Quartz glass member for exposure to deposition process gas

Abstract

A quartz glass component for exposing a film-forming gas is provided, which, without increasing its size, shape, or dimensions compared to previous quartz glass components for exposing a film-forming gas, increases the derived surface area obtained from the BET specific surface area without increasing labor or cost. This quartz glass component for exposing a film-forming gas comprises: a plate-shaped quartz glass component body; a plurality of linear protrusions with slightly square cross-sections, at least a portion of which are formed on the surface of the aforementioned quartz glass component body; and a plurality of microcracks, formed on at least one side of the aforementioned linear protrusions. Assuming that the dimensional surface area of ​​the linear protrusions is 1, and the aforementioned quartz glass component for exposing a film-forming gas has the aforementioned linear protrusions and the aforementioned microcracks, the derived surface area obtained from the BET specific surface area obtained by the BET measurement method is B times 1, then B is 5 or more.

Description

Technical Field

[0001] This invention relates to a quartz glass component for exposing gas during film formation and a method for manufacturing the same. The quartz glass component for exposing gas during film formation is placed together with the semiconductor substrate undergoing film formation in a reaction chamber during the film formation process of a semiconductor substrate, thereby increasing the exposure area to the gas during film formation. Prior Technology

[0002] Previously, in the manufacturing process of semiconductor devices, various film-forming processes, such as CVD (Chemical Vapor Deposition), were performed on semiconductor substrates such as silicon wafers. In this film-forming process, for example, the semiconductor substrate is placed on a wafer holder called a wafer boat and moved into a reaction chamber for film formation.

[0003] In this type of film deposition process using a wafer holder, a crystal boat is made of a material that does not react with the processing gas, namely quartz glass. The semiconductor substrate is placed on the crystal boat, and the aforementioned semiconductor substrate and components made of the material that does not react with the processing gas, namely quartz glass, are housed together in a reaction chamber for film deposition.

[0004] The surface of a semiconductor substrate undergoing film deposition treatment will become uneven due to the treatment, and its surface area is larger than that of a semiconductor substrate with a flat surface. Therefore, in order to achieve uniform film deposition on the semiconductor substrate, the surface area of ​​the quartz glass component (also known as a dummy wafer) exposed in the film deposition treatment gas in the reaction chamber must also be maximized.

[0005] In the case of the gas distribution adjustment component described in Patent Document 1, the surface area is calculated based on the outer diameter, without taking into account details such as the existence of tiny cracks (micro-cracks). As a result, it is impossible to quantitatively assess the actual surface area containing minute irregularities.

[0006] The quartz glass component for increasing the exposure area described in Patent Document 2 is a technology for managing the unevenness of the trench depth in terms of size and shape, but it does not manage the actual surface area that affects gas adsorption.

[0007] The manufacturing method described in Patent Document 3 involves creating cavitation bubbles in silica glass to increase its surface area, but this requires processing under high temperature and pressure, which is time-consuming and costly.

[0008] On the other hand, the quartz glass components used for film formation are limited in shape and size; their dimensions and shapes cannot be infinitely enlarged. Therefore, there is a limit to increasing the surface area beyond the previous figures by focusing on size and shape. Consequently, it is necessary to understand which factors can overcome the size limitations of the quartz glass components used for film formation, contribute to increasing the surface area of ​​the aforementioned quartz glass components, and incorporate these factors into the quartz glass components.

[0009] Based on the conditions of Example 1 in Patent Document 2, the inventors discovered that using different quartz glass components with increased exposure area to manufacture the mold for the processing steps resulted in variations in BET (Brunaure Emmett Teller Value) due to different grinding stones, even when using the same finishing dimensions, leading to differences in film quality. Further investigation to understand the cause of this difference revealed that even with the same finishing dimensions, processing conditions resulted in different BET specific surface areas; using a component with a larger BET specific surface area resulted in better film quality. [Previous Technical Documents] [Patent Literature]

[0010] [Patent Document 1] Japanese Patent Application Publication No. 2015-173154 [Patent Document 2] WO2017 / 217309 [Patent Document 3] WO2022 / 215663 Summary of the Invention

[0011] [The problem the invention aims to solve] The objective of this invention is to provide a quartz glass component for exposing a film-forming gas and a method for manufacturing the same, which can increase the derived surface area obtained from the BET specific surface area without increasing the size, shape or size of previous quartz glass components for exposing a film-forming gas, or by increasing the time or cost. [Methods for solving problems]

[0012] The quartz glass member for film-forming treatment gas exposure of the present invention is a plate-shaped quartz glass member for film-forming treatment gas exposure that is exposed to the film-forming treatment gas used in the semiconductor film-forming step, and includes a plate-shaped quartz glass member body; a plurality of linear convex portions with a substantially square cross-section, which are formed on at least a part of the surface of the quartz glass member body; and a plurality of microcracks, which are formed on at least one side surface of the linear convex portion. Assuming that the surface area of the linear convex portion obtained from the size is 1, and for the quartz glass member for film-forming treatment gas exposure on which the linear convex portion and the microcracks are formed, if the derived surface area obtained from the BET specific surface area measured by the BET measurement method and 1 have a relationship of B times, then B is 5 or more.

[0013] Ideally, the quartz glass member for film-forming treatment gas exposure is such that: assuming that the surface of the quartz glass member body has no such linear convex portions and microcracks and is a completely flat surface, becoming a quartz glass member with only a flat surface, and assuming that the surface area of the size of only the flat surface obtained from the size is 1, and assuming that at least a part of the surface of the quartz glass member body forms linear convex portions without microcracks, becoming a quartz glass member with linear convex portions, and the relationship between the surface area of the size of the linear convex portions obtained from the size and 1 is A times; assuming that the surface area of the size of only the flat surface obtained from the size is 1, and the relationship between the derived surface area obtained from the BET specific surface area and 1 is C times; then the relationship of A < B < C is satisfied.

[0014] Ideally, the quartz glass member for film-forming treatment gas exposure satisfies the relationship that B is 2 times or more of A and C is 6 times or more of A.

[0015] Ideally, microcracks are formed within 0.1 mm of the unit length of at least one side surface of the linear convex portion, the average depth of each microcrack is 8 μm or more, and the total depth of all microcracks in each unit length is 50 μm or more.

[0016] Ideally, the microcracks are enlarged microcracks enlarged by etching.

[0017] Ideally, for the quartz glass member for film-forming treatment gas exposure including the enlarged microcracks, the BET specific surface area obtained by the BET measurement method is 7 times or more relative to the BET specific surface area obtained by the BET measurement method assuming that the surface of the quartz glass member body has no such linear convex portions and microcracks and is a completely flat surface, becoming a quartz glass member with only a flat surface.

