Photomask loading system and method

Abstract

This invention discloses a photomask loading system, comprising: a first port allowing a photomask transport box to be transferred between an external environment and a loading environment; a second port allowing a photomask storage box to be transferred between the loading environment and a storage environment; a first lifting means cooperating with the first port and carrying the photomask transport box, and moving up and down within the loading environment, enabling the photomask transport box to move up and down between a top position and a bottom position; and a second lifting means cooperating with the second port and carrying the photomask storage box, and moving up and down within the loading environment, enabling the photomask storage box to move up and down between a top position and a bottom position.

Description

Mask loading system and method The present invention relates to a mask storage box and a mask holding method, and more particularly to a mask storage box comprising an outer box and an inner box, and a mask holding method in which the outer box and the inner box cooperate with each other. The mask storage box is used in a mask storage system and method. In current extreme ultraviolet (EUV) lithography processes, masks are protected by a conventional double-layered EUV pod (EUV POD). This pod consists of an inner pod (EIP) and an outer pod (EOP). To store the mask, the mask is placed in the inner pod, which is then stored inside the outer pod. The entire EUV pod is then placed in a nitrogen cabinet and filled with nitrogen to store the mask. Furthermore, the design of conventional reticle pods allows the inner pod containing the reticle to avoid particle contamination and reticle damage caused by vibration and misalignment during long-distance transport. Furthermore, conventional reticle pods can be configured to be loaded into various process equipment for various inspections. Therefore, the inner pod's structure is more complex than the outer pod, resulting in higher manufacturing costs. If the inner pod of a reticle pod designed for this purpose is stored in a nitrogen cabinet for an extended period, the inner pod's efficiency is compromised. Referring to the first and second figures, the conventional mask transport box (10) is a double-layer box structure, comprising an inner box (11) and an outer box (12), wherein the inner box (11) accommodates a mask (R), and the outer box (12) accommodates the inner box (11). The inner box (11) comprises a base (20) and a cover (30), which cooperate with each other to seal and accommodate the mask (R). The outer box (12) comprises an outer base (40) and an outer cover (50), wherein the outer base (40) has a supporting means for the inner box (11), and the outer cover (50) is combined with the outer base (40) to define the accommodating space of the inner box (11). The inner side of the outer cover (50) can usually be provided with an appropriate downward pressing means, so that when the outer cover (50) is combined with the outer base (40), the inner box (11) can be pressed down, thereby forming a stable accommodation. The outer base (40) generally also includes a latching means to lock the outer cover (50) to the outer base (40). Since the transport of this type of mask transport box (10) in the factory is performed by the overhead crane system, the top of the outer cover (50) has a handle (52) for the overhead crane arm to grasp. Therefore, the conventional mask transport box (10) is not conducive to stacking and storage due to the height of the handle (52), and the height of the handle (52) will take up additional storage space. Furthermore, in typical designs, conventional inner and outer boxes have corresponding interlocking mechanisms, meaning that conventional outer boxes can only be used with corresponding inner boxes and cannot adapt to inner boxes with different mechanical designs. This means that only certain outer and inner boxes are compatible and can securely house the photomask. Using incompatible outer and inner boxes will not achieve the desired stability. When considering manufacturing costs and storage efficiency in photomask cassette storage, existing outer box designs cannot meet these requirements. Therefore, the industry needs a dedicated photomask storage box suitable for long-term storage and related methods, as well as a photomask storage system and method for storing dedicated photomask storage boxes. In addition, the present invention develops a technology that uses a single outer box to accommodate at least two inner boxes with different mechanical designs, which will help reduce storage costs. Conventional reticle transport boxes feature an inner box with a mechanism, known as a hold-down pin, that is applied by an outer box to stabilize the inner box. This mechanism only acts on the reticle within the inner box when the inner box is contained within the outer box. For example, the top of the hold-down pin is exposed outside the top of the inner box. When transporting only the inner box without an outer box, the reticle's lack of stability within the inner box can easily lead to vibration and impact. Furthermore, if masks are to be stored long-term in a dedicated mask storage cabinet system, they must be removed from the double-layered mask transfer box and transferred to a dedicated box. Therefore, a compatible mask loading system and related methods must be developed before masks can be stored in the mask storage cabinet system. Furthermore, photomasks are used in high-precision processes in semiconductor manufacturing equipment. Storing these expensive photomasks in storage cabinets for extended periods requires strict environmental conditions. Therefore, there is a need for a mask storage cabinet piping inflation system and related methods for long-term mask storage, as well as a mask storage cabinet management system and related methods for scheduling the cabinet system. To accommodate more reticles within the same space, the present invention provides a storage method to increase reticle storage efficiency. Specifically, the present invention provides a specialized reticle storage box that differs from conventional reticle transport boxes. Throughout this disclosure, "reticle transport box" refers to conventional reticle boxes, while "reticle storage box" refers to the specialized reticle box proposed by the present invention, which utilizes a storage method to improve efficiency. If the mask storage box is only transferred between the storage cabinets of the mask loading system and the mask storage cabinet system, the mask storage box designed for this purpose, in addition to still having sufficient protection mechanisms to prevent the invasion of external particles, does not require complex structures and processing, which helps to reduce manufacturing costs. The present invention aims to provide a photomask loading system, comprising: a first port configured to allow a photomask transport box to be transferred between an external environment and a loading environment; a second port configured to allow a photomask storage box to be transferred between the loading environment and a storage environment; a first lifting means configured to cooperate with the first port and carry the photomask transport box, and to move up and down in the loading environment, so that the photomask transport box can be lifted and down between a top position and a bottom position, wherein when the photomask transport box reaches the bottom position, a accommodating space of the photomask transport box is opened and exposed to the loading environment. a loading environment; a second lifting means configured to cooperate with the second port and carry the mask storage box, and to move up and down in the loading environment, so that the mask storage box can be lifted and down between a top position and a bottom position, wherein when reaching the bottom position, a storage space of the mask storage box is opened and exposed to the loading environment; and a mask clamping mechanism configured to operate in the loading environment, so that a mask or a base carrying the mask can be transferred between the storage space exposed by the opening of the mask conveying box and the storage space exposed by the opening of the mask storage box. In one embodiment, the reticle transport box at the top position and the reticle storage box at the top position are both in a closed state, so that the accommodating space of the reticle transport box and the accommodating space of the reticle storage box are not exposed. In one embodiment, the reticle transport box at the bottom position and the reticle storage box at the bottom position are both in an open state, so that an outer cover and an inner cover of the reticle transport box and an outer cover and an inner cover of the reticle storage box are removed. In one embodiment, the outer cover and the inner cover of the removed reticle transport box and the outer cover and the inner cover of the reticle storage box all stay between the top position and the bottom position. In one embodiment, the reticle clamping mechanism has a track and a clamping assembly configured to clamp both sides of the reticle or base, and the clamping assembly moves laterally between the bottom positions via the track. In one embodiment, the present invention further comprises: an identification and inspection means configured to cooperate with the first lifting means or the second lifting means to read information related to the reticle transport box, the reticle storage box, the reticle film, the reticle, or any of the above; a gas control means configured to control air intake, filtration, and exhaust to maintain the cleanliness of the loading environment. Another object of the present invention is to provide a first port for transferring a reticle transport box from an external environment to a loading environment, wherein the reticle transport box contains a reticle; and a second port for transferring a reticle storage box from a storage environment to the loading environment. A first lifting means cooperating with the first port is provided in the loading environment to enable the mask conveying box to descend from a top position to a bottom position, and when the mask conveying box reaches the bottom position, the mask conveying box is opened to expose a storage space of the mask conveying box and the mask; a second lifting means cooperating with the second port is provided in the loading environment to enable the mask storage box to descend from a top position to a bottom position, and when the mask storage box reaches the bottom position, the mask storage box is opened to expose a storage space of the mask storage box; and a mask clamping mechanism operable in the loading environment is used to transfer the exposed mask from the mask conveying box in the open state to the storage space exposed by the mask storage box in the open state. In a specific embodiment, the method further comprises providing a cover opening means to remove an outer cover and an inner cover of the reticle pod before the reticle pod reaches the bottom position, and an outer base and an inner base of the reticle pod reach the bottom position. In a specific embodiment, the method further comprises providing a cover opening means so that an outer cover and an inner cover of the photomask storage box are removed before the outer cover and the inner cover of the photomask storage box reach the bottom position, and an outer base and an inner base of the photomask storage box reach the bottom position. In one embodiment, the method further comprises: after the mask is converted, raising the mask transport box to the top position via the first lifting means, and converting the mask transport box to the external environment via the first port. In one embodiment, the method further comprises: after the mask is converted, raising the mask storage box to the top position via the second lifting means, and converting the mask storage box to the storage environment via the second port. In one embodiment, the present invention further includes providing an identification and inspection means in the loading environment to read information related to the mask transport box, the mask storage box, the mask pellicle, the mask, or any of the above between the top position and the bottom position of the first lifting means or between the top position and the bottom position of the second means. In one embodiment, the method further includes providing a gas control means in the loading environment to maintain the cleanliness of the loading environment. Another object of the present invention is to provide a mask unloading method, comprising: providing a first port to transfer a mask conveying box from an external environment to a loading environment; providing a second port to transfer a mask storage box from a storage environment to the loading environment, and the mask storage box accommodates a mask; providing a first lifting means cooperating with the first port in the loading environment to make the mask conveying box descend from a top position to a bottom position, and when reaching the bottom position, the mask conveying box is opened to expose a storage space of the mask conveying box; providing a second lifting means cooperating with the second port in the loading environment to make the mask storage box descend from a top position to a bottom position, and when reaching the bottom position, the mask storage box is opened to expose a storage space of the mask storage box and the mask; and transferring the exposed mask from the mask storage box in the open state to the storage space exposed by the mask conveying box in the open state via a mask clamping mechanism operable in the loading environment. In one embodiment, the method further comprises: providing a cover opening means to remove an outer cover and an inner cover of the reticle pod before the reticle pod reaches the bottom position, and an outer base and an inner base of the reticle pod reach the bottom position. In a specific embodiment, the method further includes providing a cover opening means to remove an outer cover and an inner cover of the photomask storage box before the outer cover and the inner base of the photomask storage box reach the bottom position. In one embodiment, the method further comprises: after the mask is converted, raising the mask pod to the top position via the first lifting means, and converting the mask pod to the external environment via the first port. In one embodiment, the method further includes: after the mask is converted, raising the mask storage box to the top position via the second lifting means, and converting the mask storage box to the storage environment via the second port. In one embodiment, the present invention further includes providing an identification and inspection means in the loading environment to read information related to the mask transport box, the mask storage box, the mask pellicle, the mask, or any of the above between the top position and the bottom position of the first lifting means or between the top position and the bottom position of the second means. In one embodiment, the method further includes providing a gas control means in the loading environment to maintain the cleanliness of the loading environment. The present invention will be more fully described below with reference to the accompanying drawings, with specific exemplary embodiments shown by way of illustration. However, the claimed subject matter may be embodied in many different forms, and thus the construction of the claimed subject matter is not limited to any exemplary embodiment disclosed herein; the exemplary embodiments are merely illustrative. Similarly, the present invention is intended to provide a reasonably broad scope for the claimed subject matter. The use of the phrase "in one embodiment" in this specification does not necessarily refer to the same embodiment, and the use of the phrase "in other (some) embodiments" in this specification does not necessarily refer to different embodiments. For example, the claimed subject matter includes combinations of all or part of the exemplary embodiments. The term "dedicated" in the following description of the embodiments refers to technical means proposed in response to the storage problem to be solved by the present invention, such as a dedicated box, a dedicated outer box, or a dedicated inner box; the term "non-dedicated" refers to technical means not involved in response to the storage target, which can be an existing or other novel mask inner box or outer box. The non-dedicated box described herein can be understood as an existing mask box, such as the conventional double-layer box shown in the first figure, but this does not mean that the non-dedicated box can only be an existing mask box. More specifically, the non-dedicated box herein should be understood as a mask box that is not dedicated to storage purposes, for example, a