Wafer cleaning brush with nodule-tip fluid delivery

Abstract

A wafer-cleaning brush includes a hollow core configured to receive a cleaning fluid and a plurality of fluid-permeable nodules disposed on the core. Each nodule includes a dispensing outlet at a distal tip in fluid communication with the core such that the cleaning fluid is dispensed at or near a brush–wafer interface during cleaning. In embodiments, the dispensing outlet comprises a pore at the distal tip and / or a passive slit-based outlet configured to regulate discharge of the cleaning fluid. Distal tips may include surface features that guide fluid laterally across a wafer surface. A cleaning system may combine deionized water and chemistry upstream of the brush, optionally monitor dissolved oxygen, and deliver fluid to a wet module for cleaning and subsequent drying.

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