[0018] Ideally, the BET specific surface area of ​​a quartz glass component for exposing a film-forming gas containing the aforementioned enlarged microcracks, measured by the BET method, is more than 19 times that of a quartz glass component with only a flat surface, assuming that the surface of the quartz glass component body does not have the aforementioned linear protrusions and microcracks.

[0019] Ideally, the thickness of the aforementioned quartz glass component body is 1 to 1.5 mm, and the height of the aforementioned linear protrusion is 0.6 mm or more but less than 1.5 mm.

[0020] The method for manufacturing a quartz glass component for film-forming gas exposure according to the present invention is the same as the aforementioned method for manufacturing a quartz glass component for film-forming gas exposure. It includes the steps of forming a linear protrusion with a slightly square cross-section on at least a portion of the quartz glass component body by grinding with a grinding blade; and forming a plurality of microcracks on at least one side of the aforementioned linear protrusion. Compared with the dimensional surface area of ​​the aforementioned quartz glass component for film-forming gas exposure determined by size, the derived surface area of ​​the aforementioned quartz glass component for film-forming gas exposure, obtained by BET specific surface area measured by the BET method, is larger.

[0021] Ideally, the process includes the following steps: a linear protrusion is formed on the body of a quartz glass component, the aforementioned microcrack is formed on the linear protrusion, and the quartz glass component body is etched with a depth range of 0.1μm to 0.6μm to enlarge the aforementioned microcrack into an enlarged microcrack.

[0022] Ideally, the aforementioned etching is performed using an HF cleaning step. [Effects of the Invention]

[0023] According to the present invention, the objective is to provide a quartz glass component for film-forming gas exposure and a method for manufacturing the same, which can increase the derived surface area obtained from the BET specific surface area without increasing the size, shape or size of the previous quartz glass component for film-forming gas exposure, or by increasing the time or cost. Simple Explanation of the Diagram

[0024] [Figure 1] is a schematic top view of one embodiment of the circular plate-shaped quartz glass component for film-forming gas exposure according to the present invention. [Figure 2] shows an example of the formation of a linear protrusion in a quartz glass component for gas exposure in film formation according to the present invention. (a) shows an enlarged cross-sectional view of the surface after the linear protrusion formation has been performed, and (b) shows an enlarged cross-sectional view of the surface before the linear protrusion formation has been performed. [Figure 3] is a schematic diagram of a microcrack in a quartz glass component for gas exposure in film formation according to the present invention. (a) is a schematic diagram of a typical microcrack, and (b) is a schematic diagram of an enlarged microcrack. [Figure 4] is an explanatory diagram illustrating the magnifications A, B, C and X used in this invention. [Figure 5] is a schematic top view showing one embodiment of a rotary grinding blade, (a) is a perspective view, and (b) is a front view. [Figure 6] is an explanatory diagram showing the shape of the sample used for BET measurement. [Figure 7] shows the SEM observation results of Example 1, which has a "medium" level of microcracks. [Figure 8] shows the SEM images of Example 2, which has a “large” number of microcracks. [Figure 9] shows the SEM images of Comparative Example 1, which has a "small" level of microcracks. [Figure 10] is an explanatory diagram illustrating the multiplier E. [Figure 11] shows a microscope photograph of the back of Experiment 6. [Figure 12] shows a microscope photograph of the back of Experiment 7. [Figure 13] shows a microscope photograph of the back of Experiment Example 8. Implementation

[0025] The following describes embodiments of the present invention, but these embodiments are merely examples, and various modifications can be made without departing from the technical concept of the present invention. In the figures, the same symbols are used to indicate the same components.

[0026] In Figures 1 and 2, symbol 10 represents the quartz glass component for exposing the film-forming process gas according to the present invention. The quartz glass component 10 for exposing the film-forming process gas is a quartz glass component used in the film-forming process of a semiconductor substrate, placed together with the semiconductor substrate undergoing the film-forming process in a reaction chamber and exposed to the film-forming process gas. The quartz glass component for exposing the film-forming process gas has a plate-shaped (circular plate in the example) quartz glass component body 12 and a plurality of slightly square-shaped linear protrusions 14 formed on at least a portion of the aforementioned quartz component body 12; it can increase the exposure area to the film-forming process gas.

[0027] Figure 2(b) shows the plate-shaped (circular plate in the example) quartz glass component body 12 before the linear protrusion 14 is formed. As shown in Figure 2(b), before the linear protrusion 14 is formed, the surface 16 and the back surface 18 of the plate-shaped (circular plate in the example) quartz glass component body 12 are both flat surfaces. Once the linear protrusion is formed, as shown in Figure 2(a), the linear protrusion 14 and the recess 20 are formed simultaneously. The linear protrusion 14 is composed of the surface 16 and the side surfaces 22a and 22b. The recess 20 is composed of the side surfaces 22a and 22b and the bottom surface 24. The side surfaces 22a and 22b of the recess 20 are also the side surfaces of the linear protrusion 14. In addition to the circular plate-shaped quartz glass component body 12, the plate-shaped quartz glass component can also be a quadrilateral or polygon with rounded corners, etc.

[0028] In Figures 1 and 2(a), a linear protrusion 14 is formed on one plane (surface side) of the quartz glass component body 12 as an example. However, in order to increase the specific surface area, a linear protrusion 14 can also be formed on the side opposite to the aforementioned plane (back side), thus forming linear protrusions 14 on both sides of the quartz glass component body 12. In addition, in order to form the linear protrusion 14, grooves can be applied to the quartz glass component body 12 to form the linear protrusion 14.

[0029] <About Microcracks> The quartz glass component 10 for film-forming gas exposure of the present invention is characterized by forming a plurality of microcracks 26, as shown in FIG. 3(a), on at least one of the side surfaces 22a and 22b of the linear protrusion 14 described above in FIG. 2(a). Microcracks 26 may also be formed on the bottom surface 24. Microcracks are fine cracks or fissures formed on the surface of the quartz glass component body 12. In FIG. 3(a), the linear protrusion 14 is partially enlarged to schematically show the microcracks 26. In the example of FIG. 3(a), microcracks 26 are formed on the side surface 22a of the linear protrusion 14. Such microcracks are also formed when the linear protrusion 14 is formed. In particular, microcracks are more likely to be formed when the linear protrusion 14 is formed by grooving.

