Liquid chemical supply system and operating methods thereof

Abstract

A method is provided. The method includes: storing a liquid chemical in a storage tank; supplying the liquid chemical from the storage tank to a semiconductor processing tool; obtaining a first sample of the liquid chemical from a first device in fluid communication with the storage tank via a liquid selection device; measuring a first particle level in the first sample by a liquid particle counter (LPC); after obtaining the first sample, obtaining a second sample of the liquid chemical from a second device in fluid communication with the storage tank via a liquid selection device, the second device being different from the first device; and measuring a second particle level in the second sample by the LPC.

Description

Technical Field

[0001] This disclosure relates to a liquid chemical supply system and its operation method. Prior Technology

[0002] Semiconductor devices are formed on, inside, and / or made from semiconductor wafers and are used in a variety of electronic devices, such as mobile phones, laptops, desktop computers, tablets, watches, gaming systems, and various other industrial, commercial, and consumer electronics. One or more semiconductor manufacturing processes are performed to form semiconductor devices on, inside, and / or on semiconductor wafers. Summary of the Invention

[0003] According to some embodiments of this disclosure, a method is provided. This method includes: storing a liquid chemical in a storage tank; supplying the liquid chemical from the storage tank to a semiconductor processing tool; obtaining a first sample of the liquid chemical from a first device in fluid communication with the storage tank via a liquid selection device; measuring a first level of particles in the first sample using a liquid particle counter (LPC); after obtaining the first sample, obtaining a second sample of the liquid chemical from a second device in fluid communication with the storage tank via a liquid selection device, the second device being different from the first device; and measuring a second level of particles in the second sample using a liquid particle counter.

[0004] According to some embodiments of this disclosure, a method is provided. This method includes: storing liquid chemicals in a storage tank; storing a first sample of the liquid chemicals from the first device, which is in fluid communication with the storage tank, through a buffer tank of a measurement system in fluid communication with the first device; measuring a first level of particles in the first sample using a liquid particle counter (LPC); after storing the first sample, storing a second sample of the liquid chemicals from a second device, which is in fluid communication with the storage tank and is different from the first device, through a buffer tank; and measuring a second level of particles in the second sample using a liquid particle counter.

[0005] According to some embodiments of this disclosure, a system is provided. This system includes: a storage tank operatively configured to store liquid chemicals; a plurality of devices in fluid communication with the storage tank; a liquid particle counter (LPC) operatively configured to determine particle levels in a sample of the liquid chemicals; a buffer tank in fluid communication with the liquid particle counter and operatively configured to store the sample; and a liquid selection device in fluid communication with the plurality of devices and the buffer tank, the liquid selection device being operatively configured to select one of the plurality of devices and obtain a sample from that device. Simple Explanation of the Diagram

[0006] When reading in conjunction with the diagrams, the various aspects of this disclosure are best understood from the following detailed description. It should be noted that, in accordance with industry standard practice, the various features are not drawn to scale. In fact, for clarity of explanation, the dimensions of the various features may be arbitrarily increased or decreased.

[0007] Figure 1A illustrates a schematic diagram of a system for supplying materials according to some embodiments.

[0008] Figure 1B illustrates a detailed schematic diagram of the system according to some embodiments.

[0009] Figure 2 illustrates a detailed schematic diagram of the liquid selection device of a system according to some embodiments.

[0010] Figure 3 illustrates a schematic diagram of a measurement system with a buffer groove according to some embodiments.

[0011] Figure 4 illustrates a schematic diagram of a measurement system and liquid selection device according to some embodiments.

[0012] Figure 5 illustrates a schematic diagram of a particle monitoring system according to some embodiments.

[0013] Figure 6 is a flowchart illustrating a method of operating a grinding fluid supply system according to some embodiments.

[0014] Figure 7 is a flowchart illustrating a method according to some embodiments.

[0015] Figure 8 is a flowchart illustrating a method according to some embodiments.

[0016] Figure 9 illustrates an example computer-readable medium according to some embodiments, which may contain computer instructions configured to embody one or more specified processor-executable instructions set forth herein. Implementation

[0017] The following disclosure provides several different embodiments or instances for implementing various features of the provided subject matter. Specific examples of elements and arrangements are described below to simplify this disclosure. Of course, these elements and arrangements are merely examples and are not intended to be limiting. For example, in the following description, the formation of a first feature on or over a second feature may include embodiments where the first and second features are formed in direct contact, and may further include embodiments where additional features may be formed between the first and second features such that the first and second features are not in direct contact. Additionally, this disclosure may repeat schematic designations and / or letters in various instances. Such repetition is for simplicity and clarity and does not in itself indicate a relationship between the various embodiments and / or configurations discussed.

[0018] Furthermore, for ease of description, spatially related terms such as "below," "under," "lower part," "above," "above," and "upper part" may be used herein to describe the relationship between one element or feature and another element or feature as shown in the figures. In addition to the orientations depicted in the figures, spatially related terms are intended to cover different orientations of the device during use or operation. The device may be oriented in other ways (rotated 90 degrees or in other orientations), and the spatially relative descriptive terms used herein shall be interpreted accordingly.

[0019] The terms "overlying" and / or similar terms can be used to describe an element or feature that overlaps with another element or feature in the vertical direction and is located at a higher height than the other element or feature. For example, if a first element is located at a higher height than a second element, and at least a portion of the first element overlaps with at least a portion of the second element in the vertical direction, then the first element overlies the second element.

[0020] The term "underlying" and / or similar terms can be used to describe an element or feature that overlaps vertically with another element or feature and is at a lower height than the other element or feature. For example, if a first element is at a lower height than a second element, and at least a portion of the first element overlaps vertically with at least a portion of the second element, then the first element is underlying the second element.

[0021] The term "above" can be used to describe a component or feature that is at a higher height than another component or feature. For example, if the first component is at a higher height than the second component, then the first component is above the second component.

[0022] The term "below" can be used to describe an element or feature that is at a lower height than another element or feature. For example, if the first element is at a lower height than the second element, then the first element is below the second element.

[0023] As advanced semiconductor process nodes advance, production lines may be affected by contamination incidents related to the supply of liquid chemical materials, such as isopropyl alcohol (IPA), developers, etchants, and cleaning agents. In advanced processes, particle size detection resolution has reached 19 nanometers (nm) or lower. On the other hand, the detection resolution at material suppliers and factory sites remains at around 30 nm. The instability of liquid materials entering the liquid particle counter (LPC) reduces measurement stability, thereby degrading the quality of the material supply.

[0024] LPC detects particles through optical refraction, a process that is becoming increasingly difficult even with high-performance optical components. Therefore, LPC measurements are highly susceptible to interference from incoming material properties, such as air bubbles in a liquid. Different LPC devices operate at different flow rates, such as 10 cc / min, 35 cc / min, etc. The measurement process benefits from stable pressure. Pressure pulses generated by the pump can cause variations in the LPC measurement results.

[0025] In the embodiments disclosed herein, differences between different measurement points can be eliminated, and the measurement conditions exhibit increased stability and uniformity. Bubble interference is reduced by including a buffer tank that uses a gas pressure method to output liquid chemicals to the LPC.

[0026] Figure 1A illustrates a schematic diagram of a system 100 for supplying materials according to some embodiments. Figure 1B illustrates a detailed schematic diagram of the system 100 according to some embodiments.

[0027] In some embodiments, liquid chemicals 121 are transferred from truck 110 to plant supply system 130 via processes that may include one or more of preparation, connection, pumping, and monitoring. Truck 110 may be, for example, a tanker truck and may be positioned on a selected platform and grounded. A flexible hose of transport system 120 is then connected between the exhaust outlet of truck 110 and the tank of plant supply system 130, with a vapor recovery system optionally used for volatile chemicals. A pump located on truck 110 or plant supply system 130 drives the liquid transfer; flow is controlled by valves and monitored by sensors to improve safe operation. The level of liquid chemicals 121 in plant supply system 130 can be closely monitored to prevent overfilling, and a leak detection system may be optionally used. After the transfer is complete, the hose can be emptied, disconnected, and secured.

[0028] The plant supply system 130 may include one or more storage tanks, pumps, filtration systems, monitoring systems, quality measurement systems, etc. Liquid chemicals 141 can be supplied from the storage tanks to line tools, such as etching machines or cleaning machines, via piping systems and pumps selected to provide uniform flow and pressure. Liquid chemicals 141 and 121 may be the same or different. In some embodiments, the liquid chemicals 141 supplied to the tools are substantially the same as the liquid chemicals 121 received from truck 110. For example, both liquid chemicals 121 and 141 can be IPA. In some embodiments, liquid chemicals 141 differ from liquid chemicals 121 in one or more ways. For example, additives may be mixed with liquid chemicals 121 in the plant supply system 130 to form liquid chemicals 141. In another example, liquid chemicals 121 in the plant supply system 130 may be "aged" to form liquid chemicals 141 by allowing a selected period of chemical reaction. For example, an etchant (e.g., an acid) may be aged before being supplied to the tools.