mask box that can be used for transportation purposes in general factory services. This is specifically stated. FIG3 shows a block diagram of the mask storage system of the present invention. The present invention provides a mask storage means for storing masks in a mask conveyor box (10). The mask storage system includes a mask loading system (200) and a mask storage cabinet system (600), wherein the mask loading system (200) is used to transfer a mask between the mask conveyor box (10) and the dedicated mask storage box (100), or to place an inner box for storing masks in the mask conveyor box (10) or the dedicated mask storage box (100). It should be understood that the mask conveyor box (10) described herein may refer to a conventional mask conveyor box or a mask conveyor box that cooperates with a factory overhead crane system. The mask storage box (100) is a storage means proposed by the present invention that is different from conventional mask boxes and is specifically used for the mask storage cabinet system (600) of the present invention. The mask loading system (200) has a first port (202) connected to the factory environment and a second port (204) connected to the mask storage cabinet system (600). The first port (202) allows the mask transfer box (10) to be transferred between the factory environment and the loading environment provided by the mask loading system (200), and the second port (204) allows the mask storage box (100) to be transferred between the loading environment and the storage environment of the mask storage cabinet system (600). The first port (202) and the second port (204) can include valve means to independently separate the factory environment, the loading environment, and the storage environment. The first port (202) can also be configured to cooperate with the overhead crane system. The mask storage cabinet system (600) includes one or more mask cabinet racks (not shown) that can store a plurality of mask storage boxes (100), a mask storage cabinet control system (300) responsible for storing and taking out the mask storage boxes (100), a mask storage cabinet gas filling pipeline system (400) responsible for the gas environment of each mask cabinet rack, and a mask storage cabinet management system (500) responsible for all processes, the details of which will be described later. FIG4 illustrates the specific external configuration of the mask storage system (600) of the present invention. The mask loading system (200) is adjacent to one side of the mask storage system (600), but the present invention is not limited to this. The first port (202) of the mask loading system (200) is basically facing upward to facilitate the vertical loading or removal of the mask transfer box (10) in conjunction with the overhead crane system. The second port (not shown) is located on the side of the mask loading system (200) and faces the mask storage system (600) to load or remove the mask storage box (100) horizontally. The photomask loading system (200) is configured to have identification means for the photomask transport box (10) and the photomask storage box (100), such as for identifying RFID or two-dimensional barcodes on the inner box and / or outer box, and such information can be associated with the identification number of the box body or the photomask. The identification means can further include detecting whether the photomask protective film (Pellicle) in the box is damaged through the window of the box and reading the two-dimensional barcode. The first port (202) and the second port (204) correspond to different lifting means in the mask loading system (200), which means that the mask transfer box (10) and the mask storage box (100) are respectively held by their respective lifting means after entering the loading environment. The loading environment also includes a clamping means for the mask, which is used to transfer the mask between the mask transfer box (10) and the mask storage box (100). The details of the lifting means and the clamping means will be described in the subsequent paragraphs. In the event that the mask loading system (200) is unavailable (e.g., for maintenance), the mask storage system (600) can deliver the mask storage box (100) together with the required masks to the second port (204). The mask storage system (600) provides a manually operated door for a worker to remove the mask storage box (100) through the manually operated door, so that the mask can be safely removed under the protection of the mask storage box (100). A fan filter unit (FFU) can be configured on the top of the mask storage system (600), which is responsible for sucking air from the outside for use by the mask storage system (600). In addition, a corresponding exhaust unit is also required. FIG5A shows an exploded side view of the photomask storage box of the present invention, wherein the photomask storage box of the present invention comprises a dedicated inner box and a dedicated outer box. In a preferred embodiment of the present invention, the photomask storage box (100) is a double-layer box structure and is dedicated to the storage cabinet rack of the photomask storage cabinet system (600) of the present invention. Although it is dedicated to storage, the photomask storage box (100) of the present invention, like the conventional photomask transfer box (10), still has a sealing means for protecting the photomask, that is, the contact surface of the box body has a good sealing and dust-blocking design. The photomask storage box (100) specifically used for the photomask storage cabinet system (600) of the present invention comprises a dedicated outer box (102) and a dedicated inner box (101). The outer box (102) receives the inner box (101), and the inner box (101) stores the photomask (R). The outer box (102) is composed of an outer cover (150) and an outer base (160) (also called a door), while the inner box (101) is composed of a cover (110) and a base (130). Compared with the conventional mask transfer box (10) in FIG. 5A, the outer cover (150) of the mask storage box (100) of the present invention does not need to cooperate with the overhead crane system, so the handle (52) of the conventional mask transfer box (10) is removed, so that the overall height of the mask storage box (100) is lower than the overall height of the conventional mask transfer box (10). In addition, compared with the conventional mask transfer box (10) in FIG. 5A, the positioning column (161) provided on the inner side of the outer base (160) of the present invention is also shorter, so that the height of the outer cover (150) and the outer base (160) of the present invention is lower than the height of the outer cover (50) and the outer base (40) of the conventional mask transfer box (10) in FIG. In order to reduce the overall height of the mask storage box (100) of the present invention as much as possible, the pair of handles (151) provided on both sides of the outer cover (150) are not higher than the top surface of the outer cover (150). The shortened positioning column (161) reduces the height of the space for accommodating the dedicated inner box (101). Therefore, the overall height of the mask storage box (100) of the present invention is significantly smaller than the height of the conventional mask transfer box (10), so that the mask storage cabinet system (600) of the present invention can store a relatively large number of dedicated mask storage boxes (100) and masks. FIG5B is a perspective view of the outer cover (150) of the special outer box of the present invention, which removes the structural design for cooperating with the overhead crane system. The outer cover (150) has a flat top surface (152) and a surrounding side surface extending downward from the flat top surface (152). The handle (151) extends from the surrounding side surface and the handle (151) is basically not higher than the flat top surface (152), or only exceeds the flat top surface (152) by a small height. Figure 5C is a three-dimensional view of the base (160) outside the dedicated outer box of the present invention, the bottom of which is configured to include multiple gas valves (162) and positioning grooves (163), wherein the gas valves (162) can be used in conjunction with specific connection ports to supply specific gases into the dedicated outer box (102) or to exhaust gases from the dedicated outer box (102), and the positioning grooves (163) are used to position the dedicated outer box (102) at a certain position in the device. FIG5D shows an exploded perspective view of the dedicated inner box (101) of the present invention, which includes a cover (110), a base (130) and a retaining mechanism. The cover (110) and the base (130) are combined to define a storage space, and the retaining mechanism is configured to support and restrict a mask (R) to be accommodated in the storage space. The top of the cover (110) is basically a flat surface and is configured with a filter membrane cover (112) and is formed with a plurality of grooves (114) of specific shapes and arrangements. This embodiment is described by configuring four grooves (114) of specific shapes and arrangements as an example. Referring to Figures 5E to 5J, compared to the structure of the inner box (11) of the mask transport box (10) in Figure 1, the holding mechanism of the inner box (101) of the mask storage box (100) of the present invention is in chamfered contact with the mask (R). As shown in Figures 5F and 5H, the holding mechanism includes elastic downward pressing mechanisms (i.e., mask limiters 120) arranged at the four corners of the inner side of the cover (110), and four support members (134) arranged on the upper side of the base (130). The number and position configuration of the elastic downward pressing mechanisms and the support members (134) are designed to match the position of the groove (114) on the top of the cover (110). Therefore, the positions of these mask limiters (120) and support members (134) correspond to each other. When the cover (110) is combined with the base (130) to accommodate the mask (R), the four support members (134) and their corresponding mask limiters (120) will contact and limit the four corners of the mask (R). A plurality of gas channels are provided at the center of the cover (110), and a filter cover (112) is provided on the upper side thereof to cover these gas channels. Specifically, the filter cover (112) is installed in the central recess of the top surface of the cover (110), as shown in Figure 5G, so that the filter cover (112) does not protrude from the top surface of the cover (110). A pair of handles (111) extending outward from the sides of the cover (110) can interact with a specific mechanism during the opening operation of the mask loading system (200), and the details will be described in subsequent paragraphs. In addition, the position of the groove (114) on the top of the cover (110) corresponds to the position of the mask limiter (120). Therefore, when the inner box (101) is accommodated in the outer box (102), the groove (114) of the cover (110) can be engaged with the pressing mechanism provided on the inner side of the outer cover (150), so that the cover (110) obtains a downward pressure, thereby strengthening the combination of the dedicated inner box (101) and the holding of the mask (R). The details will be further described in the subsequent paragraphs. Compared to the inner box (11) of the mask transport box (10) in the first figure, the inner box (101) of the mask storage box (100) of the present invention stores the mask (R) more stably. By the outer cover (150) of the outer box (102) exerting an external force on the top surface of the cover (110) of the inner box (101), the elastic downward pressing mechanism (i.e., the mask limiter 120) provided on the inner side of the cover (110) is prompted to stably press the four corners of the mask (R). More specifically, in order to stabilize the mask during long-distance transport, the mask transport box (10) in the first figure utilizes the outer cover (50) of the outer box (12) to directly exert an external force on the elastic downward pressing mechanism provided on the cover (30) of the inner box (11), so that the elastic downward pressing mechanism acts on the upper surface of the mask. In other words, the outer cover (50) in the first figure does not act on the cover (30). Compared to the base (20) of the inner box (11) of the mask transport box (10) in the first figure, the base (130) of the inner box (101) of the mask storage box (100) of the present invention removes the complex structure of the base (20). These removed complex structures may include the reflective laser engraving on the bottom surface of the base (20), part of the window frame and the step difference structure, so that the base (130) of the present invention does not require additional processing operations, thereby significantly reducing costs. In addition, the bottom surface of the base (130) is a flat surface except for the configuration of the positioning groove (132) and the window (W). The base (130) has a window (W) for detecting the two-dimensional barcode and the protective film (Pellicle) on the mask (R). Because the bottom surface and the side of the base (130) are continuous flat surfaces, this design without step difference is more convenient for blowing and cleaning. In addition, the depth of the protective film groove (131) on the base (130) is deeper than the depth of the protective film groove of the base (20) in the first figure, so that the air flow replacement efficiency in the box is better, the relative humidity (RH%) decrease rate is increased, and it is conducive to the long-term preservation of the mask. The base (130) is formed with a surrounding groove (133) (as shown in the sixth figure), and four support members (134) are provided at the positions of the four corners of the mask (R) in the surrounding groove (133). When the cover (110) is sealed with the base (130), the configuration of the surrounding groove (133) helps to capture particles entering the box. Figure 5K shows a three-dimensional view of the base (130) of the special inner box of the present invention, and Figures 5L and 5M respectively enlarge the support member (134) configured in the surrounding groove based on the dotted frame in Figure 5K. FIG5N shows separately the mask limiter (120) provided on the inner side of the cover (110) of the present invention. The elastic downward pressing mechanism of the cover (110) of the present invention can be realized by the mask limiter (120) shown in FIG5N. The mask limiter (120) includes a main body (121) and a pair of elastic arms (122) extending in different directions from both sides of the main body (121). One end of each elastic arm (122) is connected to the main body (121), and the other end is connected to a limiting portion (123). One end of the limiting portion (123) is connected to the elastic arm (122), and the other end is connected to an inclined surface (124). The two inclined surfaces (124) extend upward from the limiting portion (123), and the ends of the two inclined surfaces (124) away from the limiting portion (123) are connected together. Specifically, the ends of the two inclined surfaces (124) are commonly connected to a pressing portion (125), but the present invention is not limited thereto, and the pressing portion (125) may be omitted. The main body (121) of the mask limiter (120) is provided with a screw hole so that the mask limiter (120) can be fixed to the inner side of the cover (110) through a known locking means. The two inclined surfaces (124) connecting the pair of elastic arms (122) are used to touch the upper edges of the two sides of a corner of the mask respectively. In this embodiment, the limit portion (123) is basically a horizontal extension structure to cooperate with the support member (134) as shown in Figures 5L and 5M to achieve the effect of limiting the lateral displacement of the pair of elastic arms (122), thereby limiting the shaking of the corner of the mask. FIG6A shows the mask limiter (120) of the special inner box of the present invention and the corresponding support member (134) limiting and supporting a corner of the mask. FIG6B is a partial enlargement showing that the support member (134) of the present invention limits the lateral displacement of the mask limiter (120). The four support members (134) of the base (130) of the present invention are respectively arranged in the surrounding grooves (133) at the four corners of the base (130), and are respectively used to support the corresponding corners of the mask (R). The support member (134) has two support parts protruding upward from the surrounding grooves (133), and each support part is formed with an inclined surface (135) facing the mask (R) and inclined downward toward the mask (R). The pair of inclined surfaces (135) are basically orthogonal to each other and touch and engage the lower edges of the two sides of the corresponding corners of the mask (R), as