Debris capture unit and light source device

Abstract

The objective of this invention is to provide a debris collection unit and a light source device that can improve the maintenance efficiency of foil traps. One embodiment of the present invention provides a debris-catching unit comprising a loading / unloading member and at least one foil-type catcher. The debris-catching unit is installed at the opening of a processing chamber body having an outlet for radiation from plasma and an opening different from the outlet. The loading / unloading member is configured to cover the opening and is freely loadable and detachable from the processing chamber body. The at least one foil-type catcher has a plurality of foils for catching debris from the plasma, and is connected to the loading / unloading member such that, with the loading / unloading member installed in the processing chamber body, the plurality of foils are arranged along the path of the radiation from the plasma to the outlet.

Description

Debris Capture Unit and Light Source Device The present invention relates to a debris capture unit and a light source device for capturing debris emitted from a plasma. Previously, X-rays have been used for medical, industrial, and research purposes. In the medical field, X-rays are used for chest X-ray photography, dental X-ray photography, CT (Computer Tomogram), etc. In the industrial field, X-rays are used for non-destructive inspection of the interior of substances such as structures or welded parts, tomography non-destructive inspection, etc. In the research field, X-rays are used for X-ray analysis for analyzing the crystal structure of substances, X-ray spectroscopy (X-ray fluorescence analysis) for analyzing the constituent elements of substances, etc. Extreme ultraviolet light (hereinafter also referred to as "EUV (Extreme Ultra Violet) light") with a wavelength of 13.5 nm in the soft X-ray region where the wavelength of X-rays is relatively long has been used as exposure light in recent years. Here, the substrate of the mask for EUV lithography that constitutes a fine pattern is a laminated structure, and a mirror made of a multilayer film (for example, molybdenum and silicon) for reflecting EUV light is provided on a substrate made of low thermal expansion glass. Then, an EUV mask is formed by patterning a material that absorbs radiation with a wavelength of 13.5 nm on the multilayer film. Also, the size of defects that cannot be tolerated in an EUV mask has become significantly smaller compared to the case of a conventional ArF mask, and it is difficult to detect them. Therefore, as an inspection of an EUV mask, so-called actinic inspection, which uses radiation with a wavelength consistent with the operating wavelength of lithography, is generally performed. For example, if detection is performed using radiation with a wavelength of 13.5 nm, defects can be detected with a resolution better than 10 nm. Generally, as an EUV light source device, a DPP (Discharge Produced Plasma) light source device, an LDP (Laser Assisted Discharge Produced Plasma) light source device, and an LPP (Laser Produced Plasma) light source device can be cited. The DPP-type EUV light source device applies a high voltage between electrodes supplied with a plasma raw material (discharge gas) containing an EUV emission species, generates a high-density high-temperature plasma by discharge, and utilizes the extreme ultraviolet light emitted therefrom. The LDP light source device is an improved version of the DPP light source device. For example, a liquid plasma raw material (such as Sn (tin) or Li (lithium), etc.) containing EUV emission species is supplied to the surface of the electrodes (discharge electrodes) for generating discharge. An energy beam (such as an electron beam or a laser beam, etc.) is irradiated onto the raw material to vaporize the raw material, and then, a high-temperature plasma is generated by discharge. On the other hand, the LPP light source device generates a high-temperature plasma by exciting EUV emission species with a laser beam. As a light source device of this type, there is a known device that focuses a laser beam on microdroplets of tin (Sn), lithium (Li), etc., which are ejected in a minute droplet shape as a target material for EUV emission, and excites the target material to generate plasma. Also, as the LPP method, there is also a known device that supplies a liquid high-temperature plasma raw material containing EUV emission species to the surface of a rotating body, and irradiates an energy beam (laser beam) onto the surface of the rotating body to generate plasma. In this way, the method of generating EUV light using plasma can be applied not only to EUV light but also to devices for generating X-rays having a wavelength shorter than EUV light by changing the type of plasma raw material and the excitation energy for generating plasma. However, debris diffuses at high speed from the plasma generated in these light source devices. The debris includes particles of the high-temperature plasma raw material, material particles of the electrodes and the rotating body sputtered along with the generation of plasma, etc. If such debris reaches a radiation utilization device using EUV light or the like, it may damage or contaminate optical elements such as a reflection film provided in the utilization device. As a result, there is a possibility of causing a reduction in the performance of the utilization device. Therefore, a debris reduction device (also referred to as a DMT (Debris Mitigation Tool)) that captures debris between the plasma and the utilization device in such a way that the debris diffusing from the plasma does not enter the utilization device has been proposed. The debris reduction device typically consists of a foil trap. The foil trap is a debris catcher that uses a thin plate-shaped foil to capture debris. For example, a fixed foil trap and a rotating foil trap are described in Patent Document 1. The rotating foil trap captures debris by rotating a plurality of foils radially arranged around a rotation axis and making the debris collide with the foils. The fixed foil trap divides the space by a plurality of foils at a fixed position, raises the pressure of the atmosphere gas in the space, and captures debris by making the debris collide with the atmosphere gas. By using these foil traps, it is possible to capture particles with a small number of structural atoms or atoms in a neutral state and an ionic state from droplets of a micron size, which are also relatively large in size among the debris. [Prior Art Documents] [Patent Documents] [Patent Document 1] Japanese Patent Application Laid-Open No. 2017-219698 [Problems to be Solved by the Invention] Debris that has invaded the foil-type catcher, for example, adheres to the foil and components around the foil, and falls into the storage container and is recovered. However, a part of the debris remains in a state of adhering to the foil or the like. For example, as the operation time becomes longer, the amount of adhered debris increases, and the capture rate of debris caused by the foil-type catcher may deteriorate. Also, in a rotary foil-type catcher, there is a possibility that the weight of the foil increases due to the adhesion of debris and the rotation becomes unstable. Therefore, in the case of using a foil-type catcher, maintenance such as removing debris adhering to the foil or the like and replacing the foil-type catcher is required. As described above, the foil-type catcher is provided between the light source part that generates plasma and the utilization device. Therefore, for removing the foil-type catcher, for example, removal or disassembly of the light source part or the like, adjustment after assembly, etc. are required. As a result, the maintenance of the foil-type catcher takes time. In view of the above circumstances, an object of the present invention is to provide a debris capture unit and a light source device that can improve the maintenance efficiency of the foil-type catcher. [Means for Solving the Problem] To achieve the foregoing object, a debris capture unit according to one aspect of the present technology includes a detachable member and at least one foil-type catcher. The debris capture unit is installed in the opening of the processing chamber body having an exit for radiation from plasma and an opening different from the exit. The detachable member is configured to cover the opening and is detachably attachable to the processing chamber body. The at least one foil-type catcher has a plurality of foils for capturing debris from the plasma, and is connected to the detachable member in such a manner that the plurality of foils are disposed on the path of the radiation from the plasma to the exit in a state where the detachable member is installed on the processing chamber body. In this debris capture unit, a detachable member that covers the opening of the processing chamber body and is detachably attached to the processing chamber body is connected to at least one foil-type catcher having a plurality of foils for capturing debris from the plasma. In a state where the detachable member is installed, the plurality of foils are disposed on the path of the radiation from the plasma to the exit. Also, by removing the detachable member, the foil-type catcher can also be removed together. Thereby, the maintenance efficiency of the foil-type catcher can be improved. The at least one foil-type catcher may include a rotary foil-type catcher having the plurality of foils and a rotating member that radially supports the plurality of foils. In this case, the debris capture unit may further include a shaft portion connected to the rotating member of the rotary foil-type catcher and a rotation driving unit that rotates the shaft portion. The rotation driving unit may be connected to the outside of the detachable member. In this case, the shaft portion may penetrate the detachable member. Also, the rotating member may be connected to the shaft portion inside the detachable member. The aforementioned debris capture unit is further configured as a member different from the aforementioned loading and unloading member, and a reinforcing member for fixing the aforementioned rotary drive unit by the aforementioned loading and unloading member is also acceptable. The aforementioned loading and unloading member may also have a reinforcing portion for reinforcing the rigidity of the portion connecting the aforementioned rotary drive unit. The aforementioned at least one foil type catcher may also include a fixed foil type catcher having the aforementioned plurality of foils and a fixing member for fixing the aforementioned plurality of foils. The aforementioned foil type capture unit may further include a foil type catcher cover connected to the aforementioned loading and unloading member, surrounding the outer peripheral portion of the aforementioned rotary foil type catcher, and collecting the aforementioned debris splashed from the aforementioned rotary foil type catcher. In this case, the aforementioned fixed foil type catcher may also be connected to the aforementioned foil type catcher cover. The aforementioned debris capture unit may further include a gas introduction pipe that penetrates the aforementioned loading and unloading member and introduces a transparent gas that is transparent to the aforementioned radiation into the aforementioned fixed foil type catcher. The aforementioned debris capture unit may further include a condenser lens connected to the aforementioned loading and unloading member and condensing the radiation from the aforementioned plasma. In this case, the aforementioned at least one foil type catcher is disposed between the aforementioned plasma and the aforementioned condenser lens. The aforementioned debris capture unit may further include a position adjustment mechanism for adjusting the position of the aforementioned condenser lens. The aforementioned debris capture unit may further include a vibration isolation mechanism for suppressing the vibration transmitted to the aforementioned processing chamber body and / or the aforementioned condenser lens. The aforementioned debris capture unit may further include at least one of a heat shield member connected to the aforementioned loading and unloading member and disposed between the aforementioned plasma and the aforementioned foil type catcher, or a detection sensor connected to the aforementioned loading and unloading member and detecting the state of the aforementioned plasma. The aforementioned loading and unloading member may also have a guiding mechanism for guiding the installation position with respect to the aforementioned processing chamber body. A light source device according to one aspect of the present invention includes a plasma generation unit, a processing chamber body, and the aforementioned debris capture unit. The aforementioned plasma generation unit plasmatizes a plasma raw material. The aforementioned processing chamber body has an emission port for radiation from the plasma generated by the aforementioned plasma generation unit and an opening different from the aforementioned emission port. [Effects of the Invention] As described above, according to the present invention, the maintenance efficiency of the foil type catcher can be improved. Furthermore, the effects described herein are not necessarily limited, and any effect described in this disclosure is also acceptable. Hereinafter, embodiments of the present invention will be described with reference to the drawings. <First Embodiment> [Structure of Light Source Device] FIG. 1 is a schematic cross-sectional view showing the structure of an EUV light source device including a debris capture unit according to the first embodiment of the present invention. In the present embodiment, as the EUV light source device 100, an extreme ultraviolet light source device of the LDP method will be described as an example. Further, the EUV light source device 100 is connected to a utilization device 110 that uses EUV light and has a function as a light source for the utilization device 110. Furthermore, in the figure, the X-axis, Y-axis, and Z-axis represent three mutually orthogonal axial directions, and the Z-axis corresponds to the vertical direction (gravity direction). Therefore, FIG. 1 is a cross-sectional view when the EUV light source device 100 is cut in the horizontal direction. [Overall Structure] In FIG. 1, the EUV light source device 100 emits extreme ultraviolet light (EUV light). The wavelength of the extreme ultraviolet light is, for example, 13.5 nm. Specifically, the EUV light source device 100 irradiates energy beams such as a laser beam LB on the liquid-phase plasma raw materials SA and SB on the surfaces of a pair of discharge electrodes EA and EB that are respectively supplied to generate discharge, vaporizing the plasma raw materials SA and SB. After that, plasma P is generated by the discharge in the discharge region D between the discharge electrodes EA and EB. EUV light is emitted from the plasma P. The utilization device 110 is, for example, a mask inspection device used for lithography. In this case, a part of the EUV light emitted from the plasma P is taken out from the exit port 16 (light extraction unit) and guided to the mask inspection device. The mask inspection device uses the EUV light emitted from the exit port 16 of the EUV light source device 100 as inspection light to perform blank inspection or pattern inspection of the mask. By using EUV light, a process corresponding to 5 to 7 nm can be achieved. In the present embodiment, the EUV light corresponds to the radiation extracted from the plasma, and the EUV light source device 100 corresponds to the light source device. Further, the mask inspection device is an example of a utilization device that uses radiation from the plasma. The EUV light source device 100 includes a processing chamber body 1, a light source unit 2, a debris capture unit 30, and a debris storage unit (not shown). The light source unit 2 generates EUV light in the processing chamber body 1 according to the LDP method. The debris capture unit 30 is installed in the processing chamber body 1 and is a debris