Wafer storage container cleaning device

Abstract

This invention suppresses the occurrence of poor cleaning and poor drying. An embodiment of the wafer storage container cleaning apparatus includes: a support portion having a support surface, the support surface supporting a storage container body having a storage space for storing wafers and an opening with the opening facing downwards; an inner nozzle unit supplying cleaning fluid or gas to the inner surface forming the storage space; and an outer nozzle unit supplying cleaning fluid or gas to the outer surface of the storage container body. The inner nozzle unit includes multiple inner nozzles supplying cleaning fluid or gas to the circumferential surface of the inner surface that surrounds the opening; and a first inner moving device moving the multiple inner nozzles in a direction orthogonal to the support surface in the support portion. The outer nozzle unit includes multiple outer nozzles supplying cleaning fluid or gas to the outer surface of the storage container body; and a first outer moving device moving the multiple outer nozzles in a direction orthogonal to the support surface.

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