Semiconductor device, and method of manufacturing semiconductor device

TW202641059APending Publication Date: 2026-10-01RAPIDUS CORP
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Patent Information

Application Number
TW114145342
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-07-11
Filing Date
2025-11-20
Publication Date
2026-10-01

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Abstract

A semiconductor device includes: a third nanometer-sized transistor adjacent to a first nanometer-sized transistor; a non-element region deposited on the third nanometer-sized transistor and adjacent to a second nanometer-sized transistor; and a second insulating layer formed between the third nanometer-sized transistor and the non-element region, separating the third nanometer-sized transistor and the non-element region. The non-element region includes: a second gate electrode shared with the third nanometer-sized transistor; and at least one of a semiconductor layer connecting the source / drain regions.
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