shown in Figure 6A. A limit block (136) also extends upward from the top of each support part of the support member (134). The limit block (136) is located at the top of the inclined surface (135) and does not interfere with the mask (R). When the mask (R) is placed on the support member (134), the two limit blocks (136) of each support member (134) are respectively located on the two side surfaces of the corner of the mask (R). When the cover (110) is combined with the base (130), the two limit blocks (136) of each support member (134) are respectively located on the outside of the limit portion (123) of the mask limiter (120) to limit the lateral displacement of the limit portion (123) connecting the pair of elastic arms (122), as shown in Figures 6A and 6B. Therefore, when the cover (110) is combined with the base (130), the two limit portions (123) of the mask limiter (120) will be limited between the two support portions of each support member (134), so that the lateral displacement of the pair of limit portions (123) is limited and the shaking of the mask limiter (120) is reduced. In other possible embodiments, it is also feasible for the limit block (136) to be located inside the limit portion (123). Preferably, as shown in FIG6B, a buffer gap is provided between the limit portion (123) and the limit block (136) to prevent particles from being generated by hardware friction. FIG7A shows a three-dimensional view of the inner box of the present invention, and FIG7B shows a cross-sectional view of the inner box of the present invention according to the dotted line of FIG7A. Compared with the inner box (11) structure of the mask transfer box (10) in FIG1, there is no specific connection direction between the cover (110) and the base (130) of the inner box (101) of the present invention. The top surface of the cover (110) is a large flat surface without a step structure, which means that the cover (110) as a whole has significantly reduced grooves and corners. The bottom surface of the base (130) also reduces or removes designs such as laser engraving marks, windows, counterweights and step structures, so that the cover (110) and the base (130) of the inner box (101) of the present invention reduce the processing steps and are easy to manufacture, which helps to improve the yield rate. In addition, the base (130) is formed with a protective film groove (131) with a relatively increased depth, so that the storage space of the inner box (101) can obtain a better internal and external gas replacement efficiency, which helps to control the relative humidity (RH%) of the storage space. In addition, the holding mechanism of the inner box (101) of the present invention includes a pair of elastic arms (122) of the mask limiter (120) that cooperate with the chamfer of the edge of the mask, and a pair of limit blocks (136) of the support member (134) that limit the pair of limit portions (123) of the mask limiter (120) to thereby hold the mask. The support member (134) and the mask limiter (120) contact the mask via their inclined surfaces (135), which avoids marks on the upper and lower surfaces of the mask and helps to maintain the horizontal state of the mask and guide the mask. The contact surface between the cover (110) and the base (130) can form a sealed contact by known means. In this embodiment, the contact surface of the base (130) is lower than the highest surface of the base (130), and the contact surface of the base (130) and the highest surface are separated by a surrounding groove (133), which helps to prevent particles from entering the protective film area. FIG8A shows a bottom view of the outer cover (150) of the special outer box (102) of the present invention, showing four downward pressing mechanisms. FIG8B shows the details of the downward pressing mechanism and its effect on the cover (110) of the special inner box, with the outer cover (150) omitted. FIG9A shows a cross-sectional view of the mask storage box (100) of FIG5A when it is combined. FIG9B shows a partial enlarged view of the area indicated by the dotted line in FIG9A. When these pressing mechanisms are configured on the inner side of the special outer box (102) of the present invention and the special inner box (101) is accommodated, the outer cover (150) provides a pressing external force to act on the special inner box (101) accommodated in the special outer box (102). Referring to Figures 5B and 5C, the special outer box (102) of the present invention includes an outer cover (150) and an outer base (160). According to the pressing mechanism further provided by the present invention, the outer cover (150) and the outer base (160) can be used to accommodate inner boxes of different structures, i.e., the inner box (11) of the second figure or the inner box (101) of the fifth figure (D). In this embodiment, the inner boxes of different structures are described by the special inner box (101) of the present invention and the inner box (11) of the mask transfer box (10). The two have different configurations on the top surface of the cover (110, 30), but the present invention is not limited to these two inner boxes. Each pressing mechanism provided on the downward surface of the inner side of the outer cover (150) is positioned substantially corresponding to the positions of the four corners of the inner boxes (101, 11) of different structures for holding the mask. Each pressing mechanism includes a first pressing mechanism and a second pressing mechanism, wherein the first pressing mechanism is configured to only provide downward pressure to the cover (30) of the inner box (11) of the mask conveying box (10), but cannot act on the cover (110) of the special inner box (101) of the present invention. Conversely, the second pressing mechanism is configured to only provide downward pressure to the cover (110) of the special inner box (101) of the present invention, but cannot act on the cover (30) of the inner box (11) of the mask conveying box (10). In addition, the present invention does not limit the first pressing mechanism and the second pressing mechanism to be separate components or a single component formed integrally. Referring to FIG. 8A , the pressing mechanism of the present invention is disposed on the downward surface of the outer cover (150), roughly corresponding to the corner of the mask. In this embodiment, the first pressing mechanism is a horseshoe-shaped pressing rib (153), and the second pressing mechanism is a pressing column (154), both of which can be made of elastic material. Specifically, the horseshoe-shaped pressing rib (153) is a winding U-shaped extension structure, and the pressing column (154) is located on the inner side of the horseshoe-shaped pressing rib (153), or the pressing column (154) is surrounded by the horseshoe-shaped pressing rib (153). The pressing column (154) of this embodiment is a Y-shaped structure, but the present invention is not limited to this. Referring to FIG. 8B , the horseshoe-shaped pressing rib (153) is of a specific size and shape so that the first pressing mechanism and the groove (114) of the cover (110) can cooperate. When the dedicated outer box (102) of the photomask storage box (100) of the present invention receives the dedicated inner box (101), the horseshoe-shaped pressing rib (153) disposed on the inner side surface of the outer cover (150) of the dedicated outer box (102) just enters the corresponding groove (114) of the cover (110), and the lower surface of the horseshoe-shaped pressing rib (153) contacts the bottom surface of the groove (114), so that the weight of the outer cover (150) can act on the cover (110) through the horseshoe-shaped pressing rib (153), but the pressing column (154) cannot contact the bottom surface of the groove (114) due to its size. As shown in Figures 9A and 9B, when the outer cover (150) is combined with the outer base (160) to accommodate the dedicated inner box (101), because the vertical dimension of the horseshoe-shaped downward pressure rib (153) is greater than the vertical dimension of the downward pressure column (154), the lower end of the horseshoe-shaped downward pressure rib (153) can enter the groove (114) and abut the bottom surface of the groove (114), while the downward pressure column (154) is suspended in the groove (114). In other words, when the dedicated outer box (102) accommodates the dedicated inner box (101), the downward pressure column (154) does not interact with the cover (110). In addition, the side wall of the groove (114) can limit the lateral displacement of the horseshoe-shaped downward pressure rib (153), preventing the dedicated inner box (101) from swaying laterally in the dedicated outer box (102). FIG10A shows a perspective view of the inner box (11) of the mask transport box. FIG10B shows the corresponding mechanism of the pressing mechanism acting on the cover (30) of the inner box (11) of the mask transport box (10), and the outer cover (150) is omitted. FIG10C shows an enlarged view of the corresponding mechanism of the pressing mechanism and the inner box (11) of the mask transport box (10). A corresponding elastic pressing mechanism is provided on the cover (30) of the inner box (11) at a position roughly corresponding to the corner of the mask. The elastic pressing mechanism includes a pressing pin (32) and a cap (34) for fixing the pressing pin (32). Specifically, the top end of the pressing pin (32) is exposed to the top of the cover (30), and the lower end of the pressing pin (32) extends downward to the inside of the cover (30) and is exposed to the storage space of the inner box (11). When the inner box (11) accommodates a mask and a pressure is applied to the top end of the pressing pin (32), the pressing pin (32) is forced to descend, so that the lower end of the pressing pin (32) is pressed against the upper surface of the mask to fix the mask. When the dedicated outer box (102) of the photomask storage box (100) of the present invention accommodates the inner box (11) of FIG. 10A, the pressing mechanism provided on the inner side surface of the outer cover (150) of the dedicated outer box (102) can act on the elastic pressing mechanism of the inner box (11). Specifically, as shown in FIG. 10B, due to the different vertical dimensions of the horseshoe-shaped pressing rib (153) and the pressing column (154), the bottom end of the pressing column (154) of the pressing mechanism can abut against the exposed top end of the pressing pin (32), thereby the weight of the outer cover (150) is pressed down on the exposed top surface of the pressing pin (32) via the pressing column (154), while the horseshoe-shaped pressing rib (153) surrounds the cap (34) and does not act on the cover (30). As shown in FIG. 10C , the inner wall of the horseshoe-shaped downward pressure rib ( 153 ) can limit the lateral displacement of the cap ( 34 ), thereby preventing the inner box ( 11 ) from lateral shaking in the dedicated outer box ( 102 ). The Y-shaped knot of the pressure column (154) of this embodiment is intended to allow the pressure column (154) and the cap (34) to produce structural interference, thereby preventing the pressure column (154) from excessively pressing the pressure pin (32) and causing the mask to be improperly stressed. Preferably, there is an appropriate buffer gap between the horseshoe-shaped pressure rib (153) and the cap (34) to prevent the generation of particles due to hardware friction. FIG11A shows a cross-sectional view of a dedicated inner box (101) housed in a dedicated outer box (102) of the photomask storage box of the present invention. FIG11B shows a cross-sectional view of a non-dedicated inner box (11) housed in a dedicated outer box (102) of the photomask storage box of the present invention. In other words, the dedicated outer box (102) provided by the present invention contains a downward pressure mechanism composed of two structures. Therefore, in addition to being able to house a dedicated inner box (101) proposed for storage purposes, it can also house existing inner boxes (11) that are widely used in the art. Moreover, for these two inner boxes (11, 101) with different configurations and usage purposes, such a downward pressure mechanism can effectively achieve a stable housing effect. FIG12 is a view of the cover (110) of the dedicated inner box (101) of the present invention and the cover (30) of the non-dedicated inner box (11) overlapped. The volume of the groove (114) is larger than the cap (34) of the elastic pressing mechanism, and the top height of the pressing pin (32) of the elastic pressing mechanism is higher than the bottom surface of the groove (114), as shown by the vertical drop (H) in the figure, so that when the dedicated inner box (101) or the non-dedicated inner box (11) is accommodated in the dedicated outer box (102), the horseshoe-shaped pressing rib (153) can just press the bottom surface of the groove (114), or the bottom surface of the pressing column (154) of the outer cover (150) can just press the top of the pressing pin (32). In other words, in order to match the dedicated inner box and the non-dedicated inner box, the vertical dimensions of the first pressing mechanism (such as the horseshoe-shaped pressing rib 153) and the second pressing mechanism (such as the pressing column 154) provided on the inner side of the outer cover (150) of the present invention basically also have a height difference similar to the vertical drop (H). Figure 13 is a perspective view of the appearance of the photomask loading system (200) of the present invention. Figure 14 is a schematic diagram of the configuration of the photomask loading system (200) of the present invention. The photomask loading system (200) of the present invention has a first port (202) that supports the E84 specification and allows the loading or unloading of a photomask transport box (10), and a second port (204) that is connected to a connection channel of the photomask storage cabinet system (600) as shown in the fourth figure to allow the loading or unloading of a photomask storage box (100). Specifically, the overhead crane system of the factory can cooperate with the first port (202) to load the photomask transport box (10) into the photomask loading system (200) or remove the photomask transport box (100) from the photomask loading system (200); the second port (204) can cooperate with the robot arm in the photomask storage cabinet system (600) to transfer the photomask storage box (100) between the environment of the photomask storage cabinet system (600) and the environment of the photomask loading system (200). In this embodiment, the second port (204) is located on the back of the photomask loading system (200) and is therefore not shown in the thirteenth figure. The mask loading system (200) is configured to have identification and inspection means for the mask transport box (10) and the mask storage box (100), such as RFID reading means related to the box body or the mask, two-dimensional barcode reading means, and mask pellicle inspection means. The first port (202) and the second port (204) correspond to a first lifting means and a second lifting means, respectively. In this embodiment, the first lifting means (A) mainly controls a lifting platform to carry the mask transfer box (10), and the second lifting means (B) mainly controls another lifting platform to carry the mask storage box (100). The first lifting means (A) enables the lifting platform to stay at different vertical heights, namely A0, A1, and A2 from high to low. Similarly, the second lifting means (B) enables the lifting platform to stay at different vertical heights, namely B0, B1, and B2 from high to low. As shown in FIG14, the mask transport box (10) and the mask storage box (100) at heights A0 and B0 are both in an unopened state, the mask transport box (10) and the mask storage box (100) at heights A1 and B1 are both in an open state (not shown in the figure), and the mask transport box (10) and the mask storage box (100) at heights A2 and B2 are both opened and one of them can expose the mask. More specifically, when the mask transport box (10) and the mask storage box (100) are at heights A1 and B1, a cover opening means intervenes to separate the outer cover and the inner cover from the outer base and the inner base. More specifically, when the mask transport box (10) and the mask storage box (100) are at heights A2 and B2, only the outer base and the inner base of each remain on the lifting platform, and the inner and outer covers are blocked and do not descend to the heights A2 and B2, and at this time the mask can be located in a mask transfer environment (206). The conditions of the mask transfer environment (206) can be different from the heights A0, A1, B0, and B1, ensuring that the risk of mask transfer is low. The mask transfer environment (206) includes a mask clamping mechanism configured to pick up the mask from the base or place the mask on the base so that the mask can be transferred between the base of the mask transport box (10) and