Contaminant trap system, and baffle plate stack

TWI931492BActive Publication Date: 2026-07-11ASM IP HLDG BV
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Patent Information

Application Number
TW111118868
Authority / Receiving Office
TW · TW
Patent Type
Patents
Current Assignee / Owner
Priority Date
2021-05-28
Filing Date
2022-05-20
Publication Date
2026-07-11
Estimated Expiration
2042-05-19

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    Figure IMG-2_DRAW_111118868-A0304-14-0005-7
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Abstract

This disclosure discloses a contaminant capture system for a reactor system, which may include a baffle stack. The baffle stack includes at least one baffle having an opening through a baffle body and a solid portion; and at least one complementary baffle having a complementary opening through a complementary baffle body and a complementary solid portion. The at least one baffle and the at least one complementary baffle are arranged in a baffle sequence between a first end and a second end of the baffle stack, such that no two baffles or complementary baffles are adjacent in this baffle sequence. The at least one baffle may include a sintered material.
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Description

Technical Field

[0001] This disclosure generally relates to a semiconductor processing or reactor system and the components contained therein, and has a system for preventing contamination of reactor system components by other components. Prior Technology

[0002] A reaction chamber can be used to deposit various material layers onto a semiconductor substrate. The substrate can be placed on a base within the reaction chamber. Both the substrate and the base can be heated to a desired substrate temperature setpoint. In an exemplary substrate processing procedure, one or more reactive gases pass through a heated substrate, causing a thin film of material to be deposited on the substrate surface. Throughout subsequent deposition, doping, lithography, etching, and other processes, these layers are fabricated into integrated circuits.

[0003] For any given process, reactant gases and / or any byproduct gases can then be removed from the reaction chamber via vacuum evacuation and / or purging. Reaction gases and other gases or materials from the reaction chamber may pass through a filter or a contaminant trapping system, wherein the reaction gases or other materials (e.g., reaction byproducts and / or byproducts) are trapped to prevent contamination of downstream reactor system components. However, materials from the contaminant trapping system may outgas under certain conditions, potentially leading to contamination of the reaction chamber or a substrate disposed therein. Summary of the Invention

[0004] This disclosure is provided to introduce a series of concepts in a simplified form. These concepts are further detailed in the embodiments disclosed below. This disclosure is not intended to necessarily identify key or essential features of the claimed subject matter, nor is it intended to limit the scope of the claimed subject matter.

[0005] In some embodiments, a contaminant capture system for a reactor system is provided. The contaminant capture system disclosed herein allows material to be collected from a reaction chamber of the reactor system to reduce or prevent contamination of downstream reactor system components. The contaminant capture system disclosed herein can also reduce or prevent potential contaminants from traveling to and contaminating the reaction chamber or one of the substrates disposed therein.

[0006] In various embodiments, a baffle stack for a contaminant capture system may include: a plurality of baffles, each including an opening in a baffle body through which the plurality of baffles pass, and a solid portion; and a plurality of complementary baffles, each including a complementary opening in a complementary baffle body through which the plurality of complementary baffles pass, and a complementary solid portion. The plurality of baffles and the plurality of complementary baffles are arranged in a baffle sequence between a first end and a second end of the alternating baffle stack, such that in the baffle sequence, no two of the plurality of baffles and no two of the plurality of complementary baffles are adjacent. The plurality of baffles and the plurality of complementary baffles may be arranged in a baffle orientation, wherein at least a portion of the openings of the plurality of baffles and at least a portion of the complementary solid portions of the plurality of complementary baffles may be aligned along a first axis across a first end and a second end of the baffle stack, and such that at least a portion of the solid portions of the plurality of baffles and at least a portion of the complementary openings of the plurality of complementary baffles may be aligned along a second axis across a first end and a second end of the baffle stack.

[0007] In various embodiments, a baffle stack may further include a connecting rod connected to each of the plurality of baffles and / or each of the plurality of complementary baffles, wherein the connecting rod may span a first end and a second end of the baffle stack, and wherein the connecting rod includes a cross-section. Each of the plurality of baffles may include a connecting hole, and each of the plurality of complementary baffles may include a complementary connecting hole, wherein these connecting holes and these complementary connecting holes may each include a shape complementary to the cross-section of the connecting rod. In various embodiments, the cross-section of the connecting rod may be non-circular, wherein the connecting hole of each of the plurality of baffles may be positioned in a first orientation, and the complementary connecting hole of each of the plurality of complementary baffles may be positioned in a second orientation. The first and second orientations may be configured with the plurality of baffles and the plurality of complementary baffles surrounding the connecting rod to achieve baffle orientation.

[0008] In various embodiments, a baffle stack may further include a plurality of spacers connected to a connecting rod, wherein at least one of the plurality of spacers may be disposed between each baffle and complementary baffle in the baffle sequence. In various embodiments, a baffle stack may further include at least one end plate disposed at a first end and a second end of the baffle stack, wherein the end plate may include an end plate opening and an end plate solid portion.

[0009] In various embodiments, the plurality of baffles may be one more than the plurality of complementary baffles, such that from a first end and a second end of the baffle stack, the baffle stack includes the plurality of baffles and the plurality of complementary baffles in the same order. In various embodiments, at least one of the plurality of baffles and the plurality of complementary baffles may include a textured surface.

[0010] In various embodiments, a contaminant capture system of a reactor system may include: a capture hood including an outer wall; a first baffle disposed within the capture hood, wherein the first baffle may include: a first opening through a first baffle body between a first top baffle surface and a first bottom baffle surface of the first baffle, and a first solid portion; and a first complementary baffle disposed within the capture hood in series with the first baffle between a first end and a second end of the capture hood, wherein the first complementary baffle may include a first complementary opening through a first complementary baffle body between a first top complementary baffle surface and a first bottom complementary baffle surface of the first complementary baffle, and a first complementary solid portion. The first baffle and the first complementary baffle may be included in a baffle stack. A first baffle and a first complementary baffle may be disposed in the trapping hood in a baffle orientation, wherein at least a portion of the first opening of the first baffle and at least a portion of the first complementary solid portion of the first complementary baffle may be aligned along a first axis spanning a first end and a second end of the trapping hood, and such that at least a portion of the first solid portion of the first baffle and at least a portion of the first complementary opening of the first complementary baffle may be aligned along a second axis spanning a first end and a second end of the trapping hood. In various embodiments, the first opening of the first baffle may be included in a radially inward portion of the first baffle, and / or the first complementary opening of the first complementary baffle may be included in a radially outward portion of the first complementary baffle. In various embodiments, the contaminant trapping system may further include a heating jacket connected to the trapping hood.

[0011] In various embodiments, the pollutant capture system may further include a connecting rod disposed within a capture hood and spanning a first end and a second end of the capture hood. A first baffle may include a first connecting hole through a first baffle body, wherein the connecting rod may pass through the first connecting hole. A first complementary baffle may include a first complementary connecting hole through a first complementary baffle body, wherein the connecting rod may pass through the first complementary connecting hole. In various embodiments, the connecting rod may include a non-circular cross-section, wherein the first connecting hole of the first baffle and the first complementary connecting hole of the first complementary baffle may each include a shape complementary to the non-circular cross-section of the connecting rod. In various embodiments, a reference point of the first connecting hole may be positioned in a first orientation, and a complementary reference point of the first complementary connecting hole may be positioned in a first complementary orientation, wherein the first orientation and the first complementary orientation may be configured such that the first baffle and the first complementary baffle surround the connecting rod to achieve the baffle orientation.

[0012] In various embodiments, the contaminant capture system may further include a spacer between the first baffle and the first complementary baffle to provide a space therebetween.

[0013] In various embodiments, the contaminant capture system may further include a second baffle disposed within a capture shroud, wherein the second baffle may include a second opening through a second baffle body between a second top baffle surface and a second bottom baffle surface of the second baffle, and a second solid portion. The second baffle may be disposed within the capture shroud such that a first complementary baffle is positioned between the first baffle and the second baffle, and wherein the baffle orientation may further include at least a portion of the second opening of the second baffle aligned with at least a portion of the first complementary solid portion of the first complementary baffle along a first axis, and at least a portion of the second solid portion of the second baffle aligned with at least a portion of the first complementary opening of the first complementary baffle along a second axis. In various embodiments, the first baffle and the second baffle may include an identical design.

[0014] In various embodiments, the baffle stack may further include an end plate, configured such that the first baffle is attached between the end plate and the first complementary baffle, or the first complementary baffle is attached between the end plate and the first baffle. The end plate may include an end plate opening and an end plate solid portion.

[0015] In various embodiments, the outer wall of the trapping hood may include an inner wall surface. An outer edge of at least one of the first baffle and the first complementary baffle may be disposed adjacent to the inner wall surface such that at least a partial seal is formed between the outer edge of the first baffle and / or the first complementary baffle and the inner wall surface.

[0016] In various embodiments, the outer edge and / or inner wall surface of at least one of the first top baffle surface, the first bottom baffle surface, the first top complementary baffle surface, the first bottom complementary baffle surface, the first baffle, and the first complementary baffle is textured.

[0017] In various embodiments, a method may include: allowing a fluid to flow from a reaction chamber into a trapping hood of a contaminant trapping system; allowing the fluid to flow through a stack of baffles disposed in the trapping hood and including a plurality of baffles and a plurality of complementary baffles; allowing the fluid to flow through an opening in a first baffle of the plurality of baffles; allowing the fluid to flow into a complementary solid portion of a first complementary baffle of the plurality of complementary baffles as it flows through the opening in the first baffle; depositing contaminants on the complementary solid portion of the first complementary baffle as it flows into the complementary solid portion of the first complementary baffle; allowing the fluid to flow through a complementary opening in the first complementary baffle as it flows through the complementary opening in the first complementary baffle; allowing the fluid to flow into a solid portion of a second baffle of the plurality of baffles as it flows through the complementary opening in the first complementary baffle; and / or depositing contaminants on the solid portion of the second baffle as it flows into the solid portion of the second baffle. Each of the plurality of baffles may include a solid portion and an opening in a baffle body passing through each of the plurality of baffles. Each of the plurality of complementary baffles may include a complementary solid portion and a complementary opening through the complementary baffle body of each of the plurality of complementary baffles. The plurality of baffles and the plurality of complementary baffles may be arranged in a baffle sequence between a first end and a second end of a baffle stack, wherein the plurality of baffles may alternate with the plurality of complementary baffles such that no two of the plurality of baffles and no two of the plurality of complementary baffles are adjacent in the baffle sequence. The plurality of baffles and the plurality of complementary baffles may be arranged in a baffle orientation, wherein at least a portion of the openings of the plurality of baffles and at least a portion of the complementary solid portions of the plurality of complementary baffles may be aligned along a first axis spanning the first and second ends of the baffle stack, and such that at least a portion of the solid portions of the plurality of baffles and at least a portion of the complementary openings of the plurality of complementary baffles may be aligned along a second axis spanning the first and second ends of the baffle stack.

