Information processing device, inference device, machine learning device, information processing method, inference method, and machine learning method

Abstract

The present invention addresses the problem of providing an information processing apparatus capable of appropriately predicting the surface state of a substrate during or after a polishing process. The information processing apparatus 5 of the present invention comprises: an information acquisition unit 500 that acquires polishing process information including apparatus state information, which displays the state of a substrate polishing apparatus performing a polishing process with a polishing pad; and an information generation unit 501 that generates surface state information by inputting the polishing process information acquired by the information acquisition unit 500 into a learning model 10, which displays the surface state of the substrate when polishing is performed by the substrate polishing apparatus in the state shown by the apparatus state included in the polishing process information. The learning model 10 is a learned model obtained by learning the correlation between the polishing process information and the surface state information through machine learning.

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