Substrate processing device

Abstract

The present invention provides a substrate processing apparatus that effectively prevents dust generated in the drive unit from entering the processing tank. The substrate processing apparatus (100) includes: a support shaft (4) supporting a plurality of spray nozzles (3); and a shaft drive mechanism (10) for reciprocating the support shaft (4), and a first inflow prevention part (14) whose internal pressure is set higher than the pressure in the processing tank (1) is provided in the processing tank (1) in such a way that it covers a portion of the support shaft (4) from a first through hole (H1) formed in the wall of the processing tank (1).

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