[0029] A pump draws chemicals from a storage tank and delivers them through compatible piping, with valves and flow meters controlling and monitoring the flow. The pump can be calibrated for selected chemicals. An example piping 140 is depicted in Figure 1A. Liquid chemicals 141 may pass through one or more filters to remove particulates or "particles" 123 before being supplied to the tool, in which the liquid chemicals 141 are introduced into the process chamber. In some systems, excess liquid chemicals 141 are collected for reuse or waste disposal, providing safe and precise delivery of liquid chemicals 141 to support the process.

[0030] In some embodiments, the tool is operable to perform one or more semiconductor manufacturing process operations on a first semiconductor wafer 150. The first semiconductor wafer 150 includes at least one substrate, a photomask, a semiconductor device, a dielectric layer, an epitaxial layer, a silicon-on-insulator (SOI) structure, a semiconductor layer, a conductive material layer, a die, etc. The first semiconductor wafer 150 includes at least one silicon, germanium, carbide, arsenide, gallium, arsenic, phosphide, indium, antimonide, silicon germanium (SiGe), silicon carbide (SiC), gallium arsenide (GaAs), gallium nitride (GaN), gallium phosphide (GaP), indium gallium phosphide (InGaP), indium phosphide (InP), indium arsenide (InAs), indium antimonide (InSb), gallium arsenide (GaAsP), aluminum indium arsenide (AlInAs), aluminum gallium arsenide (AlGaAs), gallium indium arsenide (GaInAs), gallium indium phosphide (GaInP), gallium indium arsenide (GaInAsP), or other suitable materials. The first semiconductor wafer 150 includes at least one single-crystal silicon, having... <100> Crystalline-oriented silicon, possessing <110> Crystalline-oriented silicon, possessing <111> Crystallographically oriented silicon or other suitable materials. Other structures and / or configurations of the first semiconductor wafer 150 are within the scope of this disclosure.

[0031] As depicted in Figure 1A, liquid chemicals 121 supplied from truck 110 to plant supply system 130 contain dispersed particles 123. When liquid chemicals 121 are transferred from truck 110 to plant supply system 130, the liquid chemicals 121 may contain contaminants as particles 123, such as residual particles from previously loaded systems, including dust, rust, or chemical residues (if truck 110 has not been properly cleaned). Environmental contaminants (such as dust or dirt) may enter during the transfer from truck 110 to plant supply system 130, for example, if connections are not properly sealed. Small particles from hoses, fittings, or piping, such as rubber fragments, metal shavings, or corrosion byproducts, may be introduced. Contaminants from the manufacturing process that form liquid chemicals 121, including trace impurities or packaging debris, and chemical degradation products formed during storage, may also contribute to particulate contamination formed by particles 123.

[0032] Then, as the liquid chemical 141 is supplied to the tool through piping 140, particles 143 may be present in and dispersed within the liquid chemical 141. Particles 143 may include portions of particles 123 that were not filtered by the filtration system before leaving the storage tank of the factory supply system 130. Particles 143 may also include agglomerates of particles 123 formed during storage in the storage tank of the factory supply system 130. Other sources of particles 143 may include one or more pipe debris, sealing and / or gasket materials, chemical deposits, microbial contaminants, residual contaminants, etc. The presence of particles 143 in the liquid chemical 141 may cause process defects on the first semiconductor wafer 150, thereby reducing yield.

[0033] Referring to FIG1B, a particle monitoring or measurement system 160 is described according to various embodiments, which can determine the concentration of particles 143 in a plant supply system 130. When the concentration of particles 143 exceeds a threshold, various actions can be taken to mitigate the yield reduction associated with exceeding the threshold. For example, one or more supply tanks can be taken offline for maintenance, or one or more flushing operations can be performed to remove particles 143 from transport lines, filtration systems, pumps, etc. In another example, a system-wide preventative maintenance can be performed to remove particles 143 from the plant supply system 130.

[0034] Figure 1B illustrates a detailed schematic diagram of system 100, including particle monitoring system 160, according to some embodiments.

[0035] System 100 includes a plant supply system or "liquid supply system" 130 and a particle monitoring system 160 in fluid communication with it.

[0036] The liquid supply system 130 includes a feed assembly 131, a first storage tank or container 132, a second storage tank or container 133, a retrieval assembly 134, a supply device 135, a feedback assembly 136, and a valve manifold box (VMB) 137. The first and second storage tanks 132 and 133 can be collectively referred to as storage tanks 132 and 133.

[0037] Feed assembly 131 is operated to receive liquid chemicals 121 from truck 110 via transport line 1311. Feed assembly 131 is further operated to discharge liquid chemicals 121 to a first storage tank 132, a second storage tank 133, or both. Feed assembly 131 is connected to the first storage tank 132 via transport line 1312. Feed assembly 131 is connected to the second storage tank 133 via transport line 1313. In some embodiments, feed assembly 131 includes one or more valves coupled to transport lines 1311, 1312, 1313 to control the flow of liquid chemicals 121 into and out of feed assembly 131 via transport lines 1311, 1312, 1313. To supply liquid chemicals 121 to the first and second storage tanks 132, 133, feed assembly 131 may include one or more pumps, one of which is depicted as pump 131G in FIG. 1B. In some embodiments, pump 131G includes a pneumatic pump, a pneumatic pump, a mechanical pump, or the like. A pneumatic pump may include one or more gas suppliers, inlets, and the like that generate a positive pressure differential, allowing liquid chemicals 121 to exit from feed assembly 131 without significant fluctuations in flow rate. The pneumatic pump can control the pressure of the gas supplied to and maintained in feed assembly 131, such as nitrogen (N2), helium (He), argon (Ar), carbon dioxide (CO2), or the like. A mechanical pump may be or include one or more piston pumps, plunger pumps, diaphragm pumps, gear pumps, rotary pumps, screw pumps, vane pumps, peristaltic pumps, centrifugal pumps, axial flow pumps, vacuum pumps, wastewater pumps, hydraulic pumps, and the like. In embodiments where pump 131G is a mechanical pump, pump 131G is operated to generate variable pressure. Therefore, pump 131G may include a reciprocating or rotary mechanism that generates pressure pulses in the flow of liquid chemicals 121. This can lead to flow rate fluctuations and potential vibrations.

[0038] Feed assembly 131 is in fluid communication with particle monitoring system 160 via transport line 1314. Particle monitoring system 160 is operated to sample liquid chemical 121 at feed assembly 131 via transport line 1314. When sampling liquid chemical 121 at feed assembly 131, flow rate fluctuations and vibrations in the sampled liquid chemical 121 may cause inaccurate measurements of particles 123 by liquid particle counter (LPC) 170 of particle monitoring system 160. In some embodiments, particle monitoring system 160 includes buffer tank 164 with a pneumatic pump to facilitate the removal of fluctuations and vibrations in liquid chemical 121 entering LPC 170. Removing fluctuations and vibrations in liquid chemical 121 entering LPC 170 improves control of particle 123 movement trajectories, which helps improve the accuracy of particle measurements.

[0039] In some embodiments, the feed assembly 131 includes a filter or filtration system. The feed assembly 131 may receive liquid chemicals 121 from a first storage tank 132, a second storage tank 133, or both. Its filter or filtration assembly may then remove particles from the liquid chemicals 121 before supplying the filtered liquid chemicals 121 to the first storage tank 132, the second storage tank 133, or both.

[0040] Extraction assembly 134 and supply device 135 are operated to supply or deliver liquid chemicals 121 to one or more semiconductor processing tools 138, such as etching tools, cleaning tools, or similar tools. Extraction assembly 134 is in fluid communication with first and second storage tanks 132, 133 to extract and / or receive liquid chemicals 121 from the first and second storage tanks 132, 133. In some embodiments, extraction assembly 134 includes one of these tanks where liquid chemicals 121 may be temporarily stored or buffered before being transported to supply device 135. Extraction assembly 134 is in fluid communication with supply device 135. In some embodiments, extraction assembly 134 includes one or more pumps, one of which, pump 134P, is shown in FIG. 1B. In some embodiments, pump 134P is a mechanical pump, such as one of the mechanical pumps previously described with reference to pump 131G. Pump 134P is operated to pump liquid chemicals 121 from extraction assembly 134 to supply device 135 via transport line 1341. The extraction component 134 is in fluid communication with the particle monitoring system 160 via the transport line 1342.

[0041] Supply device 135 is operated to supply liquid chemicals 121 to one or more tools. Supply device 135 is in fluid communication with a flow divider valve box (VMB) 137, an extraction assembly 134, and a particle monitoring system 160. In some embodiments, supply device 135 includes a tank in which the liquid chemicals 121 may be temporarily stored or buffered before being transported to flow divider valve box 137. Supply device 135 is in fluid communication with flow divider valve box 137. In some embodiments, supply device 135 includes one or more pumps, one of which, pump 135G, is shown in FIG. 1B. In some embodiments, pump 135G is a pneumatic pump, such as a pneumatic pump similar to that described previously in reference pump 131G. Pump 135G is operated to pump liquid chemicals 121 from supply device 135 to flow divider valve box 137 via transport line 1351. Supply device 135 is in fluid communication with particle monitoring system 160 via transport line 1352.