the base of the mask storage box (100). In addition, the robot arm in the mask storage cabinet system (600) can take the mask storage box (100) in the mask loading system (200) through the second port (204). If the mask loading system (200) cannot operate due to a fault and there is still a mask storage box (100) inside it, the robot arm of the mask storage cabinet system (600) can temporarily remove the mask storage box (100), thereby ensuring that the dedicated box of the mask storage cabinet system (600) will not be contaminated due to maintenance of the mask loading system (200). In order to ensure that the environment in the mask loading system (200) also has a certain degree of cleanliness, as shown in FIG13 , a fan filter unit (FFU) is provided above the cabinet to be responsible for air intake, filtration and exhaust. FIG15 and FIG16 are flowcharts of mask loading and unloading according to the embodiment of FIG14. In step 1500A, a mask transport box (10) is loaded via a first port (202). The mask transport box (10) includes an inner box for accommodating a mask and an outer box for accommodating the inner box. The mask needs to be stored because it is not used or has been used. The inner box and the outer box may correspond to the inner box (11) and the outer box (12) in the first figure, respectively. In step 1500B, a mask storage box (100) is loaded from the mask storage cabinet system (600). The mask storage box (100) includes an empty dedicated inner box and a dedicated outer box for accommodating the dedicated inner box. The mask storage cabinet system (600) already stores a plurality of mask storage boxes (100). The empty dedicated box is loaded in this step. The dedicated inner box and dedicated outer box may correspond to the dedicated inner box (101) and dedicated outer box (102) in FIG. 5A. In step 1502, the mask loading system (200) detects the mask transfer box (10) and the mask storage box (100) respectively; performs the inner box and outer box opening action of the mask transfer box (10); performs the dedicated outer box and dedicated inner box opening action of the mask storage box (100); and lowers the outer base of the mask transfer box (10) and the outer base of the mask storage box (100) to the mask transfer environment (206). Specifically, this step may cover positions A0 to A2 and B0 to B2 of the first lifting means A and the second lifting means B in Figure 14. In step 1504, the mask is taken from the base of the mask transport box (10) and transferred to the base of the mask storage box (100). The transfer in this step is achieved by a mask clamping mechanism, and the mask is moved in a mask transfer environment (206) with high cleanliness to reduce the risk of mask contamination. In step 1506, the mask transport box (10) and the mask storage box (100) are restored to a closed state. At this time, the mask transport box (10) is empty, and the mask storage box (100) is loaded with masks to be stored. In step 1508, the mask storage box (100) carrying the mask is transferred to a designated storage rack of the mask cabinet system (600). Preferably, the designation of the storage rack is based on the shortest movement path of the robot arm between the storage rack and the second port (204) of FIG. 14. In step 1510, a gas filling method is performed to fill the photomask storage box (100) with non-reactive gas to complete the storage of the photomask. Specifically, the storage rack has a dedicated pipe and connector connected to the photomask storage box (100), which can fill the dedicated outer box of the photomask cabinet system (600) with nitrogen. In other words, the dedicated inner box is stored in a specific gas environment. In step 1600A, a mask transport box (10) is loaded from the first port (202), wherein the mask transport box (10) includes an empty inner box and an outer box for accommodating the inner box. The inner box and the outer box may correspond to the inner box (11) and the outer box (12) in the first figure. In step 1600B, a mask storage box (100) is loaded from the mask storage cabinet system (600) to the mask loading system (200). The mask storage box (100) includes a dedicated inner box for accommodating a mask and a dedicated outer box for accommodating the inner box. The dedicated inner box and the dedicated outer box may correspond to the dedicated inner box (101) and the dedicated outer box (102) in FIG. 5A. The masks in this step have been previously stored in the mask storage cabinet system (600) and will be taken out for various applications. In step 1602, the mask loading system (200) detects the mask transfer box (10) and the mask storage box (100) respectively; opens the inner box and the outer box of the mask transfer box (10); opens the inner box and the outer box of the mask storage box (100); and lowers the outer bases of the mask transfer box (10) and the mask storage box (100) to the mask transfer environment (206). In step 1604, the mask is taken from the base of the mask storage box (100) and placed on the base of the mask transfer box (10). Similarly, the mask loading system (200) transfers the mask from the base of the mask storage box (100) to the base of the mask transfer box (10) using the mask clamping mechanism, and the mask is moved in the mask transfer environment (206). In step 1606, the mask transport box (10) and the mask storage box (100) are restored to a closed state. At this time, the mask transport box (10) is loaded with a mask, while the mask storage box (100) is empty. In step 1608, the mask transport box (10) carrying the mask is moved out of the mask loading system (200) from the first port (202). Specifically, the first port (202) can cooperate with the overhead crane system to remove the mask transport box (10). The empty mask storage box (100) is then returned to the appropriate area of ​​the mask storage cabinet system (600) to wait for the next use. FIG17 shows a specific flow chart of a mask transfer of the present invention, which is explained below in conjunction with FIG14 , wherein the left half is executed by the first lifting means (A), the right half is executed by the second lifting means (B), and the rest are executed jointly. In step 1700A, a mask transport box (10) is loaded from the first port (202) to the first lifting means (A) of the mask loading system (200). The mask transport box (10) includes an inner box and an outer box for accommodating the inner box. Specifically, the lifting platform of the first lifting means (A) stops at a height A0 to receive and carry the mask transport box (10). In step 1700B, a mask storage box (100) is loaded from the mask storage system (600) via a connecting passage to the second lifting means (B) of the mask loading system (200). The mask storage box (100) includes a dedicated inner box and a dedicated outer box for accommodating the inner box. Specifically, the lifting platform of the second lifting means (B) stops at a height B0 to receive and carry the mask storage box (100). In step 1702A, the cover of the outer box of the mask transport box (10) is grasped, and the lifting platform of the first lifting means (A) is lowered from A0 to A1, and the cover of the outer box is separated from the base of the outer box. When the lifting platform is at A1, the cover of the outer box has been removed, and only the base of the outer box and the inner box are left on the lifting platform. In step 1702B, the cover of the outer box of the mask storage box (100) is grasped, and the lifting platform of the second lifting means (B) is lowered from B0 to B1, and the cover of the outer box is separated from the base of the outer box. When the lifting platform is at B1, the cover of the outer box has been removed, and only the base of the outer box and the inner box are left on the lifting platform. In step 1704A, the cover of the inner box of the mask transport box (10) is grasped, and when the lifting platform of the first lifting means (A) is lowered from A1 to A2, the cover of the inner box is separated from the base. When the lifting platform is at A2, the cover of the inner box has been removed, and only the base of the outer box and the base of the inner box remain. During the period when the lifting platform is lowered from A0 to A2, the mask loading system (200) can read the two-dimensional barcode of the inner box, the two-dimensional barcode of the mask and / or detect the state of the protective film. In step 1704B, the cover of the inner box of the mask storage box (100) is grasped, and when the lifting platform of the second lifting means (B) is lowered from B1 to B2, the cover of the inner box is separated from the base. When the lifting platform is at B2, the cover of the inner box has been removed, and only the base of the outer box and the base of the inner box remain. During the period when the lifting platform is lowered from B0 to B2, the mask loading system (200) can read the two-dimensional barcode of the inner box, the two-dimensional barcode of the mask and / or detect the state of the protective film. In step 1706, a mask is transferred between the base of the inner box of the mask transport box (10) and the base of the inner box of the mask storage box (100) by the mask clamping mechanism of the mask loading system (200). Specific embodiments of the mask clamping mechanism can be found in Figures 19A to 19C and their descriptions. In step 1708A, the lifting platform of the first lifting means (A) is raised from height A2 to A1, so that the cover of the inner box of the mask transfer box (10) is combined with the base of the inner box. In step 1708B, the lifting platform of the second lifting means (B) is raised from the height B2 to B1, so that the cover of the inner box of the mask storage box (100) is combined with the base of the inner box. In step 1710A, the lifting platform of the first lifting means (A) is raised from height A1 to A0, so that the cover of the outer box of the mask transfer box (10) is combined with the base of the outer box. In step 1710B, the lifting platform of the second lifting means (B) is raised from height B1 to B0, so that the cover of the outer box of the mask storage box (100) is combined with the base of the outer box. In step 1712A, the mask transport box (10) is removed through the first port (202). The lifting platform of the first lifting means (A) is higher than A0 and exposes the mask transport box (10) to the first port (202) of the mask loading system (200), waiting for subsequent action of the overhead crane system. In step 1712B, the mask storage box (100) is loaded into the mask storage system (600) via the connection channel of the mask storage system (600). The robot arm of the mask storage system (600) can enter the mask loading system (200) and take the mask storage box (100) from the second lifting means (B). In the above embodiment, the first lifting means (A) and the second lifting means (B) can each perform dedicated customized operations for the mask transport box (10) and the mask storage box (100), such as the first lifting means (A) can be configured to lock and unlock the outer box of the mask storage box (100). FIG18 shows a specific embodiment of the photomask loading system of the present invention, which has a first lifting means (A) and a second lifting means (B) as shown in FIG14. It can be seen that the first lifting means (A) has an outer box cover support surface (1800A), which basically only contacts the cover of the outer box of the photomask conveying box (10), that is, the center of the outer box cover support surface (1800A) basically has a hollow that allows the base of the outer box to fall. As for the base of the outer box of the photomask conveying box (10), it is supported by the lifting platform (1802A). Therefore, when the outer box of the photomask conveying box (10) is not locked, the descent of the lifting platform (1802A) can separate the cover and base of the outer box, so that the base of the outer box and the inner box can be lowered together to achieve the purpose of opening the box. The closing of the box is similar. When the lifting platform (1802A) rises to a height that is roughly flush with the outer box cover support surface (1800A), the outer box cover of the mask transfer box (10) is combined with the base. The second lifting means (B) can have a similar configuration to achieve the operation of the mask storage box (100). Although Figure 18 only shows the opening of the outer box of the mask transport box (10), the opening of the inner box of the mask transport box (10) can be opened by the intervention of other mechanisms. The mask storage box (100) can also be opened and closed by the same mechanism. In addition, an appropriate identification device or sensing unit can be provided in the mask loading system (200) to timely identify relevant information on the box when the mask transport box (10) and the mask storage box (100) are opened, such as RFID and a two-dimensional barcode. Figures 19A, 19B and 19C show a specific embodiment of a mask clamping mechanism (1900) for use in a mask loading system. The mask clamping mechanism (1900) is configured in a mask transfer environment (206) as shown in Figure 14, and has a track (1902) and a clamping assembly (1904). The track (1902) is fixed to the inner side of the mask loading system (200). As shown in Figure 20, the clamping assembly (1904) is controlled to move laterally on the track (1902). The clamping assembly (1904) has a pair of clamping arms (1906) and a pair of contact plates (1908). The pair of contact plates (1908) can be driven to approach each other and, through their mating portions (1910), engage with the periphery of the mask (R) to achieve the purpose of clamping the mask (R). The mask holding mechanism (1900) does not have the ability to move vertically, so the lifting platform must be lowered to allow the mask (R) to leave the base. Figure 20 shows a side view of the cooperation between the mask clamping mechanism (1900) and the lifting platform (2000). The lifting platform (2000) carrying the outer base (40) of the outer box (12), the base (20) of the inner box (11) and the mask (omitted and not shown) descends to the bottom of the mask clamping mechanism (1900), as shown in the right figure in Figure 20. Then, the clamping assembly (1904) moves horizontally to above the mask (R) carried by the lifting platform (2000). The lifting platform (2000) rises to a height at which the mask can be clamped, as shown in the left figure in Figure 20. After the clamping assembly (1904) clamps the mask, the lifting platform (2000) descends. The clamping assembly (1904) moves horizontally to above another lifting platform (not shown). Similarly, the other lifting platform rises to a height at which the base of the inner box can receive the mask. The clamping assembly (1904) releases the mask to complete the transfer action. During the period when the mask clamping mechanism (1900) is not in operation, the clamping assembly (1904) can be moved between the two lifting means to avoid interference in movement. The dotted line in Figure 20 shows that the clamping assembly (1904) is maintained at the same height during the movement. FIG21 illustrates an abnormality handling process of a mask loading system, in particular, an abnormality handling process of loading a mask transfer box (10) on a lifting platform of the first lifting means (A) or the second lifting means (B) as shown in FIG14. In the case where the mask transport box (10) is abnormally loaded and stops, the mask loading system (200) can display the abnormal state and detect whether an initialization button is activated. When the initialization button is activated, the mask loading system (200) is fully initialized. The lifting platform returns the mask transport box (10) to the height A0. In the case where the mask storage box (100) is abnormally loaded and stops, the mask loading system (200) can display the abnormal state and detect whether an initialization button is activated. When the initialization button is activated, the mask loading system (200) is fully initialized. The lifting platform returns the mask storage box (100) to the height B0. In the case where the lifting platforms of the first lifting means (A) and the second lifting means (B) are at heights A2 and B2 and a conversion abnormality occurs and the system stops, the mask loading system (200) can display the abnormal state and detect whether an initialization button is activated. When the initialization button is activated, the entire mask loading system (200) is initialized. The mask clamping mechanism (1900) places the mask in the inner box of the mask transfer box (10) or the inner box of the mask storage box (100). The lifting platforms of the first lifting means (A) and the second lifting means (B) return to heights A0 and B0 respectively. FIG22 illustrates another abnormality handling process of the mask loading system (200), which further includes checking the state of the pellicle. The mask loading system (200) can also detect whether