Progress management system, server, and progress management methods

Abstract

The purpose of this invention is to provide a technique for managing the progress of multiple evaluations involved in manufacturing formula development, taking into account the evaluation progress amount. One aspect of the progress management system of this invention is characterized by the following steps: calculating an evaluation progress amount representing the progress of each evaluation relative to all evaluations based on the completion time of all evaluations (i.e., the evaluation end time) or the application usage order corresponding to the content of each evaluation; calculating a first specification achievement rate using the results of each evaluation; and determining the evaluation status based on a second specification achievement rate calculated using the first specification achievement rate and the evaluation progress amount, all executed via a progress management application; the first specification achievement rate being the achievement rate among the results of each evaluation for the processed specification; and the second specification achievement rate being the achievement rate of the specification across all evaluations.

Description

Technical Field

[0001] This invention relates to a progress management system, server, and progress management method in the process of manufacturing formula development. Prior Technology

[0002] In the process of developing the process—that is, defining the conditions for the formulation required to achieve the desired performance of a semiconductor manufacturing device—development schedule management is generally implemented. Typically, multiple evaluations are required during manufacturing formulation development, but delays can occur if these evaluations are not carried out properly. Therefore, schedule management is necessary, such as implementing improvement measures for processes that are developing slowly.

[0003] As prior art, as shown in Patent Document 1, a progress management system is disclosed, which includes: a master control table management device for managing engineering processes, a history management device for managing the history of devices, and a progress management device for controlling progress. By controlling based on the content registered in the prohibition master control table, countermeasures can be taken against prohibited actions in the progress. Specifically, Patent Document 1 addresses the issue of batch progress control and engineering process completion in a semiconductor device pilot production line, checking the proper functioning of the engineering process handling device, and preventing damage such as device contamination or product defects. As an invention of a control device and processing system, the following contents are disclosed. In a progress management system 100 that includes a master control table management device 120 for managing batches of engineering processes, a history management device 130 for managing the history of batches or devices, and a progress management device 150 for controlling progress, the master control table memory unit 142 of the master control table management device 120 defines the prohibited sequence as a prohibited master control table according to each level of the engineering or device. Then, the engineering or device is given an attribute (check flag) for sequence checking. The checking unit 143 checks each level defined in the prohibited master control table. If the sequence matches the one defined in the prohibited master control table, the system displays the intention that there is an error on the display screen 145 to notify the user. [Previous Technical Documents] [Patent Literature]

[0004] [Patent Document 1] Japanese Patent Application Publication No. 2005-208889 Summary of the Invention

[0005] [The problem that the invention aims to solve] In the progress management system of Patent Document 1, the indicators for measuring and evaluating progress, namely the evaluation progress quantity, are not considered. Therefore, it is impossible to identify problems from the evaluated progress status, and even if problems exist, it is impossible to issue work instructions corresponding to the causes of the problems. The purpose of this invention is to provide a technique for managing the progress of multiple evaluations involved in the development of a manufacturing formula by taking into account the evaluation progress. [Methods used to solve problems]

[0006] To address the aforementioned issues, one representative progress management system of the present invention is a progress management system comprising: a platform implementing a progress management application for managing the progress of evaluations of processing results caused by a semiconductor manufacturing apparatus; characterized by: a step of calculating an evaluation progress amount representing the progress amount of each preceding evaluation relative to all preceding evaluations based on the completion time of all preceding evaluations, i.e., the evaluation end time or the usage order of the application corresponding to the content of each preceding evaluation; a step of calculating a first specification achievement rate using the results of each preceding evaluation; and a step of determining the status of the preceding evaluation based on a second specification achievement rate calculated using the first specification achievement rate and the progress amount of the preceding evaluation, which is executed by the preceding progress management application; the first specification achievement rate being the achievement rate among the results of each preceding evaluation for the specifications of the preceding processing results; and the second specification achievement rate being the achievement rate of the preceding specifications among all preceding evaluations. [Invention Effects]

[0007] According to the present invention, a technique can be provided that can take into account the progress of evaluation and manage the progress of multiple evaluations involved in the development of manufacturing formula. The issues, structure, and effects beyond those mentioned above can be understood through the following description of the form in which the invention is implemented. Simple Explanation of the Diagram

[0008] [Figure 1] Figure 1 is an illustration of one example of the components of a progress management system. [Figure 2] Figure 2 is an illustration of one example of the structure of a visualization tool or data analysis application server. [Figure 3] Figure 3 is a flowchart illustrating the process of multiple evaluations carried out in the development of a manufacturing formula. [Figure 4] Figure 4 is a frequency distribution diagram of multiple evaluations performed in the manufacturing formula development process. [Figure 5] Figure 5 is an illustration of one example of a progress management graphic. [Figure 6] Figure 6 is an illustration of an example of a progress management system GUI. [Figure 7] Figure 7 is an illustration of an example of a progress management system GUI. [Figure 8] Figure 8 is a flowchart of the processing of a visualization tool or data parsing application server. Implementation

[0009] Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. However, the present invention is not limited to these embodiments. Furthermore, in the drawings, the same reference numerals are used to denote the same parts.

