Gas supply nozzle for semiconductor manufacturing

TWD246306D03SActive Publication Date: 2026-08-21NGK INSULATORS LTD
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Patent Information

Application Number
TW114305749D03
Authority / Receiving Office
TW · TW
Patent Type
Designs
Current Assignee / Owner
Priority Date
2025-06-09
Filing Date
2025-12-08
Publication Date
2026-08-21
Estimated Expiration
2040-12-07
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Abstract

【Purpose of the Item】; The item used in this design is a gas supply nozzle used in semiconductor manufacturing equipment. It discharges gases used in the semiconductor process from a spiral-shaped flow path. The part to be designed constitutes the spiral-shaped flow path. 【Design Description】; The parts shown by solid lines in each drawing are the parts to be designed. The parts shown by dashed lines in some drawings are the parts not to be designed. The enlarged views of parts A-B, C-C (enlarged cross-sectional view within part A-B), D-D (enlarged cross-sectional view within C-C), E-E, and F-F (enlarged perspective view) are used to identify the parts to be designed. The item used in this design is entirely transparent.
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