a key eject is activated and perform various actions to return the mask to the mask transfer box (10) or the mask storage box (100), or return the mask storage box (100) to a designated storage rack. Figure 23 illustrates the abnormal handling process of the mask clamping mechanism, wherein the mask comes from the inner box of the mask conveying box (10) or the inner box of the mask storage box (100), and the mask clamping mechanism (1900) can return the mask to the inner box of the mask conveying box (10) or the inner box of the mask storage box (100), and then return the mask conveying box (10) or the mask storage box (100) to the position specified by the initialization process. FIG24 is a block diagram of the mask loading system and mask storage system of the present invention. The mask cabinet system (600) includes one or more storage cabinets (602). The storage cabinet (602) includes a plurality of storage racks (604) stacked vertically. The storage cabinet (602) can be roughly divided into an upper area and a lower area. A dedicated mask storage box (100) can be placed on each storage rack (604) of the storage cabinet (602). The dedicated mask storage box (100) consists of a dedicated outer box and a dedicated inner box, wherein the dedicated outer box is suitable for accommodating and stabilizing the dedicated inner box, and the dedicated inner box is suitable for accommodating and stabilizing a mask. The dedicated inner box and the dedicated outer box can correspond to the dedicated inner box (101) and the dedicated outer box (102) shown in FIG5A. Part of the storage rack (604) of the storage cabinet (602) can be planned as a buffer zone (606). The buffer zone (606) is used to store cleaned mask storage boxes (100) or used mask storage boxes (100). The cleaned mask storage boxes (100) are empty boxes waiting to be provided to the mask loading system (200) to receive the masks to be collected. The used mask storage boxes (100) refer to empty boxes returned from the mask loading system (200). Since they are exposed to a lower cleanliness environment during the mask conversion process, there is a risk of contamination. The photomask cabinet system (600) includes a management means (608), which is mainly configured to manage the photomask information stored in the storage cabinet (602) and monitor the ambient temperature and humidity in the storage cabinet (602). For example, an oxygen detection unit is used to detect the ambient oxygen concentration in the cabinet. Preferably, the environment in the storage cabinet (602) meets the Class 10 cleanliness level, and the inflation gas meets the Class 1 cleanliness level. The photomask cabinet system (600) also includes a control means (610) to control a robotic arm (609) to transfer the photomask storage box to a designated general storage area or storage rack (604) in the buffer zone (606). The photomask cabinet system (600) also includes a flow control means (612) responsible for various flow controls of the storage cabinet (602), especially the non-reactive gas connected to each storage rack (604). For example, a mass flow controller is used to control the flow of one or more nitrogen main lines. The flow control means (612) further includes controlling a fan filter unit (FFU) configured at the top of the photomask cabinet system (600) and an exhaust module configured at the bottom of the photomask cabinet system (600). The photomask cabinet system (600) further includes a cleaning device (614) adjacent to the buffer zone (606) for providing clean photomask storage boxes (100) to the storage cabinet (602) and receiving used photomask storage boxes (100) from the storage cabinet (602). FIG25 is a top view of the photomask storage system (600) of the present invention, showing the specific configuration of the interior of the photomask storage system. The storage cabinets (602) are mainly placed along the inner wall of the photomask storage system (600). The robot arm (609) is located in the center of the photomask storage system (600) and can access each storage rack (604) of these storage cabinets (602). FIG26A shows a perspective view of a specific embodiment of the storage rack (604) of the present invention. FIG26B shows the bottom configuration of the storage rack (604). Each storage rack (604) is a flat rack having a front end (2600) and a rear end (2602). The rack has an upward-facing load-bearing surface and a downward-facing bottom surface. A notch is formed at the front end (2600) of the rack, which provides space required for the robot arm (609) to move, so that the robot arm (609) can smoothly place the mask storage box (100) on the storage rack (604) or remove the mask storage box (100) from the storage rack (604). The rear end (2602) of the rack is equipped with a nitrogen gas charging pipe (2604), the upstream end of which is connected to a nitrogen source, and the downstream end is connected to a pair of nozzles (2606) of the flat rack, which supply nitrogen at the same time. Three kinematic coupling positioning pins (2608) are provided on the bearing surface of each storage rack (604) for supporting the bottom of the mask storage box (100), two of which are located near the front end (2600) and on both sides of the notch, and the other positioning pin (2608) is located at the rear end (2602) of the rack body, so that the storage rack (604) mainly supports and positions the mask storage box (100) through these three positioning pins (2608). Specifically, the three positioning pins (2608) correspond to the positioning grooves (163) of the outer base shown in Figure 5C or the positioning grooves (132) of the base (130) shown in Figure 5I, respectively, depending on whether the storage rack (604) supports an outer box or an inner box of a special box. The supporting surface of the storage rack (604) is also provided with a stopper (2610) for limiting the photomask storage box (100). Preferably, the stopper (2610) can be marked with information that can be identified by the robotic arm (609). The information can also be marked on the front end (2600) of the storage rack (604). As shown in the figure, side walls for limiting the photomask storage box (100) are also formed on both sides of the rack. The two sides of the rack of the storage rack (604) are fixed to a wall or a vertical branch of a frame via a pair of connecting arms (2612) to establish a vertical stack of multiple storage racks (604). The positioning column (2608), the stopper (2610) and the side wall can be made of PEEK plastic material to reduce particles generated by friction. FIG27A shows that the storage rack (604) has a photomask storage box (100). FIG27B shows a bottom view of the storage rack (604) having a photomask storage box (100). FIG27C shows another view of the storage rack (604) having a photomask storage box (100). As shown in FIG5A, the mask storage box (100) includes a dedicated inner box (101) and a dedicated outer box (102), wherein the dedicated outer box (102) has an outer cover (150) and an outer base (160). The bottom of the outer base (160) is provided with a latch mechanism (2700) for interlocking or unlocking the outer cover (150) and the outer base (160). When the mask storage box (100) is loaded onto the lifting platform of the mask loading system (200) as shown in FIG14, the operating mechanism provided in the second lifting means (B) can cooperate with the latch mechanism (2700) of the outer base (160) to lock or unlock the outer box (102). When the photomask storage box (100) is placed on a designated storage rack (604), the positioning posts (2608) of the storage rack (604) cooperate with the corresponding positioning slots (163) at the bottom of the photomask storage box (100), thereby positioning the photomask storage box (100) on the storage rack (604). Specifically, the positioning posts (2608) of the storage rack (604) are located at an outer end of the corresponding positioning slot (163), i.e., an end away from the latch mechanism (2700), and the inner end of each positioning slot (163) near the latch mechanism (2700) is exposed through a notch, so that when the robotic arm (609) approaches the bottom of the photomask storage box (100), the positioning posts (2804) of the robotic arm (609) can engage the proximal end of the corresponding positioning slot (163). FIG28A shows a top view of a specific embodiment of the storage rack (604) and the robotic arm (609), wherein the robotic arm (609) is located below the photomask storage box (100), and the positioning groove (163) at the bottom of the photomask storage box (100) on the storage rack (604) is indicated by a dotted line. FIG28B shows a side view of the robotic arm (609) entering below the storage rack (604) and extracting the photomask storage box (100). FIG28C shows a side view of the robotic arm (609) removing the photomask storage box (100) from the storage rack (604). The robotic arm (609) has a front end (2800) and a rear end (2802), wherein the front end (2800) is basically an arrow-shaped flat plate, and its upward bearing surface has three positioning posts (2804), and the three positioning posts (2804) are aligned with the inner ends of the positioning grooves (163) at the bottom of the mask storage box (100), while the positioning posts (2608) of the storage rack (604) are aligned with the outer ends of the positioning grooves (163). In other words, the positioning grooves (163) at the bottom of the mask storage box (100) of the present invention extend from at least the range of the flat plate frame of the storage rack (604) to the range of the notch, but the present invention is not limited to this. The rear end (2802) is connected to the transmission mechanism, so that the robotic arm (609) can move at least horizontally and vertically. As shown in Figures 28A and 28B, when the robotic arm (609) approaches the mask storage box (100), the front end (2800) of the robotic arm (609) first extends under the gap of the target storage rack (604), and the positioning column (2804) of the robotic arm (609) is aligned with the corresponding positioning groove (163) at the bottom of the mask storage box (100). The robotic arm (609) rises so that the positioning column (2804) engages with the positioning slot (163) at the bottom of the photomask storage box (100). The robotic arm (609) continues to rise to lift the photomask storage box (100) away from the storage rack (604), and the lifting height is at least higher than the front end (2600) of the storage rack to allow the robotic arm (609) to exit the storage rack (604), as shown in Figure 28C. Under the condition that the minimum space required for the robot arm (609) to access each mask storage box (100) is determined, the height between the upper and lower storage racks (604) can be minimized to achieve maximum storage efficiency. FIG29 shows the upstream gas supply line (2900) of the storage rack (604) and its flow control means. The downstream of the gas supply line (2900) is connected to the gas charging line (2604) as shown in FIG26A. Therefore, nitrogen can be supplied to the box through the nozzle (2606) of the storage rack (604) and the corresponding two gas valves (162) of the mask storage box (100) as shown in FIG5C. As for the other two unconnected gas valves (162) of the mask storage box (100), the gas in the box is discharged, so that the mask storage space of the mask storage box (100) located on the storage rack (604) has convection gas. The flow control means upstream of each gas supply pipeline (2900) may include a ball valve (2901), a flow display (2902), a flow limiting valve (2903), a filter (2904), a thermometer and hygrometer (2905), a mechanical pressure gauge (2906), an electronic pressure gauge (2907), a pressure regulating valve (2908), and a main pipeline (2909) having a pressure gauge (2910) and an air valve (2911), but the present invention is not limited to this. FIG30 shows two specific embodiments of the upstream gas supply line connected to the storage rack (604). In a configuration with a flow controller (3000), one or more sensors provided on the storage rack (604) can transmit a detection signal to the flow controller (3000) according to whether there is a mask storage box (100) on the storage rack (604), so that the flow controller (3000) can control the gas flow entering the storage rack (604) accordingly. For example, when the storage rack (604) has a dedicated box, nitrogen is supplied; when the storage rack (604) does not have a dedicated box, the nitrogen supply is turned off. In a configuration with a needle valve (3002), the gas flow supplied to the storage rack (604) can be manually adjusted, and can even be maintained in a continuous gas supply state. Regardless of the gas used, the filter (3001) ensures that impurities in the gas are reduced. FIG31 illustrates an abnormality handling process of the robot arm (609) of the mask cabinet system (600), which includes checking the state of the protective film and selectively making the mask transfer box (non-dedicated box) or the mask storage box (dedicated box) perform specific actions and return to the designated position according to the state of the protective film. FIG32 shows a schematic diagram of another embodiment of the mask loading device (200') and the mask storage system (600') of the present invention. Each storage rack (604) of the storage cabinet (602) of this embodiment only supplies a dedicated outer box (102) of the dedicated mask storage box (100) as shown in FIG5A, and does not provide a dedicated inner box (101) of the mask storage box (100). However, the dedicated outer box (102) can accommodate the inner box obtained from the mask loading system (200'), that is, the inner box (11) of the non-dedicated mask transfer box (10) as shown in FIG1. ​​Therefore, the purpose of the mask loading system (200') of this embodiment is to transfer the inner box containing the mask. Apart from this, the remaining configuration is roughly the same as the embodiment of FIG24, and the relevant description will not be repeated. The details of the mask loading system (200') and the mask storage system (600') will be described later. The reason why the photomask storage system (600') of this embodiment does not provide a dedicated inner box is that the dedicated outer box (102) of the photomask storage box (100) of the present invention has a downward pressing mechanism as shown in Figure 8A, which is compatible with non-dedicated inner boxes. As shown in Figure 8A and Figure 11B, when the dedicated outer box (102) of the storage cabinet (602) accommodates the non-dedicated inner box (11), the horseshoe-shaped downward pressing rib (153) of the dedicated outer box (102) surrounds and restricts the cap (34), and the downward pressing column (154) abuts against the downward pressing pin (32) on the cover (30) of the inner box (11), thereby realizing the storage of the non-dedicated inner box (11) and the photomask. This has the advantage that the photomask will not be exposed to the environment outside the box during the transfer process, thereby reducing the risk of particle contamination. FIG33 is a flowchart of the mask loading process according to the embodiment of FIG32 , wherein the left half is performed by the first lifting means (A) and the right half is performed by the second lifting means (B). In step 3300A, the overhead crane system or manually loads the mask transport box (10) into the mask loading system (200') via the first port (202). The mask transport box (10) includes an inner box (11) and an outer box (12) containing masks. The loaded mask transport box (10) is received by the lifting platform of the first lifting means (A) at a height A0. In step 3300B, a dedicated outer box (102) of a dedicated box is loaded from the mask storage cabinet system (600') to the mask loading system (200') via the second port (204), wherein the loaded dedicated outer box (102) is an empty box that does not contain any inner box. Specifically, the robot arm (609) of the mask storage cabinet system (600') places the dedicated outer box (102) on the lifting platform of the second lifting means (B), that is, at a height B0. In step 3302, the mask transfer box (10) and the dedicated outer box (102) are detected, for example, the information marked on or inside the box body and the status of the mask film are identified. The lifting platforms of the first lifting means (A) and the second lifting means (B) are lowered to heights A2 and B2 respectively. During the lowering process, the non-dedicated outer box (12) and the dedicated outer box (102) are opened by a similar mechanism. The lifting platform of the first lifting means (A) at heights A2 and B2 only carries the outer base (40) and the inner box (11), and the lifting platform of the second lifting means (B) only carries the outer base (160) of the dedicated box, and both are located in the mask transfer environment (206). It should be understood that since the inner box (11) does not need to be opened in this embodiment, the mask transfer environment (206) can meet the cleanliness requirements of the inner box. Furthermore, since this embodiment does not require opening the inner box (11) to transfer the mask, compared with the embodiment of Figure 14, the first lifting means (A) and the second lifting means (B) can omit the related actions of the heights A1 and B1. In step 3304, the gripping mechanism of the mask loading system (200') extracts the inner box (11) and transfers the inner box (11) to the outer base (160) of the dedicated box. The gripping mechanism can be similar to the configuration of FIG. 19A, but is suitable for the inner box (11). The action of the gripping mechanism is similar to the description of FIG. 20. In step 3306, after the transfer of the inner box (11) is completed, the lifting platforms of the first lifting means (A) and the second lifting means (B) rise to heights A0 and B0, so that the non-dedicated outer box (12) is closed, and the dedicated outer box (102) is closed and accommodates the inner box (11). In step 3308, the dedicated outer box (102) containing the inner box (11) is stored on a designated storage rack (604) of the storage cabinet (602). The mask storage cabinet system (600') can specify the target storage rack (604) based on a shortest path that the robot arm (609) can move. In step 3310, the storage rack (604) fills the dedicated outer box (102) with nitrogen. Similarly, the dedicated outer box (102) and the storage rack (604) of this embodiment can be configured as shown in the embodiments of Figures 27A and 27B to achieve the gas filling. FIG34 is a flowchart of the mask unloading process according to the embodiment of FIG32 , wherein the left half is executed by the first lifting means (A) and the right half is executed by the second lifting means (B). In step 3400A, an empty outer box (12) of a non-dedicated mask transport box (10) is loaded from the first port (202). The loaded outer box (12) does not contain any inner box and is carried by the lifting platform of the first lifting means (A) at a height A0. In step 3400B, a dedicated outer box (102) is loaded from the photomask storage cabinet system (600') via the second port (204), and the loaded dedicated outer box (102) contains an inner box (11) with a photomask. The loaded dedicated outer box (102) and inner box (11) are carried by the lifting platform of the second means (B) at a height B0. In step 3402, similarly, the first lifting means (A) and the second lifting means (B) detect the outer box (12) that is not a dedicated box, the dedicated outer box (102), and the inner box (11). The outer box (12) and the dedicated outer box (102) are opened respectively, and the outer base (40) of the outer box (12) and the outer base (160) of the dedicated outer box (102) are lowered to heights A2 and B2, so that the inner box (11) is located in the mask transfer environment (206). In step 3404, the inner box (11) is extracted and transferred to the outer base (40) of the outer box (12). The transfer is carried out in a mask transfer environment (206) or in another environment with a cleanliness level suitable for inner box transfer. In step 3406, the lifting platforms of the first lifting means (A) and the second lifting means (B) rise from heights A2 and B2 to heights A0 and B0, causing the non-dedicated outer box (12) to close and accommodate the inner box (11), and causing the dedicated outer box (102) to close. At this time, the closed dedicated outer box (102) is empty, and the non-dedicated inner box (11) and the outer box (12) form the mask transfer box (10). In step 3408, the first lifting means (A) moves the mask transport box (10) out of the mask loading system (200') from the first port (202) and sends it to various processing environments. FIG35 is a flow chart of the inner box (11) transfer according to the embodiment of FIG32, wherein the left half is the action performed by the first lifting means (A), and the right half is the action performed by the second lifting means (B). In steps 3500A and 3500B, the first lifting means (A) receives the outer box (12) of the non-dedicated mask transport box (10) at a height A0, and the second lifting means (B) receives the dedicated outer box (102) of the dedicated mask storage box (100) at a height B0. Either the non-dedicated outer box (12) or the dedicated outer box (102) accommodates an inner box (11) having a mask, and the inner box (11) is structurally compatible with the non-dedicated outer box (12) and the dedicated outer box (102). In steps 3502A and 3502B, the first lifting means (A) and the second lifting means (B) are respectively operated to unlock the non-dedicated outer box (12) and the dedicated outer box (102). After unlocking, the first lifting means (A) and the second lifting means (B) respectively grasp the outer covers of the non-dedicated outer box (12) and the dedicated outer box (102) and lower the lifting platform from heights A0 and B0 to heights A2 and B2, so that the non-dedicated outer box (12) and the dedicated outer box (102) are opened during the lowering process. In steps 3504A and 3504B, the first lifting means (A) and the second lifting means (B) are respectively operated to identify information marked on the non-dedicated outer box (12), the dedicated outer box (102), the received inner box (11) and / or the mask during the descent, such as a two-dimensional barcode or the mask film status. If the identification result does not match the expected target, the mask loading system (200') can execute the relevant exception handling process. In step 3506, the inner box (11) is transferred between the non-dedicated outer base (40) and the dedicated outer base (160) using a mask clamping mechanism (1900) similar to FIG19A. For example, the clamping arm (1906) and the contact plate (1908) of the mask clamping mechanism (1900) in FIG19A can be modified to adapt to the size and structure of the inner box (11) to achieve the transfer of the inner box (11). In steps 3508A and 3508B, the first lifting means (A) and the second lifting means (B) are operated to raise the lifting platform from heights A2 and B2 to heights A0 and B0, respectively, so that the non-dedicated outer box (12) and the dedicated outer box (102) are closed and locked respectively. In steps 3510A and 3510B, an empty non-dedicated outer box (12) or a mask transport box (10) with an inner box (11) can be moved out of the mask loading system (200') via the first port (202), and an empty dedicated outer box (102) or a dedicated outer box (102) containing a non-dedicated inner box (11) can be returned to the mask storage cabinet system (600') via the second port (204). FIG36 shows a process of transferring the inner box (11). During this period, the first lifting means (A) and the second lifting means (B) are operated in the mask transfer environment (206) or other clean environment. As shown in the figure, the lifting platforms are all lowered to the bottom of the inner box clamping mechanism (1900'). The clamping mechanism (1900') moves horizontally to the top of the inner box (11). When the inner box clamping mechanism (1900') does not move up and down, the lifting platform of the first lifting means (A) rises to a height at which the inner box (11) can be clamped. After the inner box (11) is clamped, the lifting platform is lowered to complete the separation. The inner box (11) is moved horizontally to the lifting platform of the second lifting means (B). The lifting platform of the second lifting means (B) rises to receive the inner box (11), and at the same time, the mask clamping mechanism (1900') is released to achieve the transfer of the inner box (11). FIG37 shows a schematic diagram of another embodiment of the mask loading device (200) and the mask storage system (600") of the present invention, wherein the mask storage system (600") is substantially the same in configuration as the aforementioned embodiment, except that the storage cabinet (602) provides a plurality of storage chambers (604'). Each storage chamber (604') can store a dedicated double-layer box, such as the mask storage box (100) shown in FIG5A. Alternatively, each storage chamber (604') can store a single-layer box (3700), which is mainly composed of a cover and a base for accommodating masks obtained from the mask transfer box (10). FIG38A shows a specific embodiment of a storage chamber (604'). FIG38B shows the configuration of the upward-facing support surface inside the storage chamber (604'). FIG38C shows a single-layer box (3700) in the storage chamber (604'). FIG38D shows the support surface mechanism of the storage chamber (604') supporting the bottom of the single-layer box (3700). These storage chambers (604') can be fixed to the bracket of the storage cabinet (602) by similar means to establish a vertical stacking form. Each storage chamber (604') is basically a box body with an opening, providing a storage space sufficient to accommodate a single-layer box (3700). The opening allows the robotic arm (609) to access the single-layer box (3700). The back of the storage chamber (604') is provided with two connectors (3800), which can be connected upstream to a nitrogen source, thereby allowing nitrogen to be filled into the storage chamber (604'). The upward bearing surface on the inner side of the storage chamber (604') is provided with three dynamic coupling positioning columns (3802) and two auxiliary guide columns (3804) for positioning and supporting the single-layer box (3700). In another embodiment, the opening of the storage chamber (604') can be provided with a gate to prevent the single-layer box (3700) from falling and to maintain the nitrogen condition in the storage chamber (604'). FIG39A shows the mask loading process according to FIG37. FIG39B shows the mask unloading process according to FIG37. In step 3900A, a double-layer box is loaded from the first port (202) onto the lifting platform of the first lifting means (A) of the mask loading system (200), such as the mask transfer box (10), which includes an inner box for accommodating a mask and an outer box for accommodating the inner box. In step 3900B, an empty single-layer box (3700) is loaded from the mask storage cabinet system (600") via the second port (204) onto the lifting platform of the second lifting means (B). In step 3902, the photomask contained in the inner box of the photomask transport box (10) is removed and transferred to an empty single-layer box. Similar to the embodiment of FIG. 24, the process of the lifting platform of the first lifting means (A) descending from height A0 to A2 opens the outer box and the inner box to expose the photomask, and the process of the lifting platform of the second lifting means (B) descending from height B0 to B2 opens the single-layer box (3700) to expose the inner base. Then, the photomask clamping mechanism transfers the photomask from the inner box base of the photomask transport box (10) to the base of the single-layer box (3700). Finally, the lifting platform of the second lifting means (B) rises from height B2 to B0 to accommodate the photomask in the single-layer box (3700). In step 3904, the single-layer box (3700) containing the mask is transferred from the mask loading system (200) to the mask storage cabinet system (600") and moved according to the storage room (604') designated by the storage cabinet (602). Preferably, the designated storage room (604') is determined by a shortest movement path of the robot arm (609). In step 3906, the robotic arm (609) opens the gate of the storage chamber (604') and places the single-layer box (3700) into the storage chamber (604'). After closing the gate, nitrogen is filled into the storage chamber (604'), completing the photomask storage. In an embodiment without a gate, the robotic arm (609) does not need to open the gate. The gate can be replaced by continuous nitrogen filling. In step 3908A, an empty double-layer box (such as the reticle transport box 10) or an empty single-layer box (3700) is loaded onto the lifting platform of the first lifting means (A) of the reticle loading system (200). In step 3908B, the robot arm (609) takes out the single-layer box (3700) containing the designated photomask from the designated storage chamber (604') and loads it onto the lifting platform of the second lifting means (B) of the photomask loading system (200). In step 3910, the first lifting means (A) and the second lifting means (B) respectively lower the inner box base of the mask transport box (10) and the mask of the single-layer box (3700) to the mask transfer environment (206) to transfer the mask of the single-layer box to the mask transport box (10). In step 3912, the mask transport box (10) containing the mask is taken out by the overhead crane system through the first port (204) and sent to the target station. FIG40 illustrates a specific mask transfer process according to the embodiment of FIG37, wherein the left half depicts the steps performed by the first lifting means (A), and the right half depicts the steps performed by the second lifting means (B). Step 4000A: Load a double-layer box (such as the mask transfer box 10) from the first port (202) onto the lifting platform of the first lifting means (A). Step 4000B, load a single-layer box (3700) from the mask storage system (600") to the lifting platform of the second lifting means (B). Step 4002A, grasp the cover of the outer box, unlock the outer box, and lower the lifting platform of the first lifting means (A) from height A0 to A1. Step 4002B, grasp the cover of the single-layer box (3700) at height B0 or ​​B1, and lower the lifting platform of the base carrying the single-layer box (3700) from height B0 to B1. Step 4004A, lower the lifting platform of the base carrying the inner box from height A1 to A2. Step 4004B, lower the lifting platform of the base carrying the single-layer box (3700) from position B1 to B2. Step 4006, the mask clamping mechanism transfers the mask between the base of the inner box and the base of the single-layer box (3700). Step 4008A, after raising the lifting platform from height A2 to A1, the inner box is closed. Step 4008B, after raising the lifting platform from position B2 to B1, the single-layer box (3700) is closed. Step 4010A, after raising the lifting platform from height A1 to A0, the outer box is closed and locked. Step 4010B, raising the lifting platform from position B1 to B0. Step 4012A, the double-layer box is taken out by the overhead crane system. Step 4012B, the single-layer box (3700) returns to the mask storage system (600"). Whether the photomasks are ultimately stored in single-layer or double-layer boxes, the storage environment is crucial for their preservation. A storage compartment with a gate helps maintain the storage environment. Of course, the gate's operational options are also limited by the cabinet system's internal configuration. The following illustrates the valve operation mechanism for the storage compartment of the cabinet system of the present invention. Figure 41A illustrates the interaction process between the robotic arms (4100, 4102) of the cabinet system and the storage chamber (4104), placing a box (P) into the storage chamber (4104). Figure 41B illustrates the interaction process between the robotic arms (4100, 4102) of the cabinet system and the storage chamber (4104), taking out a box (P) from the storage chamber (4104). The storage chamber (4104) shown has a gate, and the front end (4102) of the robotic arm can be configured to interact with the gate of the storage chamber (4104), for example, the front end (4102) of the robotic arm has a specific mechanism that can extend into the bottom notch of the gate and lift the gate to expose the space of the storage chamber (4104), but the present invention is not limited to this. More specifically, the robotic arm can be composed of at least two parts, one is a gripping mechanism (4100), and the other is an interaction mechanism (4102) for the gate, and the two mechanisms can operate independently. As shown in Figure 41A, one part of the robot arm first opens the gate, while the other part places the box (P). Once the placement is complete, the gate is restored to its closed state. Figure 41B shows the reverse process. Figure 42A illustrates another embodiment of the interaction between the cabinet system's robotic arm and the storage compartment, showing the process of placing a box into the storage compartment. Figure 42B illustrates another embodiment of the interaction between the cabinet system's robotic arm and the storage compartment, showing the process of removing a box from the storage compartment. The robotic arm of this embodiment comprises two independent parts: a gripping portion (4200) and a pushing portion (4202). The gripping portion (4200) is used to carry or clamp a box (P) and access the space in the storage compartment (4204). The storage compartment (4204) has a pivotable gate (4206). The pushing portion (4202) can extend forward relative to the gripping portion (4200) to push a plate (4208) on the gate (4206), causing the