[0018] In various embodiments, a contaminant capture system of a reactor system may include a capture hood; and a capture structure disposed within the capture hood. The capture structure may include a baffle, a base plate, and a plurality of rods spanning and connected to the baffle and the base plate. The rods may be arranged around a flow orifice passing through the base plate.

[0019] In various embodiments, a contaminant capture system of a reactor system may include a capture hood comprising a bottom surface and a top surface; and a capture structure disposed within the capture hood. The capture structure may include a plurality of tubes configured with one of a shape complementary to that of the capture hood; a support disposed within the configuration of the plurality of tubes and projecting outward from one end of the plurality of tubes, wherein the support contacts the bottom surface of the hood, creating a space between this end of the plurality of tubes and the bottom surface of the hood; and a tensioning device connected and configured around the plurality of tubes to hold the plurality of tubes together. The plurality of tubes may be hexagonally packaged, wherein each of the plurality of tubes includes an aperture and may at least partially span the bottom and top surfaces of the hood.

[0020] In various embodiments, contaminant capture in a reactor system may include a capture hood; and a capture structure disposed within the capture hood. The capture structure may include a corrugated plate connected to a non-corrugated plate. The corrugated and non-corrugated plates may be spiral-shaped, such that portions of the corrugated plate are disposed between portions of the non-corrugated plate, and portions of the non-corrugated plate are disposed between portions of the corrugated plate.

[0021] In various embodiments, the trapping structure included in a contaminant trapping system (e.g., one or more baffles, complementary baffles, rods, tubes, corrugated plates, etc.) may include, or at least partially consist of, a sintered material. In various embodiments, the sintered material may include at least one of a metallic material (e.g., a metal or metal alloy) or a ceramic material.

[0022] For the purpose of summarizing this disclosure and the advantages achieved over the prior art, certain objectives and advantages of this disclosure have been described above. It should be understood, of course, that not all such objectives or advantages need to be achieved according to any specific embodiment of this disclosure. Therefore, for example, those skilled in the art will recognize that the embodiments disclosed herein can be implemented in a manner that achieves or optimizes one or more advantages as taught or suggested herein without necessarily achieving other objectives or advantages that may be taught or suggested herein.

[0023] All of these embodiments are intended to fall within the scope of this disclosure. Those skilled in the art will readily understand these and other embodiments from the following detailed description of some embodiments accompanied by the accompanying drawings. This disclosure is not limited to any of the specific embodiments discussed. Simple Explanation of the Diagram

[0024] Although this specification concludes with the scope of the patent application specifically pointed out and explicitly claimed as the embodiment to which this disclosure is regarded, the advantages of the embodiments disclosed can be more readily apparent from the description of certain examples of the disclosed embodiments when read in conjunction with the accompanying drawings. Elements with similar element numbers in the various drawings are intended to be identical.

[0025] Figure 1 illustrates a schematic diagram of an exemplary reactor system according to various embodiments; Figure 2 illustrates an exploded view of an exemplary contaminant capture system according to various embodiments; Figure 3A illustrates an exemplary baffle according to various embodiments; Figure 3B illustrates an exemplary complementary baffle according to various embodiments; Figure 4A illustrates a perspective view of an exemplary filter baffle stack according to various embodiments of a contaminant capture system; Figure 4B illustrates a cross-sectional perspective view of an exemplary filter baffle stack according to various embodiments of a contaminant capture system; Figure 5A illustrates another exemplary baffle according to various embodiments; Figure 5B illustrates another exemplary complementary baffle according to various embodiments; Figure 6A illustrates yet another exemplary baffle according to various embodiments; Figure 6B illustrates yet another exemplary baffle according to various embodiments. Complementary baffle; Figure 7A illustrates another exemplary baffle according to various embodiments; Figure 7B illustrates another exemplary complementary baffle according to various embodiments; Figure 8 illustrates a perspective view of a heating jacket for a contaminant trapping system according to various embodiments; Figure 9 illustrates a method of allowing fluid to flow through a contaminant trapping system of a reactor system according to various embodiments; Figure 10A illustrates a cross-sectional view of an exemplary trapping structure according to various embodiments; Figure 10B illustrates an exploded cross-sectional view of the trapping structure of Figure 10A according to various embodiments; Figure 11 illustrates an exemplary trapping structure according to various embodiments; Figure 12 illustrates an exemplary trapping structure according to various embodiments; and Figure 13 illustrates exemplary sintered materials having various media grades according to various embodiments. Implementation

[0026] While certain embodiments and examples are disclosed below, those skilled in the art will understand that this disclosure extends beyond the specific embodiments and / or uses disclosed herein, as well as obvious modifications and equivalents. Therefore, it is intended that the scope of this disclosure should not be limited to the specific embodiments described herein.

[0027] The drawings presented herein are not intended to represent actual views of any particular material, device, structure, or apparatus, but are merely representations used to describe embodiments of this disclosure.

[0028] As used herein, the term "substrate" may refer to any underlying material on which devices, circuits or films may be formed or on which they may be used.

[0029] As used herein, the term "atomic layer deposition" (ALD) refers to a vapor deposition process in which deposition cycles (preferably multiple successive deposition cycles) are performed in a process chamber. Typically, during each cycle, a precursor is chemisorbed onto a deposition surface (e.g., a substrate surface or a previously deposited underlayer surface, such as material from a previous ALD cycle), forming a monolayer or sub-monolayer that is not readily reacting with additional precursors (i.e., a self-limiting reaction). Subsequently, if necessary, a reactant (e.g., another precursor or reactive gas) can be introduced into the process chamber to convert the chemisorbed precursor into the desired material on the deposition surface. Generally, this reactant can further react with the precursor. Furthermore, a purging step can be used during each cycle to remove excess precursors from the process chamber, and / or to remove excess reactants and / or reaction byproducts from the process chamber after conversion of the chemisorbed precursors. Furthermore, when using alternating pulses of precursor components, reactive gases, and purging (e.g., inert support) gases, the term "atomic layer deposition" as used herein is also intended to include processes specified by related terms such as "chemical vapor atomic layer deposition," "atomic layer epitaxy" (ALE), molecular beam epitaxy (MBE), gas source MBE, or organometallic MBE, and chemical beam epitaxy.

[0030] As used herein, the term "chemical vapor deposition" (CVD) can refer to any process in which a substrate is exposed to one or more volatile precursors that react and / or decompose on the substrate surface to produce the desired deposition.

[0031] As used herein, the terms "membrane" and "thin film" can refer to any continuous or discontinuous structure and material deposited by the methods disclosed herein. For example, "membrane" and "thin film" can include two-dimensional (2D) materials, nanorods, nanotubes, or nanoparticles, or even partial or complete molecular layers, or partial or complete atomic layers, or atomic and / or molecular clusters. "Membrane" and "thin film" can comprise a material or a layer that has pinholes but is still at least partially continuous.

[0032] As used herein, the term "contaminant" may refer to any unwanted material disposed within a reaction chamber that could affect the purity of a substrate disposed within the reaction chamber, or any unwanted material in any component of a reaction system. The term "contaminant" may refer to, but is not limited to, unwanted deposits, metallic and non-metallic particles, impurities, and waste disposed within the reaction chamber or other components of the reactor system.

[0033] Furthermore, in this disclosure, any two numbers of a variable may constitute a working range of the variable, and any indicated range may include or exclude endpoints. Additionally, any numerical value of the indicated variable (whether or not such numerical values ​​are indicated as “about”) may refer to an exact value or an approximate value, including equivalent values, and may refer to an average, median, representative value, multi-value, or similar. Furthermore, in some embodiments of this disclosure, the terms “comprising,” “consisting of,” and “having” may independently mean “generally or broadly comprising,” “including,” “substantially composed of,” or “composed of.” Any meaning defined in this disclosure does not necessarily exclude the common and customary meanings in some embodiments.

[0034] Reactor systems for atomic layer deposition, chemical vapor deposition, and / or the like can be used in a variety of applications, including depositing and etching materials on substrate surfaces. In various embodiments, a reactor system 50 may include: a reaction chamber 4; a base 6 for holding a substrate 30 during processing; a fluid distribution system 8 (e.g., a spray head) for distributing one or more reactants to a surface of the substrate 30; one or more reactant sources 10, 12 and / or a carrier and / or purge gas source 14, fluidly connected to the reaction chamber 4 via lines 16 to 20; and valves or controllers 22 to 26. Reactant gases or other materials from reactant sources 10, 12 may be applied to the substrate 30 within the reaction chamber 4. A purge gas from purge gas source 14 may flow through and through the reaction chamber 4 to remove any excess reactants or other unwanted materials from the reaction chamber 4. System 50 may also include a vacuum source 28 fluidly connected to reaction chamber 4, which may be configured to extract reactants, a purge gas, or other materials from reaction chamber 4. System 50 may include a contaminant trapping system 40 disposed between reaction chamber 4 and vacuum source 28 to trap (i.e., accumulate) materials (e.g., contaminants) from reaction chamber 4, reducing or preventing contamination of reactor system 50 components downstream of contaminant trapping system 40.

[0035] Referring to Figure 2, a contaminant capture system 100 (and an exploded view thereof) is illustrated according to various embodiments (an example of the contaminant capture system 40 in Figure 1). In various embodiments, the contaminant capture system 100 may include a capture hood 103, which may include multiple components (e.g., an upper hood 103A and a lower hood 103B). In various embodiments, the upper hood 103A and the lower hood 103B may be connected to enclose other components of the contaminant capture system 100. The upper hood 103A may include a fluid inlet 101A through which the interior of the capture hood 103 is fluidly connected to a reaction chamber (e.g., reaction chamber 4). Gases and other materials may flow into the contaminant capture system 100 from the reaction chamber through the fluid inlet 101A and may exit the contaminant capture system 100 through the fluid outlet 101B.

[0036] In various embodiments, the trap shroud 103 may include an outer wall 105, which includes an inner wall surface. The inner wall surface may define an internal space enclosed within the trap shroud 103 (e.g., when the upper shroud 103A and the lower shroud 103B are connected). The internal space of the trap shroud 103 may be in fluid communication with a fluid inlet 101A and a fluid outlet 101B.

[0037] In various embodiments, the contaminant capture system 100 may include a capture structure (e.g., disposed within a capture hood) configured to capture contaminants passing through it. Contaminants may deposit on the surface of the capture structure as fluid flows through the capture system. In various embodiments, the capture structure may include a baffle stack (e.g., baffle stack 130). Baffle stack 130 may include at least two plates that can guide fluid into the interior space of the capture hood 103 to take a specific path (e.g., a path that increases or maximizes the flow of fluid through the interior space of the capture hood 103, and / or allows increased or maximized removal of contaminants from the fluid flowing through the contaminant capture system and its components). The fluid flow path through the interior space of the capture hood 103 can increase the fluid path to increase contact with the components of the contaminant capture system 100 (e.g., the surfaces of the baffles in the capture hood 103), thus allowing contaminants more opportunities to deposit on such surfaces as fluid flows through the contaminant capture system 100.

