Semiconductor device and method of manufacturing semiconductor device

Abstract

An embodiment semiconductor device includes a substrate, a first plurality of functional gate structures within a first circuit area over the substrate, a first plurality of dummy gate structures adjacent to the first circuit area over the substrate, a second plurality of functional gate structures within a second circuit area over the substrate, and a second plurality of dummy gate structures adjacent to the second circuit area over the substrate. The first average height and the second average height are different.

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