reduction device that captures debris DB that splashes together with the EUV light emitted from the light source unit 2. The debris storage unit stores debris generated in the light source unit 2 and debris captured by the debris capture unit 30. (Processing Chamber Body) The processing chamber body 1 is a vacuum chamber (vacuum processing chamber) that generates plasma P and maintains a reduced-pressure atmosphere for extracting EUV light from the plasma P. The processing chamber body 1 is connected to a utilization device 110 (mask inspection device) that uses EUV light. As shown in FIG. 1, in the present embodiment, the processing chamber body 1 includes a light source processing chamber 11 and a connection processing chamber 15. The light source processing chamber 11 is a decompression container that isolates the plasma P generated inside from the outside. The light source processing chamber 11 forms a plasma generation chamber for accommodating the light source unit 2 that generates the plasma P. The light source processing chamber 11 is a rigid body, such as a metal vacuum housing, and discharges are well generated inside it to heat and excite the plasma raw materials SA and SB. In order to suppress the attenuation of EUV light, a decompression atmosphere below a predetermined pressure is maintained by a vacuum pump (not shown). On the side wall 11a of the light source processing chamber 11, a transparent window 12 for introducing the laser beam LB is provided. Also, on the side wall 11b of the light source processing chamber 11, a through hole 13 communicating with the connection processing chamber 15 is provided. The connection processing chamber 15 is a decompression container that connects the light source processing chamber 11 and the utilization device 110. The connection processing chamber 15 is connected to the side wall 11b of the light source processing chamber 11, and the internal space of the connection processing chamber 15 communicates with the internal space of the light source processing chamber 11 through the through hole 13. The connection processing chamber 15 is a rigid body, such as a metal vacuum housing, and inside it, like the light source processing chamber 11, a decompression atmosphere below a predetermined pressure is maintained to suppress the attenuation of EUV light. The connection processing chamber 15 has an exit port 16 and an opening 17. The exit port 16 is for guiding the EUV light incident from the through hole 13 to the optical window of the utilization device 110, and has the function of a light extraction part for extracting EUV light in the EUV light source device 100. In the example shown in FIG. 1, the exit port 16 is provided on the side wall 15a of the connection processing chamber 15. The opening 17 is a mounting port for mounting the debris capture unit 30, and is provided at a position different from the exit port 16. In FIG. 1, the opening 17 is schematically shown by a dotted-line area. Thus, the processing chamber body 1 (connection processing chamber 15) has an exit port 16 for EUV light from the plasma P and an opening 17 different from the exit port 16. Also, the debris capture unit 30 described later is mounted on the opening 17. Furthermore, in the example shown in FIG. 1, the processing chamber body 1 is constituted by connecting two processing chambers (light source processing chamber 11 and connection processing chamber 15). It is not limited to this. For example, the processing chamber body 1 may be constituted by a vacuum housing using a single member, or may be composed of combining two or more members in such a way that the whole forms one vacuum housing. (Light source unit) The light source unit 2 plasmatizes the plasma raw materials to generate the plasma P that emits EUV light. In the present embodiment, the light source unit 2 corresponds to a plasma generation unit that plasmatizes the plasma raw materials. The light source unit 2 includes a pair of discharge electrodes EA and EB. The discharge electrodes EA and EB are disk-shaped members of the same shape and size. For example, the discharge electrode EA is used as the cathode, and the discharge electrode EB is used as the anode. The discharge electrodes EA and EB are formed of a high melting point metal such as molybdenum (Mo), tungsten (W), or tantalum (Ta). The discharge electrodes EA and EB are arranged at positions separated from each other, and the peripheral portions of the discharge electrodes EA and EB are adjacent to each other. At this time, the discharge region D where the plasma P is generated is located in the gap between the discharge electrodes EA and EB where the peripheral portions of the discharge electrodes EA and EB are closest to each other. Inside the light source processing chamber 11, a container CA for storing the liquid-phase plasma raw material SA and a container CB for storing the liquid-phase plasma raw material SB are arranged. To each of the containers CA and CB, the heated liquid-phase plasma raw materials SA and SB are supplied. The liquid-phase plasma raw materials SA and SB are, for example, tin (Sn), but may also be lithium (Li). The container CA houses the plasma raw material SA in such a manner that the lower part of the discharge electrode EA is immersed in the liquid-phase plasma raw material SA. The container CB houses the plasma raw material SB in such a manner that the lower part of the discharge electrode EB is immersed in the liquid-phase plasma raw material SB. Therefore, the liquid-phase plasma raw materials SA and SB adhere to the lower parts of the discharge electrodes EA and EB. The liquid-phase plasma raw materials SA and SB adhering to the lower parts of the discharge electrodes EA and EB are transported to the discharge region D where the plasma P is generated along with the rotation of the discharge electrodes EA and EB. The discharge electrode EA is connected to the rotating shaft JA of the motor MA and rotates around the axis of the discharge electrode EA. The discharge electrode EB is connected to the rotating shaft JB of the motor MB and rotates around the axis of the discharge electrode EB. The motors MA and MB are arranged outside the light source processing chamber 11, and the rotating shafts JA and JB of the respective motors MA and MB extend from the outside to the inside of the light source processing chamber 11. The gap between the rotating shaft JA and the wall portion of the light source processing chamber 11 is sealed with a sealing member PA, and the gap between the rotating shaft JB and the wall portion of the light source processing chamber 11 is sealed with a sealing member PB. The sealing members PA and PB are, for example, mechanical seals. Each of the sealing members PA and PB supports the rotating shafts JA and JB rotatably while maintaining the reduced-pressure atmosphere inside the light source processing chamber 11. The EUV light source device 100 further includes a control unit 20, a pulsed power supply unit 21, a laser source (energy beam irradiation device) 22, and a movable mirror 23. The control unit 20, the pulsed power supply unit 21, the laser source 22, and the movable mirror 23 are provided outside the light source processing chamber 11. As described later, the control unit 20 controls the operations of the respective parts of the EUV light source device 100. For example, the control unit 20 controls the rotational driving of the motors MA and MB to rotate the discharge electrodes EA and EB at a predetermined rotational speed. Also, the control unit 20 controls the operation of the pulsed power supply unit 21, the irradiation timing of the laser beam LB from the laser source 22, and the like. Two power supply lines QA and QB extending from the pulse power supply unit 21 pass through the seals FA and FB and are respectively connected to the containers CA and CB disposed inside the light source processing chamber 11. The seals FA and FB are sealing members embedded in the wall portion of the light source processing chamber 11 to maintain the reduced-pressure atmosphere inside the light source processing chamber 11. The containers CA and CB are formed of a conductive material, and the plasma raw materials SA and SB accommodated inside the respective containers CA and CB are also conductive materials such as tin. The lower portions of the discharge electrodes EA and EB are respectively immersed in the plasma raw materials SA and SB accommodated inside the respective containers CA and CB. Therefore, when pulse power is supplied from the pulse power supply unit 21 to the containers CA and CB, the pulse power is respectively supplied to the discharge electrodes EA and EB through the plasma raw materials SA and SB. The pulse power supply unit 21 generates a discharge in the discharge region D by supplying pulse power to the discharge electrodes EA and EB. Then, according to the rotation of the respective discharge electrodes EA and EB, the plasma raw materials SA and SB transported to the discharge region D are heated and excited by the current flowing between the discharge electrodes EA and EB during discharge, generating a plasma P that emits EUV light. The laser source 22 irradiates an energy beam onto the plasma raw material SA attached to the discharge electrode EA transported to the discharge region D to vaporize the plasma raw material SA. The laser source 22 is, for example, a Nd:YVO 4 (Neodymium-doped Yttrium Orthovanadate) laser device. At this time, the laser source 22 emits a laser beam LB in the infrared region with a wavelength of 1064 nm. However, as long as the energy beam irradiation device can vaporize the plasma raw material SA, it may be a device that emits an energy beam other than the laser beam LB. The laser beam LB emitted from the laser source 22 is guided to the movable mirror 23 through a condensing means including a condenser lens 24, for example. The condensing means adjusts the spot diameter of the laser beam LB at the laser beam irradiation position of the discharge electrode EA. The condenser lens 24 and the movable mirror 23 are disposed outside the light source processing chamber 11. The laser beam LB condensed by the condenser lens 24 is reflected by the movable mirror 23, passes through the transparent window 12 provided on the side wall 11a of the light source processing chamber 11, and irradiates the peripheral portion of the discharge electrode EA near the discharge region D. By adjusting the posture of the movable mirror 23, the irradiation position of the laser beam LB on the discharge electrode EA is adjusted. Furthermore, the adjustment of the posture of the movable mirror 23 may be manually performed by an operator, or the control unit 20 may perform the posture control of the movable mirror 23 based on the EUV light intensity information from a detection sensor 82 described later. At this time, the movable mirror 23 is driven by a movable mirror driving unit (not shown). In order to facilitate the irradiation of the peripheral portion of the discharge electrode EA near the discharge region D with the laser beam LB, the axes of the discharge electrodes EA and EB are not parallel. The interval between the rotation axes JA and JB is narrow on the side of the motors MA and MB and widens on the side of the discharge electrodes EA and EB. Thereby, while bringing the facing surfaces of the discharge electrodes EA and EB closer to each other, the opposite sides of the facing surfaces of the discharge electrodes EA and EB are retracted from the irradiation path of the laser beam LB, facilitating the irradiation of the peripheral portion of the discharge electrode EA near the discharge region D with the laser beam LB. The discharge electrode EB is disposed between the discharge electrode EA and the movable mirror 23. The laser beam LB reflected by the movable mirror 23 reaches the outer peripheral surface of the discharge electrode EA after passing near the outer peripheral surface of the discharge electrode EB. At this time, the discharge electrode EB is retracted further in the direction of the motor MB (the left side in FIG. 1) than the discharge electrode EA so that the laser beam LB is not blocked by the discharge electrode EB. The liquid-phase plasma raw material SA adhering to the outer peripheral surface of the discharge electrode EA near the discharge region D is vaporized by the irradiation of the laser beam LB, and the gaseous-phase plasma raw material SA is supplied to the discharge region D. In order to generate plasma P in the discharge region D (to plasmaize the gaseous-phase plasma raw material SA), the pulse power supply unit 21 supplies power to the discharge electrodes EA and EB. Then, when the gaseous-phase plasma raw material SA is supplied to the discharge region D by the irradiation of the laser beam LB, a discharge occurs between the discharge electrodes EA and EB in the discharge region D. When a discharge occurs between the discharge electrodes EA and EB, the gaseous-phase plasma material SA in the discharge region D is heated and excited by the current to generate plasma P. The EUV light emitted from the generated plasma P enters the connection processing chamber 15 through the through-hole 13 provided in the side wall 11b of the light source processing chamber 11. [Structure of the debris capture unit] FIG. 2 is a schematic diagram showing a structural example of the debris capture unit according to the first embodiment. FIG. 3 is a schematic diagram showing a state in which the debris capture unit is removed. FIGS. 2 and 3 are cross-sectional views when the EUV light source device 100 shown in FIG. 1 is cut in the vertical direction. Here, the illustration of the light source unit 2 that generates plasma P is omitted. First, referring to FIG. 2, the structure of the connection processing chamber 15 (processing chamber main body 1) in which the debris capture unit 30 is installed will be described. As described above, the EUV light exit port 16 and the opening 17 for installing the debris capture unit 30 are provided in the connection processing chamber 15. The exit port 16 is typically a through-hole and is connected to the entrance port 111 of EUV light provided outside the utilization device 110. In this situation, the internal space of the connection processing chamber 15 communicates with the internal space of the utilization device 110 through the exit port 16. In the example shown in FIG. 2, the exit port 16 is provided below the side wall 15a of the connection processing chamber 15, and EUV light traveling downward and to the right in the figure is extracted from the exit port 16 by the plasma P. Further, a connection flange 18 connecting the exit port 16 and the entrance port 111 of the utilization device 110 is provided. The opening diameters of the exit port 16 and the connection flange 18 are appropriately set according to the beam diameter of the EUV light emitted to the utilization device 110 and the like. Furthermore, a transparent member such as an optical filter that allows EUV light to pass through may be provided at the exit port 16. Also, a valve or a gate for opening and closing the path from the connection processing chamber 15 to the utilization device 110 may be provided. With such a structure, the decompression atmosphere on the EUV light source device 100 side and the decompression atmosphere on the utilization device 110 side can be independently operated. Thereby, for example, while maintaining the decompression atmosphere inside the utilization device 110, the connection processing chamber 15 can be opened to the atmosphere, making maintenance easier. The opening 17 is provided in the connection processing chamber 15 in such a manner that the contents of the debris capture unit 30 can be inserted and removed. As shown in FIG. 2, in the present embodiment, the opening 17 is provided from above the connection processing chamber 15 across the side wall 15a where the exit port 16 is provided. The shape, size, position, etc. of the opening 17 are not limited and may be appropriately set according to the optical path of the EUV light, the structure of the light source unit 2, the debris capture unit 30, and the like. The debris capture unit 30 is installed at the opening 17 of the connection processing