[0038] In various embodiments, the baffle stack 130 may include at least one baffle 132 and at least one complementary baffle 134. Each baffle 132 may have substantially the same design (e.g., including an opening therethrough), and each complementary baffle 134 may have substantially the same design (e.g., including a complementary opening therethrough). The baffles 132 and complementary baffles 134 may be arranged in a baffle sequence within the baffle stack 130 between a first end (near fluid inlet 101A) and a second end (near fluid outlet 101B) of the trap shroud 103. A first end of the baffle stack 130 may be close to a first end of the trap shroud 103, and a second end of the baffle stack 130 may be close to a second end of the trap shroud 103. The baffle sequence may include alternating positions of the baffles 132 and complementary baffles 134, such that no two baffles 132 and no two complementary baffles 134 are adjacent in the baffle sequence.

[0039] The baffle stack 130 may include any suitable number of baffles of any design, order, and / or composition. For example, in various embodiments, the baffle stack 130 may include all baffles of the same type (e.g., all baffles 132 or all complementary baffles 134). In various embodiments, the baffle stack 130 may include a mixture of any suitable baffle designs. For example, the baffle stack 130 may include baffles comprising two or more designs. As another example, the baffle stack 130 may include a first number of baffles 132 and a second number of complementary baffles 134. In various embodiments, the baffle stack 130 may include an equal number of baffles 132 and complementary baffles 134 (e.g., baffles alternating in baffle order between the first and second ends of the baffle stack 130). In various embodiments, the baffle stack 130 may include one more baffle 132 than the complementary baffle 134, such that the baffle sequence begins and ends with a baffle 132 (i.e., a baffle 132 is the baffle closest to the first and second ends of the trap hood 103).

[0040] In various embodiments, the baffle stack may include at least one end plate connected to each end of the baffle stack. For example, a first end plate 136A may be included in the baffle stack 130 as an end plate at a first end of the baffle stack 130, and a second end plate 136B may be included in the baffle stack 130 as an end plate at a second end of the baffle stack 130. The first end plate system of the baffle stack 130 may be disposed within the internal space of the trap shroud 103 near a first end of the trap shroud 103, and the second end plate system of the baffle stack 130 may be disposed within the internal space of the trap shroud 103 near a second end of the trap shroud 103. The end plate system included in a baffle stack may include any suitable design, including a design different from that of the baffles and / or complementary baffles included in the baffle stack.

[0041] The configuration of the baffles in the baffle stack 130 can include any suitable configuration, including any suitable spacing configuration. Each baffle can be separated by a spacer 133. That is, a spacer 133 can be provided between every two baffles in the baffle stack. For example, the baffles in the baffle stack can be spaced at any suitable distance to achieve a desired pressure drop for the fluid flow through the trap shroud 103. Fewer baffles and / or larger spaces between baffles in the baffle stack can reduce the pressure drop through the trap shroud 103. Conversely, more baffles and / or smaller spaces between baffles in the baffle stack can increase the pressure drop through the trap shroud 103.

[0042] Each baffle (e.g., baffle 132 and complementary baffle 134 in baffle stack 130) may include a shape complementary to the interior space of trap shroud 103, such that baffle stack 130 and the baffle system included therein can be disposed within the interior space of trap shroud 103. In various embodiments, an outer edge of one or more baffles disposed within the interior space of trap shroud 103 and included in the baffle stack may be disposed adjacent to and / or in contact with the inner wall of trap shroud 103. The outer edge of one or more baffles may form at least a partial seal between the corresponding baffle and the inner wall of trap shroud 103. Thus, a limited flow rate (or no flow rate) of fluid can pass between the outer edge of a baffle in a baffle stack and the inner wall of trap shroud 103.

[0043] Referring to Figures 3A, 3B, and 4A, in various embodiments, a baffle (e.g., baffle 300A, an example of baffle 132 in Figure 2) may include a top surface 322, a bottom surface 324, a baffle body between the two, and a baffle outer edge 326. A baffle may include at least one opening through the baffle body between the top surface 322 and the bottom surface 324, defined by an opening edge. For example, baffle 300A may include a first opening 331 and a second opening 333. The openings included in a baffle can be of any suitable configuration, such as the opening configuration of baffle 300A shown in Figure 3A. As one example of an opening configuration for a baffle, the openings may be equidistant from other similar openings around a center of the baffle shape (e.g., the center of a circle). In various embodiments, the openings of a baffle may be included in an opening portion of the baffle. For example, the opening 325 of the baffle 300A may be provided on a radially inward portion of the baffle, wherein the radially outward portion of the baffle 300A may not include an opening. A portion of the baffle that does not have an opening may be a solid portion (e.g., solid portion 335 of the baffle 300A).

[0044] Referring again to Figures 3A, 3B, and 4A, in various embodiments, a complementary baffle (e.g., complementary baffle 300B, an example of complementary baffle 134 in Figure 2) may include a complementary top surface 352, a complementary bottom surface 354, a complementary baffle body between the two, and a complementary baffle outer edge 356. A complementary baffle may include at least one complementary opening through the complementary baffle body between the complementary top surface 352 and the complementary bottom surface 354, defined by an edge of the complementary opening. For example, complementary baffle 300B may include a first complementary opening 361 and a second complementary opening 363. The complementary openings included in a complementary baffle may be in any suitable complementary opening configuration, such as the opening configuration of complementary baffle 300B shown in Figure 3B. As one example of a complementary opening configuration of a complementary baffle, the complementary openings may be equidistant from other similar complementary openings around a center (e.g., the center of a circle) of the complementary baffle shape. In various embodiments, a complementary opening of a complementary baffle may be included in a complementary opening portion of the complementary baffle. For example, the opening portion 355 of the complementary baffle 300B may be provided on a radially outward portion of the complementary baffle, wherein the radially inward portion of the complementary baffle 300B may not include a complementary opening. The portion of a complementary baffle that does not have a complementary opening may be a complementary solid portion (e.g., the complementary solid portion 365 of the complementary baffle 300B).

[0045] A complementary baffle (such as complementary baffle 300B) may be complementary to a baffle (such as baffle 300A) because the complementary baffle may include complementary openings in the plate portion of the baffle that does not include an opening. For example, as described above, complementary baffle 300B includes complementary openings 361 and 363 in a radially outward portion thereof, while baffle 300A does not include an opening in a radially outward portion thereof.

[0046] In various embodiments, a baffle stack may include a connecting rod to which a baffle and / or complementary baffle can be connected. For example, the baffle stack 400B in Figure 4B may include a connecting rod 450. The connecting rod may include any suitable shape, length, and / or cross-sectional shape. In various embodiments, the connecting rod may be configured to span between the first and second ends of the trap shroud 103. The connecting rod may be configured to engage and / or connect to other components of a baffle stack, such as baffles, complementary baffles, end plates, spacers, and / or the like. In various embodiments, at least a portion of a connecting rod may include threads, for example, the ends of one or more connecting rods 450 engaging with a fastener to secure the baffles, complementary baffles, end plates, and / or spacers together.

[0047] For purposes of space and clarity, the reference numerals and guide lines for specific baffle assemblies and complementary baffle assemblies in Figures 4A and 4B are included in one or more of the exemplary baffles or complementary baffles illustrated herein. However, the components thus indicated may be applied to each similarly indicated baffle or complementary baffle where appropriate.

[0048] In various embodiments, each baffle may include a connection hole configured to receive and / or engage a connecting rod. For example, baffle 300A may include a connection hole 347 having a shape complementary to a cross-sectional shape of the connecting rod 450. Thus, the connecting rod 450 can be inserted through the connection hole 347, and the connection hole 347 can engage with the connecting rod 450.

[0049] In various embodiments, the connection hole of a baffle may include a non-circular shape, allowing the connecting rod to engage with the connection hole and hold the baffle in a desired position (e.g., preventing the baffle 300A from rotating about the connecting rod 450 within the trap shroud 103). In various embodiments, the connection hole of a baffle may include a shape that is symmetrical only with respect to a line passing through the connection hole (e.g., through a center of the connection hole). Thus, the connection hole may engage with the connecting rod only in a manner that positions the baffle in a desired orientation (a self-aligning feature). In various embodiments, to aid in positioning the baffle in a desired orientation around the connecting rod, the connection hole may include a reference point positioned at a specific orientation or angle and / or at a specific location relative to one of the openings of the baffle. For example, the connection hole 347 may include a reference point 348 that may be oriented at a specific angle (e.g., such that the reference point 348 is aligned with a first opening 331 and / or located between two second openings 333).

[0050] In various embodiments, each complementary baffle may include a complementary connecting hole configured to receive and / or engage a connecting rod. For example, complementary baffle 300B may include a complementary connecting hole 367 having a complementary shape that is complementary to a cross-sectional shape of connecting rod 450. Thus, connecting rod 450 can be inserted through complementary connecting hole 367, and complementary connecting hole 367 can engage connecting rod 450.

[0051] In various embodiments, the complementary connection hole of a complementary baffle may include a non-circular shape, allowing the connecting rod to engage with the complementary connection hole and hold the complementary baffle in a desired position (e.g., preventing the complementary baffle 300B from rotating about the connecting rod 450 within the trap shroud 103). In various embodiments, the complementary connection hole of a complementary baffle may include a complementary shape that is symmetrical only with respect to a line passing through the connection hole (e.g., through a center of the connection hole). Thus, the complementary connection hole may engage with the connecting rod only in a manner that positions the complementary baffle in a desired orientation (a self-aligning feature). In various embodiments, to aid in positioning a complementary baffle in a desired orientation around the connecting rod, the complementary connection hole may include a complementary reference point oriented at a specific complementary angle and / or at a specific location relative to one of the openings of the complementary baffle. For example, the complementary connection hole 367 may include a complementary reference point 368 oriented at a specific complementary angle (e.g., such that the complementary reference point 368 is aligned with a complementary second opening 363 and / or located between two complementary first openings 361).

[0052] In various embodiments, a reference point for a connecting hole and a complementary reference point for a complementary connecting hole may be configured with baffles and complementary baffles in one position, such that an opening of a baffle is aligned along an axis with a complementary solid portion of an adjacent complementary baffle in the baffle sequence (or radially close to the space between the complementary openings), wherein this axis extends along the baffle sequence. In various embodiments, a reference point and a complementary reference point for a complementary connecting hole may be configured with baffles and complementary baffles in one position, such that a complementary opening of a complementary baffle is aligned along an axis with a solid portion of an adjacent baffle in the baffle sequence (or radially close to the space between the openings), wherein this axis extends along the baffle sequence. For example, connecting hole 347 and reference point 348 may be configured with baffle 300A, and complementary connecting hole 367 and complementary reference point 368 may be configured with complementary baffle 300B, such that opening 333 is aligned along an axis with the space between complementary opening 363, and complementary opening 363 is aligned along an axis with the space between opening 333.

