Gas supply nozzle for semiconductor manufacturing
TWD246306D03SActive Publication Date: 2026-08-21NGK INSULATORS LTD
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Patent Information
- Application Number
- TW114305749D03
- Authority / Receiving Office
- TW · TW
- Patent Type
- Designs
- Current Assignee / Owner
- Priority Date
- 2025-06-09
- Filing Date
- 2025-12-08
- Publication Date
- 2026-08-21
- Estimated Expiration
- 2040-12-07
Abstract
【Purpose of the Item】; The item used in this design is a gas supply nozzle used in semiconductor manufacturing equipment. It discharges gases used in the semiconductor process from a spiral-shaped flow path. The part to be designed constitutes the spiral-shaped flow path. 【Design Description】; The parts shown by solid lines in each drawing are the parts to be designed. The parts shown by dashed lines in some drawings are the parts not to be designed. The enlarged views of parts A-B, C-C (enlarged cross-sectional view within part A-B), D-D (enlarged cross-sectional view within C-C), E-E, and F-F (enlarged perspective view) are used to identify the parts to be designed. The item used in this design is entirely transparent.
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