Mask topology-based charge state influencing

TW202642266APending Publication Date: 2026-10-16CARL ZEISS SMT GMBH
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Patent Information

Application Number
TW114146039
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-11-26
Filing Date
2025-11-25
Publication Date
2026-10-16

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Abstract

A first aspect relates to a computer-implemented method for influencing a charge state of a lithographic mask. The computer-implemented method comprises selecting a region of the mask based on a material distribution of the region of the mask. The method furthermore comprises directing a particle beam onto the region of the mask in order to influence the charge state of the mask.
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