[0053] In various embodiments, the baffles and complementary baffles may be positioned in a specific baffle orientation to achieve desired fluid flow through the baffles and contaminant deposition on the baffles during operation of the contaminant capture system 100. In various embodiments, the rotational positions of the baffles and complementary baffles about a connecting rod in a baffle stack may be offset relative to each other (e.g., by the orientation of the connecting hole and reference point, and the orientation of the complementary connecting hole and complementary reference point), such that an opening of one baffle is not in series with and / or aligned with a complementary opening of a complementary baffle along an axis spanning the baffle stack. Furthermore, along an axis spanning the baffle stack, an opening of one baffle may be in series with and / or aligned with at least a portion of the complementary solid portion (or a portion of the complementary baffle body, e.g., between complementary openings) of one complementary baffle along an axis spanning the baffle stack. In other words, in various embodiments, a reference point of a connecting hole may be aligned with an opening of a baffle, and a complementary reference point of a complementary connecting hole may be aligned with a space between a complementary solid portion or a complementary opening of a complementary baffle; and / or a reference point of a connecting hole may be aligned with a space between a solid portion or an opening of a baffle, and a complementary reference point of a complementary connecting hole may be aligned with a complementary opening of a complementary opening of a complementary baffle. For example, reference point 348 may be aligned with an opening of baffle 300A, and complementary reference point 368 may be aligned with a complementary solid portion 365 of complementary baffle 300B. Accordingly, the openings 331 and 333 of the baffle 300A can be connected and / or aligned with the space between the complementary solid portion 365 and / or the complementary openings 361 and / or 363 of the complementary baffle 300B, and the complementary openings 361 and / or 363 of the complementary baffle 300B can be connected and / or aligned with the space between the solid portion 335 and / or the openings 331 and / or 333 of the baffle 300A.

[0054] Figures 5A and 5B illustrate, according to an additional embodiment, a baffle 500A and a complementary baffle 500B. Baffle 500A may include an opening 533 and a solid portion 535. Baffle 500A may further include a connection hole 547 having a reference point 548. The reference point 548 may be oriented toward an opening 533. The opening 533 may be equidistantly surrounding the center of baffle 500A.

[0055] The complementary baffle 500B may include a complementary opening 563 and a complementary solid portion 565. The complementary baffle 500B may further include a complementary connecting hole 567 having a complementary reference point 568. The complementary reference point 568 may be oriented toward a complementary solid portion 565. The complementary solid portion 565 may be equidistantly surrounding the center of the complementary baffle 500B.

[0056] A connecting rod that can be connected to baffle 500A and complementary baffle 500B may include a cross-sectional shape complementary to connecting hole 547 and complementary connecting hole 567. That is, the connecting rod may include a body and a protrusion complementary to reference point 548 and complementary reference point 568. The shape and orientation of connecting hole 547 and complementary connecting hole 567 and reference point 548 and complementary reference point 568 may respectively offset the rotational position of the baffle and complementary baffle in a baffle stack relative to each other about a connecting rod. Accordingly, along an axis spanning a baffle stack, the opening 533 of baffle 500A may be spatially connected and / or aligned with the complementary solid portion 565 and / or complementary opening 563 of complementary baffle 500B, and along an axis spanning a baffle stack, the complementary opening 563 of complementary baffle 500B may be spatially connected and / or aligned with the solid portion 535 and / or opening 533 of baffle 500A.

[0057] Figures 6A and 6B illustrate, according to an additional embodiment, a baffle 600A and a complementary baffle 600B. Baffle 600A may include an opening 633 and a solid portion 635. Baffle 600A may further include a connection hole 647 having a reference point 648. The reference point 648 may be oriented toward the space between a solid portion 635 and / or the opening 633. The opening 633 may be equidistantly surrounding the center of baffle 600A.

[0058] The complementary baffle 600B may include a complementary opening 663 and a complementary solid portion 665. The complementary baffle 600B may further include a complementary connecting hole 667 having a complementary reference point 668. The complementary reference point 668 may be oriented toward a complementary opening 663. The complementary opening 663 may be equidistantly surrounding the center of the complementary baffle 600B.

[0059] A connecting rod that can connect to baffle 600A and complementary baffle 600B may include a cross-sectional shape complementary to connecting hole 647 and complementary connecting hole 667. That is, the connecting rod may include a body and a protrusion complementary to reference point 648 and complementary reference point 668. The shape and orientation of connecting hole 647 and complementary connecting hole 667, and reference point 648 and complementary reference point 668, respectively, can offset the rotational position of the baffle and complementary baffle in a baffle stack relative to each other about a connecting rod. Reference point 648 may be aligned with the space between a solid portion 635 and / or opening 633 of baffle 600A, and complementary reference point 668 may be aligned with a complementary opening 663 of complementary baffle 600B. Accordingly, along an axis spanning a stack of baffles, the opening 633 of baffle 600A can be spatially connected and / or aligned with the complementary solid portion 665 and / or the complementary opening 663 of complementary baffle 600B, and along an axis spanning a stack of baffles, the complementary opening 663 of complementary baffle 600B can be spatially connected and / or aligned with the solid portion 635 and / or the opening 633 of baffle 600A.

[0060] Figures 7A and 7B illustrate a baffle 700A and a complementary baffle 700B according to various embodiments. Baffle 700A may include an opening 733 and a solid portion 735. Baffle 700A may further include a connection hole 747 having a reference point 748. The reference point 748 may be oriented toward the space between a solid portion 735 and / or the opening 733. The openings 733 may be equidistantly surrounding the center of baffle 700A.

[0061] The complementary baffle 700B may include a complementary opening 763 and a complementary solid portion 765. The complementary baffle 700B may further include a complementary connecting hole 767 having a complementary reference point 768. The complementary reference point 768 may be oriented toward a complementary opening 763. The complementary opening 763 may be equidistantly surrounding the center of the complementary baffle 700B.

[0062] The connecting rod, which can be connected to baffle 700A and complementary baffle 700B, may include a cross-sectional shape complementary to connecting hole 747 and complementary connecting hole 767. That is, the connecting rod may include a body and a protrusion complementary to reference point 748 and complementary reference point 768. The shape and orientation of connecting hole 747 and complementary connecting hole 767, and reference point 748 and complementary reference point 768, respectively, can offset the rotational position of the baffle and complementary baffle in a baffle stack relative to each other about a connecting rod. Reference point 748 may be aligned with the space between a solid portion 735 or opening 733 of baffle 700A, and complementary reference point 768 may be aligned with a complementary opening 763 of complementary baffle 700B. Accordingly, along an axis spanning a stack of baffles, the opening 733 of baffle 700A can be spatially connected and / or aligned with the complementary solid portion 765 and / or the complementary opening 763 of complementary baffle 700B, and along an axis spanning a stack of baffles, the complementary opening 763 of complementary baffle 700B can be spatially connected and / or aligned with the solid portion 735 and / or the opening 733 of baffle 700A.

[0063] Any pair (or individual plates) of the baffles and complementary baffles discussed herein can be placed in a baffle stack (e.g., replacing baffle 300A and complementary baffle 300B in baffle stack 400B).

[0064] In various embodiments, a spacer may be provided between the baffles and complementary baffles in a baffle stack to separate adjacent baffles and complementary baffles. For example, referring to Figure 4B, baffle 300A and complementary baffle 300B may be separated by spacer 303 (an example of spacer 133 in Figure 2). A spacer may be provided between each plate in a baffle stack (e.g., between a baffle and a complementary baffle, between an end plate and a baffle and / or a complementary baffle, or the like) to achieve any desired spacing between two plates. Such spacing can achieve a desired pressure drop in the fluid flow through the trap shroud 103 and the openings and complementary openings in the baffles and complementary baffles included therein.

[0065] In various embodiments, a baffle stack may include at least one end plate disposed adjacent to a first and / or last baffle (or complementary baffle) in the baffle sequence. An end plate may have an end plate connection hole similar to the connection hole of a baffle and a complementary connection hole of a complementary baffle, configured to engage a connecting rod. An end plate may further include at least one end plate opening disposed through an end plate body between a first and a second surface of the end plate. For example, as shown in Figure 4A, end plate 410 may include an end plate opening 412. The end plate opening may be provided through an end plate in any suitable design or configuration. In various embodiments, a portion of the end plate excluding an opening may be an end plate solid portion (e.g., end plate solid portion 414).

[0066] In various embodiments, an end plate (such as end plate 410 in Figure 4A) may be configured adjacent to the inner surface of a first or second end of the trap shroud 103, such that the outer surface of the end plate may be adjacent to and / or in contact with the inner surface of the trap shroud 103. This configuration allows, for example, greater heat conduction from an external heat source, such as a heating sleeve (e.g., heating sleeve 800 shown in Figure 8), configured to surround the contaminant trapping system 100 and / or the trap shroud 103, into the baffle stack. In various embodiments, an end plate (such as end plate 420 in Figure 4B) may be configured spaced apart from the inner surface of a first or second end of the trap shroud 103, such that there is a space between the outer surface of the end plate and the inner surface of the trap shroud 103. The space between the inner surface of the trap shroud 103 and the end plate may be achieved by an end plate including a flange (e.g., flange 424) or a spacer disposed between the two. Such a configuration can achieve the desired pressure drop of one of the fluid flows passing through the trap 103, and / or provide a larger area for contaminants to deposit within the trap 103 and the baffle stack (e.g., baffle stack 400B).

[0067] In various embodiments, an end plate may include an end plate opening and / or an end plate opening configuration that causes an end plate opening (e.g., along an axis across a baffle stack) to be in series and / or aligned with an opening of one of the next adjacent plates in the baffle stack. For example, along an axis across a baffle stack, an end plate opening 422 of end plate 420 may be in series and / or aligned with openings 331 and / or 333 of baffle 300A. In this way, fluid entering and flowing through the trap shroud 103 and the baffle stack 400B will deposit less contaminant on the plate closer to the fluid inlet 101A, thus reducing the risk of contaminant escaping from the contaminant trapping system 100 to upstream components (e.g., a reaction chamber).

[0068] In various embodiments, plates in a baffle stack, including a baffle, a complementary baffle, and an end plate, can be connected to a connecting rod and secured by a fastener. For example, a fastener 402 (e.g., a screw, nail, clamp, or the like) can engage the connecting rod 450 (e.g., by screwing, force, and / or the like) and secure the baffle 300A, the complementary baffle 300B, the end plate 420, and / or the spacer 303.

[0069] In various embodiments, fastener 402 may be disposed and / or connected to a sleeve 407, which may be disposed in one end of connecting rod 450. Sleeve 407 may be configured to provide a buffer between adjacent surfaces of fastener 402 and connecting rod 450 to prevent wear.

[0070] In various embodiments, one or more plates in a baffle stack may include an indicator to quickly communicate to a user or assembler of the baffle stack which plate is positioned within which baffle stack. Thus, in various embodiments, for example, baffle 300A may include an indicator 304 (e.g., a notch) to indicate at any time that a notched or otherwise marked plate is a baffle 300A. In this way, a user or assembler of the baffle stack can easily determine whether the correct baffle and complementary baffle sequence has been achieved. Any baffle in the baffle stack discussed herein may include an indicator.

[0071] In various embodiments, a baffle stack can be palindromic, such that the order of the components is identical from either end of the stack. As shown in Figure 4B, the baffle stack 400B begins and ends at one end plate 420, wherein an odd number of baffles 300A alternate with an even number of complementary baffles 300B in a baffle sequence, such that the baffle sequence begins and ends at one baffle 300A. Thus, personnel assembling a contaminant capture system can insert the baffle stack 400B into the capture hood 103 without concern about whether the baffle stack 400B is face up or upside down.