gate (4206) to be opened like a lever, allowing the gripping portion to deliver the box (P) into the storage compartment (4204). Once completed, the pushing portion (4208) retracts, returning the gate (4206) to its closed position. Figure 43 is a schematic diagram of an embodiment of the mask storage cabinet pipeline filling system of the present invention. At least one main pipeline (4300) is connected upstream to a nitrogen source (4302) and downstream to a plurality of branch pipelines (4304). Each branch pipeline (4304) is connected to a corresponding storage chamber (604') in the storage cabinet (602). At least one flow controller (4306) is connected to the main pipeline (4300). When a mask box is placed in a designated storage chamber (604') of the storage cabinet (602), the flow controller (4306) determines the opening and closing of a specific gas valve to fill the designated storage chamber (604') with nitrogen. For example, the flow controller (4306) can be configured to monitor the gas flow of the main pipeline (4306) and control the opening and closing of the regulating valve (4308) on each branch pipeline (4304). The regulating valve (4308) can be used to adjust the gas flow rate of each branch pipeline (4304). As shown in the figure, the upstream end of the main line (4300) may include a particulate filter (4310), a pressure gauge (4312), a pressure sensor (4314), a pressure regulator (4316) and a ball valve (4318), but the present invention is not limited thereto. FIG44 shows a schematic diagram of another embodiment of the mask loading device and the mask storage system of the present invention. Compared with the aforementioned embodiment, it can be seen that the mask loading system (200") of this embodiment realizes the transfer of the mask by only a single lifting means (A). Similarly, the mask transfer box (10) is opened during the process of descending from height A0 to A1, and finally the inner box (11) is exposed. The inner box (11) at the height A1 allows interaction with the robot arm (609) and is clamped, so that the path of the mask transfer is shortened and the risk of the mask shaking is reduced. Figure 45A is a mask loading process according to the embodiment of Figure 44. Figure 45B is a mask unloading process according to the embodiment of Figure 44. Step 4500, load a double-layer box (such as the mask transfer box 10) onto the lifting platform, the double-layer box includes an inner box (11) for accommodating a mask and an outer box for accommodating the inner box (11). Step 4502, expose the inner box (11) of the double-layer box to a height A1, that is, the mask transfer environment. Step 4504, transfer the inner box (11) to a storage chamber (604') designated by the storage cabinet (602). Step 4506, open the gate of the designated storage chamber (604') to place the inner box (11), close the gate and fill the storage chamber (604') with nitrogen to complete storage. Step 4508, load an outer box of a double-layer box (such as the outer box 12 in the first figure) onto the lifting platform, the outer box includes a cover and a base. In step 4510, the lift table descends to open the outer box and place the base at height A1. In step 4512, the inner box (11) containing the photomask is removed from the designated storage room (604') of the storage cabinet (602), and the inner box is unloaded and placed on the base at height A1. In step 4514, the lift table ascends to close the double-layer box and lock it. In step 4516, the double-layer box is removed. Figure 46A is another mask loading process according to the embodiment of Figure 44. Figure 46B is another mask unloading process according to the embodiment of Figure 44. Step 4600, load a double-layer box from a port to the lifting platform, the double-layer box includes an inner box (11) and an outer box for accommodating the inner box. Step 4602, grasp the cover of the outer box, lower the lifting platform carrying the inner box (11) and the outer box base from height A0 to A1, thereby opening the outer box. Step 4604, while the lifting platform is lowered from height A0 to A1, read the two-dimensional barcode on the inner box (11) through an identification means, and detect the status of the protective film. Step 4606, the robotic arm of the cabinet system (600") removes the inner box (11) carried by the outer box base, so that the mask loading system (200") only has the outer box of the double-layer box. In step 4608, when the lifting platform is raised from height A1 to A0, the outer box of the double-layer box is closed and locked. In step 4610, the outer box of the double-layer box is taken out from the port. In step 4612, an outer box of a double-layer box is loaded from the port to the lifting platform to receive an inner box (11) in the mask cabinet system (600"). In step 4614, the cover of the outer box is grasped and the lifting platform carrying the base of the outer box is lowered from height A0 to A1, thereby opening the outer box. In step 4616, the robotic arm of the mask cabinet system (600" will designate an inner box (11) to be placed on the outer box base of the lifting platform. In step 4618, while the lifting platform is raised from height A1 to A0, the two-dimensional bar code on the inner box (11) is read by an identification means and the protective film status is detected. In step 4620, after the lifting platform is raised from height A1 to A0, the double-layer box is closed and locked. Step 4622, remove the double-layer box from the port.10: Mask transfer box 11: Inner box 12: Outer box 20: Base 30: Cover 32: Press pin 34: Cap 40: Outer base 50: Outer cover 52: Handle 100: Mask storage box 101: Dedicated inner box 102: Dedicated outer box 110: Cover 111: Handle 112: Filter cover 114: Groove 120: Mask limiter 121: Body 122: Elastic arm 123: Limit Part 124: Inclined surface 125: Pressing portion 130: Base 131: Cuticle groove 132: Positioning groove 134: Support member 135: Inclined surface 136: Limit block 150: Outer cover 151: Handle 152: Flat top surface 153: Horseshoe-shaped downward pressure rib 154: Downward pressure column 160: Outer base 161: Positioning column 162: Air valve 163: Positioning groove 200: Mask loading system 200': Mask loading system 200" : Mask loading system 202: First port 204: Second port 206: Mask transfer environment 300: Flow controller 400: Mask storage cabinet inflation pipeline system 500: Mask storage cabinet management system 600: Mask storage system 600': Mask storage system 600": Mask storage system 602: Storage cabinet 604: Storage rack 604': Storage room 606: Buffer zone 608: Management means 609: Machinery Arm 610: Control 612: Flow Control 614: Cleaning Device 1800A: Outer Box Cover Support Surface 1802A: Lifting Platform 1900: Mask Clamping Mechanism 1900': Mask Clamping Mechanism 1902: Track 1904: Clamping Assembly 1906: Clamping Arm 1908: Contact Plate 1910: Fitting Portion 2000: Lifting Platform 2600: Front End 2602: Back End 2604: Inflation Pipeline 2606: Nozzle 2608: Dynamic coupling positioning column 2610: Stopper 2612: Connecting arm 2700: Latch mechanism 2800: Front end 2802: Rear end 2804: Positioning column 2900: Air supply line 2901: Ball valve 2902: Flow indicator 2903: Flow limiting valve 2904: Filter 2905: Thermohygrometer 2906: Mechanical pressure gauge 2907: Electronic pressure gauge 2908 : Pressure regulating valve 2909: Main line 2910: Pressure gauge 2911: Air valve 3000: Flow controller 3001: Filter 3002: Needle valve 3700: Single-layer box 3900 to 3912: Step 3800: Connector 3802: Dynamic coupling positioning column 3804: Guide column 4000 to 4012: Step 4100: Gripping mechanism of the robotic arm 4102: Front end of the robotic arm (interactive mechanism) 4104: Storage chamber 4200: Gripping portion 4202: Pushing portion 4204: Storage chamber4206: Gate 4208: Plate 4300: Main line 4302: Nitrogen source 4304: Branch line 4306: Flow controller 4308: Regulating valve 4310: Particulate filter 4312: Pressure gauge 4314: Pressure sensor 4316: Pressure regulator 4318: Ball valve R: Mask W: Window H: Vertical drop A: First lifting means B: Second lifting means P: Box A0 to A2: Height B0 to B2: Height 1500 to 1510: Steps 1600 to 1608: Steps 1700 to 1712: Steps 3300 to 3310: Steps 3400 to 3408: Steps 3500 to 3510: Steps 4500 to 4516: Steps 4600 to 4622: Steps The present invention may be further understood with reference to the following figures and descriptions. Non-limiting and non-exhaustive examples are described with reference to the following figures. The components in the figures are not necessarily to actual size; the emphasis is on illustrating the structure and principles. FIG1 shows an exploded side view of a conventional photomask storage box. FIG2 shows an exploded perspective view of a conventional inner box and a light mask. FIG3 shows a block diagram of the photomask storage system of the present invention. FIG. 4 is a perspective view showing the photomask storage system of the present invention. FIG5A shows an exploded side view of the photomask storage box of the present invention. Figure 5B is a three-dimensional view of the outer cover of the special outer box of the present invention. Figure 5C is a three-dimensional view of the base outside the special outer box of the present invention. Figure 5D is an exploded perspective view of the dedicated inner box of the present invention. Figure 5E shows a top view of the cover of the special inner box of the present invention. FIG5F shows a bottom view of the cover of the inner box of the present invention. FIG5G shows a cross-sectional view of the cover of the inner box according to the present invention according to the dotted line in FIG5E. Figure 5H shows a top view of the base of the special inner box of the present invention. FIG5I shows a bottom view of the base of the special inner box of the present invention. FIG5J shows a cross-sectional view of the base of the inner box according to the present invention according to the dotted line in FIG5H. Figure 5K shows a three-dimensional view of the base of the special inner box of the present invention. FIG5L shows a perspective view of a corner of the base of the present invention. FIG5M shows a three-dimensional view of another corner of the base of the present invention. FIG5N shows a mask limiter provided on the inner side of the cover of the present invention. FIG6A shows a mask limiter and a corresponding support member of a dedicated inner box of the present invention for limiting a corner of a mask. FIG6B is a partial enlargement showing that the support member of the present invention limits the lateral displacement of the mask limiter. FIG7A is a perspective view showing the inner box of the present invention. FIG7B shows a cross-sectional view of the inner box according to the present invention along the dotted line in FIG7A . FIG8A shows a bottom view of the outer cover of the special outer box of the present invention. Figure 8B shows an enlarged view of the pressing mechanism acting on the cover of the dedicated inner box. FIG. 9A is a cross-sectional view showing the mask storage box of FIG. 5A when combined. FIG9B shows a partial enlarged view of the area indicated by the dotted line in FIG9A. FIG. 10A is a perspective view showing a conventional mask transfer inner box. FIG. 10B shows the corresponding mechanism of the pressing mechanism acting on the cover of the conventional mask transfer inner box. FIG10C is an enlarged view showing the corresponding mechanism between the pressing mechanism and the inner box of the mask transfer box. FIG. 11A is a cross-sectional view showing a dedicated inner box housed in a dedicated outer box of the photomask storage box of the present invention. FIG. 11B is a cross-sectional view showing a dedicated outer box of the photomask storage box of the present invention accommodating a non-dedicated inner box. FIG12 is an overlapping view of the cover of the inner box of the present invention and the cover of the inner box of the mask transfer box. FIG13 is a perspective view of the appearance of the mask loading system of the present invention. FIG14 is a schematic diagram of a mask loading system according to the present invention. FIG. 15 shows a loading flow chart of the mask storage method of the present invention. FIG. 16 shows a flow chart of the unloading process of the mask storage method of the present invention. FIG. 17 shows a specific flow chart of a mask transfer process according to the present invention. FIG. 18 shows a specific embodiment of the photomask loading system of the present invention. FIG. 19A shows an embodiment of a reticle clamping mechanism for use in a reticle loading system. FIG19B shows a front view of the photomask clamping mechanism. FIG. 19C shows a top view of the photomask clamping mechanism. FIG. 20 shows the cooperation between the mask clamping mechanism and the lifting platform. FIG21 illustrates the abnormality handling process of the mask loading system. FIG. 22 illustrates another abnormality handling process of the mask loading system. FIG23 illustrates the abnormality handling process of the mask clamping mechanism. FIG24 is a block diagram of the mask loading system and the mask storage system of the present invention. FIG25 is a top view of the photomask storage system of the present invention, showing the specific configuration inside the photomask storage system. FIG26A shows a perspective view of a specific embodiment of the storage rack of the present invention. FIG. 26B shows the bottom configuration of the storage rack. FIG. 27A shows that the storage rack has a photomask storage box. FIG. 27B shows a bottom view of the storage rack with the photomask storage box. FIG. 27C shows another view of the storage rack with the photomask storage box. FIG28A shows a top view of a specific embodiment of the storage rack and the robotic arm, wherein the robotic arm is located below the mask storage box, and the positioning slots at the bottom of the mask storage box on the storage rack are indicated by dotted lines. FIG28B is a side view showing the robotic arm entering under the storage rack and extracting the mask storage box. FIG28C shows a side view of the robotic arm removing the mask storage box from the storage rack. FIG29 shows the upstream air supply pipeline of the storage rack and its flow control means. FIG. 30 shows two specific embodiments of the upstream air supply line connected to the storage rack. Figure 31 illustrates the abnormality handling process of the robotic arm of the mask cabinet system. FIG32 is a schematic diagram showing another embodiment of the mask loading device and the mask storage system of the present invention. FIG33 is a flowchart of mask loading according to the embodiment of FIG32 . FIG34 is a flowchart of the mask unloading process according to the embodiment of FIG32. FIG35 is a detailed mask transfer process according to the embodiment of FIG32. FIG36 shows the process of transferring the inner box. FIG37 is a schematic diagram showing another embodiment of the mask loading device and the mask storage system of the present invention. FIG. 38A shows a specific embodiment of the storage chamber. FIG. 38B shows the configuration of the upward-facing support surface on the inner side of the storage chamber. Figure 38C shows a single layer of boxes in the storage chamber. Figure 38D shows that the bearing surface mechanism of the storage chamber supports the bottom of the single-layer box. FIG. 39A shows the mask loading process according to FIG. 37 . FIG. 39B shows the mask unloading process according to FIG. 37 . FIG. 40 is a detailed mask transfer process according to the embodiment of FIG. 37 . Figure 41A illustrates an embodiment of the interaction between the robotic arm of the cabinet system and the storage chamber, and the process of placing a box into the storage chamber. Figure 41B illustrates an embodiment of the interaction between the robotic arm of the cabinet system and the storage chamber, and the process of taking out a box from the storage chamber. FIG42A illustrates another embodiment of the interaction between the robotic arm of the cabinet system and the storage chamber, illustrating the process of placing a box into the storage chamber. FIG42B illustrates another embodiment of the interaction between the robotic arm of the cabinet system and the storage chamber, illustrating the process of taking out a box from the storage chamber. Figure 43 is a schematic diagram of an embodiment of the mask storage cabinet pipeline inflation system of the present invention. FIG44 is a schematic diagram showing yet another embodiment of the mask loading device and the mask storage system of the present invention. FIG45A is a photomask loading process according to the embodiment of FIG44. FIG45B is a photomask unloading process according to the embodiment of FIG44. FIG. 46A is another mask loading process according to the embodiment of FIG. 44 . FIG46B is another mask unloading process according to the embodiment of FIG44. 200:Mask loading system 202: First Port