[0030] Ideally, at least one side of the linear protrusion 14 described above in this invention has microcracks 26 formed within a unit length of 0.1 mm or less, each microcrack having an average depth of 8 μm or more, and the total depth of all microcracks within the aforementioned unit length being 50 μm or more.

[0031] The microcracks shown in Fig. 3(b) are enlarged microcracks 28 enlarged by etching. In the present invention, the aforementioned microcracks are preferably enlarged microcracks 28 enlarged by etching. In order to remove the processing contamination on the outermost surface of the quartz glass member, it can be washed with pure water. However, by removing the outermost surface by etching, the microcracks that were originally in a blocked state are liberated, and the specific surface area can be increased. In addition, the so-called enlarged microcracks are microcracks in which the crack part is enlarged by etching.

[0032] Regarding the quartz glass member 10 for film-forming treatment gas exposure of the present invention, assuming that the surface of the aforementioned quartz glass member body 12 and the linear convex portion 14, the surface area of the linear convex portion dimension calculated from the dimensions (without considering the existence of microcracks, the surface area calculated based on the external dimensions) is 1; and for the aforementioned quartz glass member for film-forming treatment gas exposure formed with the aforementioned linear convex portion 14 and the aforementioned microcracks 26, the derived surface area obtained from the BET specific surface area measured by the BET method, and the relationship with 1 is B times, then B is 5 or more. Fig. 4 is an explanatory diagram showing the aforementioned magnification.

[0033] As shown in Fig. 4, looking at the quartz glass member body 12 without the formation of a linear convex portion, the surface area of the quartz glass member body 12 with the formation of a linear convex portion in terms of dimensions is A times. This technique for increasing the surface area in terms of dimensions has been disclosed in Patent Document 1 or Patent Document 2.

[0034] Then regarding the quartz glass member 10 for film-forming treatment gas exposure of the present invention, preferably, assuming that the surface 16 of the aforementioned quartz glass member body 12 does not have the aforementioned linear convex portion 14 and microcracks 26, is a completely flat surface, and becomes a quartz glass member with only a flat surface (that is, the quartz glass member body 12 without the formation of a linear convex portion), and the dimensional surface area of only the flat surface is calculated from the dimensions to be 1, assuming that at least a part of the surface of the aforementioned quartz glass member body forms a linear convex portion and does not have microcracks, and becomes a quartz glass member with a linear convex portion, and the dimensional surface area of the linear convex portion is calculated from the dimensions, and the relationship with 1 is A times; assuming that the dimensional surface area of only the flat surface is calculated from the aforementioned dimensions to be 1, and the derived surface area obtained from the aforementioned BET specific surface area, and the relationship with 1 is C times; then the relationship of A < B < C is satisfied.

[0035] More preferably, the aforementioned quartz glass member 10 for film-forming treatment gas exposure satisfies the relationship that B is 2 times or more of A and C is 6 times or more of A.

[0036] Then, in this invention, the BET specific surface area of ​​the quartz glass component 10 for film-forming treatment gas exposure, which includes the aforementioned enlarged microcracks, obtained by the BET measurement method, is ideally 7 times or more, preferably 19 times or more, relative to the BET specific surface area obtained by the BET measurement method for a quartz glass component that assumes the surface of the aforementioned quartz glass component body has no aforementioned linear protrusions and microcracks and is a completely flat surface, becoming a quartz glass component with only flat surfaces. In this invention, the ratio of the BET specific surface area obtained by the BET measurement method for the quartz glass component 10 for film-forming treatment gas exposure of this invention to the BET specific surface area obtained by the BET measurement method for a quartz glass component that assumes the surface of the aforementioned quartz glass component body has no aforementioned linear protrusions and microcracks and is a completely flat surface, becoming a quartz glass component with only flat surfaces, is called the ratio X.

[0037] <About BET Measurement Method> In this invention, the BET measurement method (gas adsorption method) is used to define the specific surface area, so surfaces with microcracks or minor irregularities can also be included as part of the surface area. Regarding the measurement of BET specific surface area using the BET measurement method, if the amount of gas adsorbed is measured according to JIS Z8830:2013, the carrier gas method is used; if the adsorption data is being analyzed, a multi-point method or a single-point method is used for measurement.

[0038] Furthermore, in this invention, ideally, the thickness of the aforementioned quartz glass component 12 body is 1 to 1.5 mm, and the height of the aforementioned linear protrusion is 0.6 mm or more but less than 1.5 mm.

[0039] The manufacturing method of the present invention is the manufacturing method of the aforementioned quartz glass component 10 for film-forming gas exposure, which includes the steps of forming a linear protrusion 14 with a slightly square cross-section on at least a portion of the surface of the aforementioned quartz glass component body 12 by grinding with a grinding blade; and forming a plurality of microcracks 26 on at least one side surface 22a, 22b of the aforementioned linear protrusion 14. Compared with the dimensional surface area of ​​the aforementioned quartz glass component 10 for film-forming gas exposure determined by size, the derived surface area of ​​the aforementioned quartz glass component for film-forming gas exposure obtained by BET measurement method is larger.

[0040] Regarding the aforementioned grinding edge, a rotary grinding edge is preferred, for example. As for the rotary grinding edge, a multi-peripheral cutting insert as shown in Figure 5 can be used, for example. In Figure 5, the multi-peripheral cutting insert 30 has: a single disc-shaped metal substrate portion 32; a diamond abrasive layer substrate portion 36, which is formed on the outer periphery 34 of the aforementioned disc-shaped metal substrate portion 32; and a diamond abrasive cutting edge portion 40, which consists of multiple integrally formed cutting edges 38 protruding from the aforementioned diamond abrasive layer substrate portion 36. A through hole 42 for inserting a rotating shaft is provided in the center. There are no particular restrictions on the conditions when using a grinding blade to carve grooves. Ideally, the feed rate of the rotating grinding blade should be 10~300 mm / min, and the rotation speed should be 1500~4000 mm / min. As for the adhesive used for grinding blades, any known adhesive can be used without particular restrictions. Examples include metal, resin, electroplating, etc., with metal being preferred.

[0041] Then, in the manufacturing method of the present invention, ideally, the following steps are included: etching the aforementioned quartz glass component 10 for exposure to film-forming gas at a depth range of 0.1 μm to 0.6 μm to enlarge the aforementioned microcrack 26 into an enlarged microcrack 28.

[0042] Ideally, the aforementioned etching is performed using an HF cleaning step. By performing an HF cleaning step, the surface area can be controlled using the HF cleaning amount. This surface area includes the microcrack opening shape that affects gas adsorption, as assessed by the BET measurement method. The HF cleaning amount can be appropriately selected based on the surface area of ​​the quartz glass component body with the linear protrusions, with 0.3 μm being preferred. Therefore, the surface area of ​​quartz components, which has a significant impact on film thickness control, can be managed more precisely.