[0072] The system components discussed herein may be made of any suitable material, such as metals or metal alloys (e.g., steel, aluminum, aluminum alloys, or the like), metal oxides, ceramic materials, and / or the like.

[0073] In various embodiments, any surface of a baffle stack or other contaminant capture system component that interacts with fluid flowing through a contaminant capture system may receive contaminant deposits (this is the purpose of the methods and systems discussed herein, to remove contaminants from the fluid to prevent contamination of downstream reactor system components). Therefore, surfaces may be textured (e.g., by bead blasting) to increase the usable surface area of ​​the component. For example, the surfaces of baffles and complementary baffles (including their outer edges), spacers, the inner walls of the capture hood, the edges of openings and complementary openings, and / or any other surfaces may be textured.

[0074] In various embodiments, to increase the available surface area of ​​baffles or other contaminant capture system components, such components may include (i.e., may be at least partially derived from) a sintered material (e.g., sintered material 350 of baffle 300A, shown in Figure 3A). This sintered material may include any suitable material, such as metals, metal alloys, metal oxides, ceramic materials, and / or the like. For example, the sintered material may include stainless steel, aluminum, aluminum alloys, alumina, boron nitride, and / or the like.

[0075] To form a contaminant capture system assembly comprising a sintered material, a powder material (e.g., comprising any material described herein, such as metals, metal alloys, metal oxides, ceramics, etc.) may be pressed together to form an article (e.g., a sheet or block of sintered material). The powder material may be pressed under any suitable conditions, including any suitable temperature or pressure, and for any suitable duration, to achieve an article comprising the sintered material. The article comprising the sintered material may be formed into any desired shape to form the contaminant capture system assembly. For example, the article comprising the sintered material may be cut (e.g., by machining, laser cutting, and / or the like) to form a desired shape, such as a baffle having any desired configuration (e.g., any baffle, or complementary baffles, as described herein).

[0076] In various embodiments, the powder used to form the sintered material contaminant capture system components can comprise any suitable size. For example, the sintered material can be formed from particles ranging in size from 0.2 media grade to 100 media grade ("media grade" or other similar terms refers to particle size in micrometers), 0.2 media grade to 5 media grade, 0.5 media grade to 5 media grade, 5 media grade to 100 media grade, 5 media grade to 20 media grade, or 20 media grade to 100 media grade. Referring to Figure 13, to obtain a more compact or sealed sintered material, a relatively small powder material can be used, such as sintered material 1302 composed of a media grade of 0.2. To obtain a relatively loose or sealed sintered material, a relatively large powder material can be used, such as sintered material 1310 containing a media grade of 100. Sintered materials 1304, 1306, and 1308 are depicted in other powder sizes of 0.5, 5, and 20 media grades, respectively, to manufacture the sintered material. As shown in Figure 13, the spaces between the sintered materials (i.e., the pores in the sintered media) provide important space for fluid movement therein, and the relatively large surface area of ​​the sintered material provides numerous sites on which contaminants can be deposited and captured. In various embodiments, fluid can pass at least partially through the sintered material of a contaminant trapping system assembly. In various embodiments, a contaminant trapping system assembly comprising a sintered material may have a surface area more than one thousand times that of a contaminant trapping system assembly comprising a solid material (i.e., a porous structure without sintered material). Therefore, a contaminant trapping system assembly comprising a sintered material can be more effective and efficient in trapping contaminants, allowing for longer use of the contaminant trapping system assembly with less frequent necessary cleaning and / or replacement.

[0077] In various embodiments, components of the contaminant capture system 100 may be clamped and / or sealed together via a clamping ring 144. A clamping ring 144 may be disposed around the upper cover 103A and / or the lower cover 103B and may be configured to tighten to hold the components of the contaminant capture system 100 together.

[0078] In various embodiments, a trapping structure included in a contaminant trapping system may include structures for trapping contaminants, other than a stack of baffles, as described above. For example, referring to Figures 10A and 10B, a contaminant trapping system may include a trapping structure 1000 disposed in a trapping hood (e.g., trapping hood 103 shown in Figure 2), which includes a plurality of rods 1055. The rods 1055 may be arranged in a configuration 1050 to guide fluid flow along a desired path between the rods 1055. The rods 1055 may span between components that can provide stability for the rods 1055 within the trapping structure 1000. For example, the rods 1055 may be connected to and / or span between a baffle 1010 and a base plate 1020. The rod 1055 may be substantially perpendicular to the baffle 1010 and / or the seat plate 1020, and / or substantially parallel to an axis spanning the fluid inlet 101A and fluid outlet 101B of the trap shroud 103 (as shown in Figure 2). (As used in this context, "substantially" means perpendicular or parallel by 20 degrees, respectively.) In various embodiments, the rod in the trap structure may be integrally formed with the baffle and / or the seat plate.

[0079] In various embodiments, as illustrated in Figures 10A and 10B, the baffle 1010 may include a recess 1014 disposed in an inner side 1011 of the baffle 1010. The recess 1014 may include a shape complementary to the cross-sectional shape of a corresponding rod 1055. A first end 1052 of each rod 1055 may be disposed in a corresponding recess 1014, thus connecting the rod 1055 to the baffle 1010. Similarly, in various embodiments, the seat plate 1020 may include a recess 1024 disposed in an inner side 1021 of the seat plate 1020 (the inner side 1021 of the seat plate 1020 may face the baffle 1010). The recess 1024 may include a shape complementary to the cross-sectional shape of a corresponding rod 1055. A second end 1054 of each rod 1055 may be disposed in a corresponding recess 1024, thus connecting the rod 1055 to the seat plate 1020. The rod of the trapping structure can be connected to a baffle and / or seat by placing the rod in a corresponding recess in the baffle and / or seat, which can be achieved by a tight fit in the corresponding recess, threads on the seat, baffle and rod end to allow the rod to be screwed into the baffle and / or seat, or similar means.

[0080] In various embodiments, regardless of whether the baffle and / or seat plate has a recess for receiving the rod, the rod can be connected to a baffle and / or seat plate in any suitable manner, such as by welding, fastening between the baffle and seat plate, adhesive, or the like.

[0081] In various embodiments, the trapping structure may include a central support (e.g., central support 1025) configured to connect two or more components of the trapping structure. For example, the central support 1025 of the trapping structure 1000 may connect a baffle 1010 to a base plate 1020, with a rod 1055 provided therebetween. The central support 1025 may be provided through a support hole 1016 in the baffle 1010, the support hole being configured to accommodate the central support 1025 passing through it. The shape of the support hole 1016 may be complementary to the cross-sectional shape of the central support 1025. The central support 1025 may be connected and / or secured to the baffle 1010 by a fastener (such as a nut 1002 and / or a seal 1004) provided around the central support 1025 and in contact with the baffle 1010. In various embodiments, the fastener may include threads complementary to the threads on the central support, allowing the fastener to be screwed onto the central support and then tightened toward the base plate to push the baffle and base plate together. Therefore, in various embodiments, the rod 1055 disposed between the baffle 1010 and the base plate 1020 may be held in place by forces from the central support 1025 and the fastener 1002 between the baffle 1010 and the base plate 1020. The central support may be a separate component, or it may be integrally formed with or integrally integrated with the baffle and / or base plate of the trapping structure.

[0082] In various embodiments, the rod 1055 may be positioned around (i.e., around) a central region of the seat plate (e.g., at or near the central support 1025 of the seat plate 1020). The central region may not include any rod. The central region may include one or more flow holes (e.g., flow holes 1027) through the seat plate through which fluid flowing through the contaminant capture system and capture structure flows. Thus, in the case of airflow through the capture shroud (e.g., due to the vacuum pressure of the vacuum pump 28 shown in Figure 1), fluid flowing through the capture shroud (including the lower shroud 103B) may need to pass through the configuration 1050 of the rod 1055, while contacting the rod 1055, and exit the capture shroud via the fluid outlet 101B of the capture shroud before leaving the capture structure 1000 through the flow holes 1027. The flow holes may be aligned and / or misaligned with the fluid outlet 101B.

[0083] In various embodiments, the rods in the trapping structure can be configured in any suitable way. For example, the rods 1055 may be spaced apart (i.e., not in contact with each other) or in contact with each other, allowing fluid to flow between the rods 1055. The spacing of the rods provides a tortuous path for the fluid flowing through the trapping structure, thus increasing the chance that the fluid will come into contact with more surfaces, and contaminants in the fluid will deposit on such surfaces within the trap. The rods may include any suitable shape or length. For example, the rods may include a circular cross-sectional shape (as shown in Figures 10A and 10B), or the rods may include, for example, a hexagonal, octagonal, triangular, or square cross-sectional shape, or any other suitable cross-sectional shape. As another example, the rods may have a cross-sectional length of approximately 2 millimeters (mm) (such as the diameter of a circle) (the word "approximately" in this context means plus or minus 0.5 millimeters). As another example, the rod may have a length of approximately 20 centimeters (cm) (e.g., spanning the distance between the baffle and the seat plate) (the word "approximately" in this context means plus or minus 5 centimeters). The rod may include a high surface area to volume ratio, such as at least 50:1, at least 100:1, at least 150:1, or at least 200:1. In various embodiments, the rod may include a textured outer surface, threads along the rod, or any other structure configured to increase the outer surface area of ​​the rod for contaminant deposition thereon.

[0084] The rod in a trapping structure may comprise any suitable material, such as steel, aluminum, or any other metal or alloy thereof, ceramic material, or the like. In various embodiments, the rod may comprise a sintered material as described herein.

[0085] In various embodiments, a base plate (e.g., base plate 1020) of a trapping structure may be disposed within a trapping hood and support other components of the trapping structure. In various embodiments, an outer side (relative to an inner side 1021) of the base plate 1020 may be spaced apart from a bottom surface (bottom surface 102) of the trapping hood. To support the base plate spaced apart from the bottom surface of the trapping hood, the trapping hood may include a support (e.g., support 1006) projecting from the trapping hood to hold the base plate in place. For example, support 1006 may project from an inner wall of the trapping hood to support the base plate 1020 in place, spaced apart from the bottom surface 102 of the trapping hood. In various embodiments, a support may project from another surface of the trapping hood to hold the base plate in place, for example, from the bottom surface. In various embodiments, the outer surface of the base plate may be configured to abut against or be adjacent to the bottom surface of the trapping hood.

[0086] In various embodiments, a baffle of a trapping structure (e.g., baffle 1010) can guide fluid into the trapping hood to take a specific path (e.g., a path that increases fluid flow around and into contact with the rod 1055 and / or increases the removal of contaminants from the fluid). Baffle 1010 can reduce or prevent fluid flow around the first end 1052 of the rod 1055. That is, baffle 1010 can form at least a partial seal between baffle 1010 and the first end 1052 of the rod 1055. In various embodiments, the shape of baffle 1010 can be smaller than a cross-sectional shape of the trapping hood such that the baffle edge 1012 does not contact the inner wall of the trapping hood. Therefore, there can be a space between the baffle edge and the inner wall of the trapping hood, and / or between the rod 1055 and the inner wall of the trapping hood (e.g., space 1075 between the inner wall of the lower hood 103B and the baffle edge 1012 and / or the rod 1055). The baffle 1010 can be configured to allow at least a portion of the fluid flow within the trap to flow around the baffle edge 1012 toward and through the configuration 1050 of the rod 1055 (e.g., via space 1075) and toward the flow orifice 1027.