[0010] In this disclosure, a "private environment" refers to a network in which machines within a defined scope can communicate with each other, but on the other hand, machines within the defined scope cannot communicate with machines outside the defined scope. For example, in the case of "private environment of location A," it means a network in which communication is not possible with locations other than location A, but communication is possible within location A. Furthermore, the term "public environment" refers to a network that does not restrict communication. For example, "public environment of location A" means that the machines contained in location A can communicate with each other and with machines contained in locations other than location A. Furthermore, the term "production line equipment group" refers to a plurality of equipment that form a production line. In the case of a semiconductor production line, it includes at least one of the following: semiconductor manufacturing equipment, semiconductor inspection equipment, and semiconductor measurement equipment. Furthermore, the term "PC" is not limited to personal computers, but also includes any server that functions as a computer (processing device). Furthermore, the term "application" refers to a program that is executed on a PC. In this disclosure, it is also referred to as an "App".

[0011] As described below, the progress management system disclosed herein includes: a group of devices containing manufacturing equipment, software that implements the management of the progress of multiple evaluations involved in the development of manufacturing formulas, and a server (visualization tool or data analysis application server 183) storing information on the usage status of human and mechanical resources allocated to the aforementioned multiple evaluations. A detailed description follows. [Example 1]

[0012] Referring to Figures 1 and 2, the structure of the schedule management system is explained. Figure 1 is an illustration of one example of the structure of a schedule management system. Schedule management system 1 manages the progress of manufacturing recipe development when it is being carried out across multiple locations. Schedule management system 1 includes a group of devices containing manufacturing equipment and an integration platform described later; therefore, it can also be considered an important device data integration system during manufacturing.

[0013] (The structure of a progress management system) The progress management system 1, spanning from site A to site C, includes: Internet 154, Internet 164, Internet 174, cloud server 180, remote monitor 182, visualization tool or data analysis application server 183 (hereinafter also referred to as "server 183"), and a shared cloud environment 184 between sites. The shared cloud environment 184 between sites can also be described as a platform implementing the progress management application required for managing the evaluation progress of processing results caused by semiconductor manufacturing equipment. Within this platform, specifically server 183, the progress management application runs to manage the evaluation progress of processing results caused by semiconductor manufacturing equipment. Furthermore, the platform is not limited to hardware components; it can also utilize a cloud environment to create the environment for executing applications.

[0014] Location A comprises a private environment 155 and a public environment 156. The private environment 155 of location A includes server A150 and production line equipment group A151. The public environment 156 of location A includes server A′152 and PCA153. Location A forms a communication network containing equipment groups and management data processing devices; therefore, location A may be referred to as integration platform A.

[0015] Similarly, Site B comprises a private environment 165 and a public environment 166. Site B's private environment 165 includes server B160 and production line equipment group B161. Site B's public environment 166 includes server B'162 and PCB 163. Site B forms a communication network containing equipment groups and management data processing devices; therefore, Site B may be referred to as Integration Platform B.

[0016] Similarly, location C contains a private environment 175 and a public environment 176. The private environment 175 of location C contains server C170 and production line equipment group C171. The public environment 176 of location C contains server C′172 and PCC176. Location C forms a communication network containing equipment groups and management data processing devices; location C may be referred to as integration platform A.

[0017] Furthermore, Server A150 and Server A′152 represent servers in location A. Server B160 and Server B′162 represent servers in location B, and Server C170 and Server C′172 represent servers in location C. The designations "A" or "A′" are used to indicate the included locations; however, when not distinguishing between locations, they may be simply referred to as "server." The same designations are used for other PCs and production line equipment groups.

[0018] (Processing in the progress management system) Within the private environment 155 of site A, production line assembly A151 performs manufacturing processes based on the input manufacturing recipe. For example, in production line assembly A151, the instruction values ​​represented in the manufacturing recipe are transmitted to each machine within production line assembly A151 for manufacturing processing. The processed manufacturing recipe is stored in server A150.

[0019] The manufactured objects are transferred to the inspection, analysis, or analytical devices included in the production line assembly group A151, where predetermined measurements are performed based on the various measurement formulas input into the production line assembly group A151. The measured results are stored in the server A150.

[0020] PCA153 determines the accessibility of data, including formulas or measurement results that have been input into production line unit A151, and specifies the data flow (data path setting). PCA153 defines data that is permitted to be accessed from other locations besides location A (accessible data) and data that is prohibited from being accessed from other locations (prohibited data). For example, publicly permitted data that can be taken outside of location A is stored on server A'152. Furthermore, publicly permitted data and publicly prohibited data are managed separately on server A150. As a specific management method, they can be categorized by type or level in the database of server A150, as described later. In addition, publicly permitted data is stored on cloud server 180 via Internet 154.

