 2026-10-01ASML NETHERLANDS BV
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Patent Information

Application Number
TW114147235
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-10
Filing Date
2025-12-03
Publication Date
2026-10-01

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Abstract

A method of operating an extreme ultraviolet (EUV) radiation source includes generating a stream of droplets of target material. The method also includes illuminating a droplet of the stream using a first laser pulse to adjust a shape of the droplet into a target. The method also includes illuminating the target using a second laser pulse to transform the target into a rarefied target. A time between the first laser pulse and the second laser pulse is
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