Gas supply nozzle for semiconductor manufacturing

Abstract

[Item for use] The item to which the design is applied is a gas supply nozzle used in a semiconductor manufacturing device. A gas used in a semiconductor process is discharged from a flow path formed in a spiral shape. The part of the design to be claimed is formed as a flow path in a spiral shape. [Design description] The part disclosed by a solid line in each drawing is the part of the design to be claimed. The part disclosed by a broken line in some drawings is the part of the design not to be claimed. The "A-B part enlarged view", "C-C cross-sectional view in the A-B part", "D-D part enlarged view in the C-C cross-sectional view", "E-E part enlarged view", and "F-F part enlarged perspective view" are used to identify the part of the design to be claimed. The item to which the design is applied is transparent as a whole.