[0043] Furthermore, by performing the HF cleaning step, the shape of the microcracks formed by the quartz glass component body 12 through grooving and other processes can be managed using the amount of HF cleaning. Instead of using silica glass with many bubbles as in Patent Document 3, no special equipment or steps are required to obtain the raw quartz glass. The surface area can be controlled without increasing costs or effort, resulting in a quartz frame with a larger surface area. [Example]

[0044] The following examples illustrate the present invention in more detail, but these examples are merely illustrative and should not be construed as limiting the present invention.

[0045] (Example 1) Using the rotary grinding blade shown in Figure 5, grooves were etched into a transparent quartz glass plate to create a plate-shaped quartz component with multiple linear protrusions (grooves). The grinding blade was a metal-bonded abrasive stone. Regarding the grooving conditions, the feed speed of the rotary grinding blade was set to low (100 mm / min), and the rotation speed to high (1500~1700 rpm). The thickness of the plate-shaped component was set to 1.5 mm, and the groove depth to 0.6 mm. To remove processing contaminants from the plate-shaped component after groove formation, HF cleaning was performed to obtain the quartz glass component for film-forming gas exposure according to the present invention. The HF cleaning amount was set to 0.6 μm.

[0046] From the components cleaned by HF, plate-shaped samples were cut out for measuring the specific surface area using the BET measurement method, and the BET specific surface area was measured. The size of the plate-shaped sample at this time is 40mm × 8mm × 1.5mm. The surface area of ​​the linear convex part in the sample (convex surface width: 0.4mm, concave bottom width: 0.2mm, side height: 0.6mm) calculated from the dimensions is called the dimensional surface area, denoted as S1. The shape of the plate-shaped sample used for specific surface area measurement is shown in Figures 6(a) and (b). BET specific surface area is measured using a BELSORP MAX measuring device manufactured by MicrotracBEL, employing Kr-BET with krypton gas. The resulting specific surface area is denoted as H1 (m2 / g). The surface area of ​​the sample is calculated by multiplying H1 by the sample weight. This surface area is called the derived surface area HS1. Prepare another sample cut from a plate-like component, the same size but without the groove shape, only a completely flat surface, adjust it to become the reference sample by double-sided grinding, and measure the BET specific surface area in the same way. At this point, the specific surface area of ​​the reference double-sided polished sample is denoted as H0 (m2 / g). The value of H1 / H0 is calculated, and the magnification X is found to be 7 times. Assuming a double-sided polished sample with a perfectly flat surface, the surface area calculated from the dimensions is S0. Then, the ratio A calculated from the relationship between the surface area S1 and the dimensions is S1 / S0 is 1.8. Furthermore, the relationship between S1 and HS1 mentioned above, HS1 / S1, is calculated, and the ratio B is 6. Furthermore, the relationship between S0 and HS1, HS1 / S0, was calculated, and the ratio C was 11. The results are shown in Table 1.

[0047] SEM observation was performed on the cross-section of the same sample to observe the state of microcracks formed every 0.1 mm in length on the side of the groove, and the number and depth of the microcracks were measured. The SEM observation image of Example 1 is shown in Figure 7, and the measurement results of the microcracks are shown in Table 2. The evaluation criteria for microcracks are as follows. Large: Cases where the total depth per unit length (0.1 mm) is 100 μm or more. Medium: Cases where the total depth per unit length (0.1 mm) is 50 μm or more but less than 100 μm. Small: The total depth per unit length (0.1 mm) is less than 50 μm.

[0048] As shown in Figure 7, microcracks of a "medium" degree were identified in the sample of Example 1. The microcracks were measured from the SEM images shown in Figure 7, and the results showed that the total depth of each 0.1 mm long microcrack was 65 μm, with an average depth of 8 μm per crack.

[0049] Furthermore, using the quartz glass component for film-forming gas exposure obtained as described above, semiconductor film formation was performed by the following method, and the quality of the film formation was evaluated. The results are shown in Table 1. <Semiconductor Film Formation Methods and Quality Evaluation> The quartz glass for exposure as described in Example 1 was prepared, and a film formation experiment of a nitride film was conducted to verify the adsorption effect of the treatment gas on the quartz glass component. The quartz glass for exposure and the film-forming material (i.e., the semiconductor substrate) were placed in a reaction vessel for film formation, and the film formation experiment was performed. The film quality was evaluated by assuming the film thickness at the center of the semiconductor substrate after film formation was 1, and confirming the ratio of the maximum film thickness (Max.) within the semiconductor substrate to 1. The evaluation criteria are as follows. Evaluation benchmark ◎: Film thickness ratio less than 1.05 〇: Film thickness ratio ≥1.05 and <1.10 △: Film thickness ratio ≥ 1.10 and < 1.30 ×: Film thickness ratio 1.30 or more

[0050]

[0051]

[0052] (Example 2) Plate-shaped quartz components with multiple grooves were prepared under the same conditions as in Example 1. Except that the HF cleaning amount described in Example 1 was changed to 0.3 μm, the samples were prepared under the same conditions. Plate-shaped samples for BET measurement were cut from the components after HF cleaning. The BET specific surface area was measured using the same method as in Example 1. Microcracks were observed and the film quality was evaluated. The size of the plate-shaped sample is 40mm × 8mm × 1.5mm. The surface area calculated based on this size is called the dimensional surface area, denoted as S2. BET specific surface area is measured using Kr-BET with krypton gas, and the resulting specific surface area is denoted as H2 (m2 / g). The surface area of ​​the sample is calculated by multiplying H2 by the sample weight. This surface area is called the derived surface area HS2. Similar to Example 1, another sample cut from a plate-like component was prepared, with the same dimensions but no groove shape, only a completely flat surface. It was adjusted to serve as a reference sample and ground on both sides. The BET specific surface area was measured in the same way. At this point, the specific surface area of ​​the reference double-sided polished sample is denoted as H0 (m2 / g). The value of H2 / H0 is calculated, and the magnification X is found to be 9 times. Similar to Example 1, assuming a double-sided polished sample with a completely flat surface, the surface area calculated from the dimensions is S0, and the ratio A calculated from the relationship between the surface area S2 and the dimensions S2 is 1.8. Furthermore, the relationship between S2 and HS2, HS2 / S2, was calculated, and the ratio B was 8. Moreover, the relationship between S0 and HS2, HS2 / S0, was calculated, and the ratio C was 15. The results are shown in Table 1. SEM observation was performed on the cross-section of the same sample to observe the state of microcracks formed every 0.1 mm in length on the side of the groove, confirming a "large" number of microcracks. The SEM image of Example 2 is shown in Figure 8. Measurement of the microcracks from the SEM image shown in Figure 8 revealed a total depth of 222 μm for every 0.1 mm in length, with an average depth of 25 μm per crack. The results are presented in Table 2.

