Drainage system, substrate processing system, drainage method, and computer-readable medium
TW202641312APending Publication Date: 2026-10-01ACM RES (SHANGHAI) INC
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Patent Information
- Application Number
- TW115108260
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-03-19
- Filing Date
- 2026-03-06
- Publication Date
- 2026-10-01
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Abstract
This application discloses a drainage system, method, substrate processing apparatus, and computer-readable medium. The drainage system includes a nozzle, a supply line, multiple hardware terminals, a purge line, and a discharge line. The nozzle supplies a liquid to the substrate; the supply line supplies the liquid to the nozzle; the multiple hardware terminals are disposed in the supply line for processing the liquid in the supply line; the purge line supplies gas to the supply line; and the discharge line is connected to the supply line for discharging the liquid. During the drainage process, the purge line is controlled to supply gas to the supply line. When there is no dripping from the nozzle, the gas in the purge line is stopped from being blown out of the nozzle, and the discharge line is opened, allowing at least one hardware terminal and residual liquid in the supply line to flow to the discharge line and be discharged under gravity. This application simplifies the drainage process.
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