Semiconductor processing system, substrate processing method, and computer program product

Abstract

A semiconductor processing system includes a chamber body, a gate valve abutting the chamber body, and a controller. The controller operably connected to the gate valve and responsive to instructions recorded on a memory to open the gate valve to load a substrate into the chamber body, close the gate valve to deposit a material layer onto the loaded substrate, and open the gate valve to unload the substrate with the material layer deposited thereon. One or more load operation to load the substrate into the chamber body is executed prior to loading the substrate into the chamber body, and one or more unload operation to unload the substrate with the material layer deposited thereon is executed prior to unloading the substrate from the chamber body. Methods of loading and unloading a substrate into and out of the chamber body and computer program products are also described.

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