Plasma treatment apparatus, power supply system, control methods and procedures

Abstract

The object of this invention is to control the quantity and quality of free radicals and ions. To achieve the above object, this invention provides a control method for a plasma processing apparatus having a first electrode on which a subject is placed, characterized by comprising: a step of supplying bias power to the first electrode; and a step of supplying a source power having a frequency higher than the bias power to a plasma processing space; the source power having a first state and a second state; the control method further comprising: a first control step of interactively applying the first state and the second state in a manner synchronized with the phase of a reference electrical state representing any one of the voltage, current, or electromagnetic field measured by the power supply system of the bias power within one cycle.

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