chamber 15 (processing chamber main body 1) and captures the debris DB diffused from the plasma P. That is, the debris capture unit 30 is a debris reduction device DMT used in the processing chamber main body 1. The debris capture unit 30 includes a detachable member 31, a foil-type catcher FT, a rotating shaft 32, and a rotation driving unit 33. (Detachable member) The detachable member 31 is a member configured to cover the opening 17 and be detachably attached to the connection processing chamber 15 (processing chamber main body 1). That is, the detachable member 31 functions as a lid for closing the opening 17 and also functions as an outer wall of the vacuum enclosure formed by the connection processing chamber 15. In the following description, the side inside the processing chamber facing the detachable member 31 is referred to as the inside of the detachable member 31, and the opposite side is referred to as the outside of the detachable member 31. The loading and unloading member 31 is a structural member made of metal, and is configured to support the foil-type catcher FT, the rotating shaft 32, and the rotation driving unit 33 while maintaining the reduced-pressure atmosphere inside the connection processing chamber 15. As the material constituting the loading and unloading member 31, aluminum or the like is used. Further, at the portion where the loading and unloading member 31 contacts the connection processing chamber 15, a seal member (not shown) is provided to avoid leakage in order to maintain the reduced-pressure atmosphere. In the example shown in FIG. 2, the loading and unloading member 31 having an L-shaped cross-sectional shape is installed so as to cover the opening 17 provided from above to the side of the connection processing chamber 15. The loading and unloading member 31 is typically fixed to the connection processing chamber 15 by screwing. The specific shape of the loading and unloading member 31 is not limited. For example, when the entire connection processing chamber 15 shown in FIG. 2 has a cylindrical shape with a bottom, the loading and unloading member 31 has a shape that cuts a part including the side surface and the bottom surface of the cylinder. Further, when the entire connection processing chamber 15 has a rectangular parallelepiped shape, the loading and unloading member 31 has an L-shaped shape that cuts the rectangular parallelepiped so as to include two orthogonal surfaces. Further, when the opening 17 is provided on a plane, the loading and unloading member 31 becomes a flat plate member that closes the opening 17. Further, the loading and unloading member 31 has a guiding mechanism 34 for guiding the installation position with respect to the connection processing chamber 15 (processing chamber main body 1). In the example shown in FIG. 2, as the guiding mechanism 34, a guide pin 34a and a guide hole 34b configured to be fitted to each other are used. For example, the guide pin 34a is provided at a position where it contacts the loading and unloading member 31 on the outside of the connection processing chamber 15. Then, on the inside of the loading and unloading member 31, a guide hole 34b into which each guide pin 34a is inserted is provided. Furthermore, the specific structure of the guiding mechanism 34 is not limited, and for example, a gap and a rib formed to be fitted to each other may be used. By providing the guiding mechanism 34, the loading and unloading member 31 can be accurately installed at a predetermined installation position. Further, almost no adjustment of the installation position is required when installing the loading and unloading member 31. Therefore, it is possible to avoid a situation where, for example, the seal member is damaged due to misalignment of the loading and unloading member 31 for alignment. Furthermore, the guiding mechanism 34 does not necessarily need to be provided. Further, a through hole 35 is provided in the loading and unloading member 31. The through hole 35 is a hole for passing the rotating shaft 32. In addition, on the outside of the loading and unloading member 31, a handle or the like for supporting the entire debris capturing unit 30 may be provided. (Foil-type catcher) The EUV light and debris DB diffuse at high speed in all directions together from the plasma P generated in the light source unit 2. The debris DB includes the plasma raw materials SA and SB, i.e., tin particles, and the material particles of the discharge electrodes EA and EB sputtered along with the generation of the plasma P. These debris DB pass through the contraction and expansion processes of the plasma P and acquire a large amount of kinetic energy. That is, the debris DB generated from the plasma P includes ions, neutral particles, and electrons moving at high speed. If such debris DB reaches the utilization device 110, it may damage or contaminate the reflective film of the optical element in the utilization device 110, resulting in a situation of reduced performance. Therefore, in the debris capture unit 30, in order not to let the debris DB invade the utilization device 110, a foil-type catcher FT is provided. The foil-type catcher FT is arranged inside the connection processing chamber 15 (processing chamber body 1), and uses a plurality of foils F to capture the debris DB from the plasma P. By using the foil-type catcher FT, for example, it is possible to capture debris from larger debris of mm size to smaller debris of atomic size. In this embodiment, the part composed of a plurality of foils F that captures the debris DB is referred to as the foil-type catcher FT. The foil-type catcher FT is connected to the loading and unloading member 31 in such a way that a plurality of foils F are arranged on the path of the EUV light from the plasma P to the exit port 16 in a state where the loading and unloading member 31 is installed in the connection processing chamber 15 (processing chamber body 1). Here, the path of the EUV light from the plasma P to the exit port 16 is the path through which the EUV light emitted from the exit port 16 passes. In the example shown in FIG. 2, a linear path directly connecting the plasma P and the exit port 16 is formed. A plurality of foils F are arranged on this path. Furthermore, the plurality of foils F are not limited to being arranged on the straight line connecting the plasma P and the exit port 16. For example, there is a situation where a mirror or the like for changing the emission direction of the EUV light is provided in the connection processing chamber 15. In this situation, a plurality of foils F are arranged on the path of the EUV light between the plasma P and the mirror to capture the debris DB heading towards the mirror. Also, the fact that the foil-type catcher FT is connected to the loading and unloading member 31 means that the foil-type catcher FT composed of a plurality of foils F is directly or indirectly connected to the loading and unloading member 31. Typically, the foil-type catcher FT is indirectly connected to the loading and unloading member 31隔着 one or more members, but there can also be a structure in which the foil-type catcher FT is directly connected to the loading and unloading member 31. By connecting the foil-type catcher FT and the loading and unloading member 31 to each other, the foil-type catcher FT can also be loaded and unloaded together with the loading and unloading member 31. As the foil type trap FT, a rotating foil type trap in which a plurality of foils F are added to actively collide with debris, and a fixed foil type trap in which the positions of the plurality of foils F are fixed can be cited. The rotating foil type trap is also called an RFT (Rotating Foil Trap). Also, the fixed foil type trap is also called an SFT (Static Foil Trap). In FIG. 2, as an example of the debris capture unit 30, a case where only the rotating foil type trap 36 is mounted will be described. Furthermore, a debris capture unit (refer to FIG. 7 etc.) that mounts both the rotating foil type trap 36 and the fixed foil type trap, or a debris capture unit that mounts only the fixed foil type trap is also possible. (Rotating Foil Trap) FIG. 4 is a schematic cross-sectional view showing a structural example of the rotating foil type trap 36. FIG. 5 is a schematic front view showing a structural example of the rotating foil type trap 36. As shown in FIGS. 4 and 5, the rotating foil type trap 36 has a plurality of foils (blades) F, a central pillar 37, and an outer ring 38. The plurality of foils F are thin films or thin plates. The central pillar 37 is a member that radially supports the plurality of foils F. The outer ring 38 is arranged concentrically with the central pillar 37 and is connected to the front ends of the respective foils F that radially extend from the central pillar 37. In the present embodiment, the central pillar 37 corresponds to the rotating member. The respective foils F are radially arranged around the central pillar 37 at almost equal angular intervals. At this time, the respective foils F are located on a plane including the central axis C0 of the central pillar 37. The material of the rotating foil type trap 36 is, for example, a high melting point metal such as tungsten (W) or molybdenum (Mo). As shown in FIG. 5, the plurality of foils F of the rotating foil type trap 36 are arranged parallel to the light direction of the EUV light so as not to block the EUV light traveling from the plasma P (light emission point) toward the exit port 16. That is, the rotating foil type trap 36 in which the respective foils F are arranged on a plane including the central axis C0 of the central pillar 37 is arranged such that the plasma P (light emission point) exists on the extension line of the central axis C0 of the central pillar 37 (refer to FIG. 2). Thereby, except for the central pillar 37 and the outer ring 38, the EUV light is only blocked by the thickness of the respective foils F, and the ratio (also called the transmittance) of the EUV light passing through the rotating foil type trap 36 can be maximized. (Rotating shaft) Referring back to Fig. 2, the rotating shaft 32 is a long member on the cylinder and is connected to the central support 37 of the rotary foil type debris catcher 36. In this embodiment, the rotating shaft 32 corresponds to the shaft portion. In this embodiment, the rotating shaft 32 is arranged in such a way as to pass through the through hole 35 of the loading and unloading member 31. At the end of the rotating shaft 32 arranged inside the loading and unloading member 31, the central support 37 of the rotary foil type debris catcher 36 is connected. Specifically, the rotating shaft 32 and the central support 37 are connected in such a way that the central axis of the rotating shaft 32 coincides with the central axis C0 of the central support 37. Also, at the end of the rotating shaft 32 arranged inside the loading and unloading member 31 (the end on the side opposite to the side where the rotary foil type debris catcher 36 is connected), the rotary drive unit 33 is connected. Also, the debris catching unit 30 has a structure that supports the rotating shaft 32 through the mechanical seal 39. As shown in Fig. 2, the through hole 35 provided in the loading and unloading member 31 is designed to be larger than the diameter of the rotating shaft 32. The gap between the rotating shaft 32 and the through hole 35 is sealed by the mechanical seal 39. The mechanical seal 39 supports the rotating shaft 32 of the motor 40 rotatably while maintaining the reduced pressure atmosphere in the connection processing chamber 15. (Rotary drive unit) The rotary drive unit 33 is a drive mechanism that rotates the rotating shaft 32 and has the function of a control unit for controlling the rotation of the rotary foil type debris catcher 36. For example, the rotation speed of the rotary foil type debris catcher 36 is appropriately controlled by the rotary drive unit 33. Also, the rotary drive unit 33 is fixed to the outside of the loading and unloading member 31 by a fixing member (not shown) in such a way that it does not rotate with respect to the loading and unloading member 31. The rotary drive unit 33 has a motor 40 and a cooling mechanism (not shown). The motor 40 is connected to the rotating shaft 32 and rotates the rotating shaft 32 around its central axis. Therefore, the rotating shaft 32 of the motor 40 can be used as the rotating shaft of the rotary foil type debris catcher 36. As the motor 40, for example, an electric motor in which the rotating shaft 32 is directly connected to the rotor is used, but a speed change mechanism such as a gear may be provided between the rotor and the rotating shaft 32. The rotary foil type debris catcher 36 is driven by the motor 40 to rotate. Thereby, the rotating plurality of foil pieces F collide with the debris DB coming from the plasma P to catch the debris DB. Thereby, it is possible to prevent the debris DB from the plasma P from invading the utilization device 110. The cooling mechanism cools the rotary foil type trap, the rotary shaft 32, and the motor 40. In the present embodiment, a cooling mechanism using a refrigerant such as cooling water supplied from the water cooling pipe 41 is provided. Outside the rotary drive unit 33, a water inlet 42 for supplying cooling water from the water cooling pipe 41 and a water outlet 43 for returning the cooling water to the water cooling pipe 41 are provided. The water inlet 42 and the water outlet 43 are connected to the cooling mechanism. Also, the connection between the water cooling pipe 41 and the water inlet 42 (water outlet 43) uses a joint or the like. Thereby, it is easy to remove the water cooling pipe 41. For example, the rotary foil type trap 36 becomes high temperature due to the radiation from the plasma P. Therefore, in order to prevent overheating of the rotary foil type trap 36, a cooling mechanism for cooling the rotary shaft 32 is provided. As such a cooling mechanism, for example, the rotary shaft 32 is made hollow to form a circulation path for a refrigerant such as cooling water. By circulating the cooling water supplied from the water cooling pipe 41 through this circulation path, the rotary shaft 32 and the rotary foil type trap 36 connected thereto can be cooled. Also, since the motor 40 itself generates heat during rotation, it is also possible to remove heat by winding a pipe through which cooling water flows around the motor 40. Thus, in the debris capture unit 30 of the present embodiment, the motor 40 is connected to the outside of the detachable member 31, the rotary shaft 32 penetrates the detachable member 31, and the central support 37 (rotary member) of the rotary foil type trap is connected to the rotary shaft 32 inside the detachable member 31. With such a structure, it is not necessary to dispose the rotary drive unit 33 in the processing chamber, and the connection processing chamber 15 can be made smaller. Also, the path of the EUV light from the plasma P to the emission port 16 can be shortened, so the expansion of the beam diameter of the EUV light can be suppressed. As a result, the optical system provided in the utilization device 110 can be simply configured. FIG. 3 schematically shows a state in which the debris capture unit 30 is removed from the connection processing chamber 15 (processing chamber main body 1). In the case of removing the debris capture unit 30, after stopping the operation of the EUV light source device 100, the inside of the connection processing chamber 15 returns to atmospheric pressure. After that, screws or the like fixing the detachable member 31 are removed, and the detachable member 31 is removed from the connection processing chamber 15. At this time, the rotary foil type trap 36 is also removed together with the detachable member 31. Thus, the debris capture unit 30 is structured by unitizing the foil type trap FT and the detachable member 31 which is the lid of the processing chamber main body 1, i.e., the connection processing chamber 15, so that it can be removed from the side of the vacuum housing. Thereby, for example, it is possible to easily remove the foil type trap FT disposed in the connection processing chamber 15 without removing the components (discharge electrodes