[0053] (Example 3) Plate-shaped quartz components with multiple grooves were prepared under the same conditions as in Example 1, except that the HF cleaning amount described in Example 1 was changed to 0.15 μm. Plate-shaped samples for BET measurement were cut from the HF-cleaned components, and the BET specific surface area was measured using the same method as in Example 1. Microcracks were observed and the film quality was evaluated. The size of the plate-shaped sample is 40mm × 8mm × 1.5mm. The surface area calculated based on this size is called the dimensional surface area, denoted as S3. BET specific surface area is measured using Kr-BET with krypton gas, and the resulting specific surface area is denoted as H3 (m2 / g). The surface area of ​​the sample is calculated by multiplying H3 by the sample weight. This surface area is called the derived surface area HS3. Similar to Example 1, another sample cut from a plate-like component is prepared. This sample has the same dimensions but no grooves; it has only a completely flat surface. It is then adjusted to serve as a reference double-sided grinding sample, and the BET specific surface area is measured. The specific surface area of ​​this reference double-sided grinding sample is denoted as H0 (m² / g). The value of H3 / H0 is calculated, yielding a magnification X of 10. Similar to Example 1, assuming a double-sided polished sample with a completely flat surface, the surface area calculated from the dimensions is S0, and the ratio A calculated from the relationship between the surface area S3 and the dimensions is S3 / S0 is 1.8. Furthermore, the relationship between S3 and HS3, HS3 / S3, is found to be 10. Moreover, the relationship between S0 and HS3, HS3 / S0, is found to be 17. SEM observation was performed on the cross-section of the same sample to observe the state of the microcracks formed every 0.1 mm in length on the side of the groove. It was confirmed that the microcracks were of a "large" degree, which was the same as the SEM observation image of Example 2 shown in Figure 8.

[0054] (Example 4) Similar to Example 1, a rotary grinding blade was used to groove a transparent quartz glass plate to create a plate-shaped quartz component with multiple grooves. The grinding blade was a metal-bonded abrasive stone. The grooving conditions were the same as in Example 1, with grooving applied to one plane (surface) of the transparent quartz glass plate, and additional grooving applied to the opposite side (back side), resulting in a double-sided grooved structure. The thickness of the plate-shaped component was set to 1.5 mm, and the groove depth was 0.6 mm on both sides. To remove processing contaminants after groove formation, the plate-shaped component underwent HF cleaning, with an HF cleaning amount of 0.3 μm. Plate-shaped samples for BET measurement were cut from the components after HF cleaning. The BET specific surface area was measured using the same method as in Example 1. Microcracks were observed and film quality was evaluated. The size of the plate-shaped sample is 40mm × 8mm × 1.5mm. The surface area calculated based on this size is called the dimensional surface area, denoted as S4. BET specific surface area is measured using Kr-BET with krypton gas, and the resulting specific surface area is denoted as H4 (m2 / g). The surface area of ​​the sample is calculated by multiplying H4 by the sample weight. This surface area is called the derived surface area HS4. Similar to Example 1, another sample cut from a plate-like component was prepared, with the same dimensions but no groove shape, only a completely flat surface. It was adjusted to serve as a reference sample and ground on both sides. The BET specific surface area was measured in the same way. At this point, the specific surface area of ​​the reference double-sided polished sample is denoted as H0 (m2 / g). The value of H4 / H0 is calculated, and the magnification X is found to be 18 times. Similar to Example 1, assuming a double-sided polished sample with a completely flat surface, the surface area calculated from the dimensions is S0, and the ratio A calculated from the relationship between the surface area S4 and the dimensions is S4 / S0 is 2.6. Furthermore, the relationship between S4 and HS4 is calculated as HS4 / S4, and the ratio B is 9. Furthermore, the relationship between S0 and HS4, HS4 / S0, is calculated, and the ratio C is 23. SEM observation was performed on the cross-section of the same sample to observe the state of the microcracks formed every 0.1 mm in length on the side of the groove. It was confirmed that the microcracks were of a "large" degree, which was the same as the SEM observation image of Example 2 shown in Figure 8.

[0055] (Example 5) Similar to Example 1, a rotary grinding blade was used to groove a transparent quartz glass plate to create a plate-shaped quartz component with multiple grooves. The grinding blade was a metal-bonded abrasive stone. The grooving conditions were set to a low feed rate and a high rotation speed for the rotary grinding blade. The thickness of the plate-shaped component was set to 1.5 mm, and the groove depth to 1 mm. To remove machining contaminants from the plate-shaped component after groove formation, HF cleaning was performed, with a cleaning amount of 0.3 μm. Plate-shaped samples for BET measurement were cut from the components after HF cleaning. The BET specific surface area was measured using the same method as in Example 1. Microcracks were observed and film quality was evaluated. The size of the plate-shaped sample is 40mm × 8mm × 1.5mm. The surface area calculated based on this size is called the dimensional surface area, denoted as S5. BET specific surface area is measured using Kr-BET with krypton gas, and the resulting specific surface area is denoted as H5 (m2 / g). The surface area of ​​the sample is calculated by multiplying H5 by the sample weight. This surface area is called the derived surface area HS5. Similar to Example 1, another sample cut from a plate-like component was prepared, with the same dimensions but no groove shape, only a completely flat surface. It was adjusted to serve as a reference sample and ground on both sides. The BET specific surface area was measured in the same way. At this point, the specific surface area of ​​the reference double-sided ground sample is denoted as H0 (m2 / g). The value of H5 / H0 is calculated, and the magnification X is found to be 19 times. Similar to Example 1, assuming a double-sided polished sample with a completely flat surface, the surface area calculated from the dimensions is S0, and the ratio A calculated from the relationship between the surface area S5 and the dimensions is S5 / S0 is 2.2. Furthermore, the relationship between S5 and HS5 is calculated as HS5 / S5, and the ratio B is 13. Furthermore, the relationship between S0 and HS5 is calculated as HS5 / S0, and the ratio C is 28. SEM observation was performed on the cross-section of the same sample to observe the state of the microcracks formed every 0.1 mm in length on the side of the groove. It was confirmed that the microcracks were of a "large" degree, which was the same as the SEM observation image of Example 2 shown in Figure 8.

