Focus ring

Abstract

【Purpose of the Article】; This article is a focusing ring installed and used inside a cavity. It is used to improve the plasma uniformity on the surface of the semiconductor wafer by extending the distribution of plasma generated in the cavity from the surface of the semiconductor wafer to the surface of this article. The "Reference Diagram Showing the Use State" is a schematic cross-sectional view illustrating the use state of this article. ; 【Design Description】; In the "Perspective View," the curved lines appearing on the surface of the article indicate shapes and do not constitute decorative patterns of this design. ; This design relates to a novel and innovative design that not only achieves the desired function but also provides a unique appearance not seen in prior art and refreshing to the observer.