Gas supply method, semiconductor device manufacturing method, gas supply system, substrate processing apparatus and process

Abstract

[Problem to be solved] A technique is provided to stably supply a gas obtained by turning a material into a gaseous state to a processing chamber. [Solution] The method comprises: step (a), venting a processing gas containing a gas that turns the aforementioned material into a gaseous state from a container containing the material without passing through the processing chamber; and step (b), switching from step (a) at a point when the flow rate of the aforementioned gas reaches saturation, and supplying the aforementioned processing gas to the aforementioned processing chamber.

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