Semiconductor substrate handling system

Abstract

A semiconductor substrate handling system is described. The system includes a track comprising paths through a plurality of process stations, and a plurality of substrate holders coupled to the track. Each substrate holder is configured to receive and hold a substrate (e.g., a reticle or a wafer), and move the substrate along the paths through the plurality of process stations to enable the substrate to be processed. A controller is operatively coupled to the track and the plurality of substrate holders. The controller is configured to control relative motion between the plurality of substrate holders to cause each substrate holder to move along the paths through the plurality of process stations independently of other substrate holders, with directions, ranges, and / or speeds for each substrate holder that vary according to processing instructions, and track position relative to the other substrate holders and the plurality of process stations.

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