Manufacturing method of laminated film

Abstract

The method for manufacturing the laminated film of the present invention includes: a preparation step, which involves preparing a strip of substrate film having a first side and a second side opposite to the first side; a plasma treatment step, which involves performing plasma treatment on the first side of the substrate film under a reduced pressure atmosphere in a chamber; and a film formation step, which involves forming an inorganic layer on the first side under a reduced pressure atmosphere after the plasma treatment step. Furthermore, in the plasma treatment step, the plasma treatment is performed using inductively coupled plasma of rare gas and oxygen-containing gas, which is generated by applying high-frequency power to a low-inductance antenna.

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