Radiosensitive linear components, patterning methods and onium salt compounds

Abstract

This invention provides a radiosensitive linear composition, a patterning method, and an onium salt compound that exhibits excellent sensitivity or CDU, LWR, MEEF, EL, development defect suppression, pattern rectangularity, and DOF during pattern formation. A radiosensitive linear composition comprises: a first onium salt compound, represented by formula (1); a second onium salt compound, represented by formula (2); a polymer containing structural units having acid-dissociable groups; and a solvent. (In formula (1), Ar1, Ar2, Ar3, and Ar4 are aromatic rings; Ra, Rb, and Rc are groups represented by formula (i)); (In formula (i), R11, R12, and R13 are monovalent organic groups or cyano groups having 1 to 20 carbon atoms, or two or three of R11, R12, and R13 are combined with each other and form a ring structure together with the bonded carbon atoms).

Images