[0021] Bases B and C have the same structure as Base A. Server B160, production line unit group B161, server B′162, and PCB163 at Base B correspond to servers A150, production line unit group A151, server A′152, and PCA153 at Base A, respectively. Similarly, servers C170, production line unit group C171, server C′172, and PCC173 at Base C correspond to servers A150, production line unit group A151, server A′152, and PCA153 at Base A, respectively.

[0022] The visualization tool or data parsing application server 183 is a processing device for executing software programs (hereinafter also referred to as "software"), i.e., visualization tools or data parsing applications. Server 183 is configured in an inter-site shared cloud environment 184, and communicates with servers at site C from site A via the inter-site shared cloud environment 184 and the Internet 154 through the Internet 174. Server 183 visualizes and parses the data obtained from each site. The visualized results can, for example, be displayed on a remote monitor 182.

[0023] The progress management system 1 has servers 183 in a cloud environment between locations, and visualizes the progress status based on publicly available licensed data from each location through remote monitors 182. Therefore, the progress management system 1 makes it possible to manage the progress of each location working together in the development of manufacturing formulas.

[0024] (The structure of the visualization tool or data parsing application server 183) Figure 2 is an illustration of one example of the configuration of a visualization tool or data parsing application server 183. The server 183 includes: a bus 1830, a processor 1831, a memory 1832, a memory device 1833, an input / output device 1834, and a communication interface 1835. The processor 1831, memory 1832, memory device 1833, input / output device 1834, and communication interface 1835 are respectively connected to the bus 1830, through which information is communicated. The processor 1831 processes the acquired information. The memory 1832 stores the processing commands executed by the processor 1831. The memory 1832 contains, for example, random access memory (RAM) or other dynamic memory devices, read-only memory (ROM) or other static memory devices that may be used, during the execution of commands executed by the processor 1831, to save temporary variables or other intermediate information. The processor 1831 can perform the functions of a visualization tool or data parsing application server 183, which will be described later, by executing the processing commands contained in the memory 1832.

[0025] Furthermore, the memory device 1833, used for storing information and commands, is composed of, for example, a magnetic disk or optical disk. The memory device 1833 can also be a database for storing commands (hereinafter referred to as "DB"). The input / output device 1834 includes: a display device for displaying information to the user, and an input device for transmitting the user's selected information and commands to the processor 1831. For example, the display device is a monitor, and the input device is a mouse and keyboard. The communication interface 1835 enables bidirectional communication via a network. Through the communication interface 1835, the server 183 can obtain information from servers A'152, B', and C'172.

[0026] In addition, memory 1832, in this disclosure, stores, besides visualization tools and data analysis applications, an application n (where n is an integer) used to measure and evaluate progress. Other applications may also be stored in memory 1832. Furthermore, the input / output device 1834 functions as a GUI (graphical user interface). As described later, it can display visualized information to the user or accept user instructions. The input / output device 1834 can also present the GUI functionality to the user via a remote monitor 182. Furthermore, memory device 1833 may also contain a database that obtains information (publicly licensed data) from servers A′152, B′, and C′172 described later. The database may also contain an application database (application DB) that stores data for each application.

[0027] Although the configuration of server 183 has been described, this disclosure is not limited to this configuration. Server 183 may also be constructed from other hardware circuits, or from a combination of hardware circuits and software. Furthermore, servers A150, A′152, PCA153, B160, B′162, PCB163, C170, C′172, and PCC173 may also have the same configuration as server 183. [Example 2]

[0028] Next, referring to Figure 3, one indicator of the progress management of the evaluation in the process development, i.e., the formulation condition list, required to obtain the desired performance of the semiconductor manufacturing device is the specification achievement rate. Figure 3 is a flowchart illustrating a pattern of the multiple evaluation processes performed in the manufacturing formulation development. Furthermore, in the case of the manufacturing formulation development being the manufacturing formulation of the semiconductor device, the multiple evaluations are, for example, evaluations required to confirm the performance of the semiconductor manufacturing device, such as etching rate measurement, CD measurement, and cross-sectional observation of the etched shape.

[0029] Although the manufacturing formula development process involves multiple evaluation processes, these evaluations are conducted sequentially (one evaluation at a time, performed in order). For example, as shown in Figure 3(a), evaluation 1 is performed first, followed by evaluation 2, then evaluation 3, evaluation 4, and evaluation 5. Furthermore, while Figure 3 illustrates a process with five evaluations (evaluation 1 to evaluation 5), the number of evaluations is not limited to five. In the following explanation, evaluation n (where n is an integer from 1 to 5) is used as the designation.

