Plasma treatment apparatus and plasma treatment method

Abstract

This invention aims to provide a plasma processing apparatus comprising: a plasma processing chamber; a base disposed within the plasma processing chamber, with an electrostatic chuck disposed on the upper part of the base; at least one control board disposed within the internal space of the base; a heat transfer medium supply section including at least one heat transfer medium supply port for supplying gaseous heat transfer medium to the internal space; and a heat transfer medium discharge section including at least one heat transfer medium discharge port for discharging the heat transfer medium from the internal space; the heat transfer medium discharge port is disposed at a position higher than the top surface of the at least one control board. Therefore, the plasma processing apparatus can effectively suppress the temperature rise of the control board disposed within the internal space of the base.

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