Substrate cleaning apparatus, substrate cleaning method and coating and developing equipment

Abstract

A substrate cleaning apparatus includes: a carrier plate; a plurality of first clamping members; a plurality of second clamping members; a first driving member for driving the second clamping members to move radially along the carrier plate; a second driving member for driving the second clamping members to rotate; a cleaning brush for brushing the lower surface of the substrate; and a third driving member for being driven to the carrier plate. In the brushing state, the first driving member drives the second clamping members to move radially inward along the carrier plate to clamp the edge of the substrate, and the second driving member drives the second clamping members to rotate the substrate, while the cleaning brush brushes the lower surface of the substrate. In the spin-drying state, the third driving member drives the carrier plate to rotate, and the first clamping members clamp and rotate the substrate to spin-dry the cleaning liquid on the substrate.

Images