[0042] Feedback component 136 is operated to receive liquid chemicals 121 from the first and / or second storage tanks 132, 133, filter the received liquid chemicals 121, and output the filtered liquid chemicals 121 back to the first and / or second storage tanks 132, 133. Feedback component 136 is in fluid communication with the first and / or second storage tanks 132, 133 and the particle monitoring system 160. For example, feedback component 136 is in fluid communication with the first storage tank 132 to receive liquid chemicals 121 from the first storage tank 132 and is in fluid communication with the first storage tank 132 to output liquid chemicals 121 to the first storage tank 132. In some embodiments, feedback component 136 includes one or more filters operated to remove particles from the liquid chemicals 121 received by feedback component 136 from the first and / or second storage tanks 132, 133. The feedback assembly 136 includes one or more pumps, one of which, pump 136P, is operated to discharge liquid chemicals 121 to first and / or second storage tanks 132, 133. In some embodiments, pump 136P is a mechanical pump, such as one of the mechanical pumps described previously with reference to pump 131G. The feedback assembly 136 is in fluid communication with the particle monitoring system 160 via a transport line 1362.

[0043] The particle monitoring system 160 is operated to sample and measure particles in the liquid chemical 121 at one or more of the feed assembly 131, extraction assembly 134, supply device 135, and feedback assembly 136. The particle monitoring system 160 includes a flow divider valve box (VMB) 162, a buffer tank 164, and a liquid particle counter (LPC) 170.

[0044] Diverter valve housing 162 receives liquid chemicals 121 from transport lines 1314, 1342, 1352, and 1362, and outputs liquid chemicals 121 from one of the transport lines 1314, 1342, 1352, and 1362 to buffer tank 164. Diverter valve housing 162 is in fluid communication with buffer tank 164. Figure 2 details a liquid selection device 200 as an embodiment of diverter valve housing 162. Diverter valve housing 162 is operated to guide samples of liquid chemicals 121 from multiple points in the plant supply system 130 via buffer tank 164 to liquid particle counter 170, which is beneficial for eliminating variability between multiple points. For example, during operation, the diversion valve box 162 can be switched between different locations within the system 100, such as the feed assembly 131, the first storage tank 132, the second storage tank 133, the extraction assembly 134, the supply device 135, the feedback assembly 136, or similar locations, as a source for sampling liquid chemicals 121. This is beneficial for one-stop detection and assessment of abnormal levels in liquid chemicals 121. Using a single liquid particle counter 170 to perform measurements can help increase the consistency of measurement conditions at all sampling points of the diversion valve box 162.

[0045] Buffer tank 164 is a container or tank designed to temporarily store liquid chemicals 121 sampled from plant supply system 130 and to supply liquid chemicals 121 to liquid particle counter 170. Liquid chemicals 121 may be highly pure and sensitive to contaminants; therefore, the materials and construction of buffer tank 164 are chosen to maintain the integrity of liquid chemicals 121. In some embodiments, buffer tank 164 is made of stainless steel, glass, or other suitable inert materials that help reduce chemical contamination. Buffer tank 164 may be constructed based on selected considerations related to chemical compatibility, pressure, and temperature levels associated with storing liquid chemicals 121. Buffer tank 164 may include one or more filters, ion exchange resins, or other purification devices that help maintain chemical purity. In some embodiments, buffer tank 164 has a stirring system that reduces sedimentation or chemical stratification. In some embodiments, buffer tank 164 includes a heating and / or cooling system that helps store liquid chemicals 121 at selected temperatures. The buffer tank 164 may include one or more sensors to monitor the level of the liquid chemical 121 in the buffer tank 164, which can help reduce the occurrence of spills or low levels. Other components included in the buffer tank 164 may include shut-off valves, pressure relief valves, and other safety devices.

[0046] The buffer tank 164 helps reduce the presence of bubbles and pressure pulses in the liquid chemicals 121 delivered to the liquid particle counter 170. The buffer tank 164 includes a gas pressure pump that can eject the liquid chemicals 121 from the buffer tank 164 while introducing very low disturbance or turbulence.

[0047] Liquid particle counter 170 is in fluid communication with buffer tank 164 to receive liquid chemicals 121 from buffer tank 164. In some embodiments, liquid particle counter 170 is operated to detect and measure small particles suspended in liquid chemicals 121. Liquid particle counter 170 is beneficial for semiconductor manufacturing because even the smallest contaminants can reduce yield.

[0048] In the operation of the liquid particle counter 170, a liquid sample of liquid chemical 121 is introduced into the liquid particle counter 170 through a controlled flow system, which may include a buffer tank 164 and a diversion valve box 162. The flow rate of liquid chemical 121 into the liquid particle counter 170 can be precisely managed to improve the uniformity and accuracy of the measurement. In some embodiments, a laser of the liquid particle counter 170 is used as a light source. The laser beam of the laser passes through the detection chamber as the liquid sample of liquid chemical 121 flows through it. When particles in the liquid sample pass through the laser beam, the particles scatter light. The amount and angle of the scattered light are related to the size and properties of the particles. A high-sensitivity photodetector is placed around the detection chamber to capture the scattered light. The photodetector is highly sensitive and capable of detecting extremely weak signals caused by small particles. The scattered light signal is converted into an electrical signal. In some embodiments, one or more signal processing algorithms are used to distinguish between real particle signals and noise, improving the accuracy of particle counting and size determination. The liquid particle counter 170 can be calibrated to correlate the intensity of the scattered light with the particle size. This allows the liquid particle counter 170 to determine the size of each detected particle. The liquid particle counter 170 calculates the number of particles detected within a selected size range, which may occur in real time. The particle count can be recorded as data, which is useful for understanding the level of contamination in the liquid sample. The liquid particle counter 170 may store software or processor-executable instructions for storing, managing, and analyzing the collected data. Instructions may include generating reports, monitoring trends over time, and setting alarms when the particle count exceeds a selected threshold. In some embodiments, the liquid particle counter 170 is operated to monitor the particle count in each liquid sample in real time, providing immediate feedback on the level of particulate contamination in the liquid chemical 121.

[0049] Figure 2 illustrates a detailed schematic diagram of the liquid selection device 200 of system 100, according to some embodiments. The liquid selection device 200 is a flow divider valve box or "VMB", according to some embodiments, and may be referred to as "flow divider valve box 200" in the description. The flow divider valve box 200 is an embodiment of the flow divider valve box 162 in Figure 1B and may be included in system 100 described with reference to Figures 1A and 1B.

[0050] The diversion valve box 200 includes a housing 210. Inside the housing 210, the diversion valve box 200 includes one or more first valves 220, 222, 224, 226, 228, one or more corresponding second valves 230, 232, 234, 236, 238, a drain valve 240, and a supply valve or "sample valve" 250. Each first valve 220, 222, 224, 226, 228 is in fluid communication with a corresponding sample source among one or more sample sources 260, 262, 264, 266, 268. Each first valve 220, 222, 224, 226, 228 is in fluid communication with one of the corresponding second valves 230, 232, 234, 236, 238. Each second valve 230, 232, 234, 236, 238 is in fluid communication with the drain valve 240 and the supply valve 250. In some embodiments, each of the first valves 220, 222, 224, 226, and 228 is structurally and compositionally identical to all other first valves 220, 222, 224, 226, and 228. Similarly, in some embodiments, each of the second valves 230, 232, 234, 236, and 238 is structurally and compositionally identical to all other second valves 230, 232, 234, 236, and 238. This facilitates improved homogeneity in the collection of liquid chemical 121 samples from sample sources 260, 262, 264, 266, and 268 in fluid communication with them.

[0051] First valve 220 is in fluid communication with sample source 260, which may be feed assembly 131 and / or transport line 1314. First valve 222 is in fluid communication with sample source 262, which may be extraction assembly 134 and / or transport line 1342. First valve 224 is in fluid communication with sample source 264, which may be feedback assembly 136 and / or transport line 1362. First valve 226 is in fluid communication with sample source 266, which may be supply assembly 135 and / or transport line 1352. First valve 228 is in fluid communication with sample source 268, which may be another supply assembly similar to supply assembly 135.

[0052] According to some embodiments, supply component 135 may be a "frontend" supply component 135, while another supply component may be a "backend" supply component. In some embodiments, the frontend supply component 135 supplies liquid chemicals 121 to "frontend" tools, which may include one or more of lithography machines, etching machines, chemical vapor deposition (CVD) tools, ion implantation machines, oxidation furnaces, chemical mechanical planarization (CMP) tools, etc. In some embodiments, the backend supply component supplies liquid chemicals 121 to "backend" tools, which may include one or more of dicing machines, wire bonding machines, flip-chip bonding machines, packaging tools, testing equipment, etc. The first valve 228 may be in fluid communication with the backend supply component through one or more suitable transport lines similar to transport lines 1352.