[0087] In various embodiments, the seat plate may form at least a partial seal with the inner wall of the trapping shroud. For example, the outer edge of the seat plate 1020 may be positioned against or adjacent to the inner wall of the lower shroud 103B, such that little or no fluid can pass through therebetween. Thus, fluid flowing through the trapping structure 1000 may be directed around the baffle 1010 (and / or through one of the baffles containing a hole therethrough) to flow through the configuration 1050 of the rod 1055 and exit the trapping structure 1000 via the flow hole 1027. Consequently, contaminants in the fluid may deposit on the surfaces of the trapping structures (e.g., the outer surface 1053 of the rod 1055, the baffle 1010, the seat plate 1020, etc.), with little or no fluid flowing between the seat plate 1020 and the inner wall of the trapping shroud.

[0088] The configuration of the components of the trapping structure 1000 allows for greater heat conduction through it. Heating a trapping structure can allow for an increased growth rate of contaminant films on the trapping system components and improve the properties of the trapped contaminant films, such as increased density and reduced peeling. Heat energy can be readily provided through the base plate, rods, and / or baffles, whether externally or internally. In various embodiments, the trapping structure 1000 can be externally heated, for example, by means of a heating jacket (e.g., heating jacket 800 shown in Figure 8) connected around the contaminant trapping system and / or trapping hood including the trapping structure 1000. In various embodiments, the trapping structure 1000 can be internally heated, for example, by means of a heater (e.g., heater 1026 shown in Figure 10B), which is disposed in or connected to a component of the trapping structure 1000 (e.g., in the base plate 1020 and / or center support 1025 including a heater 1026). In particular, in embodiments where the rod 1055 comprises a metallic material (e.g., steel or aluminum or an alloy thereof), heat can be easily transmitted between the seat plate 1020 (receiving heat from the heater 1026 and / or from a heating jacket via a trap), the rod 1055, and the baffle 1010.

[0089] In various embodiments, a trapping structure (e.g., a trapping structure 1000 including a rod 1055 disposed between a baffle 1010 and a base plate 1020) not only provides ample surface area on which contaminants can be deposited, but also offers the advantages of reusability and ease of maintenance. When the trapping structure 1000 has been used and / or is filled with contaminants, the components of the trapping structure 1000 (e.g., rod 1055, baffle 1010, and base plate 1020) can be disassembled (and / or removed from the trapping hood), easily cleaned, and then reassembled for subsequent use. The trapping structure can be disassembled, for example, by removing fastener 1002 from the central support 1025. If one or more components are damaged or need replacement, such replacement can be easily performed. Other existing components of the trapping structure are disposable items and / or difficult to clean.

[0090] In various embodiments, a trapping structure included in a contaminant trapping system may include a plurality of tubes in which fluid can flow. Each tube may include an aperture (e.g., aperture 1157) provided along its length to allow contaminants to deposit on the inner and outer surfaces of the tube. For example, referring to Figure 11, trapping structure 1100 may include a configuration 1150 of tubes 1155. Trapping structure 1100 may be disposed in a trapping shroud (e.g., trapping shroud 103 shown in Figure 2) such that tubes 1155 at least partially span between the top and bottom surfaces of a trapping shroud (e.g., along the direction of fluid flow through the trapping shroud, and / or substantially parallel to an axis spanning between fluid inlet 101A and fluid outlet 101B of trapping shroud 103 (shown in Figure 2)) (as used in this context, "substantially" means from parallel plus or minus 20 degrees). The arrangement of tubes in a trapping structure can be complementary to the shape of the trapping shroud, such that tubes surrounding the tube arrangement can abut against or be adjacent to the inner wall of the trapping shroud. For example, the arrangement 1150 of tubes 1155 can be configured to be disposed within a hexagonal trapping shroud. In various embodiments, the tubes for one tube arrangement of a trapping structure may include a circular arrangement configured to be disposed within a circular trapping shroud (e.g., within the lower trapping shroud 103B shown in Figure 10A).

[0091] The tubes can be configured in any suitable manner. The tube configuration can be configured to limit or minimize the space between the tubes. For example, as shown in Figure 11, according to various embodiments, tubes 1155 can be hexagonally packaged such that each tube 1155 (except for the outermost tube) is surrounded by six other tubes 1155. Thus, each tube 1155 (except for the outermost tube) can abut or contact six other tubes 1155. This hexagonal packaging allows for uniform packaging of the tubes 1155 and limits the space between them, providing a tight package of the circular tubes. This tight package prevents the tubes from moving relative to each other. Furthermore, the hexagonal packaging of the tubes forms concave triangular spaces (e.g., space 1159) between the contacting tubes. These spaces between the tubes provide additional space for fluid to flow through and additional surface area (on the outside of the tubes) on which contaminants can deposit. The hexagonal packaging of the tubes is not necessarily applied to the shape of the tube configuration and can be implemented in a tube configuration having a circular shape.

[0092] The tube in a trapping structure may include any suitable shape or size. In various embodiments, the tube may include a circular cross-sectional shape (e.g., tube 1155) or any other suitable cross-sectional shape configured to allow a desired configuration of the tube. In various embodiments, the tube aperture may include a circular cross-sectional shape (e.g., aperture 1157), or any other suitable cross-sectional aperture shape. In various embodiments, the tube may have a cross-sectional length of approximately 2 millimeters (mm) (e.g., an outer diameter of tube 1155). In various embodiments, the tube may have an inner diameter of approximately 1 millimeter (e.g., the length across the aperture, such as the diameter of aperture 1157) (the word "approximately" in this context means plus or minus 0.5 millimeters). In various embodiments, the tube may have a length of approximately 20 centimeters (cm) (the word "approximately" in this context means plus or minus 5 centimeters). The tubes may include a high surface area to volume ratio, such as at least 50:1, at least 100:1, at least 150:1, or at least 200:1. For example, a tube in a hexagonal package configuration, approximately 20 cm in length, having an outer diameter of approximately 2 mm and an inner diameter of 1 mm, and filling a trap hood with a diameter of approximately 19 cm, provides a significant surface area for receiving contaminant deposits. In such an example, the surface area of ​​the tube apertures, for a total surface area of ​​approximately twelve square meters, can provide approximately six square meters of trapping surface, and the gaps between the tubes (e.g., space 1159) can provide slightly less than six square meters. Assuming a typical deposition process in a reactor produces three square micrometers of contaminant deposits within a trap, the surface area provided by the trapping structure, including the tubes of the aforementioned configuration and dimensions, allows the same trapping structure to be used for multiple deposition cycles before requiring maintenance or replacement.

[0093] In various embodiments, the outer and / or inner surface of the tube may include a textured outer surface, threads along the outer and / or inner surface, or any other structure configured to increase the outer surface area of ​​the tube for contaminant deposition thereon.

[0094] The tubes in a trapping structure may comprise any suitable material, such as steel, aluminum, or any other metal or alloy thereof, ceramic materials, or the like. In various embodiments, the tubes may comprise sintered materials as discussed herein.

[0095] In various embodiments, the tubes can be connected in any suitable manner, such as adhesive, welding, and / or tight fit within the trap. As shown in Figure 11, the tubes 1155 are connected together by a tensioning device 1188 to maintain configuration 1150, which can be a clamping ring (similar to clamping ring 114), a strap, an elastic band, or the like.

[0096] In various embodiments, a configuration 1150 of the tube 1155 may include at least one support 1125. The support 1125 may be a rod or other structure that projects outwardly from the bottom of the configuration 1150 (i.e., the support 1125 extends closer to a bottom surface of a trap than the tube 1155). In various embodiments, a configuration of the tube may include more than one support (e.g., three supports 1125 as shown in Figure 11). The supports 1125 may be configured to support the configuration 1150 of the tube 1155 such that there is a space between the bottom of the tube 1155 and a bottom surface of the trap (e.g., bottom surface 102, if the trapping structure 1100 is disposed in a lower trapping shroud 103B, as shown in Figure 10A). Similarly, when disposed in a trapping shroud, there may be a space between the top of the tube 1155 and a top surface of the trapping shroud. For example, the tube configuration 1150 can simply be positioned within the trap shroud, resulting in a space between the top of the tube 1155 and a top surface of the trap shroud (e.g., due to the way the upper and lower covers of the trap shroud fit together). As another example, the support 1125 can also project outward from the top of the configuration 1150 (i.e., the support 1125 extends closer to a top surface of the trap shroud than the tube 1155). Therefore, if a cap or upper cover of the trap shroud is placed on the trap structure, the cap or upper cover will rest against the end of the support 125, thus allowing a space between the top surface of the trap shroud and the top of the tube 1155. This space allows fluid to flow into a trap shroud (e.g., via fluid inlet 101A shown in Figure 2) to disperse and utilize more of the tubes 1155 to trap contaminants.

[0097] In various embodiments, a structure such as a baffle with holes, a spray head, or the like may be positioned above a tube configuration in a trap to disperse the fluid flowing therein in a desired manner to increase the utilization of the surface area provided by the tube.

[0098] The configuration of the components of the trapping structure 1100 allows for greater heat conduction through it. Heating a trapping structure can allow for an increased growth rate of contaminant films on the trapping system components and improve the properties of the trapped contaminant films, such as increased density and reduced shedding. Heat can easily propagate through the trapping hood, support 1125, and / or tubes, whether the heat is supplied externally or internally. In various embodiments, the trapping structure 1100 can be externally heated, for example, by means of a heating jacket (such as heating jacket 800 shown in Figure 8) connected around the contaminant trapping system and / or trapping hood including the trapping structure 1100. In various embodiments, the trapping structure 1100 can be internally heated, for example, by means of a heater disposed in the configuration 1150 of the tube 1155. For example, a heater can replace a tube within the tube configuration (e.g., a tube at or near the center of the configuration), and / or a support 125 can be fitted with or may include a heater. In particular, in embodiments where the tube 1155 comprises a metallic material such as steel or aluminum (or an alloy thereof), heat energy can be easily transmitted through the tube 1155 and / or the support 1125 (e.g., if heat energy is received from a heating jacket or an internal heater via a trap).

[0099] In various embodiments, a trapping structure, such as a trapping structure 1100 including tube 1155, not only provides ample surface area on which contaminants can be deposited, but also offers the advantages of reusability and ease of maintenance. When the trapping structure 1100 has been used and / or is filled with contaminants, the components of the trapping structure 1100 (e.g., tube 1155, support 1125, tension device 1188) can be easily removed from a trapping hood and / or disassembled, cleaned, and then reassembled for subsequent use. The trapping structure can be disassembled, for example, by detaching the tension device 1188 from the tube 1155. If one or more components are damaged or need to be replaced, such replacement can be easily performed.

