Electrostatic chuck with top surface pattern for temperature uniformity

TW202641286APending Publication Date: 2026-10-01LAM RES CORP
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Patent Information

Application Number
TW114144394
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-11-15
Filing Date
2025-11-14
Publication Date
2026-10-01

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Abstract

An electrostatic chuck includes a baseplate and a ceramic plate attached by a bonding layer to the baseplate. The ceramic plate includes a first annular seal band arranged adjacent to a radially outer edge of the ceramic plate; and a second annular seal band arranged radially inwardly from the first annular seal band. The first annular seal band and the second annular seal band define an outer cooling gas zone. A plurality of contact pads is arranged between the first annular seal band and the second annular seal band. A first plurality of cooling gas grooves is arranged between the plurality of contact pads, between first ones of the plurality of contact pads and the first annular seal band, and between second ones of the plurality of contact pads and the second annular seal band.
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