EA and EB, containers CA and CB, etc.) constituting the light source unit 2. Also, since it is not necessary to disassemble the light source unit 2, it is not necessary to adjust the optical axis of the EUV light or the like. As a result, the maintenance operation time can be sufficiently shortened, and the operation rate of the EUV light source device 100 can be improved. [Example of Structure of Connection between Reinforcing Detachable Member and Rotary Driving Unit] FIG. 6 is a schematic diagram showing another structural example of the debris capturing unit. The debris capturing unit 50 shown in FIG. 6 includes a detachable member 51, a rotary foil-type catcher 56, a rotary shaft 52, a rotary driving unit 53, and a reinforcing member 54. The structure of the connection part between the detachable member and the rotary driving unit of the debris capturing unit 50 is different from that of the debris capturing unit 30 shown in FIGS. 2 and 3. Furthermore, in FIG. 6, the guiding mechanism is omitted. The detachable member 51 has a reinforcing part 55 that reinforces the rigidity of the part connecting to the rotary driving unit 53. The reinforcing part 55 is a structural part that reinforces the rigidity of the detachable member 51 itself and is provided at the part connecting to the rotary driving unit 53. That is to say, the reinforcing part 55 can also be said to be a structure that suppresses the deformation of the part bearing the load of the rotary driving unit 53. In FIG. 6, as the reinforcing part 55, a thickness structure that increases the thickness of the detachable member 51 is provided. Here, the central axis C0 of the rotary foil-type catcher 56 (rotary shaft 52) is set to be inclined with respect to the horizontal plane. At this time, the rotary driving unit 53 is also arranged to be inclined with respect to the horizontal plane. In such a situation, the outer surface (connection surface 51a) of the detachable member 51 connecting to the rotary driving unit 53 is formed as an inclined surface orthogonal to the central axis C0. Thus, by making the connection surface 51a inclined, as shown in FIG. 6, a reinforcing part 55 with a thicker thickness is formed between the inner surface of the detachable member 51 and the connection surface 51a. Furthermore, the structure of the reinforcing part 55 is not limited. For example, as the reinforcing part 55, a rib structure may be provided on the inner surface of the detachable member 51. By providing the reinforcing part 55 directly below the connection surface 51a, it is possible to avoid the situation where the detachable member 51 is deformed due to the load applied to the connection surface 51a from the rotary driving unit 53. Also, the rotary driving unit 53 can be stably fixed. The reinforcing member 54 is formed as a member different from the detachable member 51 and is a member that fixes the rotary driving unit 53 to the detachable member 51. The reinforcing member 54 is a metal structural member and is made of a material with a higher rigidity than the detachable member 51, for example. When the detachable member 51 is made of aluminum, for example, a stainless-steel reinforcing member 54 is used. Furthermore, the reinforcing member 54 and the detachable member 51 may be of the same material. At the rear part of the rotary shaft 52 of the rotary foil-type catcher 56, the rotary driving unit 53 that controls its rotation is connected. Inside the rotary driving unit 53, a cooling mechanism for circulating cooling water is provided to cool the heat of the rotary shaft 52 and the rotary foil-type catcher 56, etc. Therefore, in the rotary driving unit 53, the housing accommodating the cooling mechanism is larger in diameter than the rotary shaft 52. Therefore, the housing for fixing the rotary driving unit 53 can stably fix the rotary driving unit 53 compared to the structure that bears the rotary shaft 52 through mechanical sealing as shown in FIG. 2. The reinforcing member 54 is disposed between the connection surface 51a of the loading and unloading member 51 and the rotation drive unit 53, and has a function as a pedestal for receiving the rotation drive unit 53. A through hole 57 for the rotation shaft 52 and a recess 58 capable of fitting the housing of the rotation drive unit 53 are formed in the reinforcing member 54. The reinforcing member 54 faces the recess 58 outward and is fixed to the connection surface 51a of the loading and unloading member 51 by screwing or the like. Further, the rotation drive unit 53 is fixed to the reinforcing member 54 by screwing or the like in a state where it is fitted into the recess 58 of the reinforcing member 54. Thus, in FIG. 6, a reinforcing member 54 fixed to the loading and unloading member 51 that can be removed from the connection processing chamber 15 is provided, and the rotation drive unit 53 that fixedly supports the rotation shaft 52 is fixed in such a manner as to be disposed on the reinforcing member 54. Thus, in FIG. 6, the connection between the loading and unloading member 51 and the rotation drive unit 53 is reinforced by using the reinforcing portion 55 provided on the loading and unloading member 51 and the reinforcing member 54 formed differently from the loading and unloading member 51. Furthermore, the structure for reinforcing the connection between the loading and unloading member 51 and the rotation drive unit 53 is not limited. For example, only one of the reinforcing portion 55 of the loading and unloading member 51 and the reinforcing member 54 may be provided. For example, the reinforcing member 54 may not be provided. In this case, a reinforcing portion 55 (such as a thickness structure) having an inclined connection surface 51a is provided on the loading and unloading member 51, and the rotation drive unit 53 is directly fixed to the connection surface 51a. Furthermore, a recess or the like for receiving the rotation drive unit 53 may be formed in the connection surface 51a. Also, for example, the reinforcing portion 55 (such as a thickness structure) of the loading and unloading member 51 may not be provided. In this case, the loading and unloading member 51 is configured like the loading and unloading member 31 shown in FIG. 2, and the connection surface 51a is a plane along the vertical direction. The reinforcing member 54 is configured to support the rotation drive unit 53 in a state where it is inclined with respect to the connection surface 51a along the vertical direction. For example, a rotary foil type trap 56 having a relatively large diameter and width is mounted on the debris capture unit 50. In FIG. 6, a schematic illustration of a rotary foil type trap 56 having a diameter larger than that of the rotary foil type trap 56 shown in FIG. 2 is shown. When the size of the rotary foil type trap 56 is large, the rotation drive unit 53 may become large. Also, because the size of the rotary foil type trap 56 is large, there is a possibility that the vibration during rotation and the deviation of the device may increase. In contrast, in FIG. 6, a reinforcing member 54 for suppressing the vibration of the housing of the rotational driving unit 53 is provided on a reinforcing portion 55 that reinforces the rigidity of the loading and unloading member 51. Thereby, a portion (the housing of the rotational driving unit 53) that houses a cooling mechanism or the like for stably operating the rotary foil type trap 56 can be mechanically and stably fixed. As a result, even when using a large-sized rotary foil type trap 56, vibration and device displacement can be suppressed and stable operation can be achieved. Furthermore, the structure described with reference to FIG. 6 is also effective for a case where a relatively small-sized rotary foil type trap is used. [Structural Example Including a Fixed Foil Type Trap] FIG. 7 is a schematic diagram showing another structural example of the debris trap unit. In the debris trap unit 60, a fixed foil type trap is provided in addition to the rotary foil type trap. The debris trap unit 60 shown in FIG. 7 includes a loading and unloading member 61, a rotary foil type trap 66, a rotary shaft 62, a rotational driving unit 63, a reinforcing member 64, a fixed foil type trap 67, and a gas introduction pipe 69. The loading and unloading member 61, the rotary shaft 62, the rotational driving unit 63, and the reinforcing member 64 are configured in the same manner as the loading and unloading member 51, the rotary shaft 52, the rotational driving unit 53, and the reinforcing member 54 shown in FIG. 6. Also, as the rotary foil type trap 66, the rotary foil type trap 36 shown in FIG. 2 can be used, but a relatively large-sized rotary foil type trap 56 shown in FIG. 6 can also be used. The fixed foil type trap 67 is a foil type trap FT in which a plurality of foils F are fixed. The fixed foil type trap 67 is provided between the rotary foil type trap 66 and the exit 16 on the path of the EUV light that travels from the plasma P to the exit 16 of the connection processing chamber 15 (the processing chamber main body 1). That is, the fixed foil type trap 67 is disposed on the downstream side of the rotary foil type trap 66 and captures debris DB that has passed through the rotary foil type trap 66. Also, the fixed foil type trap 67 is arranged with reference to the central path through which the light beam (EUV extraction light) of the EUV light extracted from the exit 16 passes. The central path is, for example, a path connecting the light emission point of the plasma P and the center point of the exit 16. The fixed foil type trap 67 is connected to the loading and unloading member 61 through a holding portion (not shown) so as to intersect the central path in a state where the loading and unloading member 61 is attached to the connection processing chamber 15. The specific structure of the holding portion will be described in detail later. The gas introduction pipe 69 penetrates through the loading and unloading member 61, and introduces a transparent gas that is transparent to EUV light into the fixed foil-type trap 67. One end of the gas introduction pipe 69 is arranged to protrude from the outside of the loading and unloading member 61 and is used as a gas inlet. Also, the other end of the gas introduction pipe 69 is connected to the fixed foil-type trap 67. The transparent gas supplied to the fixed foil-type trap 67 is preferably a gas with a high transmittance to EUV light. For example, noble gases such as helium (He) and argon (Ar) or hydrogen (H 2 ) etc. are used. FIG. 8 is a schematic cross-sectional view showing an example of the structure of the fixed foil-type trap. FIG. 9 is a schematic front view showing an example of the structure of the fixed foil-type trap. FIG. 8 is a view of the fixed foil-type trap 67 cut along the central path of the EUV light. Also, FIG. 9 is a view of the fixed foil-type trap 67 observed from the direction of the central path of the EUV light. As shown in FIGS. 8 and 9, the fixed foil-type trap 67 includes a plurality of foils F and a fixed frame 68 that supports the plurality of foils F. In this embodiment, the fixed frame 68 corresponds to a fixing member. As shown in FIG. 9, when observed from the direction of the central path of the EUV light, the plurality of foils F are arranged at equal intervals. Also, the fixed frame 68 is, for example, rectangular when observed from the front. Furthermore, the outer shape of the fixed frame 68 can be any shape. Further, as shown in FIG. 8, in the cross-section cut along the central path, the plurality of foils F are arranged radially so as to extend in the direction of the light rays of the EUV light. The plurality of foils F of the fixed foil-type trap 67 finely divide the space where the fixed foil-type trap 67 is arranged, and play a role of reducing the conductance of this part and locally increasing the pressure. Also, a transparent gas is supplied to the fixed foil-type trap 67 through the gas introduction pipe 69. Thereby, the pressure of the fixed foil-type trap 67 can be increased. In other words, in the connection processing chamber 15, a gas is locally present in the fixed foil-type trap 67, and a portion with a relatively high pressure is set. The high-speed debris DB that cannot be captured by the rotary foil-type trap 66 has its speed reduced because the probability of collision with the gas increases in the region where the pressure of the fixed foil-type trap 67 is increased. Also, due to the collision with the gas, the traveling direction of the debris DB also changes. The fixed foil-type trap 67 thus captures the debris DB whose speed has been reduced and whose traveling direction has changed by the foil F or the fixed frame 68. In this way, by providing the rotary foil type catcher 66 and the fixed foil type catcher 67, the debris DB can be sufficiently captured. Also, in the debris capture unit 60, both the rotary foil type catcher 66 and the fixed foil type catcher 67 are connected to the detachable member 61. Thereby, by removing the detachable member 61, the rotary foil type catcher 66 and the fixed foil type catcher 67 can also be removed. With such a structure, for example, by replacing with a new debris capture unit 60 prepared in advance, it is possible to shorten the maintenance time. [Foil Type Catcher Cover] FIG. 10 is a schematic diagram showing a structural example of a debris capture unit including a foil type catcher cover. The debris capture unit 70 shown in FIG. 10 has a structure in which a foil type catcher cover 71 is provided in the debris capture unit 60 shown in FIG. 7. Furthermore, in FIG. 7, the rotation drive unit and the utilization device are omitted. The foil type catcher cover 71 surrounds the outer peripheral portion of the rotary foil type catcher 66 and captures the debris DB splashed from the rotary foil type catcher 66. By providing the foil type catcher cover 71, it is possible to prevent the debris DB captured by the rotary foil type catcher 66 from splashing into the interior of the connection process chamber 15. The foil type catcher cover 71 is provided with an incident side opening KI and an exit side opening KO. The incident side opening KI is provided at a position where the EUV light incident on the rotary foil type catcher 66 is not blocked. The exit side opening KO is provided at a position where the EUV light incident on the fixed foil type catcher 67 after passing through the incident side opening KI and the rotary foil type catcher 66 is not blocked. At least a part of the debris DB captured by the rotary foil type catcher 66 moves in the radial direction by centrifugal force on the foil F of the rotary foil type catcher 66, detaches from the end of the foil F, and adheres to the inner surface of the foil type catcher cover 71. The foil type catcher cover 71 is heated by radiation accompanying the emission of EUV light by a heating means (cover heating unit) (not shown). By this heating, the debris DB adhering to the inner surface of the foil type catcher cover 71 does not solidify but remains in a liquid phase state. The debris DB adhering to the inner surface of the foil type catcher cover 71 gathers at the lower part of the foil type catcher cover 71 due to gravity and is discharged out of the foil type catcher cover 71 through the discharge pipe 72 to become waste raw material. The debris DB that has become waste raw material is accommodated in a debris accommodation portion (not shown). As shown in FIG. 10, in the debris capture unit 70, the foil-type capture cover 71 is connected to the loading and unloading member 61. That is, the foil-type capture cover 71 and the loading and unloading member 61 are unitized. For example, a cylindrical protrusion 73 is formed on the rear side of the foil-type capture cover 71 so as to surround the rotation shaft 62, and the front end of the protrusion 73 is connected to the loading and unloading member 61. Of course, in addition to the protrusion 73, a portion connecting the foil-type capture cover 71 and the loading and unloading member 61 may be provided. Thereby, the foil-type capture cover 71 can also be removed together with the loading and unloading member 61. Also, in the example shown in FIG. 10, the fixed foil-type capture