Claims

1. A photomask loading system, comprising: a first port configured to allow a photomask transport box to be transferred between an external environment and a loading environment; a second port configured to allow a photomask storage box to be transferred between the loading environment and a storage environment; and a first lifting means configured to cooperate with the first port and carry the photomask transport box, and to move vertically within the loading environment such that the photomask transport box can be lifted between a top position and a bottom position, wherein when the bottom position is reached, a receiving space of the photomask transport box is opened and exposed to the loading environment; A second lifting means is configured to cooperate with the second port and carry the photomask storage box, and to move up and down in the loading environment, so that the photomask storage box can move up and down between a top position and a bottom position, wherein when the bottom position is reached, a receiving space of the photomask storage box is opened and exposed to the loading environment; and a photomask clamping mechanism is configured to operate at a height in the loading environment, the height corresponding to the bottom position that the photomask transport box and the photomask storage box can reach, so that a photomask or a base carrying the photomask can be transferred between the receiving space exposed when the photomask transport box is opened and the receiving space exposed when the photomask storage box is opened.

2. The photomask loading system as described in claim 1, wherein, Both the photomask delivery box and the photomask storage box located at the top are closed, so that the accommodating space of the photomask delivery box and the accommodating space of the photomask storage box are not exposed.

3. The photomask loading system as described in claim 1, wherein, Both the photomask transport box and the photomask storage box located at the bottom are in the open state, so that the outer cover and the inner cover of the photomask transport box and the outer cover and the inner cover of the photomask storage box are removed.

4. The photomask loading system as described in claim 3, wherein, The outer and inner covers of the removed photomask transfer box, as well as the outer and inner covers of the photomask storage box, remain between the top and bottom positions.

5. The photomask loading system as described in claim 1, wherein, The photomask clamping mechanism has a track and a clamping assembly configured to clamp both sides of the photomask or base, and the clamping assembly can move laterally between the bottom positions via the track.

6. The photomask loading system as described in claim 1 further includes: an identification and inspection means configured to cooperate with the first lifting means or the second lifting means to read information relating to the photomask transport box, the photomask storage box, the photomask protective film, the photomask, or any of the above.

7. The photomask loading system as described in claim 1 further includes: a gas control means configured to control air intake, filtration and exhaust to maintain the cleanliness of the loading environment.

8. A photomask loading method, comprising: providing a first port for transferring a photomask transport box from an external environment to a loading environment, wherein the photomask transport box houses a photomask; providing a second port for transferring a photomask storage box from a storage environment to the loading environment; and providing in the loading environment a first lifting means cooperating with the first port to lower the photomask transport box from a top position to a bottom position, and upon reaching the bottom position, opening the photomask transport box to expose a receiving space of the photomask transport box and the photomask; In the loading environment, a second lifting means is provided in conjunction with the second port to lower the photomask storage box from a top position to a bottom position, and upon reaching the bottom position, the photomask storage box is opened to expose a receiving space of the photomask storage box; and via a photomask clamping mechanism operable in the loading environment, the exposed photomask is transferred from the opened photomask transport box to the exposed receiving space of the opened photomask storage box, wherein the photomask clamping mechanism is located at a height in the loading environment corresponding to the bottom position that the photomask transport box and the photomask storage box can reach.

9. The photomask loading method as described in claim 8 further includes: providing an opening means such that an outer cover and an inner cover of the photomask transport box are removed before reaching the bottom position, while an outer base and an inner base of the photomask transport box reach the bottom position.

10. The photomask loading method as described in claim 8 further comprises: providing an opening means such that an outer cover and an inner cover of the photomask storage box are removed before reaching the bottom position, while an outer base and an inner base of the photomask storage box reach the bottom position.

11. The photomask loading method as described in claim 8 further includes: after photomask conversion, raising the photomask transport box to the top position via the first lifting means, and converting the photomask transport box to the external environment via the first port.

12. The photomask loading method as described in claim 8 further includes: after photomask conversion, raising the photomask storage box to the top position via the second lifting means, and converting the photomask storage box to the storage environment via the second port.

13. The photomask loading method as described in claim 8 further includes: providing an identification and inspection means in the loading environment to read information relating to the photomask transport box, the photomask storage box, the photomask protective film, the photomask, or any of the above between the top and bottom positions of the first lifting means or between the top and bottom positions of the second lifting means.

14. The photomask loading method as described in claim 8 further includes: providing a gas control means in the loading environment to maintain the cleanliness of the loading environment.

15. A method for removing a photomask, comprising: providing a first port for transferring a photomask transport box from an external environment to a loading environment; providing a second port for transferring a photomask storage box from a storage environment to the loading environment, wherein the photomask storage box houses a photomask; and providing in the loading environment a first lifting means cooperating with the first port to lower the photomask transport box from a top position to a bottom position, and upon reaching the bottom position, opening the photomask transport box to expose a receiving space of the photomask transport box; In the loading environment, a second lifting means is provided in conjunction with the second port to lower the photomask storage box from a top position to a bottom position, and upon reaching the bottom position, the photomask storage box is opened to expose a receiving space of the photomask storage box and the photomask; and via a photomask clamping mechanism operable in the loading environment, the exposed photomask is transferred from the opened photomask storage box to the receiving space exposed by the opened photomask transfer box, wherein the photomask clamping mechanism is located at a height in the loading environment corresponding to the bottom position that the photomask transfer box and the photomask storage box can reach.

16. The photomask removal method as described in claim 15 further comprises: providing an opening means such that an outer cover and an inner cover of the photomask transport box are removed before reaching the bottom position, while an outer base and an inner base of the photomask transport box reach the bottom position.

17. The photomask removal method as described in claim 15 further comprises: providing an opening means such that an outer cover and an inner cover of the photomask storage box are removed before reaching the bottom position, while an outer base and an inner base of the photomask storage box reach the bottom position.

18. The photomask removal method as described in claim 15 further comprises: after the photomask is changed, raising the photomask transport box to the top position via the first lifting means, and transferring the photomask transport box to the external environment via the first port.

19. The photomask removal method as described in claim 15 further comprises: after the photomask is changed, raising the photomask storage box to the top position via the second lifting means, and changing the photomask storage box to the storage environment via the second port.

20. The photomask removal method as described in claim 15 further comprises: providing an identification and inspection means in the loading environment to read information relating to the photomask transport box, the photomask storage box, the photomask protective film, the photomask, or any of the above between the top and bottom positions of the first lifting means or between the top and bottom positions of the second lifting means.

21. The photomask removal method as described in claim 15 further includes: providing a gas control means in the loading environment to maintain the cleanliness of the loading environment.

Images