[0053] In some embodiments, each of the first valves 220, 222, 224, 226, and 228 is a manual valve, which can be manually operated. In short, a manual valve can be manually operated by a human operator by turning a handwheel, lever, or knob, directly controlling its opening and closing. Therefore, a manual valve may require human intervention and personnel presence to operate. Manual valves may be advantageous for providing infrequent and / or precise manual control. A manual valve may include a rotary or sliding mechanism controlled by a human operator.

[0054] In some embodiments, each of the second valves 230, 232, 234, 236, 238, the drain valve 240, and the supply valve 250 is a pneumatic valve, which may be a diaphragm valve. A pneumatic valve is operated by compressed air, moving a diaphragm to open or close the valve. The diaphragm separates the flowing medium (e.g., liquid chemical 121) from the actuator. In some embodiments, the pneumatic valve is a component of an automation system and can be remotely controlled by air pressure signals, which may be or include electronic signals generated by controller circuitry. Pneumatic valves offer the advantage of precise and consistent operation. In some embodiments, a pneumatic valve may include a diaphragm, an actuator, and other pneumatic components.

[0055] During operation, the first valves 220, 222, 224, 226, and 228 may be opened to allow liquid chemical 121 to flow from sample sources 260, 262, 264, 266, and 268. In some embodiments, one or more of the first valves 220, 222, 224, 226, and 228 may be closed, for example, when the corresponding sample source among sample sources 260, 262, 264, 266, and 268 is offline or does not require sampling from it.

[0056] Then, one of the second valves 230, 232, 234, 236, and 238 opens to allow liquid chemical 121 to flow from the corresponding sample source among sample sources 260, 262, 264, 266, and 268 to sample valve 250. The other valves among the second valves 230, 232, 234, 236, and 238 close to prevent liquid from other sources among sample sources 260, 262, 264, 266, and 268 from flowing to sample valve 250.

[0057] Then, sample valve 250 may open to allow liquid chemicals 121 from a selected sample source to flow to liquid particle counter 170.

[0058] Then, after measurement by the liquid particle counter 170, sample valve 250 and a selected second valve from second valves 230, 232, 234, 236, 238 may close, and drain valve 240 may open to drain liquid chemical 121 present between the second valves 230, 232, 234, 236, 238 and the sample valve and drain valves 250, 240. Liquid chemical 121 is discharged from the diversion valve box 200, for example, to a waste collection system or a feedback system that can return liquid chemical 121 to the first and / or second storage tanks 132, 133.

[0059] After removing liquid chemical 121 through drain valve 240, another of the second valves 230, 232, 234, 236, and 238 can be opened, and the other valves in the second valves 230, 232, 234, 236, and 238 can be closed to sample liquid chemical 121 from the corresponding sample sources 260, 262, 264, 266, and 268. Through a similar operation as described above, liquid chemical 121 can be measured by liquid particle counter 170, and then excess liquid chemical 121 is drained after measurement by liquid particle counter 170.

[0060] Using the diversion valve box 200 has the advantage of improving the consistency of particle measurements in liquid chemicals 121 across sample sources 260, 262, 264, 266, and 268. One reason for this is that all samples are measured by the same liquid particle counter 170, and all samples are transferred through the same sample valve 250, as well as similar first valves 220, 222, 224, 226, and 228, and similar second valves 230, 232, 234, 236, and 238.

[0061] It should be understood that, although not individually indicated in Figure 2, sample sources 260, 262, 264, 266, 268, first valves 220, 222, 224, 226, 228, second valves 230, 232, 234, 236, 238, sample valve 250, and drain valve 240 are fluidly connected to each other through one or more transport lines, which are depicted as solid lines.

[0062] Figure 3 illustrates a schematic diagram of a measurement system 300 having a buffer groove 310 according to some embodiments.

[0063] In Figure 3, the measurement system 300 includes a buffer tank 310, a flow meter 322, pressure supply valves 324 and 326, a pressure measurement assembly 330, sampling valves 342 and 344, measuring valves 352 and 362, drain valves 354 and 364, and a liquid particle counter 370. The liquid particle counter 370 is similar in most respects to the liquid particle counter 170 described with reference to Figures 1A and 1B.

[0064] Buffer tank 310 is operated to contain liquid chemical 321, which is similar in most respects to liquid chemical 121 described with reference to Figures 1A to 2. In some embodiments, buffer tank 310 is or includes container walls containing perfluoroalkyl (PFA) or other suitable materials that are highly resistant to a wide range of acids, alkalis, salts and other corrosive chemicals, while also having non-reactive surfaces that are inert to most chemicals. In some embodiments, the container walls of buffer tank 310 may be or include polyvinyl chloride (PVC), polypropylene (PP), polyethylene (PE), polyvinylidene fluoride (PVDF), polytetrafluoroethylene (PTFE), fiberglass reinforced plastic (FRP), high-density polyethylene (HDPE), chlorinated polyvinyl chloride (CPVC) or similar materials.

[0065] Flow meter 322 is in fluid (or gas) communication with gas supplier 380. In some embodiments, gas supplier 380 is operated to supply pressurized gas, which is an inert gas such as N2, He, Ar, CO2, or similar gases. Flow meter 322 is in fluid (or gas) communication with pressure supply valve 324. In some embodiments, flow meter 322 is or includes one or more of the following devices or similar devices: thermal mass flow meter, Coriolis mass flow meter, variable area flow meter (or "rotameter"), mass flow controller (MFC), differential pressure flow meter, ultrasonic flow meter, turbine flow meter, pressure flow meter.

[0066] Pressure supply valve 324 is in fluid (or gas) communication with buffer tank 310. In operation, pressure supply valve 324 can open to allow pressurized gas to flow into buffer tank 310. Pressurized gas 323 supplied through pressure supply valve 324 is present in buffer tank 310. Pressurized gas 323 operates to force liquid chemical 321 towards liquid particle counter 370 without generating a large number of bubbles, which helps improve the accuracy and stability of the liquid particle counter 370 in measuring particles in liquid chemical 321. Pressure supply valve 324 can be electronically regulated and controlled by a controller (e.g., a microcontroller unit (MCU) or similar device). Regulation of pressure supply valve 324 can be in response to the flow rate measured by flow meter 322, the pressure measured by pressure measurement component 330, or both.

[0067] Pressure supply valves 324 and 326 are in fluid communication with the upper portion of buffer tank 310. This upper portion can be considered as the part where pressurized gas 323 accumulates, resides, and is normally present in buffer tank 310. The lower portion of buffer tank 310 can be considered as the part where liquid chemical 321 accumulates, resides, and is present. Allowing pressurized gas 323 to enter from the upper portion (or "first side") of buffer tank 310 reduces disturbance in liquid chemical 321. Similarly, allowing liquid chemical 321 to enter from the lower portion (or "second side") of buffer tank 310 reduces disturbance in liquid chemical 321. Reduced disturbance results in reduced bubble generation in the liquid chemical 321 supplied to liquid particle counter 370, which improves the uniformity and accuracy of particle measurement in liquid chemical 321 by liquid particle counter 370.

[0068] Pressure supply valve 326 may be the same type of valve as pressure supply valve 324. In operation, pressure supply valve 326 may open to allow pressurized gas 323 to drain from buffer tank 310. For example, pressure measuring component 330, in fluid (or gas) communication with buffer tank 310, may determine the pressure of pressurized gas 323 in buffer tank 310 when pressure supply valve 326 is closed. In response to a pressure measured by pressure measuring component 330 exceeding a selected value, pressure supply valve 326 opens and pressure supply valve 324 closes to drain a portion of pressurized gas 323 from buffer tank 310. The drain may proceed through pressure supply valve 326 to a drain system 382 in fluid (or gas) communication with buffer tank 310. After pressurized gas 323 is drained from buffer tank 310, the pressure of pressurized gas 323 in buffer tank 310 may decrease. In response to a pressure measured by pressure measuring component 330 falling below a selected value, pressure supply valve 326 may close to stop the draining of pressurized gas 323 from buffer tank 310.

[0069] The pressure measurement component or device 330 is in fluid or gas communication with the buffer tank 310 and is operated to measure the pressure of the buffer tank 310. The pressure measurement component 330 may be or include one or more of the following: a capacitive pressure gauge, a Pirani vacuum gauge, an ion vacuum gauge, a Baratto vacuum gauge, a piezoelectric pressure sensor, a thermocouple vacuum gauge, a quartz crystal microbalance (QCM) sensor, a differential pressure sensor, a combination thereof, or similar devices.

[0070] The buffer tank 310 is in fluid communication with the sampling source 384 via sampling valves 342 and 344. The sampling source 384 may be the diversion valve box 200 described with reference to FIG2. In some embodiments, the sampling valve 342 is in fluid communication with the supply valve 250 of the diversion valve box 200. In some embodiments, the sampling valve 342, the sampling valve 344, or both are the supply valve 250 of the diversion valve box 200.

