Substrate processing system and status acquisition method

Abstract

An exemplary embodiment of the substrate processing system of the present invention includes: a chamber having an internally divided space; a first support disposed within the chamber; and a measuring device capable of being mounted on the first support. The measuring device includes: a substrate mounted on the first support; and a triangulation sensor mounted on the substrate. The triangulation sensor has a light source for illuminating light and an imaging element for capturing light illuminating an object from the light source. Based on the image captured by the imaging element, the triangulation sensor determines the distance between itself and the object by triangulation.

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