[0030] In the progress management system 1, as shown in Figure 3(b), an application corresponding to each evaluation is used to measure the status of each evaluation. For example, application n is used to measure the status of evaluation n. Furthermore, manufacturing formula development is typically a demonstration development requested by the customer, and each evaluation may contain specifications provided by the customer (e.g., specifications for evaluation 1, specifications for evaluation 2, etc.). Therefore, in the progress management system 1, as shown in Figure 3(c), the achievement rate (specification achievement rate) is calculated for each specification based on each evaluation. Additionally, the application can be executed on, for example, a server 183.

[0031] The specification achievement rate (hereinafter referred to as "specification n achievement rate") for evaluation n is calculated as follows (1). [Number 1] Specification n Achievement Rate =The current specifications of rating n calculated by the application ÷The specifications of rating n suggested by the customer…(1)

[0032] Here, assuming that all evaluation weights are equal, the evaluation progress is calculated as shown in the following formula (2). In formula (2), the evaluation progress is calculated as the evaluation progress up to 50% of evaluation n, which is taken as "50% evaluation progress of application n". Furthermore, as the evaluation progress, let the total number of evaluation items (the number of multiple evaluations) be Z, and let the evaluation progress be 100 when all evaluations have been completed. [Number 2] The 50% evaluation progress of application n = n÷Z×100-(1÷Z×100)÷2…(2)

[0033] The 50% evaluation progress of application n, expressed by formula (2), is the evaluation progress up to 50% in evaluation n. In the calculation shown in Example 4 below, if the achievement rate of specification n has not reached 100%, the value of formula (2) is used as the evaluation progress of evaluation n. Furthermore, if the achievement rate of specification n has reached 100%, and the achievement rate of specification n+1 has not reached 100%, the value of the following formula (3) is used as the evaluation progress of evaluation n. [Number 3] The evaluation progress of application n = n ÷ Z × 100 …(3) [Example 3]

[0034] Next, referring to Figure 4, the situation where evaluations are performed simultaneously will be explained. Figure 4 is a frequency distribution diagram of multiple evaluations performed during the manufacturing formula development process. The frequency distribution diagram in this embodiment is a regular distribution diagram. Although Figure 3 illustrates a situation where each evaluation is performed vertically with the same weight, there are also situations where the weights are different (in Figure 4, this represents a situation where the frequencies are different), and other evaluations are performed simultaneously. Such a situation occurs, for example, when the next evaluation has begun, but it may affect the specifications of the previous evaluation, and it is considered that the previous evaluation may be performed again.

[0035] When the start time tns, the end time tne, and the end time tE of evaluation n are given, the evaluation progress is calculated as follows (4). [Number 4] The 50% evaluation progress of application n = {(tns+tne)÷2}×100÷tE…(4) The 50% evaluation progress of application n, expressed by formula (4), is the evaluation progress up to 50% in evaluation n. In the calculation shown in Example 4 described later, if the achievement rate of specification n has not reached 100%, the value of formula (4) is used as the evaluation progress of evaluation n. Furthermore, if the achievement rate of specification n has reached 100%, and the achievement rate of specification n+1 has not reached 100%, the evaluation progress of application n shown by the following formula (5) is used. [Number 5] The evaluation progress of application n = tne × 100 ÷ tE…(5)

[0036] In addition, when calculating the evaluation progress in more detail, the relationship between the frequency of use of each application and the evaluation time can be obtained. The evaluation time tr can be calculated based on the frequency of use of the application. The more accurate evaluation progress of application n can be obtained by using the calculation method shown in the following formula (6). [Number 6] The evaluation progress of application n = tr × 100 ÷ tE…(6) [Example 4]

[0037] Next, referring to Figure 5, the method for evaluating the overall progress will be explained. Figure 5 is an example of a progress management diagram.

[0038] In managing the progress of manufacturing formula development, the progress assessment is not based on the specification achievement rate of each individual evaluation, but rather on the specification achievement rate across the entire set of multiple evaluations. The formula for calculating the specification achievement rate across the entire set of evaluations is expressed by the following equation (7). [Number 7] …(7)

[0039] Figure 5(a) is a graph plotting the corresponding evaluation progress amount and specification achievement rate calculated in Examples 2 and 3. The corresponding graph in Figure 5(a) can be based on either estimated values ​​or actual measurements, either way is acceptable. Figure 5(b) is a graph plotting the estimated value of the specification achievement rate. In Figure 5(b), the straight line connecting the point where the specification achievement rate is 100% for the required deadline G and the point where the specification achievement rate is 0% at time 0 is plotted. In Figure 5(b), the horizontal axis represents time, but if the deadline G is replaced by 100% of the evaluation progress amount in Figure 5(a), a graph plotting the corresponding evaluation progress amount and specification achievement rate based on the estimated value can be obtained.

[0040] In Figure 5, the measured points at the current time are plotted, and the specification achievement rate b in time ta (Figure 5(b)) and the specification achievement rate b in the evaluation progress amount a (Figure 5(a)) are illustrated. In addition, the time delay for the deadline can be calculated in the case of Figure 4(b), so it is more practical than Figure 4(a).

