Additives for chemical mechanical polishing and their manufacturing methods, as well as the composition of polishing fluids.
Polymers with narrow molecular weight distribution and specific structural units address the issues of insufficient polishing speed and depression formation in CMP, achieving rapid and defect-free surface planarization.
TWI931603BActive Publication Date: 2026-07-11TOAGOSEI CO LTD
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Patent Information
- Application Number
- TW111139751
- Authority / Receiving Office
- TW · TW
- Patent Type
- Patents
- Current Assignee / Owner
- Priority Date
- 2021-11-15
- Filing Date
- 2022-10-20
- Publication Date
- 2026-07-11
- Estimated Expiration
- 2042-10-19
AI Technical Summary
Technical Problem
Existing chemical mechanical polishing (CMP) technologies face issues with insufficient polishing speed and excessive depression formation on uneven surfaces, leading to dish-like bending phenomena and reduced productivity.
Method used
The use of polymers with narrow molecular weight distribution and specific structural units, including vinyl monomers with -(LO)nR groups, functional groups, and block copolymers, to enhance polishing speed and reduce depressions.
Benefits of technology
The solution enables rapid polishing of protrusions while significantly reducing depressions, resulting in a highly flat polished surface without compromising grinding speed or introducing defects.
✦ Generated by Eureka AI based on patent content.
Abstract
The additive is formulated as used in chemimechanical milling and contains a polymer (P). The polymer (P) contains structural units (A) derived from vinyl monomers having a -(LO)nR group, and the amount of structural units derived from monomers having one or more functional groups selected from the group consisting of carboxylic acid groups, phosphate groups, phosphonic acid groups, sulfate groups, sulfonic acid groups and salts thereof, totaling 0 to 0.6% by mass, and the dispersion (PDI) of the polymer (P) expressed as weight average molecular weight (Mw) / number average molecular weight (Mn) is 2.0 or less. (However, L is an alkyl group having 4 or fewer carbon atoms, n is any integer from 3 to 150, and R is a hydrogen atom or a monovalent hydrocarbon group having 1 to 4 carbon atoms).
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