Mist deposition apparatus

TW202642005APending Publication Date: 2026-10-16TMEIC CORP
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Patent Information

Application Number
TW114149753
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-03-31
Filing Date
2025-12-17
Publication Date
2026-10-16

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Abstract

The present disclosure has an object of providing a mist deposition apparatus that can form a thin film on a deposition target with high accuracy. A deposition nozzle (5A) in a mist deposition apparatus
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