[0041] Hereinafter, Figure 5 is used to illustrate the formulas for calculating the specification achievement rate delay at the current point in time and the time delay relative to the deadline at the current point in time. Furthermore, in deriving formulas (8) and (9), it is assumed that the specification achievement rate is achieved proportionally to time.

[0042] [Number 8] Current specification achievement rate delay = (ab) / a × 100…(8) [Number 9] The time delay of the current point relative to the deadline = ta - tb…(9) [Example 5]

[0043] Next, referring to Figures 6 and 7, the visualization of the analyzed data will be explained. Figures 6 and 7 are illustrations of an example of a GUI for a progress management system. Figures 6 and 7 are special illustrations displayed in the GUI, which can be displayed on the input / output device 1834 of the server 183 and the remote monitor 182.

[0044] In server 183, a graph is created using the specification n achievement rate, evaluation progress, and specification achievement rate calculated in Examples 1 to 4 as the vertical axis, and time and evaluation progress as the horizontal axis. This data is output from server 183 and is accessed in real-time from the application database of server 183 and reflected on the graph, thus the graph is updated in real-time. Furthermore, it can also work in conjunction with the databases of parts management, device management, and other applications to graphically represent the shortage status of parts or the idle status of devices, similarly enabling real-time visualization.

[0045] The analysis results of the progress and specification achievement rate evaluation indicate that if the progress or specification achievement rate shown in Figure 5 is not met, server 183 identifies the problem and displays it on the GUI shown in Figure 6. To determine the cause of the problem, server 183 identifies the evaluation stage based on the current time and compares it with the current progress history or application log data to determine the root cause, which is then displayed on the GUI. Furthermore, to resolve the cause, server 183 compares the idle status of personnel, parts, or equipment, re-examines resource allocation, and displays instructions on the GUI to allocate resources for delayed portions.

[0046] The graphics display unit 200 contains graphics, for example, that visualize publicly available license information. The server 183 displays data stored in its application database or data obtained from the cloud server 180, converted into graphics, etc. The evaluation stage display unit 201 displays information about the evaluation stage; specifically, it displays the evaluation progress, specification achievement rate, and project status. The cause display unit 202 displays information about cause resolution, showing the problem's content, its cause, and the instructions needed to resolve it.

[0047] Furthermore, the processing procedure from the extraction of the cause of the problem to the instruction is stored in the DB of the memory device 1833. After the DB is filled, by combining the data in the DB and performing machine learning, the progress management, problem extraction and instructions resulting from the use of AI can be displayed on the GUI.

[0048] In the progress management system 1, users such as managers responsible for progress management monitor the GUI and issue instructions based on the GUI. Instructions can even be transferred to the PCs at the locations where problems are occurring via the server 183, allowing direct instructions to the locations.

[0049] Furthermore, assuming that the manufacturing formula development is carried out in parallel by three projects, the current position of each project is plotted on the graph in Figure 5 using server 183, and as shown in Figure 7, the progress of the projects can be compared. Thus, based on the difference between delayed and progressing projects, it is possible to determine in detail which project's progress is being hindered.

[0050] The corresponding graphic display unit 203 displays a corresponding graphic that plots the evaluation progress and specification achievement rate for each project. For example, project A can be set as a black dot, project B as a triangle, and project C as a white circle, and displayed on the corresponding graphic. Furthermore, the cause display unit 204 displays the progress management results for each project, based on cause analysis, and includes information such as evaluation progress, specification achievement rate, project status, problems, causes, and instructions. [Example 6]

[0051] Next, referring to Figure 8, the processing of server 183 will be explained. Figure 8 is a flowchart of the processing of visualization tool or data parsing application server 183.

[0052] As step S1, server 183 converts the end time of the final evaluation step among the plurality of evaluations concerning the development of the manufacturing formula into a baseline value. In this disclosure, the conversion of the baseline value is equivalent to setting the end time tne for each evaluation n included in the plurality of evaluations, such as the start time tns, end time tne, and end time tE of evaluation n, in the derivation of equation (4).

[0053] Following step S2, server 183 calculates the expected evaluation progress time for each evaluation content as the evaluation progress value based on the usage order and baseline values ​​of the applications corresponding to the evaluation content of the plurality of evaluations. In other words, server 183 calculates the evaluation progress amount representing the progress of each evaluation relative to all evaluations based on the completion time of all evaluations (i.e., the evaluation end time) or the usage order of the applications corresponding to the content of each evaluation. Furthermore, the evaluation progress amount is calculated using the start time, end time, and evaluation end time of each evaluation. Also, the evaluation progress amount is the value obtained by dividing the time of each evaluation calculated based on the usage frequency of the application by the evaluation end time. In this disclosure, the 50% evaluation progress amount of application n shown in equation (2) or the evaluation progress amount of application n shown in equation (3) are equivalent to the evaluation progress amount.