[0071] During operation, sampling valves 342 and 344 are opened to allow liquid chemical 321 to flow from sampling source 384 (e.g., diversion valve box 200) into buffer tank 310. In some embodiments, before opening sampling valves 342 and 344, residual liquid chemical 321 from previous sampling and measurement operations is drained from buffer tank 310, so that buffer tank 310 is substantially empty before sampling valves 342 and 344 are opened. Sampling valves 342 and 344 can be closed to stop the flow of liquid chemical 321 into buffer tank 310 before measurement of liquid chemical 321 introduced into buffer tank 310 via the opened sampling valves 342 and 344. This can help reduce disturbance of liquid chemical 321 in buffer tank 310 during particle measurement by liquid particle counter 370. In some embodiments, a selected volume of liquid chemical 321 can be supplied to and stored in buffer tank 310 before particle measurement begins.

[0072] The measurement system 300 includes measuring valves 352 and 362. Measuring valves 352 and 362 are in fluid communication with a buffer tank 310 and a liquid particle counter 370. During measurement operation, measuring valves 352 and 362 are operated to open, allowing liquid chemical 321 to flow from the buffer tank 310 to the liquid particle counter 370. During measurement operation, measuring valves 352 and 362 and a drain valve 364 are open. When the measuring valves and drain valves 352, 362, and 364 are open, liquid chemical 321 flows out of the buffer tank 310, enters the liquid particle counter 370, flows out of the liquid particle counter 370, and flows from the measurement system 300 to the drain system 386. The flow rate of liquid chemical 321 flowing into liquid particle counter 370 can be controlled at a selected flow rate value, which is in the range of about 5 cc / min to about 50 cc / min, such as about 10 cc / min, about 35 cc / min, or another suitable flow rate value within this range. Figure 3 depicts a single liquid particle counter 370 included in the measurement system 300. In some embodiments, the measurement system 300 includes additional liquid particle counters. For example, the measurement system 300 may include a first liquid particle counter (e.g., liquid particle counter 370) and a second liquid particle counter. The first liquid particle counter can operate with a first flow rate value, such as about 10 cc / min, and the second liquid particle counter can operate with a second flow rate value different from the first flow rate value, such as about 35 cc / min. A first liquid particle counter can measure the count of a first particle in a first sample associated with a first device (e.g., one of the feed assembly 131, extraction assembly 134, supply device 135, or feedback assembly 136), and a second liquid particle counter can measure the count of a second particle in a second sample associated with a second device (e.g., the other of the feed assembly 131, extraction assembly 134, supply device 135, or feedback assembly 136).

[0073] In some embodiments, the measurement system 300 includes a flow meter positioned between a buffer tank 310 and a liquid particle counter 370. For example, the flow meter may be positioned between the buffer tank 310 and a measuring valve 352. In another example, the flow meter may be positioned between measuring valve 352 and measuring valve 362. In yet another example, the flow meter may be positioned between measuring valve 362 and the liquid particle counter 370. In some embodiments, the flow meter is positioned inside the liquid particle counter 370. In some embodiments, the flow meter is positioned between the liquid particle counter 370 and a drain valve 364.

[0074] Before performing a measurement operation, to drain the liquid chemical 321 from the buffer tank 310, the measurement valve 352 and the drain valve 354 can be opened, allowing the liquid chemical 321 to drain from the buffer tank 310 and flow to the drain system 386. This can be referred to as a drain operation. A drain operation can be performed between every two consecutive sampling and measurement operations. For example, a first sampling and measurement operation can be performed to sample and measure the liquid chemical 321 from one of the feed assembly 131, extraction assembly 134, supply device 135, or feedback assembly 136. Then, a drain operation can be performed to remove the liquid chemical 321 used for the first sampling and measurement operation. Next, a second sampling and measurement operation can be performed to sample and measure the liquid chemical 321 from another of the feed assembly 131, extraction assembly 134, supply device 135, or feedback assembly 136.

[0075] Using the operation described with reference to FIG3, the measurement system 300 can obtain a first particle count associated with a first sample from a first device and a second particle count associated with a second sample from a second device. For example, the first particle count may be associated with a first sample taken from a first position before the filter, and the second particle count may be associated with a second sample taken from a second position after the filter. In response to the difference between the first particle count and the second particle count being less than a threshold, preventative maintenance, repair, or replacement of the filter can be scheduled. A difference less than a threshold may indicate that the filter is not removing an adequate number of particles from the liquid chemicals passing through it.

[0076] In another example, the first particle count may be associated with a first sample taken from a first location at the inlet or outlet of a first storage tank (e.g., first storage tank 132), and the second particle count may be associated with a second sample taken from a second location at the inlet or outlet of a second storage tank (e.g., second storage tank 133). The first and second particle counts can then be compared to determine the difference in cleanliness between the first and second storage tanks. In response to the first or second particle count exceeding a threshold, preventative maintenance, repair, or replacement of the first or second storage tank can be scheduled, which may include flushing, cleaning, or other suitable actions.

[0077] In another example, the first particle count may be associated with a first sample taken from a first location at the outlet of a first pump (e.g., one of pumps 131G, 134P, 136P, 135G), and the second particle count may be associated with a second sample taken from a second location at the outlet of a second pump (e.g., the other of pumps 131G, 134P, 136P, 135G). The first and second particle counts can then be compared to determine the difference in cleanliness between the first and second pumps. In response to the first or second particle count exceeding a threshold, preventative maintenance, repair, or replacement of the first or second pump can be scheduled, which may include rinsing, cleaning, or other suitable actions.

[0078] Figure 4 illustrates a schematic diagram of a measurement system 400 and a liquid selection device 410 according to some embodiments. The measurement system 400 and the liquid selection device 410 are similar in most respects to the measurement system 300 and the diverter valve box 200, respectively.

[0079] In Figure 4, the measurement system 400 includes a first buffer tank 422 and a second buffer tank 424, which are similar to buffer tank 310 in most respects. The first buffer tank 422 is in fluid communication with pressure supply valves 432 and 434. The second buffer tank 424 is in fluid communication with pressure supply valves 436 and 438. Pressure supply valves 432, 434, 436, and 438 are similar to pressure supply valves 324 and 326 in Figure 3 in most respects.

[0080] The first buffer tank 422 is in fluid communication with sampling valve 442, which is in fluid communication with liquid selection device 410 via transport line 482. The second buffer tank 424 is in fluid communication with sampling valve 444, which is in fluid communication with liquid selection device 410 via transport line 482. Sampling valves 442 and 444 are similar in most respects to sampling valve 344 in Figure 3.

[0081] The first buffer tank 422 is in fluid communication with the drain line 480 via the drain valve 462. The second buffer tank 424 is in fluid communication with the drain line 480 via the drain valve 464. The drain valves 462 and 464 are similar in most respects to the drain valve 354 in Figure 3.

[0082] The first buffer tank 422 is in fluid communication with the liquid particle counter 470 via measuring valve 452 and measuring transmission line 484. The second buffer tank 424 is in fluid communication with the liquid particle counter 470 via measuring valve 454 and measuring transmission line 484. Measuring valves 452 and 454 are similar in most respects to measuring valve 362 in Figure 3.

[0083] The liquid particle counter 470 is in fluid communication with the drain line 480 via a drain valve 466, which is similar in most respects to the drain valve 364 in Figure 3.

[0084] The measurement system 400, including first and second buffer tanks 422, 424, offers advantages. For example, the first buffer tank 422 may contain a first liquid chemical 421 from a first device consisting of a feed assembly 131, an extraction assembly 134, a supply assembly 135, and a feedback assembly 136, and the second buffer tank 424 may contain a second liquid chemical 423 from a second device consisting of the same components. The first and second liquid chemicals 421, 423 (or "liquid chemicals 421, 423") are similar in most respects to liquid chemicals 121 and 321 described with reference to Figures 1A and 3, respectively. The first liquid chemical 421 may then be measured by a liquid particle counter 470, followed by measurement of the second liquid chemical 423 by the liquid particle counter 470. In some embodiments, the second liquid chemical 423 may be sampled and transported to the second buffer tank 424 during the measurement of the first liquid chemical 421 by the liquid particle counter 470. This can improve the operating time of the liquid particle counter 470.

[0085] Another advantage of including the first and second buffer tanks 422, 424 is that one of the first and second buffer tanks 422, 424 can be taken offline (e.g., for preventative maintenance or repair) while the other of the first and second buffer tanks 422, 424 continues to operate, measuring the first or second liquid chemicals 421, 423 by the liquid particle counter 470. This improves the operating time of the liquid particle counter 470.

[0086] Although two buffer tanks 422 and 424 are described with reference to FIG4, the measurement system 400 may include additional buffer tanks. For example, the measurement system 400 may include three, four, or more buffer tanks. Each buffer tank may be in fluid communication with the liquid particle counter 470 and the liquid selection device 410 to allow liquid chemicals to be input into the corresponding buffer tank and output to the liquid particle counter 470 for particle measurement.