[0056] (Example 6) Similar to Example 1, a rotary grinding blade was used to groove a transparent quartz glass plate to produce a plate-shaped quartz component with multiple grooves. The grinding blade was a metal-bonded abrasive stone, similar to that used in Example 1. Regarding the grooving conditions, the feed speed of the rotary grinding blade was set to low, and the rotation speed to high. The thickness of the plate-shaped component was set to 1.5 mm, and the groove depth to 0.6 mm. To remove processing contaminants from the plate-shaped components after groove formation, pure water cleaning was performed instead of HF cleaning. Plate-shaped samples for BET measurement were cut from the components after pure water cleaning, and the BET specific surface area was measured using the same method as in Example 1. Microcracks were observed and film quality was evaluated. The size of the plate-shaped sample is 40mm × 8mm × 1.5mm. The surface area calculated based on this size is called the dimensional surface area, denoted as S6. BET specific surface area, measured using Kr-BET with krypton, is denoted as H6 (m2 / g). The surface area of ​​the sample is calculated by multiplying H6 by the sample weight. This surface area is called the derived surface area HS6. Similar to Example 1, another sample cut from a plate-like component was prepared, with the same dimensions but no groove shape, only a completely flat surface. It was adjusted to serve as a reference sample and ground on both sides. The BET specific surface area was measured in the same way. At this point, the specific surface area of ​​the reference double-sided ground sample is denoted as H0 (m2 / g). The value of H6 / H0 is calculated, and the magnification X is 21 times. Similar to Example 1, assuming a double-sided polished sample with a completely flat surface, the surface area calculated from the dimensions is S0, and the ratio A calculated from the relationship between the surface area S6 and the dimensions is S6 / S0 is 1.8. Furthermore, the relationship between S6 and HS6 mentioned above, HS6 / S6, is calculated, and the ratio B is 20. Furthermore, the relationship between S0 and HS6 is calculated as HS6 / S0, and the ratio C is 36. SEM observation was performed on the cross-section of the same sample to observe the state of the microcracks formed every 0.1 mm in length on the side of the groove. It was confirmed that the microcracks were of a "large" degree, which was the same as the SEM observation image of Example 2 shown in Figure 8.

[0057] (Example 7) Similar to Example 1, a rotary grinding blade was used to groove a transparent quartz glass plate to create a plate-shaped quartz component with multiple grooves. The grinding blade was a metal-bonded abrasive stone, the same as in Example 1. Regarding the grooving conditions, the feed speed of the rotary grinding blade was set to low, and the rotation speed to high. The thickness of the plate-shaped component was set to 1.5 mm, and the groove depth to 0.6 mm. To remove machining contaminants from the plate-shaped component after groove formation, HF cleaning was performed, with an HF cleaning amount of 0.7 μm. After cleaning the components with pure water, plate-shaped samples for BET measurement were cut out. The BET specific surface area was measured using the same method as in Example 1. Microcracks were observed and the film quality was evaluated. The size of the plate-shaped sample is 40mm × 8mm × 1.5mm. The surface area calculated based on this size is called the dimensional surface area, denoted as S7. BET specific surface area is measured using Kr-BET with krypton gas, and the resulting specific surface area is labeled as H7 (m2 / g). The surface area of ​​the sample is calculated by multiplying H7 by the sample weight. This surface area is called the derived surface area HS7. Similar to Example 1, another sample cut from a plate-like component was prepared, with the same dimensions but no groove shape, only a completely flat surface. It was adjusted to serve as a reference sample and ground on both sides. The BET specific surface area was measured in the same way. At this point, the specific surface area of ​​the reference double-sided ground sample is denoted as H0 (m2 / g). The value of H7 / H0 is calculated, and the magnification X is found to be 6 times. Similar to Example 1, assuming a double-sided polished sample with a completely flat surface, the surface area calculated from the dimensions is S0, and the ratio A calculated from the relationship between the surface area S7 and the dimensions is S7 / S0 is 1.8. Furthermore, the relationship between S7 and HS7 mentioned above, HS7 / S7, is calculated, and the ratio B is 5. Furthermore, the relationship between S0 and HS7 is calculated as HS7 / S0, and the ratio C is 9. SEM observation was performed on the cross-section of the same sample to observe the state of the microcracks formed every 0.1 mm in length on the side of the groove. It was confirmed that the microcracks were of the same degree as those in the SEM observation image of Example 1 shown in Figure 7, and had a "medium" degree of microcracks.

[0058] (Example 8) Similar to Example 1, a rotary grinding blade was used to groove a transparent quartz glass plate to produce a plate-shaped quartz component with multiple grooves. The grinding blade was a metal-bonded abrasive stone, similar to that used in Example 1. Regarding the grooving conditions, the feed speed of the rotary grinding blade was set to low, and the rotation speed to high. The thickness of the plate-shaped component was set to 1.5 mm, and the groove depth to 0.6 mm. To remove processing contaminants from the plate-shaped components after groove formation, HF cleaning was performed, with an HF cleaning amount of 0.9 μm. After cleaning the component with pure water, a plate-shaped sample for BET measurement was cut out. The BET specific surface area was measured using the same method as in Example 1. Microcracks were observed and the film quality was evaluated. The size of the plate-shaped sample was 40mm × 8mm × 1.5mm. The surface area calculated based on this size was called the dimensional surface area and denoted as S8. BET specific surface area is measured using Kr-BET with krypton gas, and the resulting specific surface area is labeled as H8 (m2 / g). The surface area of ​​the sample is calculated by multiplying H8 by the sample weight. This surface area is called the derived surface area HS8. Similar to Example 1, another sample cut from a plate-like component was prepared, with the same dimensions but no groove shape, only a completely flat surface. It was adjusted to serve as a reference sample and ground on both sides. The BET specific surface area was measured in the same way. At this point, the specific surface area of ​​the reference double-sided polished sample is denoted as H0 (m2 / g). The value of H8 / H0 is calculated, and the magnification X is found to be 6 times. Similar to Example 1, assuming a double-sided polished sample with a completely flat surface, the surface area calculated from the dimensions is S0, and the ratio A calculated from the relationship between the surface area S8 and the dimensions is S8 / S0 is 1.8. Furthermore, the relationship between S8 and HS8 mentioned above, HS8 / S8, is calculated, and the ratio B is 5. Furthermore, the relationship between S0 and HS8 is calculated as HS8 / S0, and the ratio C is 8. SEM observation was performed on the cross-section of the same sample to observe the state of the microcracks. It was confirmed that the microcracks were of the same degree as those observed in the SEM image of Example 1 shown in Figure 7, and had a "medium" degree of microcracks.