device 67 is connected to the foil-type capture cover 71. Specifically, the fixed foil-type capture device 67 is fixed to the rear side of the foil-type capture cover 71 so as to cover the exit-side opening KO of the foil-type capture cover 71. Thereby, by using the foil-type capture cover 71, it is possible to easily unitize the fixed foil-type capture device 67. Also, it becomes unnecessary to provide a dedicated holding portion for fixing the fixed foil-type capture device 67, etc., so the device cost can be suppressed. [Heat shield member, detection sensor] FIG. 11 is a schematic diagram showing a structural example of a debris capture unit including a heat shield plate. The debris capture unit 80 shown in FIG. 11 has a structure in which a heat shield member 81 and a detection sensor 82 are provided in the debris capture unit 70 shown in FIG. 10. The heat shield member 81 is connected to the loading and unloading member 61 and is disposed between the plasma P and the rotary foil-type capture device FT. Also, in the example shown in FIG. 11, the heat shield member 81 is disposed between the plasma P and the rotary foil-type capture device FT. Since the heat shield member 81 is disposed near the plasma P, it is made of a high melting point material such as molybdenum or tungsten, for example. By providing the heat shield member 81, the radiation from the plasma P to the rotary foil-type capture device 66 can be reduced, and overheating of the rotary foil-type capture device 66 can be prevented. The heat shield member 81 is a plate-shaped member configured to cover the entire rotary foil-type capture device FT. Also, openings KA and KB are provided in the heat shield member 81 to allow EUV light from the plasma P to pass through. The opening KA is an opening for extracting EUV light emitted from the exit port 16 toward the utilization device 110. The opening KA is provided at a position eccentric from the rotation axis (central axis C0) of the rotary foil-type capture device 66. At this time, a part of the EUV light emitted from the plasma P passes through the opening KA and has an inclination angle with respect to the rotation axis of the rotary foil-type capture device 66, and is extracted from the heat shield member 81 at a predetermined solid angle. The rotary foil-type capture device 66 and the fixed foil-type capture device 67 are arranged such that the foil F is on the central path of the light beam (EUV extraction light) of the EUV light passing through the opening KA of the heat shield member 81. The opening KB is an opening for extracting EUV light that is emitted toward the detection sensor 82 described later. The opening KB is provided on a straight line from the light emission point of the plasma P toward the detection sensor 82. In FIG. 11, a rotary foil trap 66 and a foil trap cover 71 are arranged between the plasma P and the detection sensor 82. Further, an emission-side opening KO' through which the EUV light extracted through the opening KB passes is provided in the foil trap cover 71. In FIG. 11, the upper end side of the heat shield member 81 is bent and fixed to the surface inside the detachable member 61. That is, the heat shield member 81 and the detachable member 61 are unitized. Thereby, the heat shield member 81 can also be removed together with the detachable member 61, and cleaning and replacement of the heat shield member 81 can be easily achieved. The detection sensor 82 is a sensor that is connected to the detachable member 61 and detects the state of the plasma P. In the present embodiment, a through hole 83 for connecting the detection sensor 82 is provided in the detachable member 61. The detection sensor 82 is connected to the outside of the detachable member 61 so as to block the through hole 83. The EUV light passing through the opening KB of the heat shield member 81, the rotary foil trap 66, the emission-side opening KO' of the foil trap cover 71, and the through hole 83 of the detachable member 61 is incident on the detection sensor 82. Further, the through hole 83 may not be provided, and the detection sensor 82 may be connected to the inside of the detachable member 61. As the detection sensor 82, for example, a light sensor that detects EUV light or the like is used. In this case, the intensity of the EUV light (the light emission intensity of the plasma P) can be detected by the detection sensor 82. Also, for example, as the detection sensor 82, a camera sensor that captures the state of the plasma P or the like may be used. In this case, the light emission state of the plasma P can be observed by the detection sensor 82. In addition, the type of the detection sensor 82 is not limited, and any sensor that can detect the state (temperature, color, size, etc.) of the plasma P can be used. Thus, in FIG. 11, the detection sensor 82 is connected to the detachable member 61. That is, the detection sensor 82 and the detachable member 61 are unitized. Thereby, the detection sensor 82 can be removed together with the detachable member 61, and cleaning and replacement of the detection sensor 82 can be easily achieved. As described above, in the debris capture units 30, 50, 60, 70, and 80 of the present embodiment, at least one foil trap FT that covers the opening 17 of the process chamber main body 1 that is connected to the process chamber 15 and is detachably attached to the detachable member that is connected to the process chamber 15 and has a plurality of foils F that capture debris from the plasma P is connected. In a state where the detachable member is installed, a plurality of foils F are arranged on the path of the radiation from the plasma P to the emission port. Also, by removing the detachable member, the foil trap FT can also be removed together. Thereby, the maintenance time of the foil trap FT can be shortened, and the maintenance efficiency can be improved. Generally, in a light source device that emits EUV light, a utilization device that utilizes the EUV light is connected. In the utilization device, a complex optical system for adjusting the EUV light emitted from the light source device is provided, and its optical axis is adjusted starting from the light emission point of the plasma P. Also, the utilization device is mostly a larger device than the light source device, and it may also be connected to other devices. Thus, since the light source device is located at the end as a system, maintenance of the debris catcher requires temporarily disassembling the light source device. Also, in the disassembly of the light source device, it is necessary to sequentially remove components such as the lid of the processing chamber, the rotating electrode, the raw material container, and the board (heat shield, etc.) at the boundary of the debris catcher from the end. After that, finally, the removal of the debris catcher can be carried out. Therefore, in the case of performing maintenance of the debris catcher, it requires a considerable amount of labor and time to reach the debris catcher itself. Also, as described above, the optical system of the utilization device is adjusted with respect to the optical axis starting from the light emission point of the plasma P. On the other hand, in maintenance such as disassembling the light source device, the light emission point and the rotating electrode are removed. Therefore, after finishing the maintenance of the debris catcher and assembling the light source device here, further adjustment of aligning the optical axis is required. As a result, the downtime of the light source device and the utilization device becomes longer, and there is a risk of reducing the utilization efficiency of the device. The debris capture unit of this embodiment connects the foil-type catcher FT to the attachment / detachment member installed in the processing chamber body 1, that is, the opening 17 connecting to the processing chamber 15. That is, a lid (attachment / detachment member) is provided in a part of the container (connecting to the processing chamber 15) that houses the foil-type catcher FT, and the lid and the foil-type catcher FT are unitized. With this structure, in the case of removing the foil-type catcher FT, it is only necessary to remove the attachment / detachment member from the connecting processing chamber 15, and it is not necessary to disassemble the light source unit 2, etc. Thereby, the installation and removal of the foil-type catcher FT can be easily performed. Also, the time required for maintaining the foil-type catcher FT can be significantly shortened. Also, in this embodiment, the member unitized with the debris capture unit does not include an optical element that changes the optical path of the EUV light. Thereby, maintenance can be performed while substantially maintaining the state of the optical axis of the optical system from the light emission point (light generation part) of the plasma P to the utilization device 110. Thereby, for example, it becomes unnecessary to perform a large-scale optical axis adjustment required when removing the discharge electrode, and the optical axis can be adjusted relatively easily. As a result, the downtime of the light source device and the utilization device becomes shorter, and the utilization efficiency of the device can be improved. Also, in the debris capture unit, the rotary foil-type catcher, the fixed foil-type catcher, the foil-type catcher cover, the heat shield member, and the detection sensor can be unitized integrally. Thereby, it becomes possible to maintain the plural members that are unitized simultaneously, and the labor for maintenance can be saved. Thereby, various components provided in the connecting processing chamber 15 can be efficiently maintained. <Second Embodiment> The EUV light source device according to the second embodiment of the present invention will be described. In the following description, parts having the same structure and function as those of the EUV light source device 100 described in the foregoing embodiment will be omitted or simplified in their description. FIG. 12 is a schematic cross-sectional view showing a structural example of an EUV light source device including a debris capture unit according to the second embodiment. The EUV light source device 200 includes a processing chamber body 201, a light source unit 202, and a debris capture unit 230. In the present embodiment, a structure in which the condenser lens 250 for condensing EUV light is unitized in the debris capture unit 230 will be described. The processing chamber body 201 has an EUV light exit port 90, a first opening 91, a second opening 92, and a vacuum exhaust port 93. The processing chamber body 201 shown in FIG. 12 has a structure in which a conical frame is connected to one end of a cylindrical frame. The exit port 90 is provided at the front end of the conical frame. Further, the first opening 91 is provided at the end of the cylindrical frame on the side opposite to the exit port 90. Further, the second opening 92 and the vacuum exhaust port 93 are provided on the side surface of the cylindrical frame. The exit port 90 is an optical window for guiding EUV light from the plasma P to a utilization device (not shown). The exit port 90 is typically a through hole, but a transparent member such as an optical filter may be provided. The first opening 91 is an opening for connecting the light source unit 202. The second opening 92 is an opening for connecting the debris capture unit 230. In FIG. 12, the second opening 92 is formed on the upper side in the figure. The vacuum exhaust port 93 is connected to a vacuum pump 95 for exhausting the processing chamber body 201. In FIG. 12, the vacuum exhaust port 93 is formed on the lower side in the figure. The light source unit 202 is a unitized mechanism for generating the plasma P in a base body 96 having a function as a lid for the first opening 91. The light source unit 202 is configured as a device for generating the plasma P by, for example, the LDP method in the same manner as in FIG. 1. In this case, a pair of discharge electrodes arranged opposite to each other and a pair of containers for supplying plasma raw materials to the respective discharge electrodes are fixed to the base body 96. Further, a transparent window (not shown) is provided in the processing chamber body 201 for introducing an energy beam (e.g., a laser beam). The energy beam is irradiated onto one of the discharge electrodes in the discharge region where the discharge electrodes face each other. By irradiating the energy beam, a gaseous plasma raw material is supplied to the discharge region. When electric power is supplied to each discharge electrode, the plasma raw material is heated and excited by discharge to generate the plasma P. Further, instead of the light source unit 202 of the LDP method, a light source unit 202 that generates the plasma P by another method such as the LPP method may be used. The debris capture unit 230 shown in FIG. 12 is a unitized structure of a foil-type trap FT and a condenser lens 250. The debris capture unit 230 includes a loading and unloading member 231, a foil-type trap FT, i.e., a rotary foil-type trap 236, a rotary shaft 232, a rotary drive unit 233, a water-cooling pipe 234, an RFT support unit 237, a foil-type trap cover 240, and a condenser lens 250. The loading and unloading member 231 is configured to cover the second opening 92 and be detachably attached to the processing chamber body 201, and functions as a lid for closing the second opening 92. The rotary foil-type trap 236, the condenser lens 250, etc. that make up the debris capture unit 230 are unitized by being directly or indirectly connected to the loading and unloading member 231. In the example shown in FIG. 12, in a state where the loading and unloading member 231 is connected to the processing chamber body 201, the rotary foil-type trap 236 and the condenser lens 250 are arranged in sequence on the path from the light emission point of the plasma P to the exit 90. The rotary foil-type trap 236 has a plurality of foils F arranged radially, and is connected to the rotary drive unit 233 through the rotary shaft 232. The water-cooling pipe 234 that penetrates the loading and unloading member 231 is connected to the rotary drive unit 233 to supply cooling water or the like. Also, power cables or the like are appropriately wired to the rotary drive unit 233. In this embodiment, in a state where the debris capture unit 230 is installed in the processing chamber body 201, the rotary foil-type trap 236 and its drive mechanism (the rotary shaft 232 and the rotary drive unit 233) are all housed in the processing chamber body 201. The RFT support unit 237 is fixed to the loading and unloading member 231 and supports the RFT (rotary foil-type trap 236) with respect to the loading and unloading member 231. Specifically, the RFT support unit 237 is configured to support the rotary drive unit 233. Also, the rotary shaft 232 connected to the rotary foil-type trap 236 is rotatably supported through a bearing mechanism such as a bearing (not shown) built in the rotary drive unit 233. Thus, the RFT support unit 237 supports the rotary foil-type trap 236 through the rotary drive unit 233 and the rotary shaft 232. As shown in FIG. 12, the RFT support unit 237 is, for example, a plate-shaped member as a whole, and has a through-hole 238 for passing the rotary shaft 232 and an opening KC for passing EUV light. Also, the RFT support unit 237 is arranged between the rotary foil-type trap 236 and the rotary drive unit 233, and the front-end face of the rotary drive unit 233 is fixed to the RFT support unit 237. At this time, the RFT support unit 237 and the rotary drive unit 233 are fixed so that the axis of the rotary shaft 232 coincides with the central axis C1 of the condenser lens 250 described later. FIG. 13 is a schematic top view showing a structural example of the RFT support portion 237. The RFT support portion 237 has a central portion 237a, a peripheral portion 237b, and a plurality of spoke portions 237c. The central portion 237a is provided at the center of the RFT support portion 237 and is a part for fixing the rotary drive portion 233. A through hole 238 having an inner diameter larger than the diameter of the rotary