electrostatic chuck device

TW202641287APending Publication Date: 2026-10-01SUMITOMO OSAKA CEMENT CO LTD
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Patent Information

Application Number
TW115108156
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-03-19
Filing Date
2026-03-06
Publication Date
2026-10-01

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Abstract

An electrostatic chuck device includes: an electrostatic chuck portion; and a base portion having a support surface supporting the electrostatic chuck portion on the opposite side of a mounting surface and a bottom surface facing the opposite side of an axial direction. The base portion has: a refrigerant flow path extending along a surface intersecting the axial direction; an inflow flow path portion extending axially from an inlet opening in the bottom surface and communicating with the refrigerant flow path; and an outflow flow path portion extending axially from the refrigerant flow path to the opposite side of an axial direction and communicating with a second opening in the bottom surface. The inflow flow path portion has a flow path expansion portion in at least a portion extending axially, the radial dimension of the flow path expansion portion being increased in the radial direction of the inflow flow path intersecting the axial direction compared to the radial dimension at the inlet.
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