[0059] (Comparative Example 1) Similar to Example 1, a rotary grinding blade was used to groove a transparent quartz glass plate to create a plate-shaped quartz component with multiple grooves. The grinding blade was a resin-bonded abrasive stone. The thickness of the plate-shaped component was set to 1.5 mm, and the groove depth to 0.6 mm. Regarding the grooving conditions, the feed speed of the rotary grinding blade was set to low, and the rotation speed to high. To remove processing contaminants from the plate-shaped components after groove formation, HF cleaning was performed, with an HF cleaning amount of 0.3 μm. Plate-shaped samples for BET measurement were cut from the components after HF cleaning. The BET specific surface area was measured using the same method as in Example 1. Microcracks were observed and film quality was evaluated. The size of the plate-shaped sample is 40mm × 8mm × 1.5mm. The surface area calculated based on this size is called the dimensional surface area, denoted as S9. BET specific surface area is measured using a BELSORP MAX measuring device manufactured by MicrotracBEL, employing Kr-BET with krypton gas. The resulting specific surface area is denoted as H9 (m2 / g). The surface area of ​​the sample is calculated by multiplying H9 by the sample weight. This surface area is called the derived surface area HS9. Similar to Example 1, another sample cut from a plate-like component was prepared, with the same dimensions but no groove shape, only a completely flat surface. It was adjusted to serve as a reference sample and ground on both sides. The BET specific surface area was measured in the same way. At this point, the specific surface area of ​​the reference double-sided ground sample is denoted as H0 (m2 / g). The value of H9 / H0 is calculated, and the magnification is 3 times. Similar to Example 1, assuming a double-sided polished sample with a completely flat surface, the surface area calculated from the dimensions is S0, and the value A calculated from the relationship S9 / S0 is 1.3. Furthermore, the relationship between S9 and HS9 mentioned above, HS9 / S9, is calculated, and the value B is 3. Furthermore, the relationship between S0 and HS9, HS9 / S0, is calculated, and the value C is 4. SEM observation was performed on the cross-sections of the same samples to observe the state of microcracks and confirm that microcracks were present in a "small" quantity. The SEM image of Comparative Example 1 is shown in Figure 9. The microcracks were measured from the SEM images shown in Figure 9, and the results showed that the total depth of microcracks per 0.1 mm length was 26 μm, and the average depth was 7 μm / crack. The results are shown in Table 2.

[0060] (Comparative Example 2) Similar to Example 1, a rotary grinding blade was used to groove transparent quartz glass to create a plate-shaped quartz component with multiple grooves. The grinding blade was a metal-bonded abrasive stone. The grooving conditions were set to a low feed rate and a high rotation speed for the rotary grinding blade. The thickness of the plate-shaped component was set to 1.5 mm, and the groove depth to 0.6 mm. To remove machining contaminants from the plate-shaped component after groove formation, HF cleaning was performed, with a cleaning volume of 5 μm. After HF cleaning, plate-shaped samples for BET measurement were cut from the components. The BET specific surface area was measured using the same method as in Example 1. Microcracks were observed and film quality was evaluated. The size of the plate-shaped sample was 40mm × 8mm × 1.5mm. The surface area calculated using this size was called the dimensional surface area and denoted as S10. BET specific surface area is measured using Kr-BET with krypton gas, and the resulting specific surface area is labeled as H10 (m2 / g). The surface area of ​​the sample is calculated by multiplying H10 by the sample weight. This surface area is called the derived surface area HS10. Similar to Example 1, another sample cut from a plate-like component was prepared, with the same dimensions but no groove shape, only a completely flat surface. It was adjusted to serve as a reference sample and ground on both sides. The BET specific surface area was measured in the same way. At this point, the specific surface area of ​​the reference double-sided ground sample is denoted as H0 (m2 / g). The value of H10 / H0 is calculated, and the magnification is 1.8 times. Similar to Example 1, assuming the surface area of ​​the double-sided polished sample calculated from its dimensions is S0, the value A calculated from the relationship S10 / S0 is 1.8. Furthermore, the relationship between S10 and HS10 is calculated as HS10 / S10, and the value B is 1. Furthermore, the relationship between S0 and HS10 is calculated as HS10 / S0, ​​and the value C is 2. SEM observation was performed on the cross-section of the same sample to observe the state of microcracks formed on the side of the groove every 0.1 mm in length. No microcracks were found.

[0061] The above results confirm that for the quartz glass component used in the film-forming gas exposure of the present invention, when the value of B is 5 or higher, the derived surface area obtained from the BET specific surface area obtained by the BET measurement method will increase. Moreover, as shown in Table 1, the film quality is good when the etching amount is below 0.6 μm, and the film quality deteriorates if it exceeds 0.6 μm.

[0062] <About Etching Process> Furthermore, the BET values ​​caused by different etching amounts (HF cleaning amounts) were tested for the same BET measurement sample used in Example 1, and the results are shown in Table 3.

[0063]

[0064] To remove contaminants from the outer surface of the quartz holder, HF cleaning must be above 0.1 μm. As can be seen from the results in Table 3, when the HF cleaning amount is above 0.6 μm, the BET specific surface area of ​​the sample used for BET measurement does not change, and if it exceeds 0.6 μm, the film quality will deteriorate. Therefore, the etching amount caused by HF cleaning, i.e., the HF cleaning amount, is best between 0.1 μm and 0.6 μm.

[0065] Regarding the processing conditions (Examples 1-5) The processing conditions for grooving the plate-shaped quartz glass component body are shown in Table 4. Except for changing the grooving processing conditions to those shown in Table 4, plate-shaped quartz components with multiple groove shapes were fabricated using the same method as in Example 1. Plate-shaped samples were then cut using the same method as in Example 1, and the BET specific surface area was measured and the film quality was evaluated. The differences in grooving conditions in Table 4 are described below. High rotation speed: 1500~4000 rpm Rotation speed is low: 500~1500 rpm The feed rate is high-speed: 300~600mm / min. The feed rate is low: 10~300mm / min. In addition, the feed rate mentioned here refers to the speed at which the rotating grinding blade moves in a direction parallel to the plane of the workpiece (plate-shaped quartz component). The deterioration of the grinding blade is assessed visually. Furthermore, the evaluation criteria for film quality in Table 4 are the same as those in Table 1, while the evaluation of BET specific surface area is as follows. BET specific surface area: large: above 0.020 m2 / g, medium: above 0.005 m2 / g but less than 0.020 m2 / g, small: less than 0.005 m2 / g.

