Substrate processing apparatus

Abstract

A substrate processing apparatus including: a batch processing block for performing a batch process; a first orientation conversion mechanism capable of converting substrates having been subjected to the batch process, from a vertical orientation to a horizontal orientation; a standby bath where the substrates having been converted into the horizontal orientation are kept on standby; a lifting mechanism for performing an exposing operation of bringing one of the substrates kept on standby in the standby bath, the one being one substrate at a time, to a space above the standby bath; a center robot capable of carrying the substrates in the space above the standby bath to outside; and a single-wafer processing block including a single-wafer processing chamber where the single-wafer process is performed to the substrates in the horizontal orientation, and the center robot carries the substrates from the space above the standby bath into the single-wafer processing chamber.

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