Semiconductor device and method of making the same

TW202642817APending Publication Date: 2026-10-16TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
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Patent Information

Application Number
TW114136950
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-07-31
Filing Date
2025-09-25
Publication Date
2026-10-16

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Abstract

The gate structure of a planar transistor has two opposite sides that pass across an active region between two source / drain regions. The two opposite sides are not parallel to each other. As a result, the channel length between the two source / drain regions is not constant across the width of the gate structure. Put another way, multiple channels with different lengths are present between the two source / drain regions. This structure results in high subthreshold swing performance, which manifests as faster transition between the on / off states of the transistor.
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