Operating device and operating method for optical proximity correction

Abstract

An operating device, is used for optical proximity correction of a mask pattern. A mask pattern generating unit of the operating device generates the mask pattern and size parameters of the mask pattern and a target pattern. The mask pattern is used for development to generate a developing pattern. A developing pattern evaluating unit generates a size parameter of the developing pattern. A light intensity analyzing unit generates a light intensity data of the developing pattern. A mask pattern correcting unit calculates a real bias of a currently-processed edge of the mask pattern according to the light intensity data, a step length, and the size parameters of the mask pattern and the target pattern. The mask pattern generating unit adjusts the mask pattern according to the real bias to obtain an adjusted mask pattern. The adjusted mask pattern is used for further developing and development to generate an adjusted developing pattern.

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