Cleaning equipment for substrate support components, substrate processing apparatus, and cleaning method for substrate support components.
TW202642944APending Publication Date: 2026-10-16TOKYO ELECTRON LTD
View PDF 0 Cites 0 Cited by
Patent Information
- Application Number
- TW115104517
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-02-12
- Filing Date
- 2026-02-05
- Publication Date
- 2026-10-16
Smart Images

Figure TWG2TA001081074_001 
Figure TWG2TA001081074_002 
Figure TWG2TA001081074_003
Abstract
This invention describes a cleaning fixture, a substrate processing apparatus, and a cleaning method for substrate support members that can effectively clean substrate support members. The cleaning fixture for substrate support members of this invention is a circular plate-shaped cleaning fixture for cleaning multiple substrate support members, and includes: a bottom surface comprising a central region including a central portion, and an annular outer region extending outward from the central region. The cleaning of the multiple substrate support members is performed by supplying cleaning fluid to the bottom surface while a portion of the multiple substrate support members supports the bottom surface. The outer region provides: at least one protrusion that a portion of the multiple substrate support members abuts against the bottom surface while a portion of the multiple substrate support members supports the bottom surface; and at least one recess that separates another portion of the multiple substrate support members from the bottom surface.
Need to check novelty before this filing date? Find Prior Art
