Electrostatic chuck components and electrostatic chuck devices
TW202641290APending Publication Date: 2026-10-01SUMITOMO OSAKA CEMENT CO LTD
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Patent Information
- Application Number
- TW115111080
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-03-27
- Filing Date
- 2026-03-24
- Publication Date
- 2026-10-01
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Figure TWG2TA001079638_001 
Figure TWG2TA001079638_002 
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Abstract
An electrostatic chuck component includes: a substrate formed of a dielectric material; and an electrostatic adsorption electrode disposed inside the substrate. The substrate has: a first adsorption portion, the upper surface of which is a first mounting surface for mounting a plate-shaped sample; and a second adsorption portion formed in a closed loop shape below the first adsorption portion and outside the first adsorption portion in plan view, and the upper surface of which is a second mounting surface for mounting a focusing ring. The electrostatic adsorption electrode includes: a first electrode disposed in the first adsorption portion; and a second electrode disposed in the second adsorption portion. The electrostatic chuck component satisfies the following equations (1) and (2): L1<L2 …(1) t1<t2 …(2) (L1: the shortest distance between the corner of the first mounting surface and the first side peripheral surface and the first electrode, L2: the shortest distance between the corner of the second mounting surface and the second side peripheral surface and the electrode included in the second adsorption portion, t1: the height of the first side peripheral surface, t2: the height of the second side peripheral surface)
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