Substrate handling system background

Abstract

A substrate handling system, that includes (i) a vacuum booster for generating a pulse of first vacuum flow; (ii) a reference vacuum source for producing a reference vacuum flow; and (iii) an vacuum flow control unit that is configured to: (a) combine, during a boost period, the first and reference vacuum flows to provide a combined vacuum flow that is provided, via conduits, to upper vacuum openings of a chuck, and (b) provide the reference vacuum flow to the upper vacuum openings during a substrate fastening period, wherein the chuck and the vacuum booster are spaced apart from each other and are mechanically coupled to a stage.

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