Sulfonium salt, chemically amplified resist composition, and pattern forming process

TWI933681BActive Publication Date: 2026-07-21SHIN ETSU CHEMICAL CO LTD

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Patent Information

Application Number: TW114135441
Authority / Receiving Office: TW · TW
Patent Type: Patents
Current Assignee / Owner
Filing Date: 2025-09-16
Publication Date: 2026-07-21
Estimated Expiration: 2045-09-15

Application Information

Patent Timeline

16 Sep 2025

Application

TW114135441

21 Jul 2026

Publication

TWI933681B

IPC: C07C63/70; C07C65/05; C07C65/21; C07C69/76; C07C323/62; C07C381/00; C07C381/12; C07D309/06; C07D327/08; C09K3/00; G03F7/004; G03F7/039; G03F7/20; G03F7/32; H10P76/00

Inventors: 福島将大

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Abstract

The present invention provides a strontium salt represented by formula (1), a chemical amplification inhibitor composition containing the strontium salt as a quenching agent, and a pattern forming method using the chemical amplification inhibitor composition. In the formula, Z- is an aromatic carboxylic acid anion that may also have substituents.

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