[0054] Next, as step S3, server 183 calculates the evaluation progress amount by taking the ratio of the evaluation progress value to the baseline value. In other words, server 183 uses the results of each evaluation to calculate the achievement rate (first specification achievement rate) of each evaluation result for the specifications of the processing result. In this disclosure, the 50% evaluation achievement rate of application n shown in equation (4) and the evaluation progress amount of application n shown in equation (5) are calculated. Furthermore, the progress of the evaluation can also be calculated by establishing a relationship between the evaluation time and the frequency of application usage in advance, and then calculating the evaluation time back from the frequency of application usage, and finally calculating the progress based on the relationship between the benchmark value and the evaluation time. In this disclosure, the relationship between the frequency of application usage can be expressed as shown in equation (6).

[0055] Next, as step S4, server 183 calculates the specification achievement rate by dividing the current specification calculated by the application by the required specification. In this disclosure, the specification n achievement rate shown in equation (1) is calculated.

[0056] Next, as step S5, server 183 calculates a revised evaluation progress amount (second specification achievement rate) based on the evaluation progress amount and specification achievement rate. The second specification achievement rate is calculated using the first specification achievement rate and is the achievement rate of specifications in all evaluations. Furthermore, the second specification achievement rate is the value obtained by dividing the sum of the first specification achievement rates by the number of all evaluations. In this disclosure, the specification achievement rate shown in equation (7) is calculated.

[0057] Next, as step S6, server 183 determines the evaluation status based on the second specification achievement rate and evaluation progress. In this disclosure, server 183 determines the evaluation status based on the revised evaluation progress and specification achievement rate.

[0058] Next, as step S7, server 183 extracts the progress delay as a problem point from the evaluation status. In this disclosure, the specification achievement rate delay at the current point of equation (8) and the time delay to the deadline at the current point of equation (9) are calculated. Furthermore, the server 183 system identifies the cause based on the specification history of each evaluation item and the usage history of the device used in the evaluation, as well as the correlation between the problem and the issue.

[0059] Next, as step S8, server 183 calculates the remaining amount of human and mechanical resources, identifies the causes that can be resolved by allocating the remaining amount to human and mechanical resources, and displays the results in the GUI. In other words, server 183 performs a two-axis graphical representation of the second specification achievement rate and evaluation progress, and a two-axis graphical representation of the second specification achievement rate and evaluation time, and displays the results in the GUI. Furthermore, when the delay in evaluation progress is considered a problem and the server is removed from the evaluation state, server 183 performs a task to resolve the problem by allocating the remaining amount of calculated human resources (resources allocated to the personnel being evaluated) and the remaining amount of calculated mechanical resources (resources used in the evaluation equipment) to human and mechanical resources respectively, and displays this task in the GUI. In this disclosure, as shown in Figures 7 and 8, information indicating the allocation of remaining resources, along with the causes identified in step S7, is displayed as instructions to the user.

[0060] Furthermore, server 183 can also store combined data of the problem points in the progress evaluation, the causes of the problem points, and the corresponding instructions for the causes of the problem points in a database, and perform machine learning using the combined data as a dataset. This design can improve the accuracy of the allocation of remaining resources or the instructions to users.

[0061] Furthermore, in step S8, progress management can also be carried out by means of visualizing the evaluation progress, specification achievement rate, and the status of the projects involved in manufacturing formula development. In this disclosure, the graphic display unit 200 in FIG6 may also include: a graph that graphically represents the specification achievement rate and evaluation progress, and a graph that plots the current position of the project on the graph.

[0062] Furthermore, in step S8, the specification achievement rate and evaluation time can also be graphically represented, plotting the current position of the project against the evaluation deadline. Additionally, the GUI can also include a display function capable of comparing the specification achievement rate with the evaluation progress, project status, progress issues, and the causes of those issues for multiple projects across multiple data points. In this disclosure, as shown in the corresponding graphical display unit 203 of FIG7, the deadline G is plotted, and the current positions of projects A through C are also plotted.

[0063] (Function, Effect) Based on the above disclosure, a technique can be provided to manage the progress of multiple evaluations involved in the development of a manufacturing formula by considering the evaluation progress. In the prior art, it was difficult to create indicators for measuring development progress, but in this disclosure, evaluation progress management is possible by introducing evaluation achievement rate and specification achievement rate. Furthermore, the problems and causes derived from the evaluation status can be identified, and work instructions corresponding to the identified causes of the problems can be issued, thus achieving efficient demonstration evaluation and development.

[0064] While the embodiments of the present invention have been described above, the present invention is not limited to the above embodiments, and various modifications can be made without departing from the spirit of the present invention. For example, although the embodiments described above illustrate the use of a PC (PCA153, PCB163, PCB173) in the progress management system 1, a virtual domain, server, or mobile terminal can also be used instead of a PC terminal. Furthermore, regarding the communication method, although SMB (Server Message Block) communication is primarily considered, it is not limited to SMB communication; FTP (File Transfer Protocol) communication or NFS (Network File System) communication can also be used. Moreover, replacing the remote monitor 182 with a PC can achieve the same effect.

