Semiconductor device and method of manufacturing semiconductor device

Abstract

A method of manufacturing a semiconductor device includes: providing a semiconductor substrate, having a cell region and a periphery region; reducing a height of a portion of the semiconductor substrate in the periphery region; forming a plurality of first trenches in the portion of the semiconductor substrate in the periphery region; forming a plurality of second trenches in a portion of the semiconductor substrate in the cell region; forming an isolation structure to fill the first trenches and the second trenches. The plurality of first trenches divide the portion of the semiconductor substrate in the periphery region into a plurality of periphery active areas, and the plurality of second trenches divide the portion of the semiconductor substrate in the cell region into a plurality of array active areas. The array active areas are higher than the periphery active areas.

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