[0100] In various embodiments, a contaminant trapping system may include a trapping structure comprising a corrugated plate through which fluid can flow and deposit contaminants. Referring to Figure 12, according to various embodiments, a corrugated trapping structure 1200 may include a corrugated plate 1250 connected to a non-corrugated plate 1280. A space 1260 between the corrugated plate 1250 and the non-corrugated plate 1280 may allow fluid to flow through it and deposit contaminants on a surface area provided in the plate. The corrugated trapping structure 1200 may be disposed in a trapping hood (e.g., trapping hood 103 shown in Figure 2), such that the space 1260 at least partially spans between the top and bottom surfaces of a trapping hood (e.g., along the direction of fluid flow through the trapping hood). Plates 1250 and 1280 may be spiraled into any suitable shape (e.g., a circle, or a square, triangle, rectangle, hexagon, or octagon shown in Figure 12). The shape of the spiral plate may be complementary to the shape of the trapping hood in which the trapping structure is disposed. For example, the waveform trapping structure 1200 can be configured to be disposed within a circular trapping hood, such as trapping hood 103 shown in Figure 2. Therefore, a waveform or non-waveform plate can be disposed against or adjacent to the inner wall of the trapping hood. The waveform or non-waveform plate can be spiral-shaped or configured such that an intermediate gap 1205 can be reduced or minimized, causing fluid flowing through it to pass through space 1260 rather than through other paths of the waveform trapping structure 1200.

[0101] In various embodiments, the waveform trapping structure 1200 may include at least one support (e.g., support 1125 shown in Figure 11). The support may be a rod or other structure projecting outward from the bottom and / or top of the waveform trapping structure 1200. Such a support may be configured to support the waveform trapping structure 1200 such that a space exists between the bottom and / or top of the waveform trapping structure 1200 and a bottom and / or top surface of the trapping shroud. Therefore, a space may be created between the bottom of the waveform trapping structure 1200 and a bottom surface of the trapping shroud and / or between the top of the waveform trapping structure 1200 and a top surface of the trapping shroud. Such a space allows fluid to flow into a trapping shroud (e.g., via fluid inlet 101A shown in Figure 2) to disperse and utilize more (i.e., flow through) space 1260 to trap contaminants.

[0102] The waveform trapping structure may comprise any suitable material, such as steel, aluminum, or any other metal or alloy thereof, ceramic materials, or the like. In various embodiments, the waveform trapping structure may comprise sintered materials as discussed herein.

[0103] In various embodiments, a structure such as a baffle with holes, a spray head, or the like may be positioned above a wave-shaped trapping structure in a trapping hood to disperse the fluid flowing therein in a desired manner to increase the utilization of the surface area for contaminant deposition.

[0104] The configuration of the components of the waveform trapping structure 1200 allows for greater heat conduction through the components. Heating a trapping structure can allow for an increased growth rate of contaminant films on the trapping system components and improve the properties of the trapped contaminant films, such as increased density and reduced peeling. Heat energy can easily propagate through the waveform trapping structure 1200, whether supplied externally or internally. In various embodiments, the waveform trapping structure 1200 can be externally heated, for example, by means of a heating jacket (such as heating jacket 800 shown in Figure 8) connected around the contaminant trapping system and / or trapping hood including the waveform trapping structure 1200. In various embodiments, the waveform trapping structure 1200 can be internally heated, for example, by means of a heater disposed in the passageway 1205 or a heater included in a support disposed in the passageway 1205. In particular, in embodiments where the waveform trapping structure 1200 comprises a metallic material (or alloy thereof) such as steel or aluminum, heat energy can be easily propagated through the waveform trapping structure 1200 (if heat energy is received from a heating jacket or an internal heater via the trapping shroud).

[0105] In various embodiments, the contaminant capture system and its components may not include adhesives or other binding materials to connect any components. The absence of adhesives, epoxy resins, or other binding materials reduces the risk of such a binding material degassing and traveling into the reaction chamber as one of the contaminants. Additionally, without such a binding material, the components of the system described herein are less prone to degradation at elevated temperatures (e.g., above 120°C). Therefore, a contaminant capture system (e.g., contaminant capture system 100 in Figure 2) and its included capture structures can be located closer to a reaction chamber of a reactor system (e.g., reaction chamber 4 of reactor system 50 in Figure 1) than a contaminant capture system including a binding material. Accordingly, a reactor system with a contaminant capture system according to the embodiments described herein can be more compact and / or have more feasible and specific configurations.

[0106] The contaminant capture system described herein is configured to increase the surface area accessible to a fluid flowing through it, allowing contaminants more opportunities to deposit on such surface area. Therefore, for example, as described herein, the opening of a baffle may not be aligned with and / or connected in series with the complementary opening of an adjacent complementary baffle in a baffle stack. As another example, a rod (e.g., rod 1055) may be configured such that there is a non-linear path from the periphery of one configuration of the rod to the flow orifice (e.g., flow orifice 1027) allowing the fluid to exit the capture structure. As yet another example, a tube (e.g., tube 1155) and / or a space (e.g., space 1260) through a waveform capture structure (e.g., waveform capture structure 1200) may allow contaminants in a fluid to deposit on the surface within the tube or the path through the waveform capture structure.

[0107] According to various embodiments, Figure 9 illustrates a method 900 of fluid flowing through a contaminant trapping system in a reaction system. Referring also to Figures 2 and 4B, a fluid may flow from a reaction chamber (e.g., reaction chamber 4 in Figure 1) to a contaminant trapping system (e.g., contaminant trapping system 100 in Figure 2) (step 902). The contaminant trapping system 100 may include a fluid inlet 101A and a fluid outlet 101B of a trapping hood 103. Fluid may flow into the contaminant trapping system 100 via fluid inlet 101A. The fluid may include material (e.g., contaminants) configured by the contaminant trapping system to be removed from the fluid.

[0108] In various embodiments, fluid may flow through a contaminant trapping structure included in a contaminant trapping system (step 904). For example, as described herein, the trapping structure may include any suitable structural configuration for collecting contaminants from the fluid. In various embodiments, the trapping structure in the contaminant trap may include a baffle stack 400B in the contaminant trapping system 100 (e.g., an example of baffle stack 130 in Figure 2). Thus, fluid may flow through a plurality of baffles 300A alternating with a plurality of complementary baffles 300B in a baffle sequence. Fluid may also flow through at least one end plate (e.g., end plate 420) included at either end of the baffle stack. As described herein, in various embodiments, fluid may flow through a trapping structure including rods, tubes, and / or corrugated and non-corrugated plates.

[0109] Fluid can flow through end plate opening 422 and / or around the outer edge of end plate 420 via a first end plate 420 to flow through baffle stack 400B. In the sequence of flow through the baffles of baffle stack 400B, fluid can contact the top surface 322 and bottom surface 324 of baffle 300A, the complementary top surface 352 and complementary bottom surface 354 of complementary baffle 300B, and pass through openings 331 and 333 of baffle 300A and complementary openings 361 and 363 of complementary baffle 300B. Openings 331 and 333 of baffle 300A are provided through baffle 300A and aligned with complementary baffle 300B, such that openings 331 and 333 are aligned with the complementary solid portion 365 of complementary baffle 300B. Therefore, when the fluid flows through the openings 331 and 333 of a baffle 300A, it can contact the complementary solid portion 365 of a successive complementary baffle 300B in the baffle stack 400B. When it contacts the complementary solid portion 365 of the next complementary baffle 300B, the fluid can flow toward the fluid outlet 101B and pass through the complementary openings 361 and 363 of this complementary baffle 300B. The complementary openings 361 and 363 of the complementary baffle 300B are provided through the complementary baffle 300B and aligned with the baffle 300A, such that the complementary openings 361 and 363 can be aligned with the solid portion 335 of the baffle 300A. Therefore, when the fluid flows through the complementary openings 361 and 363 of a complementary baffle 300B, it can contact the solid portion 335 of a successive baffle 300A in the baffle stack 400B. When the fluid comes into contact with the solid portion 335 of the next baffle 300A, it can flow toward the fluid outlet 101B and through the openings 331 and 333 of this baffle 300A.

[0110] The fluid flow follows this flow pattern through the baffle sequence of baffle 300A and complementary baffle 300B until it passes the last baffle in the sequence. The fluid may flow over an end plate 420 at a second end of the baffle stack 400B, contacting the surface of this end plate 420, and flowing through the end plate opening 422. While flowing through the baffle stack 400B, the fluid may additionally flow between the outer edges of baffle 300A and complementary baffle 300B and the inner wall surface of the outer wall 105, interacting with and contacting those surfaces.

[0111] In various embodiments, fluid may contact and flow around baffle 1010 into space 1075 to flow through a trapping structure (e.g., trapping structure 1000) having a rod. The fluid may then flow through configuration 1050 of rod 1055, contacting rod 1055 before exiting trapping structure 1000 via flow orifice 1027.

[0112] In various embodiments, fluid may flow through tube 1155 before leaving trap structure 1100 to flow through a trap structure (e.g., trap structure 1100) having tubes.

[0113] In various embodiments, fluid may flow through space 1260 before leaving waveform trapping structure 1200 to flow through a waveform trapping structure (e.g., waveform trapping structure 1200).

[0114] When fluid comes into contact with the aforementioned surfaces (e.g., baffles, complementary baffles, end plates, the inner wall surface of outer wall 105, rods 1055, pipes 1155, corrugated and non-corrugated plates 1250 and 1280, etc.), contaminants included in the fluid can be deposited or collected from the fluid on the surfaces of the contaminant collection system and the corresponding collection structures disposed therein (step 906). The surfaces in the contaminant collection system and their relative positions to each other provide increased surface area on which such contaminants can be deposited. Some of these surfaces may include texture to provide further usable surface area.

[0115] In various embodiments, fluid may flow through fluid outlet 101B and exit the contaminant capture system (step 908).

[0116] While exemplary embodiments of this disclosure are presented herein, it should be understood that this disclosure is not limited thereto. For example, although reactors and contaminant capture systems are described in combination with various specific configurations, this disclosure is not necessarily limited to these examples. Various modifications, variations, and enhancements may be made to the systems and methods presented herein without departing from the spirit and scope of this disclosure.

[0117] The subject matter of this disclosure includes all novel and non-obvious combinations and sub-combinations of the various systems, components and configurations and other features, functions, actions and / or properties disclosed herein, as well as any and all equivalents thereof.