[0065] Furthermore, although the above embodiments describe the situation of a production line group, the same effect can be achieved when a progress management system is applied to the equipment performing the accompanying evaluation operation.

[0066] Furthermore, the present invention is not limited to the embodiments described above, and various modifications can be made without departing from the spirit of the present invention.

[0067] The possible forms of the content of this invention are described below, but are not limited thereto. (State 1) A schedule management system comprises: a platform containing a schedule management application program implemented to manage the progress of evaluating the processing results caused by a semiconductor manufacturing apparatus; characterized in that, The steps for calculating the evaluation progress amount, representing the progress of each prior evaluation relative to all prior evaluations, are based on the completion time of all prior evaluations (i.e., the evaluation completion time) or the application usage order corresponding to the content of each prior evaluation; and The steps for calculating the first specification achievement rate using the results of the various evaluations mentioned above; and The step of determining the status of the previous evaluation based on the second specification achievement rate calculated using the first specification achievement rate and the previous evaluation progress amount is executed through the previous progress management application. The first specification achievement rate mentioned above refers to the achievement rate among the various evaluation results of the specifications mentioned above, based on the processing results mentioned above. The achievement rate of the second specification in the foregoing refers to the achievement rate of the foregoing specification in all evaluations in the foregoing. (State 2) As described in Sample 1, the progress management system includes, The progress of the previous evaluation is calculated using the start time, end time, and end time of each previous evaluation. (State 3) As described in the progress management system of state sample 1 or state sample 2, in which, The progress of the previous evaluation is calculated by dividing the time of each previous evaluation by the usage frequency of the previous application. (State 4) The progress management system described in any one of states 1 to 3, wherein, The graph of the achievement rate of the second specification mentioned above and the progress of the previous evaluation, or the graph of the achievement rate of the second specification mentioned above and the time of the previous evaluation, is displayed in the GUI. (Style 5) The progress management system described in any one of states 1 to 4, wherein, If the delay in the progress of the previous evaluation is treated as a problem and removed from the status of the previous evaluation, The GUI displays the operation of resolving the aforementioned problem by allocating the calculated surplus of human resources and the calculated surplus of mechanical resources to the aforementioned human resources and mechanical resources, respectively. The aforementioned human resources refer to the human resources allocated to the personnel evaluated in the preceding section. The mechanical resources mentioned above refer to the resources of the apparatus used in the evaluation mentioned above. (Style 6) The progress management system described in any one of states 1 to 5, wherein, Machine learning is performed by combining the data of the problems in the previous evaluation, the causes of the previous problems, and the corresponding instructions for the causes of the previous problems into a dataset. (Style 7) The progress management system described in any one of states 1 to 6, wherein, The achievement rate of the second specification mentioned above is the value obtained by dividing the sum of the achievement rates of the first specification mentioned above by the number of all the evaluations mentioned above. (Style 8) The progress management system described in any one of states 1 to 7, wherein, The platform mentioned above is a server. (Style 9) The progress management system described in any one of states 1 to 8, wherein, The evaluation system described above is based on the etching rate measurement. (Style 10) A server is a server for implementing a schedule management application required for managing the evaluation of processing results caused by semiconductor manufacturing equipment, characterized in that, The steps for calculating the evaluation progress amount, representing the progress of each prior evaluation relative to all prior evaluations, are based on the completion time of all prior evaluations (i.e., the evaluation completion time) or the application usage order corresponding to the content of each prior evaluation; and The steps for calculating the first specification achievement rate using the results of the various evaluations mentioned above; and The step of determining the status of the previous evaluation based on the second specification achievement rate calculated using the first specification achievement rate and the previous evaluation progress amount is executed through the previous progress management application. The first specification achievement rate mentioned above refers to the achievement rate among the various evaluation results of the specifications mentioned above, based on the processing results mentioned above. The achievement rate of the second specification in the foregoing refers to the achievement rate of the foregoing specification in all evaluations in the foregoing. (Style 11) A schedule management method is a schedule management method for managing the evaluation schedule of processing results caused by semiconductor manufacturing equipment, characterized by: The project progress amount, representing the progress of each preceding evaluation relative to all preceding evaluations, is calculated based on the completion time of all preceding evaluations (i.e., the evaluation completion time) or the application usage order corresponding to the content of each preceding evaluation; and The project that calculates the first specification achievement rate using the results of the aforementioned evaluations; and The status of the previous evaluation is determined based on the second specification achievement rate calculated using the first specification achievement rate and the previous evaluation progress amount; The first specification achievement rate mentioned above refers to the achievement rate among the various evaluation results of the specifications mentioned above, based on the processing results mentioned above. The achievement rate of the second specification in the foregoing refers to the achievement rate of the foregoing specification in all evaluations in the foregoing.