[0087] Figure 5 illustrates a schematic diagram of a particle monitoring system 500, according to some embodiments. The particle monitoring system 500 includes at least one of a set of sample monitoring devices 504, facility equipment 502, a computer 514, a status system 506, or one or more client devices 508. The set of sample monitoring devices 504 includes sample monitoring devices distributed at various locations within the facility. The sample monitoring devices are used to determine measurements related to devices and / or other equipment in the facility (e.g., the feed assembly 131, extraction assembly 134, supply assembly 135, and feedback assembly 136 described with reference to FIG1B).

[0088] In some embodiments, a set of sample monitoring devices 504 transmits a set of monitoring signals 512 to a computer 514. In some embodiments, each signal in the set of monitoring signals 512 is transmitted by a monitoring device (e.g., liquid particle counter 370 or liquid particle counter 470) in the set of sample monitoring devices 504 within the facility's liquid chemical supply system.

[0089] In some embodiments, a set of monitoring signals 512 includes a first monitoring signal from liquid particle counter 370 or liquid particle counter 470. In some embodiments, liquid particle counter 370 and / or liquid particle counter 470 includes a wireless communication module that wirelessly transmits the first monitoring signal to computer 514. In some embodiments, liquid particle counter 370 and / or liquid particle counter 470 transmits the first monitoring signal to computer 514 via a wired connection between liquid particle counter 370 and / or liquid particle counter 470 and computer 514. In some embodiments, the first monitoring signal indicates the particle level (e.g., particle count) associated with liquid chemicals 321, 421, 423 sampled by measurement system 300 or measurement system 400, respectively.

[0090] In some embodiments, a set of monitoring signals 512 includes a second monitoring signal from liquid particle counter 370 and / or liquid particle counter 470. In some embodiments, the second monitoring signal indicates the particle level (e.g., particle count) associated with liquid chemicals 321, 421, 423 sampled by measurement system 300 or measurement system 400, respectively. The first monitoring signal may indicate a first level of particles associated with a first device of the feed assembly or "CCB" 131, the extraction assembly or "CTU" 134, the supply device or "CDU" 135, and the feedback assembly or "RU" 136, while the second monitoring signal may indicate a second level of particles associated with a second device of the feed assembly 131, the extraction assembly 134, the supply device 135, and the feedback assembly 136.

[0091] In some embodiments, computer 514 controls a display panel 520 that includes a set of status indicators associated with devices (e.g., CCB 131, CTU 134, CDU 135, and RU 136) of the liquid chemical supply system in the facility. In some embodiments, an indicator in the set of status indicators includes a light, such as an indicator light, for indicating whether the corresponding device is associated with a particle level, wherein a first state indicates that the corresponding device is associated with a particle level exceeding a threshold and / or a second state indicates that the corresponding device is not associated with a particle level exceeding a threshold. In some embodiments, display panel 520 includes a display configured to display an alarm indicating the particle monitoring status of one or more detected particles from one or more devices. In some embodiments, the first state corresponds to a first color emitted by the light, such as red or another color, and the second state corresponds to a second color emitted by the light, such as green or another color. A set of status indicators includes at least one of the following: a first indicator "CCB" associated with a first device (e.g., CCB 131), a second indicator "CTU" associated with a second device (e.g., CTU 134), a third indicator "RU" associated with a third device (e.g., RU 136), a fourth indicator "CDU" associated with a fourth device (e.g., CDU 135), or other indicators.

[0092] In some embodiments, computer 514 provides one or more first signals 510 to facility equipment 502. In some embodiments, the one or more first signals 510 are used to control at least a portion of facility equipment 502, such as one, part, or all of the liquid chemical supply system of the facility and / or other equipment of the facility. In some embodiments, the one or more first signals 510 are generated using a signal generator of computer 514. The one or more first signals 510 may indicate the particle level of liquid chemicals in the liquid chemical supply system. In some embodiments, computer 514 wirelessly transmits one or more first signals 510 to facility equipment 502, for example, using a wireless communication device of computer 514. In some embodiments, computer 514 transmits one or more first signals 510 to facility equipment 502 via a physical connection between computer 514 and facility equipment 502. In some embodiments, computer 514 transmits one or more first signals 510 to a controller that controls one or more valves of the liquid chemical supply system. For example, the controller can control one or more pressure supply valves 342, 432, 436 to regulate the flow of pressurized gas into buffer tanks 310, 422, 424, thereby regulating the flow rate of liquid chemicals 321, 421, 423 from buffer tanks 310, 422, 424.

[0093] In some embodiments, computer 514 transmits a second signal 518 to state system 506. The second signal 518 is generated using a signal generator of computer 514. In some embodiments, the second signal 518 indicates at least one of the following: (i) a set of particle monitoring states, (ii) a list of devices identifying particle levels exceeding a selection threshold, or (iii) other information. In some embodiments, computer 514 transmits the second signal 518 to state system 506 wirelessly, for example using a wireless communication device of computer 514. In some embodiments, computer 514 transmits the second signal 518 to state system 506 via a physical connection between computer 514 and state system 506. In some embodiments, state system 506 triggers an alarm function based on the second signal 518. In some embodiments, state system 506 triggers an alarm function based on the second signal 518 indicating that a device is associated with a particle level exceeding a selection threshold. In some embodiments, in response to triggering the alarm function, a display of state system 506 displays an alarm message. The alarm message includes at least one of the following: an indication that the device is associated with a particle level exceeding a selected threshold, an indication of lead time for performing preventative maintenance, an indication including an instruction to stop the operation of the liquid chemical supply system (e.g., until the particle level is sufficiently low), or other indications. In some embodiments, in response to triggering the alarm function, a speaker connected to the status system 506 outputs an alarm sound.

[0094] In some embodiments, computer 514 transmits a third signal 516 to one or more client devices 508. The one or more client devices 508 include at least one of a telephone, smartphone, mobile phone, landline, laptop, desktop computer, hardware, or other type of client device. The third signal 516 is generated using a signal generator of computer 514. In some embodiments, the third signal 516 indicates at least one of the following: (i) a set of particle monitoring states, (ii) a list of devices associated with particle levels exceeding a selection threshold, or (iii) other information. In some embodiments, computer 514 wirelessly transmits the third signal 516 to the client devices among the one or more client devices 508, for example, using a wireless communication device of computer 514. In some embodiments, computer 514 transmits the third signal 516 to the client devices among the one or more client devices 508 via a physical connection between computer 514 and the client devices. In some embodiments, the third signal 516 includes at least one of the following messages transmitted in response to the detection of one or more particle levels exceeding a selection threshold: email, text message, etc. In some embodiments, in response to the detection of a device-related particle value exceeding a selection threshold, a telephone call is made to a client device (e.g., a landline or mobile phone) among the one or more client devices 508 using the dialer of computer 514.

[0095] In some embodiments, multiple monitoring signals 512 are used as feedback, and the computer 514 controls the operation of the facility equipment 502 based on this feedback. In some embodiments, the computer 514 controls the operation of the facility equipment 502 based on measurements provided by the multiple monitoring signals 512. In some embodiments, the operation of the facility equipment 502 is controlled using one or more first signals 510. In some embodiments, the signals in one or more first signals 510 indicate one or more instructions.

[0096] In some embodiments, in response to receiving a signal indicating that the particle level exceeds a selection threshold (one or more first signals 510), the system 100 of facility equipment 502 performs at least one of the following: stops operation, enters a locked state, or performs another operation. In some embodiments, one or more first signals 510 include signals transmitted to a machine (e.g., system 100). In some embodiments, this signal instructs the machine to activate the first storage tank 132 when the second storage tank 133 is undergoing preventative maintenance. In some embodiments, this signal allocates one or more resources (e.g., manpower, robots, one or more tools, replacement components, etc.) to the second storage tank 133 to repair downtime associated with the second storage tank 133.

[0097] In some embodiments, in response to determining that the second storage tank 133 is not associated with a shutdown, the second storage tank 133 is used to supply liquid chemicals to a tool to perform an etching process or other suitable process on the first semiconductor wafer 150. In some embodiments, in response to determining that the second storage tank 133 is associated with a shutdown, the computer 514 instructs the second storage tank 133 not to deliver liquid chemicals (e.g., until the shutdown problem is resolved). During the period when the system 100 is not delivering liquid chemicals through the second storage tank 133, the system 100 may deliver liquid chemicals through another storage tank (e.g., the first storage tank 132).

[0098] Figure 6 is a flowchart illustrating a method 600 for operating a liquid chemical supply system according to some embodiments.

[0099] Method 600 is illustrated in Figure 6 according to some embodiments. The method begins at 602. At 604, method 600 includes sampling the liquid chemicals from a liquid chemical supply system via a diversion valve box. At 606, method 600 includes storing the sampled liquid chemicals in a buffer tank. At 608, method 600 includes delivering the sampled liquid chemicals to a liquid particle counter via a pneumatic pump in fluid communication with the buffer tank. At 610, method 600 includes measuring the particle level of the sampled liquid chemicals via the liquid particle counter. At 612, method 600 includes discharging the liquid chemicals from the liquid particle counter, the buffer tank, the diversion valve box, and the transport lines connecting them. At 614, method 600 includes replacing the sample source with the diversion valve box. After 614, method 600 returns to 604 to sample the liquid chemicals from the sample source.