shaft 232 is provided in the central portion 237a. The peripheral portion 237b is provided so as to surround the periphery of the central portion 237a at a certain distance from the central portion 237a. The peripheral portion 237b is a part connected to the loading and unloading member 231 and the foil type catcher cover 240, for example. The plurality of spoke portions 237c are length members connecting the central portion 237a and the peripheral portion 237b. The cavity surrounded by the central portion 237a, the peripheral portion 237b, and each spoke portion 237c becomes an opening KC for passing EUV light. In the example shown in FIG. 13, six spoke portions 237c are arranged at an angular interval of 60 degrees, and six openings KC are formed between the central portion 237a and the peripheral portion 237b. These openings KC are mainly provided on the optical path of the EUV light passing through the rotary foil type catcher 236. In addition, the number and shape of the spoke portions 237c and the openings KC are not limited. Also, in the example shown in FIG. 13, the outer periphery of the RFT support portion 237 (peripheral portion 237b) is a cylindrical surface, but for example, in order to be fixed to the loading and unloading member 231, a part of the outer periphery may be in a flat shape. Returning to FIG. 12, the foil type catcher cover 240 surrounds the outer peripheral portion of the rotary foil type catcher 236 and collects the debris DB splashed from the rotary foil type catcher 236. The foil type catcher cover 240 is a cylindrical member that houses the rotary foil type catcher 236. An incident side opening KI for EUV light to enter is provided on the front side of the foil type catcher cover 240 (the side facing the plasma P), and the RFT support portion 237 is connected to the rear side of the foil type catcher cover 240. In the example shown in FIG. 12, the RFT support portion 237 covers the rear side of the foil type catcher cover 240 and functions as a part of the cover. For example, the RFT support section 237 and the foil-type trap cover 240 are each fixed to the loading and unloading member 231 while being installed with respect to each other. Also for example, one of the RFT support section 237 or the foil-type trap cover 240 is fixed to the loading and unloading member 231, and the other may be installed on the one fixed to the loading and unloading member 231. Further, the RFT support section 237 and the foil-type trap cover 240 may not be installed with respect to each other and may be individually fixed to the loading and unloading member 231. In any case, the rotation drive section 233 is supported by the RFT support section 237. Furthermore, in addition to the RFT support section 237, the water-cooling pipe 234 connected to the rear of the rotation drive section 233 may be configured as a member that supports the rotation drive section 233. Also, the water-cooling pipe 234 may be arranged along the RFT support section 237 and connected to the front of the rotation drive section 233. FIG. 14 is a schematic perspective view showing a structural example of a condenser. The condenser 250 is connected to the loading and unloading member 231 and condenses EUV light from the plasma P. The condenser 250 has a reflecting surface 251 that reflects EUV light and a support 252 on which the reflecting surface 251 is provided. In the present embodiment, the reflecting surface 251 is formed on the inner peripheral surface of the cylindrical support 252. Therefore, the condenser 250 becomes a cylindrical reflecting mirror. As shown in FIG. 14, since the condenser 250 is an inclined incidence type lens, the reflecting surface 251 is formed using a single layer film. For example, the reflecting surface 251 is formed by coating the inner peripheral surface of the support 252 with a single layer film of ruthenium. Hereinafter, the side where EUV light is incident is described as the front of the condenser 250, and the side where EUV light is emitted is described as the rear of the condenser 250. The reflecting surface 251 is, for example, a surface that is rotationally symmetric with respect to the central axis C1. The shape of the reflecting surface 251 (the shape of the inner peripheral surface of the support 252) is designed such that light from the light-emitting point 253 on the central axis C1 set in front of the condenser 250 is condensed onto the condensing point 254 on the central axis C1 set behind the condenser. Here, the light-emitting point 253 of the condenser 250 corresponds to the light-emitting point of the plasma P. Also, the condensing point 254 of the condenser 250 corresponds to, for example, the center position of the exit port 90. Furthermore, the reflecting surface 251 is not limited to a rotationally symmetric structure, and a free surface designed by optical simulation or the like may be used. As shown in FIG. 12, the support 252 of the condenser 250 is fixed to the loading and unloading member 231 in such a manner that the light-emitting point of the plasma P coincides with the light-emitting point 253 set for the condenser 250 and the center position of the exit port 90 coincides with the condensing point 254 set for the condenser 250 in a state where the loading and unloading member 231 is connected to the processing chamber main body 201. Thereby, EUV light emitted from the plasma P, passing through the rotary foil-type trap 236, and incident on the front of the condenser 250 is condensed onto the exit port 90. Further, the condenser lens 250 is unitized together with the rotary foil-type catcher 236 and can be removed together with the loading and unloading member 231. Thereby, cleaning, replacement, etc. of the condenser lens 250 can be easily performed. Further, a foil-type catcher FT, i.e., a rotary foil-type catcher 236, is disposed between the plasma P and the condenser lens 250. Thereby, debris DB diffused from the plasma P is captured before invading the condenser lens 250, and a situation where the debris DB collides with and accumulates on the reflecting surface 251 can be suppressed. Also, in the situation where the loading and unloading member 231 is removed, the rotary foil-type catcher 236 is also removed, so maintenance of the rotary foil-type catcher 236 can be easily performed. Furthermore, the condenser lens 250 is not connected to the RFT support portion 237 and the foil-type catcher cover 240, and is fixed to the loading and unloading member 231 independently of the RFT support portion 237 and the foil-type catcher cover 240. Thereby, a situation where vibrations generated, for example, by the rotary foil-type catcher 236 are directly transmitted to the condenser lens 250 can be avoided. Thereby, vibration of the condenser lens 250 can be suppressed. Further, in this structure using the cylindrical condenser lens 250, EUV light passing through the entire circumference of the rotary foil-type catcher 236 is condensed. Thereby, compared to a situation where EUV light passing through only a partial angular range of the rotary foil-type catcher is extracted as described, for example, with reference to FIG. 2, etc., the amount of EUV light can be increased. Furthermore, in FIGS. 12 and 14, although the reflecting surface 251 is a single layer, the reflecting surface 251 may be configured with a plurality of layers so as to surround the central axis C1, for example. Thereby, the condensing efficiency of EUV light can be further improved. [Rotary Foil-Type Catcher and Fixed Foil-Type Catcher] FIG. 15 is a schematic diagram showing another structural example of a debris capture unit including a condenser lens. The debris capture unit 230a shown in FIG. 15 unitizes two types of foil-type catchers FT (a rotary foil-type catcher 236 and a fixed foil-type catcher 245) with the condenser lens 250. The debris capture unit 230a has a structure in which the fixed foil-type catcher 245 is added to the debris capture unit 230 shown in FIG. 12. The fixed foil-type catcher 245 has an inner ring 246 disposed around a predetermined axis, and an outer ring 247 disposed so as to surround the inner ring 246. In the cylindrical inner region sandwiched between the inner ring 246 and the outer ring 247, a plurality of foil pieces F are radially disposed around the predetermined axis. At this time, each foil piece F is located on a plane including the predetermined axis. Thus, in the present embodiment, the cylindrical fixed foil-type catcher 245 is used. The fixed foil catcher 245 is arranged behind the rotary foil catcher 236隔着RFT support part 237 in such a way that the axis of the fixed foil catcher 245 coincides with the axis of the rotary shaft 232. Further, the inner ring 246 and the outer ring 247 of the fixed foil catcher 245 are configured in such a way that they do not block the optical path of the EUV light emitted from the opening KC arranged in the RFT support part 237. Further, for the internal area of the fixed foil catcher 245, a gas introduction pipe 248 connecting the through loading and unloading member 231 supplies a transparent gas with a high transmittance for EUV light. For example, high-speed debris DB that cannot be captured by the rotary foil catcher 236 collides with the gas in the pressure-raising area of the fixed foil catcher 245. Due to this kind of collision with the gas, the debris DB whose speed is reduced and the traveling direction is changed is captured by the foil F, the inner ring 246, and the outer ring 247. In this way, by providing the rotary foil catcher 236 and the fixed foil catcher 245, the debris DB can be sufficiently captured. The foil catcher cover 240 provided in the debris capture unit 230a surrounds both the rotary foil catcher 236 and the fixed foil catcher 245. That is to say, the rotary foil catcher 236 and the fixed foil catcher 245 arranged隔着RFT support part 237 are housed inside the foil catcher cover 240. An incident side opening KI for EUV light incident is provided on the front side of the foil catcher cover 240 in the same way as in FIG. 12. Further, an insertion hole 241 surrounded by an annular protruding part protruding toward the RFT support part 237 is formed on the rear side of the foil catcher cover 240. The insertion hole 241 is a hole for arranging the rotary shaft 232 and the rotary drive part 233, and the front end of the insertion hole 241 (protruding part) is connected to the RFT support part 237. Further, on the periphery of the insertion hole 241, an exit side opening KO for the EUV light emitted through the fixed foil catcher 245 is provided. For example, the debris DB captured by the fixed foil catcher 245 flows into the foil catcher cover 240 and is collected by the foil catcher cover 240. Thereby, a situation where the debris DB captured by the fixed foil catcher 245 adheres to the rotary shaft 232 or the like can be avoided. In the example shown in FIG. 15, the fixed foil-type catcher 245 is fixed to the RFT support portion 237. However, for example, the fixed foil-type catcher 245 may be fixed to the foil-type catcher cover 240. Further, the RFT support portion 237 and the foil-type catcher cover 240 may be fixed to the loading and unloading member 231 in a state where they are mutually installed, or the other may be installed on one of them fixed to the loading and unloading member 231. Further, the RFT support portion 237 and the foil-type catcher cover 240 may be individually fixed to the loading and unloading member 231. Furthermore, the condenser lens 250 is not connected to the foil-type catcher cover 240 and is fixed to the loading and unloading member 231 independently of the foil-type catcher cover 240. Thereby, the vibration from the rotary foil-type catcher 236 is less likely to be transmitted to the condenser lens 250. [Position adjustment mechanism] FIG. 16 is a schematic diagram showing another structural example of the debris capture unit including the condenser lens. The debris capture unit 230b shown in FIG. 16 has a structure in which a position adjustment mechanism 262 is provided in the debris capture unit 230a shown in FIG. 15. The debris capture unit 230b includes an intermediate member 261, a position adjustment mechanism 262, and a telescopic cover 263. Furthermore, in FIG. 16, the illustration of the water cooling pipe and the gas supply pipe described in FIGS. 12 and 15 is omitted. The intermediate member 261 is configured as a member independent of the loading and unloading member 231 and integrally supports the rotary foil-type catcher 236, the fixed foil-type catcher 245, and the condenser lens 250. Specifically, the rotary foil-type catcher 236 and the fixed foil-type catcher 245 are fixed to the intermediate member 261 through at least one of the RFT support portion 237 and the foil-type catcher cover 240. Further, the support body 252 of the condenser lens 250 is fixed to the intermediate member 261 independently of the RET support portion 237 and the foil-type catcher cover 240. The position adjustment mechanism 262 is a mechanism for adjusting the arrangement of the condenser lens 250. Here, the arrangement of the condenser lens 250 includes the position and posture of the condenser lens 250. The position of the condenser lens 250 is, for example, the X coordinate, Y coordinate, and Z coordinate of the reference position (for example, the center of gravity position) of the condenser lens 250. Further, the posture of the condenser lens 250 is the roll angle, pitch angle, and deviation angle of the condenser lens 250. Furthermore, when the condenser lens 250 is rotationally symmetric, adjustment of the roll angle is not required. The position adjustment mechanism 262 is configured to be able to adjust these parameters. The position adjustment mechanism 262 has a drive unit 264 and an adjustment shaft 265. The drive unit 264 is connected to the adjustment shaft 265 and drives the adjustment shaft 265. The drive unit 264 is configured, for example, to be able to adjust the position of the adjustment shaft 265 in three mutually orthogonal axial directions. Also, for example, the drive unit 264 may be configured to be able to perform posture adjustments such as rotation and inclination of the adjustment shaft 265. As the drive unit 264, a servo motor or the like is used, and a mechanism that adjusts the position and posture of the adjustment shaft 265 by means may also be used, for example. In FIG. 16, two pairs of drive units 264 and adjustment shafts 265 are arranged. However, only the required number of drive units 264 and adjustment shafts 265 are arranged in such a manner that the arrangement of the condenser lens 250 can be adjusted. Also, the drive unit 264 is connected to the outside of the loading and unloading member 231, and the adjustment shaft 265 passes through the through hole 267 provided in the loading and unloading member 231 and is connected to the intermediate member 261 inside the loading and unloading member 231. With this structure, for example, a servo motor or the like that operates in the atmosphere can be directly utilized as the drive unit 264, and the device cost can be suppressed. Furthermore, the through hole 267 of the adjustment shaft 265 is formed to be larger than the adjustment shaft 265 so that the position and posture of the adjustment shaft 265 can be changed. Therefore, on the adjustment shaft 265, a telescopic cover 263 is provided to block the gap between the through hole 267 and the adjustment shaft 265. The telescopic cover 263 is a tubular member with one end open. The side surface of the telescopic cover 263 is formed using, for example, a corrugated tube or the like. The end of the opening of the telescopic cover 263 is connected to the inside of the loading and unloading member 231 so as to surround the through hole 267 through which the adjustment shaft 265 passes. Also, the adjustment shaft 265 penetrates the bottom of the telescopic cover 263 and is connected to the intermediate member 261. Furthermore, the telescopic cover 263 is connected to the loading and unloading member 231 and the adjustment shaft 265 without leakage. Thereby, the position of the adjustment shaft 265 can be moved to adjust the arrangement of the condenser lens 250 while maintaining the reduced-pressure atmosphere of the