Low-dissipation polyimide, manufacturing method thereof, flexible copper clad laminate and manufacturing method of flexible copper clad laminate
TW202641895AInactive Publication Date: 2026-10-16NATIONAL CHUNG HSING UNIVERSITY
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Patent Information
- Application Number
- TW114113804
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2025-04-11
- Publication Date
- 2026-10-16
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
The present disclosure provides a low-dissipation polyimide, a manufacturing method thereof, a flexible copper clad laminate and a manufacturing method of the flexible copper clad laminate. The low-dissipation polyimide has a structure represented by formula (I), in which each symbol is as defined in the specification. The manufacturing method of the low-dissipation polyimide includes dissolving a first diamine monomer in an organic solvent to form a diamine monomer solution, adding a first di-anhydride monomer into the diamine monomer solution to form a polyamic acid solution, and performing a ring-closing reaction by heating the polyamic acid solution to form the low-dissipation polyimide. Therefore, the dielectric dissipation of the low-dissipation polyimide can be reduced, and it is favorable for being applied to printed circuit boards with a high frequency transmission.
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