[0118] 4: Reaction Chamber

[0119] 6: Base

[0120] 8: Fluid distribution system

[0121] 10: Source of reactants

[0122] 12: Reactant source

[0123] 14: Purge gas source

[0124] 16: Pipelines

[0125] 18: Pipelines

[0126] 20: Pipelines

[0127] 22: Valve or controller

[0128] 24: Valve or controller

[0129] 26: Valve or controller

[0130] 28: Vacuum Source

[0131] 30:Substrate

[0132] 40: Pollutant capture system

[0133] 50: Reactor System

[0134] 100: Pollutant capture system

[0135] 101A: Fluid Inlet

[0136] 101B: Fluid Outlet

[0137] 102: Bottom surface

[0138] 103A: Top Cover

[0139] 103B: Lower Cover

[0140] 105:Outer wall

[0141] 130: Baffle stacking

[0142] 132: baffle

[0143] 133: Spacer

[0144] 134: Complementary baffle

[0145] 136A: First end plate

[0146] 136B: Second end plate

[0147] 144: Clamping ring

[0148] 300A: Baffle

[0149] 300B: Complementary baffle

[0150] 303: Spacer

[0151] 304: Indicator

[0152] 322: Top surface

[0153] 324: Bottom surface

[0154] 325: Opening

[0155] 326: Outer edge of the baffle

[0156] 331: Opening

[0157] 333: Opening

[0158] 335: Entity Section

[0159] 347: Connecting hole

[0160] 348: Reference Point

[0161] 350: Sintered materials

[0162] 352: Complementary top surface

[0163] 354: Complementary bottom surface

[0164] 355: Opening

[0165] 356: Outer edge of the baffle

[0166] 361: First complementary opening

[0167] 363: Second complementary opening

[0168] 365: Complementary Entities

[0169] 367: Complementary Connecting Hole

[0170] 368: Complementary Reference Point

[0171] 400B: Baffle Stacking

[0172] 402: Fasteners

[0173] 407: Sleeve

[0174] 410: End plate

[0175] 412: End plate opening

[0176] 414: End plate solid part

[0177] 420: End plate

[0178] 422: End plate opening

[0179] 424: Flange

[0180] 450: Connecting rod

[0181] 500A: Baffle

[0182] 500B: Complementary baffle

[0183] 533: Opening

[0184] 535: Entity Section

[0185] 547: Connecting hole

[0186] 548: Reference Point

[0187] 563: Complementary openings

[0188] 565: Complementary Entities

[0189] 567: Complementary Connecting Hole

[0190] 568: Complementary Reference Point

[0191] 600A: Baffle

[0192] 600B: Complementary baffle

[0193] 633: Opening

[0194] 635: Entity Section

[0195] 647: Connecting hole

[0196] 648: Reference Point

[0197] 663: Complementary openings

[0198] 665: Complementary Entities

[0199] 667: Complementary Connecting Hole

[0200] 668: Complementary Reference Point

[0201] 700A: Baffle

[0202] 700B: Complementary baffle

[0203] 733: Opening

[0204] 735: Entity Section

[0205] 747: Connecting hole

[0206] 748: Reference Point

[0207] 763: Complementary openings

[0208] 765: Complementary Entities

[0209] 767: Complementary Connecting Hole

[0210] 768: Complementary Reference Point

[0211] 800: Heating jacket

[0212] 900: Method

[0213] 902, 904, 906, 908: Steps

[0214] 1000: Capture Structure

[0215] 1002: Nut

[0216] 1004: Seals

[0217] 1006: Support

[0218] 1010: baffle

[0219] 1011: Inner side

[0220] 1012: Edge of the baffle

[0221] 1014: concave part

[0222] 1016: Support hole

[0223] 1020: Seat board

[0224] 1021: Inner side

[0225] 1024: concave part

[0226] 1025: Central support

[0227] 1026: Heater

[0228] 1027: Flow hole

[0229] 1050: Configuration

[0230] 1052: First end

[0231] 1053: Outer surface

[0232] 1054: Second End

[0233] 1055: Pole

[0234] 1075: Space

[0235] 1100: Capture Structure

[0236] 1125: Support

[0237] 1150: Configuration

[0238] 1155: Pipe

[0239] 1157: Aperture

[0240] 1159: Space

[0241] 1188: Tension device

[0242] 1200: Waveform Capture Structure

[0243] 1205: Gap

[0244] 1250: Waveform board

[0245] 1260: Space

[0246] 1280: Non-waveform board

[0247] 1302: Sintered materials

[0248] 1304: Sintered material

[0249] 1306: Sintered materials

[0250] 1308: Sintered materials

[0251] 1310: Sintered materials

Claims

1. A pollutant capture system for a reactor system, comprising: A collection hood includes an outer wall of the hood; a first baffle disposed in the collection hood, wherein the first baffle includes a sintered material, wherein the first baffle is configured to allow fluid to pass through when a fluid flows from a first end to a second end of the collection hood, and wherein the sintered material is configured to collect contaminants from the fluid when the fluid contacts the sintered material; The first baffle includes: a first opening passing through a first baffle body between a first top baffle surface and a first bottom baffle surface; and a first solid portion. The pollutant collection system further includes: a first complementary baffle made of a second sintered material, wherein the first complementary baffle is disposed within the collection hood and connected in series with the first baffle between a first end and a second end of the collection hood. The first complementary baffle includes: a first complementary opening passing through a first complementary baffle body between a first top complementary baffle surface and a first bottom complementary baffle surface; and a first complementary solid portion. The first baffle and the first complementary baffle are included in a baffle stack, and the first baffle and the first complementary baffle are arranged in a baffle orientation in the trapping hood. At least a portion of the first opening of the first baffle and at least a portion of the first complementary solid portion of the first complementary baffle are aligned along a first axis across the first end and the second end of the trapping hood, and at least a portion of the first solid portion of the first baffle and at least a portion of the first complementary opening of the first complementary baffle are aligned along a second axis across the first end and the second end of the trapping hood.

2. The pollutant capture system of claim 1, wherein the sintered material comprises at least one of a metallic material or a ceramic material.

3. The pollutant capture system of claim 1 further includes a connecting rod disposed in the capture hood and spanning between the first end and the second end of the capture hood, wherein the first baffle includes a first connecting hole through the first baffle body, wherein the connecting rod is disposed through the first connecting hole, and wherein the first complementary baffle includes a first complementary connecting hole through the first complementary baffle body, wherein the connecting rod is disposed through the first complementary connecting hole.

4. The pollutant capture system of claim 3, wherein the connecting rod includes a non-circular cross-section, wherein the first connecting hole of the first baffle and the first complementary connecting hole of the first complementary baffle each include a shape complementary to the non-circular cross-section of the connecting rod.

5. The pollutant capture system of claim 4, wherein a reference point of the first connecting hole is set in a first orientation, and a complementary reference point of the first complementary connecting hole is set in a first complementary orientation, wherein the first orientation and the first complementary orientation configure the first baffle and the first complementary baffle around the connecting rod to achieve the baffle orientation.

6. The pollutant capture system of claim 5 further includes a spacer between the first baffle and the first complementary baffle to provide a space therebetween.

7. The pollutant capture system of claim 1 further includes a second baffle disposed within the capture hood, wherein the second baffle includes: A second opening passes through a second baffle body between a second top baffle surface and a second bottom baffle surface of the second baffle; And a second solid portion, wherein the second baffle is disposed in the trapping hood such that the first complementary baffle is located between the first baffle and the second baffle, and wherein the baffle orientation further includes at least a portion of the second opening of the second baffle aligned along the first axis and at least a portion of the first complementary solid portion of the first complementary baffle, and wherein the baffle orientation further includes at least a portion of the second solid portion of the second baffle aligned along the second axis and at least a portion of the first complementary opening of the first complementary baffle.

8. The pollutant capture system of claim 7, wherein the first baffle and the second baffle include the same design.

9. The contaminant capture system of claim 5, wherein the baffle stack further includes an end plate, configured such that at least one of the following is achieved: the first baffle is located between the end plate and the first complementary baffle, or the first complementary baffle is located between the end plate and the first baffle, wherein the end plate includes an end plate opening and an end plate solid portion.

10. The pollutant capture system of claim 1, wherein the outer wall of the capture hood includes an inner wall surface, wherein the outer edge of at least one of the first baffle and the first complementary baffle is disposed adjacent to the inner wall surface, such that at least a partial seal is formed between the outer edge of the at least one of the first baffle and the first complementary baffle and the inner wall surface.

11. The pollutant capture system of claim 10, wherein the inner wall surface of the capture hood is textured.

12. The contaminant capture system of claim 1 further includes a heating jacket connected to the capture hood.

13. The pollutant capture system of claim 1, wherein the first opening of the first baffle is included in a radially inward portion of the first baffle, and wherein the first complementary opening of the first complementary baffle is included in a radially outward portion of the first complementary baffle.

14. A baffle stack for a contaminant capture system, the baffle stack comprising: A plurality of baffles, at least one of which is made of a sintered material, wherein each of the baffles includes: an opening through which a baffle body passes; and a solid portion; and a plurality of complementary baffles, at least one of which is made of a second sintered material, wherein each of the complementary baffles includes: a complementary opening through which a complementary baffle body passes; and a complementary solid portion, wherein the baffles and the complementary baffles are arranged in a baffle sequence between a first end and a second end of an alternating stack of baffles, such that no two baffles in the baffle sequence are adjacent and no two complementary baffles are adjacent. The baffles and the complementary baffles are arranged in a baffle orientation, wherein at least a portion of the openings of the baffles and at least a portion of the complementary solid portions of the complementary baffles are aligned along a first axis across the first end and the second end of the baffle stack, and such that at least a portion of the solid portions of the baffles and at least a portion of the complementary openings of the complementary baffles are aligned along a second axis across the first end and the second end of the baffle stack.

15. The baffle stack of claim 14 further includes a connecting rod connected to each of the baffles and each of the complementary baffles, wherein the connecting rod spans between the first end and the second end of the baffle stack, wherein the connecting rod includes a cross-section, wherein each of the baffles includes a connecting hole and each of the complementary baffles includes a complementary connecting hole, wherein the connecting hole and the complementary connecting hole each include a shape complementary to the cross-section of the connecting rod.

16. The baffle stack of claim 15, wherein the cross-section of the connecting rod is non-circular, wherein the connecting hole of each of the baffles is arranged in a first orientation, and the complementary connecting hole of each of the complementary baffles is arranged in a second orientation, wherein the first orientation and the second orientation configure the baffles and the complementary baffles around the connecting rod to achieve the baffle orientation.

17. A baffle stack as claimed in claim 14, wherein the baffles are one more than the complementary baffles, such that the baffle stack includes the baffles and the complementary baffles in the same order from the first end and the second end of the baffle stack.

18. A pollutant capture system for a reactor system, comprising: One capture hood; And a trapping structure disposed in the trapping hood, comprising: a baffle; a base plate; and a plurality of rods spanning and connected to the baffle and the base plate, wherein the rods are disposed around a flow hole disposed through the base plate, and wherein at least one of the rods comprises a sintered material.

19. A pollutant capture system for a reactor system, comprising: A trapping hood includes a bottom surface and a top surface; And a trapping structure disposed within the trapping hood, comprising: a plurality of tubes arranged in a configuration having an external shape complementary to that of the trapping hood, wherein at least one of the tubes comprises a sintered material, wherein each of the tubes comprises an aperture and at least partially spans between the bottom surface and the top surface of the hood; a support disposed within the configuration of the tubes and projecting outward from one end of the tubes, wherein the support contacts the bottom surface of the hood, thereby creating a space between the end of the tubes and the bottom surface of the hood; and a tensioning device connected around the tubes to hold the tubes together.