processing chamber main body 201. The condenser lens 250 is an optical element that adjusts the optical path of EUV light. Therefore, for example, when the debris capture unit 230b is removed, if the position and posture of the condenser lens 250 deviate, the optical path of the EUV light from the light source unit 202 to the utilization device will change, and there is a possibility that the focal point or the like will deviate. Even in such a situation, in the debris capture unit 230b, the position adjustment mechanism 262 can be used to adjust the position and posture of the condenser lens 250. Thereby, it becomes possible to easily perform adjustments of the optical path of EUV light, etc., and even when the condenser lens 250 is unitized, maintenance can be completed in a short time. Furthermore, in FIG. 16, the drive unit 264 of the position adjustment mechanism 262 is arranged outside the loading and unloading member 231. However, it is not limited to this, and the drive unit 264 may also be arranged inside the loading and unloading member 231. In this case, there is no need to provide a telescopic cover 263 for passing the adjustment shaft 265 through the through hole 267 of the loading and unloading member 231 to prevent leakage, etc., so the device structure can be made simple. [Vibration Isolation Mechanism] FIG. 17 is a schematic diagram showing another structural example of the debris capture unit including a condenser lens. The debris capture unit 230c shown in FIG. 17 has a structure in which a vibration isolation mechanism 270 is provided in the debris capture unit 230b shown in FIG. 16. The vibration isolation mechanism 270 is a mechanism that suppresses the vibration transmitted to the processing chamber body 201. That is to say, the vibration isolation mechanism 270 prevents the vibration of the debris capture unit 230c including the condenser lens 250 from being transmitted to the processing chamber body 201. The vibration transmitted to the processing chamber body 201 is mainly caused by the operation of the rotary foil type catcher 236 provided in the debris capture unit 230c and its drive mechanism (rotating shaft 232 and rotary drive unit 233). The light source unit 202 that generates the plasma P is connected to the processing chamber body 201. Therefore, if the processing chamber body 201 vibrates, it seems that the light changes in position in the utilization device located downstream of the focal point 254. Also, there will be a situation where the vibration itself is transmitted to the utilization device and causes problems. The vibration isolation mechanism 270 is a mechanism that makes it difficult for such vibration to be transmitted to the processing chamber body 201 to reduce the vibration of the debris capture unit 230c itself. The vibration isolation mechanism 270 has a vibration isolation part 271 and a vibration sensor (not shown), and is a mechanism that actively isolates vibration by operating the vibration isolation part 271 in response to the output of the vibration sensor. The vibration isolation part 271 is an element that expands and contracts in a manner to reduce vibration, and uses a linear actuator composed of, for example, a piezoelectric element or a stepping motor. In the example shown in FIG. 17, a vibration isolation part 271 is provided corresponding to each pair of the drive unit 264 and the adjustment shaft 265. Specifically, the vibration isolation part 271 is provided between the drive unit 264 and the adjustment shaft 265. That is to say, the vibration isolation part 271 can be said to have a function as a part of the adjustment shaft 265. The vibration sensor is a sensor that detects the vibration generated by the operation of the rotary foil type catcher 236, and is configured, for example, to detect the vibration of the intermediate member 261. As the vibration sensor, for example, a laser displacement meter or an acceleration sensor is used. The vibration isolation unit 271 expands and contracts in a manner that cancels out the vibration of the intermediate member 261 based on the output of the vibration sensor. By the expansion and contraction of the vibration isolation unit 271, the vibration of the intermediate member 261 generated by the operation of the rotary foil trap 236 or the like is suppressed, and as a result, the vibration transmitted from the intermediate member 261 to the process chamber main body 201 is suppressed. Thereby, it is possible to suppress the positional variation of the light of the apparatus to which EUV light is supplied. Also, the vibration transmitted from the process chamber main body 201 to the apparatus is suppressed, and the occurrence of problems caused by vibration can be avoided. Further, since the vibration of the intermediate member 261 is suppressed, the vibration of the condenser lens 250 fixed to the intermediate member 261 is also suppressed. Thereby, the deterioration of the condensing accuracy of EUV light caused by the condenser lens 250 can be prevented. In the example shown in FIG. 17, the vibration isolation unit 271 is provided between the drive unit 264 and the adjustment shaft 265. Thereby, for example, it becomes possible to introduce a linear actuator or the like having a relatively large expansion and contraction length, and a sufficient vibration isolation function can be exhibited. Further, the vibration isolation unit 271 may be provided at other positions. For example, the vibration isolation unit 271 may be provided between the intermediate member 261 and the fixing members (RFT support portion 237 and foil trap cover 240) of the rotary foil trap 236. Also, the vibration isolation unit 271 may be provided between the intermediate member 261 and the condenser lens 250. That is to say, the vibration isolation mechanism 270 may be configured to suppress the vibration transmitted to the condenser lens 250. Thereby, for example, the condensing accuracy of EUV light can be maintained at a high level. Also, the vibration isolation mechanism 270 may be configured to be capable of performing passive vibration isolation. In this case, the vibration isolation unit 271 uses a member having a function as a damper that attenuates vibration. In passive vibration isolation, for example, the vibration isolation unit 271 can be configured inexpensively and a vibration sensor or the like does not need to be provided. Therefore, the device cost can be suppressed. In FIG. 17, the structure in which the vibration isolation mechanism 270 is provided in the debris capture unit 230c including the position adjustment mechanism 262 has been described. However, it is not limited thereto. For example, as shown in FIGS. 12 and 15, the vibration isolation mechanism 270 may be provided in the debris capture unit that does not include the position adjustment mechanism 262. In this case, for example, the vibration isolation unit 271 is provided between the loading and unloading member 231 and the fixing members (RFT support portion 237 and foil trap cover 240) of the rotary foil trap 236. Also, the vibration isolation unit 271 may be provided between the loading and unloading member 231 and the condenser lens 250. In this way, in the structure in which the condenser lens 250 is unitized, by providing the vibration isolation mechanism 270, the vibration transmitted to the process chamber main body 201 and / or the condenser lens 250 (such as the vibration generated by the operation of the rotary foil trap 236) can be suppressed. Thereby, EUV light that is appropriately condensed can be supplied to the apparatus. <Other Embodiments> The present invention is not limited to the embodiments described above, and various other embodiments can be implemented. In the foregoing embodiments, an EUV light source device that extracts EUV light from plasma P has been described. However, the present invention is not limited thereto, and the present invention can also be applied to a light source device that extracts X-rays or the like having a wavelength shorter than EUV light from plasma P. Furthermore, in the foregoing embodiments, a light source device of the LDP method has been mainly described. However, the method for generating radiation such as EUV light or X-rays is not limited. For example, the present invention can also be applied to a light source device of the LPP method. In addition, in any device that generates plasma P, when capturing debris DB from plasma P, by using the debris capture unit of the present invention, the maintenance efficiency of the foil-type catcher can be improved. In this disclosure, for the sake of easy understanding of the description, terms such as "substantially" and "about" are appropriately used. However, whether these terms are used or not does not represent a clear difference in definition. That is, in this disclosure, concepts such as "center", "equal", "same", "orthogonal", "parallel", "symmetric", "cylindrical", etc., which define shapes, dimensions, positional relationships, states, etc., are regarded as concepts including "substantially center", "substantially equal", "substantially same", "substantially orthogonal", "substantially parallel", "substantially symmetric", "substantially cylindrical", etc. For example, it also includes states included in a predetermined range (for example, a range of ±10%) based on "completely center", "completely equal", "completely same", "completely orthogonal", "completely parallel", "completely symmetric", "completely cylindrical", etc. Therefore, even in the case where terms such as "substantially" and "about" are not added, concepts that can be expressed by terms such as "substantially" and "about" may be included. On the contrary, in the case of a state with expressions such as "substantially" and "about" added, a complete state is not necessarily excluded. In this disclosure, the expression "greater than A (larger than A)", "less than A (smaller than A)", etc., using the "greater than and less than" expression includes both concepts that inclusively include the situation equivalent to A and concepts that do not include the situation equivalent to A. For example, "greater than A" is not limited to the situation that does not include the situation equivalent to A, and also includes "A or more". Also, "smaller than A" is not limited to "less than A", and also includes "A or less". When implementing this technology, according to the concepts included in "larger than A" and "smaller than A", specific settings and the like can be appropriately adopted to achieve the effects described above. At least two characteristic parts in the characteristic part of the technology described above can also be combined. That is, the various characteristic parts described in each embodiment are not distinguished by each embodiment, and any combination is possible. In addition, the various effects described above are only examples and are not limiting, and other effects can also be achieved. 1: Processing chamber body 2: Light source unit 11: Light source processing chamber 11a: Side wall 11b: Side wall 12: Transparent window 13: Through hole 15: Connection processing chamber 15a: Side wall 16: Exit port 17: Opening 18: Flange 20: Control unit 21: Pulse power supply unit 22: Laser source (energy beam irradiation device) 23: Movable lens 24: Condensing lens 30: Debris capture unit 31: Loading and unloading member 32: Rotating shaft 33: Rotation drive unit 34: Guide mechanism 34a: Guide hole 34b: Guide pin 35: Through hole 36: Rotary foil-type catcher 37: Central support 38: Outer ring 39: Mechanical seal 40: Motor 41: Water-cooling pipe 42: Water inlet 43: Water outlet 50: Debris capture unit 51: Loading and unloading member 51a: Connection surface 52: Rotating shaft 53: Rotation drive unit 54: Reinforcing member 55: Reinforcing part 56: Rotary foil-type catcher 57: Through hole 58: Depressed part 60: Debris capture unit 61: Loading and unloading member 62: Rotating shaft 63: Rotation drive unit 64: Reinforcing member 66: Rotary foil-type catcher 67: Fixed foil-type catcher 68: Fixed frame 69: Gas introduction pipe 70: Debris capture unit 71: Foil-type catcher cover 73: Protrusion 80: Debris capture unit 81: Heat shielding member 82: Detection sensor 90: Exit port 91: First opening 92: Second opening 93: Vacuum exhaust port 95: Vacuum pump 96: Base part 100: EUV light source device 110: Utilization device 111: Inlet port 200: EUV light source device 201: Processing chamber body 202: Light source unit 230: Debris capture unit 230a: Debris capture unit 230b: Debris capture unit 230c: Debris capture unit 231: Loading and unloading member 232: Rotating shaft 233: Rotation drive unit 234: Water-cooling pipe 236: Rotary foil-type catcher 237: RFT support part 237a: Central part 237b: Peripheral part 237c: Spoke part 240: Foil-type catcher cover 241: Insertion hole 245: Fixed foil-type catcher 246: Inner ring 247: Outer ring 248: Gas introduction pipe 250: Condensing mirror 251: Reflective surface 252: Support body 253: Light-emitting point 254: Condensing point 261: Intermediate member 262: Position adjustment mechanism 263: Telescopic cover 264: Drive unit 265: Adjustment shaft 267: Through hole 270: Vibration isolation mechanism 271: Vibration isolation part C0: Central axis line C1: Central axis line CA: Container CB: Container D: Discharge area DB: Debris EA: Discharge electrode EB: Discharge electrode F: Foil FA: Seal FB: Seal FT: Foil-type catcher JA: Rotating shaft JB: Rotating shaft KA: OpeningKB: Opening KC: Opening KI: Inlet opening KO: Outlet opening KO': Outlet opening LB: Laser beam QA: Power supply line QB: Power supply line MA: Motor P: Plasma PA: Sealing member PB: Sealing member SA: Plasma raw material SB: Plasma raw material [Fig. 1] is a schematic cross-sectional view showing the structure of an EUV light source device including a debris capture unit according to the first embodiment of the present invention. [Fig. 2] is a schematic view showing an example of the structure of the debris capture unit according to the first embodiment. [Fig. 3] is a schematic view showing a state where the debris capture unit is removed. [Fig. 4] is a schematic cross-sectional view showing an example of the structure of a rotary foil type catcher. [Fig. 5] is a schematic front view showing an example of the structure of a rotary foil type catcher. [Fig. 6] is a schematic view showing another example of the structure of the debris capture unit. [Fig. 7] is a schematic view showing another example of the structure of the debris capture unit. [Fig. 8] is a schematic cross-sectional view showing an example of the structure of a fixed foil type catcher. [Fig. 9] is a schematic front view showing an example of the structure of a fixed foil type catcher. [Fig. 10] is a schematic view showing an example of the structure of a debris capture unit including a foil type catcher cover. [Fig. 11] is a schematic view showing an example of the structure of a debris capture unit including a heat shield. [Fig. 12] is a schematic cross-sectional view showing an example of the structure of an EUV light source device including a debris capture unit according to the second embodiment. [Fig. 13] is a schematic top view showing an example of the structure of an RFT support portion. [Fig. 14] is a schematic perspective view showing an example of the structure of a condenser lens. [Fig. 15] is a schematic view showing another example of the structure of a debris capture unit including a condenser lens. [Fig. 16] is a schematic view showing another example of the structure of a debris capture unit including a condenser lens. [Fig. 17] is a schematic view showing another example of the structure of a debris capture unit including a condenser lens. 1: Processing chamber body 11: Light source processing chamber 13: Through hole 15: Connection processing chamber 15a: Side wall 16: Outlet 17: Opening 18: Flange 30: Debris capture unit 31: Loading and unloading member 32: Rotating shaft 33: Rotation drive unit 34: Guide mechanism 34a: Guide hole 34b: Guide pin 35: Through hole 36: Rotary foil type catcher 39: Mechanical seal 40: Motor 41: Water-cooled piping 42: Water inlet 43: Water outlet 110: Utilization device 111: Incident port C0: Central axis F: Foil FT: Foil-type catcher P: Plasma