[0100] Figure 7 is a flowchart illustrating method 700 according to some embodiments.

[0101] Method 700 is illustrated in FIG. 7 according to some embodiments. At 702, method 700 includes storing liquid chemicals in a storage tank. At 704, method 700 includes supplying liquid chemicals from the storage tank to a semiconductor processing tool. At 706, method 700 includes obtaining a first sample of liquid chemicals from a first device in fluid communication with the storage tank via a liquid selection device. At 708, method 700 includes measuring a first level of particles in the first sample using a liquid particle counter (LPC). At 710, method 700 includes, after obtaining the first sample, obtaining a second sample of liquid chemicals from a second device in fluid communication with the storage tank via a liquid selection device, the second device being different from the first device. At 712, method 700 includes measuring a second level of particles in the second sample using a liquid particle counter.

[0102] Figure 8 is a flowchart illustrating a method 800 according to some embodiments.

[0103] According to some embodiments, method 800 is illustrated in FIG. 8. At 802, method 800 includes storing liquid chemicals in a storage tank. At 804, method 800 includes storing a first sample of liquid chemicals from a first device in fluid communication with the storage tank via a buffer tank of a measurement system in fluid communication with the first device. At 806, method 800 includes measuring a first level of particles in the first sample using a liquid particle counter (LPC). At 808, method 800 includes, after storing the first sample, storing a second sample of liquid chemicals from a second device in fluid communication with the storage tank via a buffer tank, the second device being different from the first device. At 810, method 800 includes measuring a second level of particles in the second sample using a liquid particle counter.

[0104] Figure 9 illustrates an example computer-readable medium that may contain processor-executable instructions configured to embody one or more of the specified instructions set forth herein, according to some embodiments.

[0105] One or more embodiments relate to a computer-readable medium including processor-executable instructions configured to implement one or more of the techniques provided herein. An exemplary computer-readable medium is illustrated in FIG9, wherein embodiment 900 includes a computer-readable medium 908 (e.g., a recordable optical disc (CD-R), a writeable digital versatile disc (DVD-R), a flash drive, a hard disk drive, etc.) having computer-readable data 906 encoded thereon. This computer-readable data 906 then includes a set of processor-executable computer instructions 904 configured to implement one or more of the principles set forth herein when executed by a processor. In some embodiments 900, the processor-executable computer instructions 904 are configured to implement method 902, such as at least some of the methods described above, when executed by a processor. In some embodiments 900, the processor-executable computer instructions 904 are configured to implement a system, such as at least some of the systems described above, when executed by a processor. Those skilled in the art can conceive of many such computer-readable media configured to operate according to the techniques provided herein.

[0106] In some embodiments, a method is provided. This method includes: storing a liquid chemical in a storage tank; supplying the liquid chemical from the storage tank to a semiconductor processing tool; obtaining a first sample of the liquid chemical from a first device in fluid communication with the storage tank via a liquid selection device; measuring a first level of particles in the first sample using a liquid particle counter (LPC); after obtaining the first sample, obtaining a second sample of the liquid chemical from a second device in fluid communication with the storage tank via the liquid selection device, the second device being different from the first device; and measuring a second level of particles in the second sample using the liquid particle counter. In one embodiment, the method includes: discharging the first sample from the liquid selection device and the liquid particle counter before obtaining the second sample. In one embodiment, obtaining the second sample includes: closing a first valve of the liquid selection device associated with the first sample; and opening a second valve of the liquid selection device associated with the second sample. In one embodiment, the method includes: transferring the liquid chemical to the storage tank via a feed assembly in fluid communication with the storage tank; transferring the liquid chemical from the storage tank to the supply assembly via an extraction assembly in fluid communication with the storage tank and the supply assembly; and feeding the liquid chemical back from the storage tank to the storage tank via a feedback assembly. In one embodiment, obtaining the first sample includes opening a first valve of the liquid selection device, the first valve being associated with a first device of the feed assembly, the extraction assembly, the supply assembly, and the feedback assembly; and obtaining the second sample includes opening a second valve of the liquid selection device, the second valve being associated with a second device of the feed assembly, the extraction assembly, the supply assembly, and the feedback assembly, the second device being different from the first device. In one embodiment, the method includes: after obtaining the second sample, obtaining a third sample of the liquid chemical from a third device in fluid communication with the storage tank via the liquid selection device, the third device being different from the first and second devices; and measuring a third level of particles in the third sample via a second liquid particle counter different from the liquid particle counter.

[0107] In some embodiments, a method is provided. This method includes: storing a liquid chemical in a storage tank; storing a first sample of the liquid chemical from the first device, which is in fluid communication with the storage tank, through a buffer tank of a measurement system in fluid communication with the first device; measuring a first level of particles in the first sample using a liquid particle counter (LPC); after storing the first sample, storing a second sample of the liquid chemical from a second device, which is different from the first device, through a buffer tank; and measuring a second level of particles in the second sample using the liquid particle counter. In one embodiment, the method includes: during the measurement of the first level, outputting the first sample of the liquid chemical to the liquid particle counter via a pneumatic pump in gas communication with the buffer tank. In one embodiment, outputting the first sample includes supplying pressurized gas to the buffer tank via opening a pressure supply valve in gas communication with a gas supplier. In one embodiment, the method includes: transferring the liquid chemical from a truck to the storage tank via a feed assembly in fluid communication with the storage tank; transferring the liquid chemical from the storage tank to the supply assembly via an extraction assembly in fluid communication with the storage tank and the supply assembly; and filtering the liquid chemical from the storage tank via a feedback assembly. In one embodiment, obtaining the first sample includes opening a first valve of a liquid selection device, wherein the first valve is associated with a first device of the feed assembly, the extraction assembly, the supply assembly, and the feedback assembly, the liquid selection device being in fluid communication with the feed assembly, the extraction assembly, the supply assembly, and the feedback assembly; and obtaining the second sample includes opening a second valve of the liquid selection device, wherein the second valve is associated with a second device of the feed assembly, the extraction assembly, the supply assembly, and the feedback assembly, the second device being different from the first device. In one embodiment, obtaining the first sample includes outputting the first sample via a mechanical pump of the first device; and obtaining the second sample includes outputting the second sample via a pneumatic pump of the second device. In one embodiment, obtaining the first sample includes opening a supply valve of the liquid selection device, the supply valve being in fluid communication with the buffer tank; and obtaining the second sample includes opening the supply valve. In one embodiment, the method includes, before obtaining the second sample, draining the liquid chemical from the liquid selection device via opening a first drain valve of the liquid selection device. In one embodiment, the method includes, before obtaining the second sample, draining the liquid chemical from the liquid particle counter via opening a second drain valve in direct fluid communication with the liquid particle counter; and draining the liquid chemical from the buffer tank via opening a third drain valve in direct fluid communication with the buffer tank.

[0108] In some embodiments, a system is provided. This system includes: a storage tank operatively configured to store a liquid chemical; a plurality of devices in fluid communication with the storage tank; a liquid particle counter (LPC) operatively configured to determine particle levels in a sample of the liquid chemical; a buffer tank in fluid communication with the liquid particle counter and operatively configured to store the sample; and a liquid selection device in fluid communication with the plurality of devices and the buffer tank, the liquid selection device being operatively configured to select one of the plurality of devices and obtain a sample from that one. In one embodiment, the plurality of devices includes: a feed assembly operatively configured to transfer the liquid chemical from a tank outside the system to the storage tank; a supply assembly operatively configured to transfer the liquid chemical to a semiconductor processing tool outside the system; and an extraction assembly in fluid communication with the supply assembly, the extraction assembly being operatively configured to transfer the liquid chemical from the storage tank to the supply assembly. In one embodiment, the liquid selection device includes: a plurality of first valves, each of the plurality of first valves in fluid communication with a corresponding one of the plurality of devices; and a plurality of second valves, each of the plurality of second valves in fluid communication with a corresponding one of the plurality of first valves. In one embodiment, the liquid selection device includes: a supply valve in fluid communication with each of the plurality of second valves; and a drain valve in fluid communication with each of the plurality of second valves. In one embodiment, the buffer tank is operated to output the sample to the liquid particle counter via pressurized inert gas stored in the buffer tank.

[0109] Although the subject matter has been described using language specific to structural features or methodological actions, it is understood that the subject matter of the accompanying request is not necessarily limited to the specific features or actions described above. Rather, the specific features and actions described above are disclosed as exemplary forms of implementing at least some of the requests.

[0110] This document provides various operations of the embodiments. The order in which some or all of the operations are described should not be construed as implying that these operations must depend on the order. Alternative orderings that benefit from this description will be understood. Furthermore, it should be understood that not all operations must exist in every embodiment provided in this disclosure. Moreover, it will be understood that not all operations are necessary in some embodiments.

