Non-thermal plasma generation device

Abstract

A nonthermal plasma generating device is characterized by comprising: a cavity; a high-voltage electrode base; a grounding electrode base; a high-voltage electrode; a plurality of grounding electrodes surrounding the high-voltage electrode; wherein the high-voltage electrode base, the cavity, and the grounding electrode base form a closed nonthermal plasma discharge zone; a gas input pipe communicating with the nonthermal plasma discharge zone for inputting gas; and a plasma output pipe communicating with the nonthermal plasma discharge zone for outputting plasma; wherein, by adjusting the number of the plurality of grounding electrodes that are connected or grounded, the discharge intensity in the discharge zone and the concentration of active species in the output plasma can be linearly adjusted to meet the needs of different applications, and the operation will not be interrupted due to the failure of a single grounding electrode, thus extending the device's service life.

Claims

1. A non-thermal plasma generating device, characterized by comprising: a cavity; a high-voltage electrode base disposed at one end of the cavity; a grounding electrode base disposed at the other end of the cavity; a high-voltage electrode disposed on the high-voltage electrode base; and a plurality of grounding electrodes disposed on the grounding electrode base and surrounding the high-voltage electrode; wherein, The high-voltage electrode base, the cavity, and the grounding electrode base form a sealed non-thermal plasma discharge zone; a gas input pipe is connected to the non-thermal plasma discharge zone for inputting gas; and a plasma output pipe is connected to the non-thermal plasma discharge zone for outputting plasma; wherein, by adjusting the number of the plurality of grounding electrodes that are connected or grounded, the discharge intensity in the discharge zone and the concentration of active species in the output plasma can be adjusted.

2. The non-thermal plasma generating apparatus as described in claim 1, wherein, The number of the plurality of grounding electrodes is proportional to the concentration of active species in the output plasma.

3. The non-thermal plasma generating apparatus as described in claim 1, wherein, The radial distance from the high-voltage electrode to each of the grounding electrodes is the same.

4. The non-thermal plasma generating apparatus as described in claim 1, wherein, The distance between adjacent grounding electrodes is the same.

5. The non-thermal plasma generating apparatus as described in claim 1, wherein, The cavity is cylindrical.

6. The non-thermal plasma generating apparatus as described in claim 1, wherein, The high-voltage electrode system is cylindrical.

7. The non-thermal plasma generating apparatus as described in claim 1, wherein, The grounding electrode is cylindrical.

8. The non-thermal plasma generating apparatus as described in claim 1, wherein, The plasma output tube is connected to a microbubble tube.

9. The non-thermal plasma generating apparatus as described in claim 8, wherein, The pore size on the microbubble tube is 10⁻³ to 10⁻⁸ meters.

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