Three-dimensional memory device and method of forming three-dimensional memory device

TW202641318APending Publication Date: 2026-10-01YANGTZE MEMORY TECH CO LTD
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Patent Information

Application Number
TW115124124
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2020-07-27
Filing Date
2020-09-14
Publication Date
2026-10-01

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Abstract

Embodiments of a three-dimensional (3D) memory device and a method for forming the 3D memory device are disclosed. In an example, a 3D memory device includes a film stacked layer. The film stacked layer includes a plurality of conductive layer / dielectric layer pairs stacked vertically on a substrate. Each conductive layer / dielectric layer pair includes a dielectric layer and a conductive layer. The 3D memory device further includes a staircase region. The staircase region includes a first staircase structure and a second staircase structure formed in the film stacked layer. Both the first staircase structure and the second staircase structure extend in a first direction and include a plurality of conductive layer / dielectric layer pairs. The staircase region further includes a staircase bridge connecting the first staircase structure and the second staircase structure.
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