[0066]

[0067] Table 4 shows that metal is more ideal than resin as a binder for grinding blades, and high speed is more ideal than low speed for rotation speed.

[0068] <On the Influence of Sandblasting and Grinding Processes> When quartz glass components are sandblasted or ground, micro-cracks may occur. These micro-cracks are also known as micro-cracks. The BET specific surface area of ​​sandblasted or ground glass components is measured and recorded in the following experimental example.

[0069] (Experimental Examples 6-8) The amount of microcracks generated on sandblasted surfaces Similar to Example 2, a plate-shaped sample with grooves were prepared on one of its surface sides. The back side of the plate-shaped sample was subjected to sandblasting (Example 6: normal back sandblasting, Example 7: stronger back sandblasting) or back grinding (Example 8: high back grinding roughness) under the conditions shown in Table 5. The cross-sections of the sandblasted and ground surfaces were observed under magnification using a Keyence VHX-7000 microscope. The number and depth of microcracks generated per 0.1 mm were measured using the multi-point measurement function of this device's planar measurement capabilities. The results are shown in Table 5. Furthermore, an explanatory diagram of the magnification E (effect on the back side) in Table 5 is shown in Figure 10. Moreover, Figure 11 shows a microscopic photograph of the back side profile of the treated sample obtained in Experimental Example 6, Figure 12 shows a microscopic photograph of the back side profile of the treated sample obtained in Experimental Example 7, and Figure 13 shows a microscopic photograph of the back side profile of the treated sample obtained in Experimental Example 8.

[0070]

[0071] As can be seen from the above, the total depth of microcracks per unit length on the sandblasted surface is much smaller than that on the ground surface. Furthermore, it can be seen that the magnification E of the sandblasted surface in Table 5 is 1.2, which does not reach the magnification of the quartz glass component for film-forming gas exposure of the present invention.

[0072] 10: Quartz glass components for film-forming treatment and gas exposure 12: Quartz glass component body 14: Linear convex part 16: Surface 18: Back 20: concave part 22a, 22b: Side view 24: Bottom 26: Microcracks 28: Enlarge microcracks 30: Multi-peripheral cutting blade 32: Disc-shaped metal substrate 34: Peripheral part 36: Diamond abrasive grain matrix 38: Multiple blades 40: Diamond abrasive grain cutting edge 42: Insertion hole

Claims

1. A quartz glass component for exposing a film-forming process gas, comprising a plate-shaped quartz glass component body; a plurality of linear protrusions with slightly square cross-sections, at least a portion of which are formed on the surface of the aforementioned quartz glass component body; and a plurality of microcracks, which are formed on at least one side of the aforementioned linear protrusions. Assuming that the dimensional surface area of ​​the linear protrusions is 1, and the aforementioned quartz glass component for exposing a film-forming process gas having the aforementioned linear protrusions and the aforementioned microcracks has a derived surface area obtained from the BET specific surface area obtained by the BET measurement method, which is B times 1, then B is 5 or more.

2. The quartz glass component for exposing film-forming treatment gases as described in claim 1, wherein, The aforementioned quartz glass component for film-forming gas exposure is as follows: Assuming the surface of the aforementioned quartz glass component body is completely flat without the aforementioned linear protrusions and microcracks, becoming a quartz glass component with only flat surfaces, and the surface area of ​​the flat surfaces is 1; assuming at least a portion of the surface of the aforementioned quartz glass component body forms linear protrusions without microcracks, becoming a quartz glass component with attached linear protrusions, and the surface area of ​​the attached linear protrusions is A times that of 1; assuming the surface area of ​​the flat surfaces is 1, and the derived surface area obtained from the aforementioned BET specific surface area is C times that of 1; then the relationship A < B < C is satisfied.

3. The quartz glass component for exposing film-forming treatment gases as described in claim 2, wherein, The aforementioned quartz glass component for gas exposure in film formation treatment satisfies the relationship that B is more than twice that of A and C is more than six times that of A.

4. The quartz glass component for exposing film-forming treatment gases as described in claim 1, wherein, Microcracks are formed within 0.1 mm of at least one side of the aforementioned linear protrusion, the average depth of each microcrack is 8 μm or more, and the total depth of all microcracks in each aforementioned unit length is 50 μm or more.

5. The quartz glass component for exposing film-forming treatment gases as described in claim 1, wherein, The aforementioned microcracks are enlarged microcracks that have been expanded by etching.

6. The quartz glass component for exposing film-forming treatment gases as described in claim 5, wherein, The BET specific surface area of ​​the aforementioned quartz glass component for exposing the film-forming gas, which includes the aforementioned enlarged microcracks, is more than 7 times that of a quartz glass component with only a flat surface, as determined by the BET measurement method.

7. The quartz glass component for exposing film-forming treatment gases as described in claim 5, wherein, The BET specific surface area of ​​the quartz glass component for exposing the film-forming gas, which includes the aforementioned enlarged microcracks, is more than 19 times that of a quartz glass component with only a flat surface, as assumed that the surface of the quartz glass component body does not have the aforementioned linear protrusions and microcracks and is a completely flat surface.

8. The quartz glass component for exposing film-forming treatment gases as described in claim 1, wherein, The thickness of the aforementioned quartz glass component body is 1 to 1.5 mm, and the height of the aforementioned linear protrusion is 0.6 mm or more but less than 1.5 mm.

9. A method for manufacturing a quartz glass component for exposing a film-forming gas, comprising the steps of manufacturing a quartz glass component for exposing a film-forming gas as described in any one of claims 1 to 8, including at least a portion of the quartz glass component body, forming a linear protrusion with a slightly square cross-section by a grinding edge; and forming a plurality of microcracks on at least one side of the linear protrusion. Compared to the dimensional surface area of ​​the quartz glass component for exposing a film-forming gas, the derived surface area of ​​the quartz glass component for exposing a film-forming gas is larger, calculated from the BET specific surface area obtained by the BET measurement method.

10. A method for manufacturing a quartz glass component for film-forming treatment gas exposure as described in claim 9, wherein, The process includes the following steps: a linear protrusion is formed on the body of a quartz glass component, the aforementioned microcrack is formed on the linear protrusion, and the quartz glass component body is etched with a depth range of 0.1μmm to 0.6μmm to enlarge the aforementioned microcrack into an enlarged microcrack.

11. A method for manufacturing a quartz glass component for film-forming treatment gas exposure as described in claim 10, wherein, The aforementioned etching was performed using an HF cleaning step.

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