Substrate treatment apparatus and substrate treatment method

Abstract

This invention efficiently monitors the movement of an object by setting a monitoring area. The processor of the substrate processing device sets the monitoring area in three dimensions based on the device's three-dimensional design information. For each moment of normal operation corresponding to process conditions, the monitoring area is transformed into a two-dimensional image from a viewpoint at the configuration position, generating a normal image. This normal image is stored in a normal image memory unit before actual processing of the substrate. Furthermore, when the processor actually processes the substrate according to process conditions, it synchronizes with the process conditions and detects anomalies based on the difference between the normal image and the actual image captured by the camera.

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