Claims

1. A debris-catching unit, which is installed in the aforementioned opening of a processing chamber body having an outlet for radiation from plasma and an opening different from the aforementioned outlet, characterized in that it comprises: a loading and unloading member configured to cover the aforementioned opening and freely load and unload to the aforementioned processing chamber body; and at least one foil-type catcher having a plurality of foils for catching debris from the aforementioned plasma, and connected to the loading and unloading member in such a way that the plurality of foils are arranged along the path of the aforementioned radiation from the aforementioned plasma to the aforementioned outlet when the aforementioned loading and unloading member is installed in the aforementioned processing chamber body.

2. The debris-catching unit as described in claim 1, wherein, The aforementioned at least one foil catcher includes a rotary foil catcher having the aforementioned plurality of foils and a rotating member that radially supports the aforementioned plurality of foils. The aforementioned debris catching unit further includes: a shaft portion connected to the aforementioned rotating member of the aforementioned rotary foil catcher, and a rotary drive portion for rotating the aforementioned shaft portion.

3. The debris-catching unit as described in claim 2, wherein, The aforementioned rotary drive unit is connected to the outside of the aforementioned loading and unloading member, the aforementioned shaft portion passes through the aforementioned loading and unloading member, and the aforementioned rotary member is connected to the aforementioned shaft portion on the inside of the aforementioned loading and unloading member.

4. The debris-catching unit as described in claim 3, wherein, It also features: a reinforcing member, which is a different component from the aforementioned loading and unloading member, and fixes the aforementioned rotary drive unit to the aforementioned loading and unloading member.

5. The debris-catching unit as described in claim 3, wherein, The aforementioned loading and unloading component has a reinforcing part that reinforces the rigidity of the portion connecting to the aforementioned rotary drive unit.

6. The debris-catching unit as described in any of claims 2 to 5, wherein, The aforementioned at least one foil catcher includes a fixed foil catcher having the aforementioned plurality of foils and a fixing member for fixing the aforementioned plurality of foils.

7. The debris-catching unit as described in claim 6, wherein, It also features: a foil trap cover connected to the aforementioned loading and unloading components, surrounding the outer periphery of the aforementioned rotary foil trap, capturing the aforementioned debris splashed from the aforementioned rotary foil trap, and the aforementioned fixed foil trap connected to the aforementioned foil trap cover.

8. The debris-catching unit as described in claim 6, wherein, It also features: a gas inlet pipe that runs through the aforementioned loading and unloading components, introducing transparent gas that is transparent to the aforementioned radiation into the aforementioned fixed foil trap.

9. The debris-catching unit as described in claim 1, wherein, It also includes: a condenser lens connected to the aforementioned loading and unloading components to focus the radiation from the aforementioned plasma, and at least one foil trap disposed between the aforementioned plasma and the aforementioned condenser lens.

10. The debris-catching unit as described in claim 9, wherein, It also features: a position adjustment mechanism for adjusting the configuration of the aforementioned condenser lens.

11. The debris-catching unit as described in claim 9, wherein, It also features: a vibration isolation mechanism to suppress vibrations transmitted to the aforementioned processing chamber body and / or the aforementioned condenser lens.

12. The debris-catching unit as described in claim 1, wherein, It also includes at least one of the following: a heat shielding member connected to the aforementioned loading and unloading member and disposed between the aforementioned plasma and the aforementioned foil trap; or a detection sensor connected to the aforementioned loading and unloading member and detecting the state of the aforementioned plasma.

13. The debris-catching unit as described in claim 1, wherein, The aforementioned loading and unloading components have a guide mechanism for guiding the installation position of the aforementioned processing chamber body.

14. A light source device, characterized by comprising: a plasma generation unit for plasmaifying plasma raw materials; a processing chamber body having an outlet for radiation from the plasma generated by the plasma generation unit and an opening different from the outlet; and a debris capture unit installed in the opening of the processing chamber body, the debris capture unit comprising: a loading and unloading member configured to cover the opening and freely load and unload to the processing chamber body; and at least one foil trap having a plurality of foils for capturing debris from the plasma, connected to the loading and unloading member such that the plurality of foils are arranged along the path of the radiation from the plasma to the outlet when the loading and unloading member is installed in the processing chamber body.

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