Radiosensitive linear components, patterning methods and onium salt compounds

Abstract

This invention provides a radiosensitive linear composition that exhibits good storage stability and excellent sensitivity, CDU, LWR, MEEF, EL, development defect suppression, pattern rectangularity, and pattern circularity during pattern formation. A radiosensitive linear composition comprises: an onium salt compound represented by formula (1) below, a polymer containing a structural unit having an acid-dissociable group, and a solvent. (In formula (1), Z+ is S+ or I+; R1 is a monovalent organic group with 1 to 20 carbon atoms; when n is 1 and p is 1, R1 is the structure represented by formula (i) below; (In formula (i), R11 to R13 are alkyl, monocyclic or polycyclic cycloalkyl, aryl, or groups formed by substituting some or all of the hydrogen atoms of these groups with halogen atoms) A- is -COO- or -N--SO2-RX; Ra is a monovalent organic group with 1 to 40 carbon atoms; when n is 1 and p is 1, Ra is the structure represented by formula (a) below)