[0111] It will be understood that the layers, features, elements, etc., described herein are illustrated with specific dimensions relative to each other, such as structural dimensions or orientations, for the purpose of simplicity and ease of understanding, and in some embodiments, the actual dimensions of these layers, features, elements, etc., are substantially different from those illustrated herein. Furthermore, various techniques exist for forming the layers, regions, features, elements, etc. mentioned herein, such as etching techniques, planarization techniques, implantation techniques, doping techniques, spin coating techniques, sputtering techniques, growth techniques, or at least one of deposition techniques such as chemical vapor deposition (CVD).

[0112] Furthermore, the terms "exemplary" and / or similar terms are used herein to mean as an instance, example, illustration, etc., and are not necessarily advantageous. As used in this application, "or" is intended to mean an inclusive "or" rather than an exclusive "or". Furthermore, unless otherwise specified or clearly indicated from the context to be for the singular form, "a" and "an" as used in this application and the appended claims should generally be interpreted as meaning "one or more". Furthermore, "at least one of A and B" and / or similar terms generally mean A or B or both A and B. Furthermore, in the use of "including," "having," "has," "with," or variations thereof, these terms are intended to be inclusive in a manner similar to the term "includes". Furthermore, unless otherwise specified, "first," "second," or similar terms are not intended to imply temporal state, spatial state, order, etc. Rather, these terms are used only as identifiers, names, etc., of features, elements, items, etc. For example, the first element and the second element usually correspond to element A and element B, or two different or two identical elements, or the same element.

[0113] Furthermore, although this disclosure has been shown and described with respect to one or more embodiments, equivalent changes and modifications will conceive of by those skilled in the art based on their reading and understanding of this specification and the accompanying drawings. This disclosure encompasses all such modifications and changes and is limited only by the scope of the following claims. In particular, with respect to the various functions performed by the aforementioned elements (e.g., elements, resources, etc.), unless otherwise stated, the terms used to describe such elements are intended to correspond to performing the specified functions of the described elements (e.g., functionally equivalent), although no element is structurally equivalent to the structure disclosed. Moreover, while a particular feature of this disclosure may have been disclosed with respect to only one of several embodiments, such feature may be combined with one or more other features of other embodiments, as may be desired and advantageous for any given or particular application.

[0114] 100: System 110: Truck 120: Transportation System 121,141,321,421,423: Liquid chemicals 123,143: Particles 130: Supply System 131: Feeding assembly 131G, 134P, 135G, 136P: Pumps 132: First storage slot 133: Second storage slot 134: Extract Components 135: Coolant distribution device 135: Supply device 136: Feedback Component 137,162,200: Diverter Valve Box 138: Semiconductor processing tools 140: Piping 150: First Semiconductor Wafer 160,500: Particle monitoring system 100: System 164,310: Buffer slot 170, 370, 470: Liquid particle counters 200,410: Liquid selection device 210: Shell 220, 222, 224, 226, 228: First valve 230, 232, 234, 236, 238: Second valve 240,354,364,462,464,466: Exhaust valve 250: Supply valve, sample valve 260, 262, 264, 266, 268: Sample source 300, 400: Measurement system 322: Flow meter 323: Pressurized gas 324, 326: Pressure supply valves 330: Equipment 330: Pressure Measurement Component 342,344,442,444: Sampling valve 352,362,452,454: Measuring valves 380: Gas Supply Unit 382: Discharge system 384: Sampling Source 386: Excretory system 421: First Liquid Chemicals, Liquid Chemicals 422: First buffer slot 422, 424: Second buffer slots 423: Second liquid chemicals, liquid chemicals 432, 434, 436, 438: Pressure supply valves 480: Drainage pipe 484: Measurement Transmission Line 502: Facilities and Equipment 504: Sample monitoring device 506: State System 508: Client device 510: First Signal 512: Monitoring signal 514: Computer 516: Third Signal 518: Second Signal 520: Display Panel 600, 700, 800, 902: Methods 900: Example 904: Processor-executable computer instructions 908: Computer-readable media 1311, 1312, 1313, 1314, 1341, 1342, 1351, 1352, 1362, 482: Transport lines

Claims

1. A method for operating a liquid chemical supply system, comprising: Liquid chemicals are stored in storage tanks; The liquid chemicals are supplied from the storage tank to the semiconductor processing equipment; A first sample of the liquid chemical is obtained from a first device in fluid communication with the storage tank via a liquid selection device, wherein the first device includes one of a feed assembly, an extraction assembly, a supply device, or a feedback assembly; a first level of particles in the first sample is measured by a liquid particle counter; after obtaining the first sample, a second sample of the liquid chemical is obtained from a second device in fluid communication with the storage tank via the liquid selection device, the second device being different from the first device, wherein the second device includes another of the feed assembly, the extraction assembly, the supply device, or the feedback assembly; and a second level of particles in the second sample is measured by the liquid particle counter.

2. The method as described in claim 1, comprising: Before obtaining the second sample, the first sample is discharged from the liquid selection device and the liquid particle counter.

3. The method as described in claim 1, comprising: The liquid chemicals are transferred to the storage tank via the feed assembly, which is in fluid communication with the storage tank. The liquid chemical is transferred from the storage tank to the supply component via the extraction component, which is in fluid communication with the storage tank and the supply component; and the liquid chemical is returned from the storage tank to the storage tank via the feedback component, wherein: obtaining the first sample includes opening a first valve of the liquid selection device, the first valve being associated with a first device of the feed component, the extraction component, the supply component, and the feedback component; and obtaining the second sample includes opening a second valve of the liquid selection device, the second valve being associated with a second device of the feed component, the extraction component, the supply component, and the feedback component, the second device being different from the first device.

4. The method as described in claim 1, comprising: After obtaining the second sample, a third sample of the liquid chemical is obtained from a third device in fluid communication with the storage tank via the liquid selection device, the third device being different from the first and second devices; and a third level of particles in the third sample is measured via a second liquid particle counter different from the liquid particle counter.

5. A method for operating a liquid chemical supply system, comprising: Liquid chemicals are stored in storage tanks; A first sample of the liquid chemicals from the first device, which is in fluid communication with the first device, is stored via a buffer tank of a measurement system in fluid communication with the first device, wherein the first device includes one of a feed assembly, an extraction assembly, a supply device, or a feedback assembly; a first level of particles in the first sample is measured via a liquid particle counter; after storing the first sample, a second sample of the liquid chemicals from a second device in fluid communication with the storage tank is stored via the buffer tank, the second device being different from the first device, wherein the second device includes another of the feed assembly, the extraction assembly, the supply device, or the feedback assembly; and a second level of particles in the second sample is measured via the liquid particle counter.

6. The method as described in claim 5, comprising: During the measurement of the first level, a first sample of the liquid chemical is output to the liquid particle counter via a pneumatic pump in gas communication with the buffer tank, wherein: outputting the first sample includes supplying pressurized gas to the buffer tank via opening a pressure supply valve in gas communication with a gas supplier.

7. The method as described in claim 5, comprising: The liquid chemicals are transferred from the truck to the storage tank via a feed assembly in fluid communication with the storage tank; The liquid chemical is transferred from the storage tank to the supply unit via an extraction unit in fluid communication with the storage tank and the supply unit; and the liquid chemical from the storage tank is filtered via a feedback unit, wherein: obtaining the first sample includes opening a first valve of a liquid selection device, wherein the first valve is associated with a first device of the feed unit, the extraction unit, the supply unit and the feedback unit, the liquid selection device being in fluid communication with the feed unit, the extraction unit, the supply unit and the feedback unit; and obtaining the second sample includes opening a second valve of the liquid selection device, wherein the second valve is associated with a second device of the feed unit, the extraction unit, the supply unit and the feedback unit, the second device being different from the first device.

8. A liquid chemical supply system, comprising: Storage tanks, operated to store liquid chemicals; Multiple devices, selected from a feed assembly, extraction assembly, supply device, or feedback assembly in fluid communication with the storage tank; a liquid particle counter, operated to determine the particle level in a sample of liquid chemicals; a buffer tank, in fluid communication with the liquid particle counter and operated to store the sample; and a liquid selection device, in fluid communication with the multiple devices and the buffer tank, operated to select one of the multiple devices and obtain the sample from said one of the multiple devices.

9. The system as claimed in claim 8, wherein the plurality of devices includes: The feed assembly is operated to transfer the liquid chemicals from a tank outside the system to the storage tank; The supply component is operated to transfer the liquid chemicals to a semiconductor processing tool outside the system; and the extraction component is in fluid communication with the supply component and is operated to transfer the liquid chemicals from the storage tank to the supply component.

10. The system of claim 8, wherein the liquid selection device comprises: A plurality of first valves, each of the plurality of first valves being in fluid communication with a corresponding one of the plurality of devices; and a plurality of second valves, each of the plurality of second valves being in fluid communication with a corresponding one of the plurality of first valves, wherein the liquid selection device includes: a supply valve, in fluid communication with each of the plurality of second valves; And a drain valve, which is in fluid communication with each of the plurality of second valves.

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