substrate cleaning equipment

Abstract

This application provides a substrate cleaning device, including a cleaning tank assembly and a cover. The cleaning tank assembly has an exhaust port on its side wall. The cover is disposed inside the cleaning tank assembly, installed on the side wall, and covers the exhaust port. The cover includes a main baffle and at least one side baffle. The main baffle is positioned opposite the exhaust port, and the side baffle is connected between the main baffle and the side wall. At least one side baffle has ventilation holes and a first region and a second region. The first region is configured to be closer to the exhaust port than the second region, and the ventilation area of ​​the second region is larger than the ventilation area of ​​the first region. The substrate cleaning device of this application achieves a uniform airflow field by setting a first region and a second region with different ventilation areas on the side baffles, making the ventilation area near the exhaust port smaller than the ventilation area away from the exhaust port. This avoids airflow turbulence during exhaust and improves the uniformity of the liquid film on the substrate surface.

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