[0068] 1: Progress Management System 150: Server A 151: Production Line Equipment Group A 152: Server A′ 153:PCA 154: Internet 155: Private Environment of Base A 156: Common Environment of Base A 160: Server B 161: Production Line Equipment Group B 162: Server B′ 163:PCB 164: Internet 165: Private Environment of Base B 166: Common Environment of Base B 170: Server C 171: Production Line Equipment Group C 172: Server C′ 173:PCC′ 174: Internet 175: Private Environment of Base C 176: Common Environment of Base C 180: Cloud Server 182: Remote Monitor 183: Visualization tools or data analysis application servers 184: Shared cloud environment between outposts 200: Graphics Display Unit 201: Evaluation Phase Display Department 202: Cause Display Department 203: Corresponding graphics display unit 204: Cause Display Section 1830: Busbar 1831: Processor 1832: Memory 1833: Memory device 1834: Input / output device 1835: Communication Interface

Claims

1. A progress management system comprising: a platform having a progress management application implemented for managing the progress of evaluations of processing results caused by a semiconductor manufacturing apparatus; characterized in that: a step of calculating an evaluation progress amount representing the progress amount of each preceding evaluation relative to all preceding evaluations based on the completion time of all preceding evaluations, i.e., the evaluation end time or the usage order of the application corresponding to the content of each preceding evaluation; a step of calculating a first specification achievement rate using the results of each preceding evaluation; and a step of determining the status of the preceding evaluation based on a second specification achievement rate calculated using the first specification achievement rate and the progress amount of the preceding evaluations, wherein the preceding progress management application is executed; the first specification achievement rate is the achievement rate among the results of each preceding evaluation for the specification of the preceding processing result; the second specification achievement rate is the achievement rate of the preceding specification among all preceding evaluations.

2. The progress management system as described in request item 1, wherein, The progress of the previous evaluation is calculated using the start time, end time, and end time of each previous evaluation.

3. The progress management system as described in request item 1, wherein, The progress of the previous evaluation is calculated by dividing the time of each previous evaluation by the frequency of use of the previous application.

4. The progress management system as described in Request 1, wherein, The graphs showing the achievement rate of the second specification and the progress of the previous evaluation as a two-axis graph, or the achievement rate of the second specification and the time of the previous evaluation as a two-axis graph, are displayed in the GUI.

5. The progress management system as described in request item 1, wherein, When a delay in the progress of the preliminary evaluation is removed from the preliminary evaluation status as a problem, the GUI displays the following: The operation to resolve the preliminary problem is to allocate the remaining calculated human resources and mechanical resources to the preliminary human resources and mechanical resources, respectively. Preliminary human resources refer to the human resources allocated to the preliminary evaluation; preliminary mechanical resources refer to the resources of the equipment used in the preliminary evaluation.

6. The progress management system as described in Request 1, wherein, Machine learning is performed by combining the data of the problems in the previous evaluation, the causes of the previous problems, and the corresponding instructions for the causes of the previous problems into a dataset.

7. The progress management system as described in Request 1, wherein, The achievement rate of the second specification mentioned above is the value obtained by dividing the sum of the achievement rates of the first specification mentioned above by the number of all the evaluations mentioned above.

8. The progress management system as described in Request 1, wherein, The platform mentioned above is a server.

9. The progress management system as described in Request 1, wherein, The evaluation system described above is based on the etching rate measurement.

10. A server, which is a server implementing a progress management application for managing the progress of evaluations of processing results caused by a semiconductor manufacturing apparatus, characterized by the following steps: calculating an evaluation progress amount representing the progress amount of each preceding evaluation relative to all preceding evaluations based on the completion time of all preceding evaluations, i.e., the evaluation end time or the usage order of the application corresponding to the content of each preceding evaluation; calculating a first specification achievement rate using the results of each preceding evaluation; and determining the status of the preceding evaluation based on a second specification achievement rate calculated using the first specification achievement rate and the progress amount of the preceding evaluation, all executed by the preceding progress management application; wherein the first specification achievement rate is the achievement rate among the results of each preceding evaluation for the specification of the preceding processing result; and the second specification achievement rate is the achievement rate of the preceding specification among all preceding evaluations.

11. A schedule management method for managing the progress of evaluations of processing results caused by a semiconductor manufacturing apparatus, characterized by comprising: a process for calculating an evaluation progress amount representing the progress amount of each preceding evaluation relative to all preceding evaluations, based on the completion time of all preceding evaluations (i.e., the evaluation end time) or the usage order of applications corresponding to the content of each preceding evaluation; a process for calculating a first specification achievement rate using the results of each preceding evaluation; and a process for determining the status of a preceding evaluation based on a second specification achievement rate calculated using the first specification achievement rate and the preceding evaluation progress amount; wherein the first specification achievement rate is the achievement rate among the results of each preceding evaluation for the specification of the preceding processing result; and the second specification achievement rate is the achievement rate of the preceding specification among all preceding evaluations.

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