High temperature furnace tube

TWI936078BActive Publication Date: 2026-08-11ACM RES (SHANGHAI) INC
View PDF 2 Cites 0 Cited by

Patent Information

Application Number
TW115115618
Authority / Receiving Office
TW · TW
Patent Type
Patents
Current Assignee / Owner
Priority Date
2021-12-02
Filing Date
2022-02-17
Publication Date
2026-08-11
Estimated Expiration
2042-02-16

Smart Images

  • Figure TWG2TB001906137_001
    Figure TWG2TB001906137_001
  • Figure TWG2TB001906137_002
    Figure TWG2TB001906137_002
  • Figure TWG2TB001906137_003
    Figure TWG2TB001906137_003
Patent Text Reader

Abstract

This invention discloses a high-temperature furnace tube, comprising: a process tube with a top cover and a through hole at its top; a gas supply pipe communicating with the through hole on the top cover of the process tube, through which process gas enters the interior of the process tube; and a crystal boat disposed inside the process tube, comprising a support frame and support plates, wherein multiple layers of support plates are distributed along the length of the support frame to support multiple substrates, each substrate being placed on each layer of support plates, and each layer of support plates supporting the entire bottom of each substrate. By setting multiple layers of support plates, with each layer supporting the entire bottom of each substrate, this invention avoids downward deformation of the substrate under high-temperature processes above 1200°C, thus preventing the generation of lattice defects within the substrate and improving wafer yield.
Need to check novelty before this filing date? Find Prior Art

Claims

1. A high-temperature furnace tube, comprising: Process pipe; A crystal boat, housed inside a process tube, includes a support frame and support plates. Multiple support plates are distributed along the length of the support frame to support multiple substrates. Each substrate is placed on each support plate layer, and each support plate layer supports the entire bottom of each substrate. Each support plate layer has three guide slots. A robotic arm for picking up and placing substrates is equipped with three suction cups. The three guide slots correspond to the three suction cups on the robotic arm. The three suction cups are inserted into the three guide slots to remove the substrate from the support plate or place the substrate onto the support plate. Alternatively, each support plate layer has two guide slots. The robotic arm for picking up and placing substrates has three suction cups, with two suction cups corresponding to one guide slot and the remaining suction cup corresponding to the other guide slot. The three suction cups are inserted into the two guide slots to remove the substrate from the support plate or place the substrate onto the support plate.

2. The high-temperature furnace tube as described in claim 1, wherein, The three suction cups on the robotic arm are all vacuum suction cups, used to hold the substrate.

3. The high-temperature furnace tube as described in claim 1, wherein, The three suction cups on the robotic arm are all solid suction cups, and each solid suction cup is provided with a sealing ring. The solid suction cups support the substrate through the friction of the sealing ring.

4. The high-temperature furnace tube as described in claim 1, wherein, Each layer of support plate has at least two slots on its outer periphery, and the support frame has at least two blocks at the corresponding positions of each layer of support plate. The at least two blocks correspond one-to-one with the at least two slots, and each layer of support plate is secured to the blocks of the support frame through the slots.

5. The high-temperature furnace tube as described in claim 4, wherein, There are four card slots and four corresponding card blocks, with the four card blocks symmetrically arranged on both sides of the circumference of each layer of support plate.

6. The high-temperature furnace tube as described in claim 4, wherein, There are three slots, which are evenly distributed on the outer periphery of each layer of support plate. The angle between two adjacent slots is 120°. There are three blocks, which correspond one-to-one with the three slots.

7. The high-temperature furnace tube as described in claim 1, wherein, The support plate is made of a different material than the support frame.

8. The high-temperature furnace tube as described in claim 1, wherein, The support plate and the support frame are made of the same material, and the support plate and the support frame are integrally formed.

9. The high-temperature furnace tube as described in claim 1, wherein, Each layer of the support plate has multiple protrusions or grooves on the side that contacts the bottom of the substrate.

10. The high-temperature furnace tube as claimed in claim 1, further comprising: Liner, fitted around the outer periphery of the process pipe; And heating components, fitted around the outer periphery of the liner.

Citation Information

Patent Citations

  • Injector, and vertical furnace

    TW202140846A

  • Thermal treatment apparatus, method for manufacturing semiconductor device, and method for manufacturing substrate

    US20090186489A1