Substrate processing apparatus

Abstract

The purpose of the substrate processing apparatus 100 of the present invention is to maintain a high vacuum in the chamber space 102a to be vacuum-evacuated. The substrate processing apparatus 100 of the present invention includes: a first chamber 10 having a first end portion 10d; a second chamber 50; a movable member 40 arranged to extend from the first chamber 10 into the second chamber 50; and a linkage mechanism 60 for actuating the movable member 40. Even when the first end portion 10d moves in the moving direction D, the substrate processing apparatus 100 can maintain the chamber space 102a at a high vacuum by actuating the movable member 40 via the linkage mechanism 60. The present invention aims to maintain an evacuated chamber space 102a at a high vacuum. A substrate processing apparatus 100 according to the present invention includes a first chamber 10 having a first end 10d, a second chamber 50, a movable member 40 positioned across the first chamber 10 and the second chamber 50, and an interlocking mechanism 60 for operating the movable member 40. Even when the first end 10d moves in the movement direction D, The substrate processing apparatus 100 maintains a high vacuum in chamber space 102a by operating the movable member 40 via the interlocking mechanism 60.

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