Methods for regulating power of radio frequency power supply and semiconductor process equipment

Abstract

A method for regulating power of a radio frequency (RF) power supply and a semiconductor manufacturing process apparatus are disclosed. The method includes: acquiring the actual load power of each station containing a wafer while executing a process recipe in a multi-station chamber; acquiring the standard load power corresponding to the process recipe and each station containing a wafer; and regulating the power of the RF power supply based on the actual load power and the standard load power of each station containing a wafer. This application achieves dynamic power regulation of the RF power supply according to the varying actual states of the semiconductor manufacturing process apparatus and the different process recipes being executed. This ensures stable power output at each station, improves film thickness consistency, covers multiple process recipes, increases the process window, and eliminates the need to set up separate regulation modules at each station. The structure and the control calculation logic are simple, and it is easy to implement at the machine end.

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